• Title/Summary/Keyword: Holographic Interferometer

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Role of Arbitrary Intensity Profile Laser Beam in Trapping of RBC for Phase-imaging

  • Kumar, Ranjeet;Srivastava, Vishal;Mehta, Dalip Singh;Shakher, Chandra
    • Journal of the Optical Society of Korea
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    • v.20 no.1
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    • pp.78-87
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    • 2016
  • Red blood cells (RBCs) are customarily adhered to a bio-functionalised substrate to make them stationary in interferometric phase-imaging modalities. This can make them susceptible to receive alterations in innate morphology due to their own weight. Optical tweezers (OTs) often driven by Gaussian profile of a laser beam is an alternative modality to overcome contact-induced perturbation but at the same time a steeply focused laser beam might cause photo-damage. In order to address both the photo-damage and substrate adherence induced perturbations, we were motivated to stabilize the RBC in OTs by utilizing a laser beam of ‘arbitrary intensity profile’ generated by a source having cavity imperfections per se. Thus the immobilized RBC was investigated for phase-imaging with sinusoidal interferograms generated by a compact and robust Michelson interferometer which was designed from a cubic beam splitter having one surface coated with reflective material and another adjacent coplanar surface aligned against a mirror. Reflected interferograms from bilayers membrane of a trapped RBC were recorded and analyzed. Our phase-imaging set-up is limited to work in reflection configuration only because of the availability of an upright microscope. Due to RBC’s membrane being poorly reflective for visible wavelengths, quantitative information in the signal is weak and therefore, the quality of experimental results is limited in comparison to results obtained in transmission mode by various holographic techniques reported elsewhere.

Damage Measurement for Molybdenum Thin Film Using Reflection-Type Digital Holography (반사형 디지털 홀로그래피를 이용한 Molybdenum 박막의 손상 측정)

  • Kim, Kyeong-Suk;Jung, Hyun-Il;Shin, Ju-Yeop;Ma, Hye-Joon;Kwon, Ik-Hwan;Yang, Seung-Pill;Hong, Chung-Ki;Jung, Hyun-Chul
    • Journal of the Korean Society for Nondestructive Testing
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    • v.35 no.2
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    • pp.141-149
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    • 2015
  • In the fabrication of electronic circuits used in electronic products, molybdenum thin films are deposited on semiconductors to prevent oxidation. During the deposition, the presence of a particle or dust at the interface between the thin film and substrate causes the decrease of adhesion, performance, and life cycle. In this study, a damage measurement targeting two kinds of glass substrate, with and without particles, was performed in order to measure the change in the molybdenum thin film deposition area in the presence of a particle. Clean and dirty molybdenum thin film specimens were fabricated and directly deposited on a substrate using the sputtering method, and a reflection-type digital holographic interferometer was configured for measuring the damage. Reflection-type digital holography has several advantages; e.g., the configuration of the interferometer is simple, the measurement range can be varied depending on the magnification of a microscopic lens, and the measuring time is short. The results confirm that reflection-type digital holography is useful for the measurement of the damage and defects of thin films.

Measurement of Width and Step-Height of Photolithographic Product Patterns by Using Digital Holography (디지털 홀로그래피를 이용한 포토리소그래피 공정 제품 패터닝의 폭과 단차 측정)

  • Shin, Ju Yeop;Kang, Sung Hoon;Ma, Hye Joon;Kwon, Ik Hwan;Yang, Seung Pil;Jung, Hyun Chul;Hong, Chung Ki;Kim, Kyeong Suk
    • Journal of the Korean Society for Nondestructive Testing
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    • v.36 no.1
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    • pp.18-26
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    • 2016
  • The semiconductor industry is one of the key industries of Korea, which has continued growing at a steady annual growth rate. Important technology for the semiconductor industry is high integration of devices. This is to increase the memory capacity for unit area, of which key is photolithography. The photolithography refers to a technique for printing the shadow of light lit on the mask surface on to wafer, which is the most important process in a semiconductor manufacturing process. In this study, the width and step-height of wafers patterned through this process were measured to ensure uniformity. The widths and inter-plate heights of the specimens patterned using photolithography were measured using transmissive digital holography. A transmissive digital holographic interferometer was configured, and nine arbitrary points were set on the specimens as measured points. The measurement of each point was compared with the measurements performed using a commercial device called scanning electron microscope (SEM) and Alpha Step. Transmission digital holography requires a short measurement time, which is an advantage compared to other techniques. Furthermore, it uses magnification lenses, allowing the flexibility of changing between high and low magnifications. The test results confirmed that transmissive digital holography is a useful technique for measuring patterns printed using photolithography.