• Proceedings of the KSME Conference
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• 2003.04a
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• pp.1309-1314
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• 2003

The high precision positioning mechanism is used in various industrial fields. It is used in semiconductor manufacturing line, test instrument, Bioengineering, and MEMS and so on. This paper presents a positioning mechanism with dual servo system. Dual servo system consists of a coarse stage and a fine motion stage. The course stage is driven by VCM and the actuator of fine stage is the PZT. The purposes of dual servo system are stability, higher bandwidth, and robustness. Lead compensator is applied to this control system, and is designed by PQ method. Designed compensator can improve property of positioning mechanism.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.149-153
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• 2005

The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. The polepieces of these lenses are usually made with high purity iron which is hard to fabricate and very expensive. In this paper, the possibility of using polepiece of object lens composed with pure iron and low carbon steel was examined to reduce cost. The magnetic field at object lens was calculated with finite element method, and practical focusing qualities of SEM pictures were observed comparing for the object lens polepieces with pure iron and two type of composed with low carbon steel.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.3 s.180
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• pp.156-162
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• 2006

Direct fabrication of nano patterns has been studied employing a nano-stereolithography (NSL) process. The needs of nano patterning techniques have been intensively increased for diverse applications for nano/micro-devices; micro-fluidic channels, micro-molds. and other novel micro-objects. For fabrication of high-aspect-ratio (HAR) patterns, a thick spin coating of SU-8 process is generally used in the conventional photolithography, however, additional processes such as pre- and post-baking processes and expansive precise photomasks are inevitably required. In this work, direct fabrication of HAR patterns with a high spatial resolution is tried employing two-photon polymerization in the NSL process. The precision and aspect ratio of patterns can be controlled using process parameters of laser power, exposure time, and numerical aperture of objective lens. It is also feasible to control the aspect ratio of patterns by truncation amounts of patterns, and a layer-by-layer piling up technique is attempted to achieve HAR patterns. Through the fabrication of several patterns using the NSL process, the possibility of effective patterning technique fer various N/MEMS applications has been demonstrated.

• Journal of the Microelectronics and Packaging Society
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• v.30 no.2
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• pp.13-20
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• 2023

The process of microelectromechanical system (MEMS) fabrication involves surface treatment to impart functionality to the device. Such surface treatment method is the self-assembled monolayer (SAM) technique, which modifies and functionalizes the surface of MEMS components with organic molecule monolayer, possessing a precisely controllable strength that depends on immersion time and solution concentration. These monolayers spontaneously adsorb on polymeric substrates or metal/ceramic components offering high precision at the nanoscale and modifying surface properties. SAM technology has been utilized in various fields, such as tribological property control, mass-production lithography, and ultrasensitive organic/biomolecular sensor applications. This paper provides an overview of the development and application of SAM technology in various fields.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.467-470
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• 2004

Diamond-Like Carbon (DLC) thin film is a semiconductor with high mechanical hardness, low friction coefficient, high chemical inertness, and optical transparency. DLC thin films have widespread applications as protective coatings and solid lubricant coatings in areas such as Hard Disk Drive (HDD) and Micro-Electro-Mechanical-Systems (MEMS). In this work, the wear characteristics of DLC thin films deposited on silicon substrates using a DC-magnetron sputtering system were analyzed. The wear tracks were measured with an Atomic Force Microscope (AFM). To identify the sp2 and sp3 hybridization of carbon bonds and other bonds Raman spectroscopy was used. The structural information of DLC thin films was obtained with Fourier transform infrared spectroscopy and wear tests were conducted by using a micro-pin-on-reciprocator tester. Results showed that the wear characteristics were dependent on the sputtering conditions. The wear rate could be correlated with the bonding state of the DLC thin film.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2003.05a
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• pp.355-358
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• 2003

Recently, micro forming process technology have been developed since the size of machine parts become the crucial factor for minimizing of products in general electronic products. Most small machine parts consist of gear and rotation axis and the wear by mechanical contact is known as the primary factor for life reduction of high precision machine part. Lots of studies for mechanical wear and friction have been reported and many researches of MEMS technology have been studied recently. But just few studies for wear of micro or milli sized machine part have teen implemented. In this research, the wear equation is suggested according to the contact shape of axial part in micro or milli sized machine part. And wear analysis model which can predict the magnitude of wear through this suggested equation with numerical analysis program.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.401-404
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• 2004

The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. To achieve small spot size as 1-2 nm for higher power of electron beam, magnetic lenses should be designed considering their magnetic field distribution. In this paper, the magnetic field at two condenser lenses and object lens are calculated with finite element method and discussed its performances.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2000.11a
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• pp.926-929
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• 2000

As the track density of hard disk drives increases, there is a need for more precise actuation of the head. This can be accomplished by using a high band width micro-actuator. In this work, the flying characteristics of sliders with micro-actuators are investigated with the aim to optimize the head/disk interface performance of such sliders. Contact-start-stop, sweep, and flying height tests are performed and analyzed. The results show that the MEMS based micro-actuator mounted on a slider possess acceptable flying characteristics.

• Journal of the Korean Society for Precision Engineering
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• v.18 no.9
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• pp.96-100
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• 2001

As the track density of hard disk drives increases, there is a need for more precise actuation of the head. This can be accomplished by using a high band width micro-actuator. In this work, the flying characteristics of sliders with micro-actuators are investigated with the aim to optimize the head/disk interface performance of such sliders. Contact-start-stop, sweep, and flying height tests are performed and analyzed. The results show that the MEMS based micro-actuator mounted on a slider possess acceptable flying characteristics.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.23-24
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• 2006

We present a dispersive scheme of white-light interferometry that enables not only to perform tomographical measurements of thin-film layers but also to measure a refractive index without mechanical depth scanning. The interferometry is found useful particularly for in-situ 3-D inspection of micro-engineered surfaces such as liquid crystal displays, semi-conductor and MEMS structure, which requires for high-speed implementation of 3-D surface metrology.