• 제목/요약/키워드: High-transmittance film

검색결과 396건 처리시간 0.032초

Enhanced Infrared detection of photodetector using Ag nanowire-embedded ITO Layers

  • 김홍식;김준동;;김자연;권민기
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.244.1-244.1
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    • 2015
  • The Ag Nanowire is one of the materials that are widely studied as alternatives to ITO and is available for large area, low cost process and the flexible transparent electrode. However, Ag nanowire can have the problem of a lack of stability at high temperatures, making this impossible to form a film. Using a structure of ITO/AgNW/ITO in photodetector device, we improved the properties of the ITO in the IR region and improved the thermal stability of the AgNW. The structure of ITO/AgNW/ITO has a high transmittance value of 89% at a wavelength of 900 nm and provide a good electrical property. The AgNWs embedded ITO film has a high transmittance, this is because of the light scattering from the AgNW. The thermal stability of the developed ITO/AgNWs/ITO films were investigated and found AgNWs embedded ITO films posses considerable high stability compared to the solo AgNWs on the Si surface. The ITO/AgNWs/ITO device showed a improved photo-response ratio compared to those of the conventional TC device in IR region. This is attributed to the high transmittance and low sheet resistance. We suggest an effective design scheme for IR-sensitive photodetection by using an AgNW embedded ITO.

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RF Power변화에 의한 CdTe 박막에 관한 연구 (A Study on CdTe Thin Film by RF Power Change)

  • 박정철
    • 한국정보전자통신기술학회논문지
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    • 제16권4호
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    • pp.187-192
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    • 2023
  • 본 논문은 스퍼터링 장비를 이용하여 ITO 유리 기판에 CdTe 박막을 RF Power로 변화주면서 CdTe 박막을 증착하였다. 박막의 두께를 측정한 결과, 100W 일 때 1481Å, 150W는 2985Å, 200W는 4684Å로 측정되었다. 그리고 이동도는 100W일 때 8.43cm2/Vs, 150W는 7.91cm2/Vs, 200W는 6.57cm2/Vs로 측정되었다. 시편의 두께와 이동도는 반비례한 한다는 것을 알 수가 있었다. 투과율을 확인한 결과, 100W 일 때 905nm에서 투과율은 84%, 150W는 825nm에서 투과율이 71%, 200W는 874nm에서 77%로 측정되었다. 이것은 시편의 두께가 100W일 때 시편의 두께가 얇았으므로 투과율이 높게 측정되었다. 즉 투과율과 두께의 상관관계를 알 수가 있는 부분이다. RF Power를 변화주어 반치폭과 입자의 크기를 측정한 결과, 반치폭은 100W일 때 0.18, 150W는 0.19, 200W는 0.73으로 계산되었다. 입자의 크기는 100W에서는 8.47Å, 150W에서는 7.98Å, 200W일 때 가장 큰 8.7Å으로 형성된 것으로 확인되었다. 결론적으로 반치폭과 입자 크기는 반비례하는 것을 알 수 있었다.

Effect of SiO2 and Nb2O5 Buffer Layer on Optical Characteristics of ITO Thin Film

  • Kwon, Yong-Han;Jang, Gun-Eik
    • Transactions on Electrical and Electronic Materials
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    • 제16권1호
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    • pp.29-33
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    • 2015
  • This paper presents the results of the optical characteristics of ITO thin film with different buffer layer thicknesses of $SiO_2$ and $Nb_2O_5$ for touch sensor application. $SiO_2$ and $Nb_2O_5$ buffer layers were deposited using RF magnetron sputtering equipment. The buffer layers were inserted between glass and ITO layers. In order to compare with the experimental results, the Essential Macleod Program (EMP) was adopted. Based on EMP simulation, the [$Nb_2O_5{\mid}SiO_2{\mid}ITO$] multi-layered thin film exhibited high transmittance of more than 85% in the visible region. The actual experimental results also showed transmittance of more than 85% in the visible region, indicating that the simulated results were well matched with the experimental results. The sheet resistance of ITO based film was about $340{\Omega}/sq$. The surface roughness maintained a relatively small value within the range of 0.1~0.4 nm when using the $Nb_2O_5$ and $SiO_2$ buffer layers.

저온 형성 가능한 "졸겔 ZnO / 은 나노선" 복합 투명전도막 (Low Temperature Processed Transparent Conductive Thin Films Based on Sol-Gel ZnO / Ag Nanowire)

  • 신원중;김보석;문찬수;조원기;백승재
    • Current Photovoltaic Research
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    • 제2권3호
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    • pp.110-114
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    • 2014
  • We propose a low temperature sol-gel ZnO/Ag nanowire composite thin film to fulfill low temperature and low cost requirements, which are essential criteria in future flexible electronic devices. In this proposed thin film, Ag nanowire plays the role of electrical conduction, and sol-gel ZnO provides a structural medium with a high visible transmittance. Low temperature restriction in the sol-gel fabrication process prevents sufficient oxidation of Zn acetate precursors, which were solved by a post-coating treatment with ultraviolet light irradiation. Composite thin film formation was performed by spin coating methods with a mixed precursor solution or in a sequential manner. We obtained an average visible transmittance larger than 85% and a sheet resistance smaller than $50{\Omega}/sq$. After optimization in a fabricated composite transparent conductive thin film with the thickness around 100 nm. Similar experimental demonstration in a flexible substrate (polyethyleneterephthalate) was successful, which implies a promising application opportunity of this technology.

광전소자 응용을 위한 Ga가 첨가된 ZnO 박막의 광학적 및 전기적 특성 연구 (A Study on the Optical and Electrical Properties of Ga-doped ZnO Films for Opto-electronic Devices)

  • 길병우;이성의;이희철
    • 한국전기전자재료학회논문지
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    • 제24권4호
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    • pp.303-308
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    • 2011
  • The Gallium-doped ZnO(GZO) film deposited at a temperature of $200^{\circ}C$ and a pressure of 10 mtorr has an optical transmittance of 89.0% and a resistivity of $2.0\;m{\Omega}{\cdot}cm$ because of its high crystallinity. Effect of $Al_2O_3$ oxide buffer layers on the optical and electrical properties of sputtered ZnO films were intensively investigated for developing the electrodes of opto-electronic devices which demanded high optical transmittance and low resistivity. The use of $Al_2O_3$ buffer layer could increase optical transmittance of GZO film to 90.7% at a wavelength of 550 nm by controlling optical spectrum. Resistivity of deposited GZO films were much dependent on the deposition condition of $O_2/(Ar+O_2)$ flow rate ratio during the buffer layer deposition. It is considered that the $Al_2O_3$ buffer layer could increase the carrier concentration of the GZO films by doping effect of diffused Al atoms through the rough interface.

PVD 코팅법에 의한 ZnO제조 및 특성 (Preparation and characterization of Zinc Oxide films deposition by (PVD))

  • 김성진;박헌균
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.95.1-95.1
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    • 2010
  • Transparent conducting ZnO films were deposited to apply DSSC Substrate on glass substrates at $500^{\circ}C$ by ionbeam-assisted deposition. Crystallinity, microstructure, surface roughness, chemical composition, electrical and optical properties of the films were investigated as a function of deposition parameters such as ion energy, and substrate temperature. The microstructure of the polycrystalline ZnO films on the glass substrate were closely related to the oxygen ion energy, arrival ratio of oxygen to Zinc Ion bombarded on the growing surface. The main effect of energetic ion bombardment on the growing surface of the film may be divided into two categories; 1) the enhancement of adatom mobility at low energetic ion bombardment and 2) the surface damage by radiation damage at high energetic ion bombardment. The domain structure was obtained in the films deposited at 300 eV. With increasing the ion energy to 600 eV, the domain structure was changed into the grain structure. In case of the low energy ion bombardment of 300 eV, the microstructure of the film was changed from the grain structure to the domain structure with increasing arrival ratio. At the high energy ion bombardment of 600 eV, however, the only grain structure was observed. The electrical properties of the deposited films were significantly related to the change of microstructure. The films with the domain structure had larger carrier concentration and mobility than those with the grain structure, because the grain boundary scattering was reduced in the large size domains compared with the small size grains. The optical transmittance of ZnO films was dependent on a surface roughness. The ZnO films with small surface roughness, represented high transmittance in the visible range because of a decreased light surface scattering. By varying the ion energy and arrival ratio, the resistivity and optical transmittance of the films were varied from $1.1{\times}10^{-4}$ to $2.3{\times}10^{-2}{\Omega}cm$ and from 80 to 87%, respectively. The ZnO film deposited at 300 eV, and substrate temperature of $500^{\circ}C$ had the resistivity of $1.1{\times}10^{-4}{\Omega}cm$ and optical transmittance of 85% in visible range. As a result of experiments, we provides a suggestition that ZnO thin Films can be effectively used as the DSSC substrate Materials.

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확산판의 투과율이 고출력 양자점 조명의 광특성에 미치는 영향에 대한 연구 (Study of the Effect of the Transmittance of a Diffuser Plate on the Optical Characteristics of High-power Quantum-dot Illumination)

  • 김혜린;유동근;유재환;장준원;최무규;홍승찬;고재현;조성윤;김용득;박태희;고영욱
    • 한국광학회지
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    • 제32권5호
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    • pp.220-229
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    • 2021
  • 눈부심 방지를 위한 확산판의 투과율과 연색지수 향상을 위한 양자점 필름의 농도가 고출력 직하형 백색 LED 조명의 광특성에 미치는 영향을 조사했다. 확산판의 투과율이 감소할 경우 조명의 휘도는 줄어들었고 색좌표, 상관색온도는 별다른 변화를 보이지 않았으며 연색지수는 약간 상승했다. 시야각에 따른 광특성의 편차는 거의 없었고 휘도 분포는 람버시안 분포에 가까웠다. 양자점 필름의 농도가 증가할 경우 스펙트럼 상 적색 성분이 늘어나면서 이 성분의 비중을 표현하는 색좌표 x가 증가했고 상관색온도는 약 6000 K에서 4000 K 부근으로 현저히 감소했다. 아울러 조명의 구조를 최적화하면 연색지수가 95까지 증가함을 확인했다. 이런 결과는 적절한 투과율의 확산판과 양자점 필름의 조합을 통해 눈부심이 없고 시야각에 따른 색편차가 거의 없으며 특히 색좌표의 가변이 가능한 고연색성의 조명 구현이 가능함을 보여준다.

안경 렌즈의 국소적 투과율 측정을 위한 방법에 관한 연구 (A Study on the Method for the Local Transmittance Measurements of the Ocular Lens)

  • 박상국;이형철;육도진;성덕용;강성수
    • 한국안광학회지
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    • 제19권4호
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    • pp.471-477
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    • 2014
  • 목적: 국소 투과율 현미경을 이용하여 안경렌즈의 투과율 분포를 분석함으로써 렌즈의 광학적 균질성을 연구하고자 한다. 방법: 안경렌즈 표면에 집광된 레이저의 투과율을 광검출기와 락인앰프로 측정하고 그 결과를 분석하였다. 코팅되지 않은 렌즈와 멀티 코팅이 된 렌즈 그리고 누진렌즈가 시료로서 분석되었다. 결과: 누진렌즈와 물리적 자극이 가해진 렌즈의 측정 결과에서 국소 투과율 현미경 분석 결과가 광학 현미경을 통한 측정 결과와 높은 일치도를 보였다. 또한 광학적 결함이 있는 곳에서 투과율의 평균값은 감소하고 표준편차는 증가하였다. 자극이 가해지지 않은 렌즈에서는 반사방지 코팅의 유무가 투과율에 큰 영향을 미치는 것을 국소 투과율 현미경과 일반적 투과율 분석 모두에서 공통적으로 분석되었다. 결론: 시료에 다양한 자극이 가해졌을 때 투과율의 분포에 변화가 생김을 국소 투과율 현미경을 통해 확인하였다. 국소 투과율 현미경을 통한 이러한 분석은 렌즈 혹은 코팅막의 균일도를 평가 혹은 확인할 수 있는 하나의 방법으로 활용될 수 있다.

Transient Behaviors of ZnO Thin Films on a Transparent, Flexible Polyethylene Terephthalate Substrate

  • Kim, Yongjun;Lee, Hoseok;Yi, Junsin;Noh, Jinseo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.179.1-179.1
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    • 2015
  • Thickness-dependent electrical, structural, and optical properties of zinc oxide (ZnO) thin films on polyethylene terephthalate (PET) substrates were investigated in the very thin thickness range of 20 to 120 nm. A very unusual transition phenomenon, in which electrical resistance increases with an increase in film thickness, was observed. From structural and compositional analyses, this transition behavior was explained to arise from metallic Zn agglomerates dispersed in non-crystalline Zn-O matrix. It was unveiled that film thickness more than 80 nm is required for the development of hexagonal crystal structure of ZnO. ZnO films on PET substrates exhibited high optical transmittance and good mechanical flexibility in the thickness range. The results of this study would provide a valuable guideline for the design of ZnO thin films on organic substrates for practical applications.

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Solution-Derived Amorphous Yttrium Gallium Oxide Thin Films for Liquid Crystal Alignment Layers

  • Oh, Byeong-Yun
    • Transactions on Electrical and Electronic Materials
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    • 제17권2호
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    • pp.109-112
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    • 2016
  • We demonstrated an alternative electrically controlled birefringence liquid crystal (ECB-LC) system with ion beam (IB)-irradiated yttrium gallium oxide (YGaO) alignment films using a sol-gel process. The surface roughness of the films was dependent on the annealing temperature; aggregated particles on surface were observed at lower annealing temperatures, whereas a smooth surface could be obtained with higher annealing temperatures. Higher transmittance in the visible region was observed at higher annealing temperatures. The film had an amorphous crystallographic state irrespective of the annealing temperature. Furthermore, ECB-LC cell with our IB-irradiated YGaO film yielded faster response time when compared to ECB-LC cell with rubbed polyimide. Considering the fast response time and high transmittance, the IB-irradiated YGaO-base LC system is a powerful alternative application for the liquid crystal display industry.