• 센서학회지
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• 제15권3호
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• pp.216-221
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• 2006

ZnO thin films prepared by PLD method exhibit an excellent optical property, but may have some problems such as incomplete surface roughness and crystallinity. In this study, undoped ZnO buffer layers were deposited on (0001) sapphire substrates by ultra high vacuum pulse laser deposition (UHV-PLD) and molecular beam epitaxy (MBE) methods, respectively. After post annealing of ZnO buffer layer, undoped ZnO thin films were deposited under different oxygen pressure ($35{\sim}350$ mtorr) conditions. The Arsenic-doped (1, 3 wt%) ZnO thin layers were deposited on the buffer layer of undoped ZnO by UHV-PLD method. The optical property of the ZnO thin films was analyzed by photoluminescence (PL) measurement. The ${\theta}-2{\theta}$ XRD analysis exhibited a strong (002)-peak, which indicates c-axis preferred orientation. Field emission-scanning electron microscope (FE-SEM) revealed that microstructures of the ZnO thin films were varied by oxygen partial pressure, Arsenic doping concentration, and deposition method of the undoped ZnO buffer layer. The denser and smoother films were obtained when employing MBE-buffer layer under lower oxygen partial pressure. It was also found that higher Arsenic concentration gave the enhanced growing of columnar structure of the ZnO thin films.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2003년도 춘계종합학술대회
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• pp.615-618
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• 2003

동시 성막법에 의한 저속 성장으로 Bi 2201 및 Bi 2212 박막을 제작하였다. Bi 2212의 조성이 되도록 각 원소를 공급하고 기판 온도 및 산화 가스 압력을 변화시켜 성막을 한 결과 낮은 기판 온도에서는 Bi 2201의 단상이 생성되었으며 75$0^{\circ}C$ 이상이 되면 Bi 2212 상이 생성되었다. 이 중간 온도 영역에서는 Bi 2212와 Bi 2201의 고용체가 생성되고 있음을 해석하였다. 순차 성막법에서 생성막을 평가한 결과 성막이 이루어지고 있는 박막의 가장 표면은 목적 조성으로부터 벗어난 상태에 있으며 결정 구조의 전하 중성 조건을 예상한 곳의 표면은 불안정하다는 것을 알 수 있었다. Bi 2201 상이 생성된 막에서도 순차 성막 과정에 의한 막 생성이라기보다는 오히려 박막 내부에서의 원자 확산 과정에 의해 생성된 것으로 생각된다.

• Environmental Engineering Research
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• 제22권1호
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• pp.19-30
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• 2017

Direct catalysis of vapors from vacuum pyrolysis of biomass was performed on MCM-41 to investigate the effects of operating parameters including catalyzing temperature, catalyzing bed height and system pressure on the organic yields. Optimization of organic phase yield was further conducted by employing response surface methodology. The statistical analysis showed that operating parameters have significant effects on the organic phase yield. The organic phase yield first increases and then decreases as catalyzing temperature and catalyzing bed height increase, and decreases as system pressure increases. The optimal conditions for the maximum organic phase yield were obtained at catalyzing temperature of $502.7^{\circ}C$, catalyzing bed height of 2.74 cm and system pressure of 6.83 kPa, the organic phase yield amounts to 15.84% which is quite close to the predicted value 16.19%. The H/C, O/C molar ratios (dry basis), density, pH value, kinematic viscosity and high heat value of the organic phase obtained at optimal conditions were 1.287, 0.174, $0.98g/cm^3$, 5.12, $5.87mm^2/s$ and 33.08 MJ/kg, respectively. Organic product compositions were examined using gas chromatography/mass spectrometry and the analysis showed that the content of oxygenated aromatics in organic phase had decreased and hydrocarbons had increased, and the hydrocarbons in organic phase were mainly aliphatic hydrocarbons. Besides, thermo-gravimetric analysis of the MCM-41 zeolite was conducted within air atmosphere and the results showed that when the catalyst continuously works over 100 min, the index of physicochemical properties of bio-oil decreases gradually from 1.15 to 0.45, suggesting that the refined bio-oil significantly deteriorates. Meanwhile, the coke deposition of catalyst increases from 4.97% to 14.81%, which suggests that the catalytic activity significantly decreases till the catalyst completely looses its activity.

• 한국추진공학회지
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• 제22권5호
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• pp.66-72
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• 2018

연소가스를 이용하여 압력비와 램 구조물의 형상에 따른 이차목 디퓨저의 성능 특성에 대한 수치적 연구를 수행하였다. 작동 조건인 압력비 75에서 램 구조물의 각도가 커짐에 따라 유동의 모멘텀 감소로 인해 진공실 압력이 상승하였다. 또한, 램 구조물의 반각 $15^{\circ}$, 폐색율 15%일 때, 디퓨저는 압력비 36과 37 사이에서 시동되었다. 이를 토대로 다양한 압력비와 램 구조물 형상에 따른 최적의 램 구조물 형상은 반각 $5{\sim}20^{\circ}$, 폐색율 15~40%로 판단된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.129-129
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• 2016

Graphene, as a single layer of $sp^2$-bonded carbon atoms packed into a 2D honeycomb crystal lattice, has attracted much attention due to its outstanding properties. In order to synthesize high quality graphene, transition metals, such as nickel and copper, have been widely employed as catalysts, which needs transfer to desired substrates for various applications. However, the transfer steps are not only complicated but also inevitably induce defects, impurities, wrinkles, and cracks of graphene. Furthermore, the direct synthesis of graphene on dielectric surfaces has still been a premature field for practical applications. Therefore, cost effective and concise methods for transfer-free graphene are essentially required for commercialization. Here, we report a facile transfer-free graphene synthesis method through nickel and carbon co-deposited layer. In order to fabricate 100 nm thick NiC layer on the top of $SiO_2/Si$ substrates, DC reactive magnetron sputtering was performed at a gas pressure of 2 mTorr with various Ar : $CH_4$ gas flow ratio and the 200 W DC input power was applied to a Ni target at room temperature. Then, the sample was annealed under 200 sccm Ar flow and pressure of 1 Torr at $1000^{\circ}C$ for 4 min employing a rapid thermal annealing (RTA) equipment. During the RTA process, the carbon atoms diffused through the NiC layer and deposited on both sides of the NiC layer to form graphene upon cooling. The remained NiC layer was removed by using a 0.5 M $FeCl_3$ aqueous solution, and graphene was then directly obtained on $SiO_2/Si$ without any transfer process. In order to confirm the quality of resulted graphene layer, Raman spectroscopy was implemented. Raman mapping revealed that the resulted graphene was at high quality with low degree of $sp^3$-type structural defects. Additionally, sheet resistance and transmittance of the produced graphene were analyzed by a four-point probe method and UV-vis spectroscopy, respectively. This facile non-transfer process would consequently facilitate the future graphene research and industrial applications.

• 대한금속재료학회지
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• 제47권2호
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• pp.129-137
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• 2009

Corrosion behaviors of TiN coated dental casting alloys have been researched by using various electrochemical methods. Three casting alloys (Alloy 1: 63Co-27Cr-5.5Mo, Alloy 2: 63Ni-16Cr-5Mo, Alloy 3: 63Co-30Cr-5Mo) were prepared for fabricating partial denture frameworks with various casting methods; centrifugal casting(CF), high frequency induction casting(HFI) and vacuum pressure casting(VP). The specimens were coated with TiN film by RF-magnetron sputtering method. The corrosion behaviors were investigated using potentiostat (EG&G Co, 263A. USA) in 0.9% NaCl solution at $36.5{\pm}1^{\circ}C$. The corrosion morphologies were analyzed using FE-SEM and EDX. Alloy 1 and Alloy 2 showed the ${\alpha}-Co$ and ${\varepsilon}-Co$ phase on the matrix, and it was disappeared in case of TiN coated Alloy 1 and 2. In the Alloy 3, $Ni_2Cr$ second phases were appeared at matrix. Corrosion potentials of TiN coated alloy were higher than that of non-coated alloy, but current density at passive region of TiN coated alloy was lower than that of non-coated alloy. Pitting corrosion resistances were increased in the order of centrifugal casting, high frequency induction casting and vacuum pressure casting method from cyclic potentiodynamic polarization test.

• 생태와환경
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• 제54권4호
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• pp.272-279
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• 2021

필터의 손상 없이 포집할 수 있는 필터케이스를 적용하고, 전압 제어와 압력 제어를 각각 할 수 있는 펌프 방식의 eDNA 포집 및 채수 시스템을 개발하여 집수매거 취수원을 대상으로 종래의 진공압 방식의 포집 및 추출 실험과 eDNA 농도를 비교함으로써 개발 시스템의 필터링 성능을 평가하였다. 개발된 시스템은 전압제어(Manual pump system) 방식과 압력제어(Automatic pump system) 방식으로 구분하여 필터링 시 필터기 내부 압력을 측정하고 각 시스템의 압력 변화를 비교하였다. 전압제어 방식은 필터링 초기에 65 [KPa]로 시작하여 필터링 시간이 경과함에 따라 필터에 축적되는 여과물의 양이 증가하므로 압력이 점진적으로 증가하였다. 압력제어 방식은 설계된 알고리즘에 따라 일정 압력을 유지하도록 제어한 결과, 압력 센서의 피드백 시간에 따라 필터링 과정에서 압력 변동의 폭은 차이가 있으나 목표 압력에 수렴하는 것을 확인하였다. 개발된 시스템의 필터링 성능을 확인하기 위해 eDNA 농도를 측정하고 전압제어 방식과 압력제어 방식을 대조군과 비교하였다. 전압제어 방식은 대조군과 유사한 결과를 얻을 수 있었으나 압력제어 방식은 대조군에 비해 낮게 나타났다. 압력제어 방식의 경우 필터링 시 압력 편차가 크고, 필터링 과정에서 일정한 압력을 유지하기 때문에 나타난 결과로 사료된다. 따라서 필터링 시에는 일정한 압력을 유지하는 것보다 필터링 시간 경과와 함께 여과물의 증가에 따라 압력이 점진적으로 증가하는 전압제어 방식이 eDNA를 포집하는데 적합함을 확인하였다. 정수역과 유수역의 eDNA 평균농도를 대조군으로 비교한 결과, 각각 96.2 [ng µL^-1], 88.4 [ng µL^-1]로 나타났으며, 펌프 방식으로 eDNA 평균농도를 비교한 결과는 각각 90.7 [ng µL^-1], 74.8 [ng µL^-1]로 정수역에서 필터링한 시료에서 높게 나타났다. 정수역에서 eDNA 농도가 높게 나타난 것은 잔존하는 eDNA를 비롯한 미세 유기물의 영향으로 사료된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.220-220
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• 2013

Surface-normal transmission electro-absorption modulator (EAM) are attractive for high-definition (HD) three-dimensional (3D) imaging application due to its features such as small system volume and simple epitaxial structure [1,2]. However, EAM in order to be used for HD 3D imaging system requires uniform modulation performance over large area. To achieve highly uniform modulation performance of EAM at the operating wavelength of 850 nm, it is extremely important to remove the GaAs substrate over large area since GaAs material has high absorption coefficient below 870 nm which corresponds to band-edge energy of GaAs (1.424 eV). In this study, we propose and experimentally demonstrate a transmission EAM in which highly selective backside etching methods which include lapping, dry etching and wet etching is carried out to remove the GaAs substrate for achieving highly uniform modulation performance. First, lapping process on GaAs substrate was carried out for different lapping speeds (5 rpm, 7 rpm, 10 rpm) and the thickness was measured over different areas of surface. For a lapping speed of 5 rpm, a highly uniform surface over a large area ($2{\times}1\;mm^2$) was obtained. Second, optimization of inductive coupled plasma-reactive ion etching (ICP-RIE) was carried out to achieve anisotropy and high etch rate. The dry etching carried out using a gas mixture of SiCl4 and Ar, each having a flow rate of 10 sccm and 40 sccm, respectively with an RF power of 50 W, ICP power of 400 W and chamber pressure of 2 mTorr was the optimum etching condition. Last, the rest of GaAs substrate was successfully removed by highly selective backside wet etching with pH adjusted solution of citric acid and hydrogen peroxide. Citric acid/hydrogen peroxide etching solution having a volume ratio of 5:1 was the best etching condition which provides not only high selectivity of 235:1 between GaAs and AlAs but also good etching profile [3]. The fabricated transmission EAM array have an amplitude modulation of more than 50% at the bias voltage of -9 V and maintains high uniformity of >90% over large area ($2{\times}1\;mm^2$). These results show that the fabricated transmission EAM with substrate removed is an excellent candidate to be used as an optical shutter for HD 3D imaging application.

• 지구물리와물리탐사
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• 제15권4호
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• pp.209-218
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• 2012

다양한 직경과 길이, 암종, 그리고 유효공극률을 가지는 8종의 암석시험편에 대하여 반복적으로 고체밀도와 유효공극률을 산출하고 그에 따른 반복성 및 재현성을 검토하였다. 또한 대기의 기온변화가 유효공극률의 산출에 미치는 영향에 대해 고찰하였다. 8종의 암석시험편에 대하여, 진공압력은 사용한 시스템의 최대진공인 1 torr로, 진공시간은 ISRM 표준시험법의 규약을 만족하는 80분으로 하여 유효공극률을 7번씩 산출하였다. 즉, 참조를 위해 각각의 시험편에 대해 1회, 반복성 검토를 위하여 모든 실험 조건을 같이한 상태에서 각 3회씩, 그리고 재현성의 검토를 위하여 동시에 수침진공하는 시험편의 숫자를 2, 4, 8개로 달리하여 3회 등 총 7번씩의 유효공극률을 산출하고 비교 검토하였다. 고체밀도의 경우 8개 암석시험편의 평균편차가 0.00 $g/cm^3$으로 나타나서 완벽한 반복성과 재현성을 보였다. 유효공극률의 경우는 모든 실험 조건을 동일하게 한 반복성 실험에서는 평균편차가 0.07% 이하, 실험 조건 중에 수침진공 하는 시험편의 숫자를 달리한 재현성 실험에서는 0.05% 이하로 모두 양호한 값을 나타내었다. 재현성 실험에 의해 측정된 유효공극률이 대부분 반복성 실험에서 측정되는 편차범위 내에서 측정되어 양호한 재현성을 보였다. 따라서, 암석시험편의 개수를 2, 4, 8개로 달리하며 수침진공 한 재현성 실험에서는 표준시험법에 따라서 1 torr 정도의 고진공을 사용하는 경우에는 여러 개의 시료를 동시에 수침진공하여도 산출되는 유효공극률에는 영향을 미치지는 않는다. 온도, 습도, 현지기압 등 기상자료와 시험편의 물속무게를 비교하고 대기 온도가 물의 온도, 밀도 및 부력에 영향을 주어 결국 시험편의 물속무게를 잘못 평가할 수 있음을 보였다. 따라서 시험편의 유효공극률을 정교하게 산출하기 위해서는 시험편의 물속무게를 측정할 때 물의 온도를 실험조건에 포함시키거나 다른 물리량과 함께 측정하여 물의 밀도 변화에 따른 물속무게 변화를 보정하여야 더 정밀한 유효공극률을 산출이 가능할 것이다.

• 한국의학물리학회:학술대회논문집
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• 한국의학물리학회 2002년도 Proceedings
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• pp.400-403
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• 2002

The fundamental experiments for measuring soft x-ray characteristics from the vacuum capillary are described. These experiments were primarily performed in order to generate line spectra such as x-ray lasers. The generator consists of a high-voltage power supply, a polarity-inversion ignitron pulse generator, a turbo-molecular pump, and a radiation tube with a capillary. A high-voltage condenser of 200 nF in the pulse generator is charged up to 20 kV by the power supply, and the electric charges in the condenser are discharged to the capillary in the tube after closing the ignitron. During the discharge, weakly ionized plasma forms on the inner and outer sides of a capillary. In the present work, the pump evacuates air from the tube with a pressure of about 1 mPa, and a demountable capillary was developed in order to measure x-ray spectra according to changes in the capillary length. In this capillary, the anode (target) and cathode elements can be changed corresponding to the objectives. The capillary diameter is 2.0 mm, and the length is adjusted from 1 to 50 mm. When a capillary with aluminum anode and cathode electrodes was employed, both the cathode voltage and the discharge current almost displayed damped oscillations. The peak values of the voltage and current increased when the charging voltage was increased, and their maximum values were -10.8 kV and 4.7 kA, respectively. The x-ray durations observed by a 1.6 ${\mu}$m aluminum filter were less than 30 ${\mu}$s, and we detected the aluminum characteristic x-ray intensity using a 6.8 ${\mu}$m aluminum filter. In the spectrum measurement, two sets of aluminum and titanium electrodes were employed, and we observed multi-line spectra. The line photon energies seldom varied according to changes in the condenser charging voltage and to changes in the electrode element. In the case where the titanium electrode was employed, the line number decreased with corresponding decreases in the capillary length. Compared with incoherent visible light, these rays from the capillary were diffracted and diffused greatly after passing through two slits.