• Proceedings of the KWS Conference
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• 2001.10a
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• pp.121-124
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• 2001

The main characteristic of the Electron Beam Welding technique is its high energy density which produces thin and deep welds with very little distortion. High accelerated electrons, focused in a beam of 0.5 ∼ 2mm diameter, produce narrow welds with deep penetration. The result is a small HAZ as well as a low and uniform distortion which is predictible within very narrow limits. But the small diameter of the EB increases the requirements for the equipment control system for centering the beam on the welding joint in order to avoid any lack of fusion. Therefore, in this paper, we introduce the system developed at our company and the quality of welding zone, the detail function of system.

• Carbon letters
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• v.15 no.4
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• pp.262-267
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• 2014

Pyrolized fuel oil (PFO) was reformed by novel electron beam (E-beam) radiation, and the elemental composition, chemical bonds, average molecular weight, solubility, softening point, yields, and density of the modified patches were characterized. These properties of modified pitch were dependent on the reforming method (heat or E-beam radiation treatment) and absorbed dose. Aromaticity ($F_a$), average molecular weight, solubility, softening point, and density increased in proportion to the absorbed dose of E-beam radiation, with the exception of the highest absorbed dose, due to modification by free radical polymerization and the powerful energy intensity of E-beam treatment. The H/C ratio and yield exhibited the opposite trend for the same reason. These results indicate that novel E-beam radiation reforming is suitable for the preparation of aromatic pitch with a high ${\beta}$-resin content.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.35-35
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• 2001

agnesium Oxide (MgO) with a NaCI structure is well known to exhibit high secondary electron emission, excellent high temperature chemical stability, high thermal conductance and electrical insulating properties. For these reason MgO films have been widely used for a buffer layer of high $T_c$ superconducting and a protective layer for AC-plasma display panels to improve discharge characteristics and panel lifetime. Up to now MgO films have been synthesized by lE-beam evaporation, Molecular Beam Epitaxy (MBE) and Metalorganic Chemical Vapor Deposition (MOCVD), however there have been some limitations such as low film density and micro-cracks in films. Therefore magnetron sputtering process were emerged as predominant method to synthesis high density MgO films. In previous works, we designed and manufactured unbalanced magnetron source with high power density for the deposition of high quality MgO films. The magnetron discharges were sustained at the pressure of O.lmtorr with power density of $110W/\textrm{cm}^2$ and the maximum deposition rate was measured at $2.8\mu\textrm{m}/min$ for Cu films. In this study, the syntheses of MgO films were carried out by unbalanced magnetron sputtering with various $O_2$ partial pressure and specially target power densities, duty cycles and frequency using pulsed DC power supply. And also we investigated the plasma states with various $O_2$ partial pressure and pulsed DC conditions by Optical Emission Spectroscopy (OES). In order to confirm the relationships between plasma states and film properties such as microstructure and secondary electron emission coefficient were analyzed by X-Ray Diffraction(XRD), Transmission Electron Microscopy(TEM) and ${\gamma}-Focused$ Ion Beam (${\gamma}-FIB$).

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.748-751
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• 2003

The electron temperature and plasma density in coplanar alternating-current plasma display panels (AC-PDPs) have been experimentally investigated by a micro Langmuir probe and the high speed discharge images in this experiment.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.10a
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• pp.119-120
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• 2012

• Journal of the Korean Society for Precision Engineering
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• v.25 no.12
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• pp.132-138
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• 2008

Recently, mastering processes for high density optical disc such as Blu-ray disc rely on electron beams, which are operable in only vacuum. In the mastering process, one of the most important tasks is to design precision stages for providing precise positioning of the works with respect to the source in a high vacuum environment. In this paper, we have developed a precision rotation table usable in the electron beam mastering. The rotation table adopted air bearings for a high positioning repeatability and velocity stability. The air leakage from the air bearings has been minimized by employing the differential exhaust scheme using three steps of air drain. The design parameters such as diameters of exhaust lines, seal lengths, and pumping speeds were decided according to the optimization method using genetic algorithm. The performance on the vacuum level of the rotation table was evaluated experimentally and theoretically. The results indicate that a vacuum level of $10^{-4}$ Pa is achieved with operation of air bearings in a vacuum chamber, which is sufficient for the electron beam mastering.

• Progress in Superconductivity
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• v.6 no.1
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• pp.13-18
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• 2004

High-.ate in-situ$ YBa_2$Cu$Cu_3$$O_{7-x}$ (YBCO) film growth was demonstrated by means of the electron beam co-evaporation. Even though our oxygen pressure is low, ∼$5 ${\times}$10^{-5}$ Torr, we can synthesize as-grown superconducting YBCO films at a deposition rate of around 10 nm/s. Relatively high temperatures of around 90$0^{\circ}C$ was necessary in this process so far, and it suggests that this temperature at a given oxygen activity allows a Ba-Cu-O liquid formation along with an YBCO epitaxy. Local critical current density shows a clear correlation with local resistivity. Homogeneous transport properties with a large critical current density ($4 ∼ 5 MA/\textrm{cm}^2$ at 77K, 0T) are observed in top faulted region while it is found that the bottom part carries little supercurrent with a large local resistivity. Therefore, it is possible that thickness dependence of critical current density is closely related with a topological variation of good superconducting paths and/or grains in the film bodies. The information derived from it may be useful in the characterization and optimization of superconducting films for electrical power and other applications.

• Proceedings of the KIEE Conference
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• 2000.07c
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• pp.2092-2094
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• 2000

As a next generation lithography (NGL) technology for VLSI semiconductor fabrication, electron beam, ion beam, X-ray and extreme ultraviolet(EUV) are considered as possible candidates. Among these methods, EUV lithography(EUVL) is thought to be the most probable because it is easily realized by improving current optical lithography technology. In order to set EUV radiation which can be applied to EUVL, it is essential to generate very high density and high temperature plasma stably. The method using a pulse power laser and a high voltage pulse discharge is commonly used to accomplish such a high density and high temperature plasma. In this paper we review the recent trends of the EUV generation technique by high density and high temperature plasma.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.21 no.7
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• pp.10-20
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• 2022

Recently, metal additive manufacturing (AM) is being investigated as a new manufacturing technology. In metal AM, powder bed fusion (PBF) is a promising technology that can be used to manufacture small and complex metallic components by selectively fusing each powder layer using an energy source such as laser or an electron beam. PBF includes selective laser melting (SLM) and electron beam melting (EBM). SLM uses high power-density laser to melt and fuse metal powders. EBM is similar to SLM but melts metals using an electron beam. When these processes are applied, the mechanical properties and microstructures change due to the many parameters involved. Therefore, this study is conducted to investigate the effects of the parameters on the mechanical properties and microstructures such that the processes can be performed more economically and efficiently.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.161-166
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• 2005

The plasma ion density in AC-PDP has shown to be increased from $5.6{\times}10^{11}cm^{-3}$ to $9.0{\times}10^{11)cm^{-3}$ as the Xe mixture ratio to neon increase from 1 % to 10 %, respectively, at fixed pressure of 400 Torr, by using the micro-Langmuir probe. It is noted that the plasma ion density is density increases as the gas pressure increases in this experiment. The electron temperature decreases from 2.3 to 1.2 eV as the Xe mole fraction increases from 1 % to 10 % at fixed pressure of 400 Torr, which is measured by the micro Langmuir probe and high-speed ICCD camera in this experiment. It is noted that the electron temperature decreases as the gas pressure increases from 150 to 400 Torr in this experiment. It is also observed that the exited Xe atom density and the plasma ion density are in strong correlation sharp between each other in this experiment. It is noted that $5.2{\times}10^{12}cm^{-3}$ in the $1s_5$ metastable state and $1.2{\times}10^{12}cm^{-3}$ in the $1s_4$ resonance state for the PDP cell with gap of 50 um distances under the fixed gas pressure of 400 Torr and Xe content ratio of 10 %.