• 제목/요약/키워드: High alumina glass

검색결과 68건 처리시간 0.033초

치아용 세라믹스에서의 접촉피로 및 강도저하 (Contact fatigue and strength degradation in dental ceramics)

  • 정연길;이수영;최성철
    • 한국결정성장학회지
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    • 제9권5호
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    • pp.527-533
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    • 1999
  • 치아용 대체재료로 사용되고 있는 세 가지의 세라믹스, 장석질 자기, 운모를 함유한 유리-세라믹 및 유리침윤 알루미나에 대한 접촉피로을 실제 치아의 접촉상황과 유사한 구형입자를 이용한 헤르지안 압입시험법으로 물에서 수행하였으며, 각 재료에서의 접촉손상이 강도에 미치는 영향을 고찰하였다. 초기의 손상형태는 각 재료가 갖는 미세구조에 의존하여 나타났으며, 장석질 자기는 취성거동을 나타내는 cone 형태의 균열이, 운모를 함유한 유리-세라믹은 준-소성 변형 거동을 나타내는 변형이, 그리고 유리침윤 알루미나는 두 재료의 중간거동을 나타내었다. 그러나 반복하중의 수(n=1~n=$10^6$)가 증가됨에 따라 모든 재료에서 급격한 강도저하를 나타내었으며, 파괴는 접촉피로에 의해 형성된 손상에서 일어났다. 일정하중(200N, 500N 및 1000N)에서 반복하중의 수가 증가됨에 따라 두 번의 강도저하가 일어났으며, 첫 번째의 강도저하는 cone 형태의 균열이 주 요인으로 작용되었으며, 두 번째 강도저하는 반복하중에 따른 radial 형태의 균열에 의해 일어났다. 이러한 radial 형태의 균열발생은 각 재료에서 급격한 강도저하를 가져왔으며, 계속적인 반복하중으로 재료의 파괴를 유발시켰다. 반복하중의 수를 고정시킨 수 압입하중의 변화에 따른 강도저하에 대한 고찰을 통해 장석질 자기가 접촉피로에 대한 손상내구성을 갖음을 알 수 있었다.

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Dependence of cation ratio in Oxynitride Glasses on the plasma etching rate

  • Lee, Jung-Ki;Hwang, Seong-Jin;Lee, Sung-Min;Kim, Hyung-Sun
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2009년도 추계학술발표대회
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    • pp.44.2-44.2
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    • 2009
  • Polycrystalline materials suchas yttria and alumina have been applied as a plasma resisting material for the plasma processing chamber. However, polycrystal line material may easily generate particles and the particles are sources of contamination during the plasma enhanced process. Amorphous material can be suitable to prevent particle generation due to absence of grain-boundaries. We manufactured nitrogen-containing $SiO_2-Al_2O_3-Y_2O_3$ based glasses with various contents of silicon and fixed nitrogen content. The thermal properties, mechanical properties and plasma etching rate were evaluated and compared for the different composition samples. The plasma etching behavior was estimated using XPS with depth profiling. From the result, the plasma etching rate highly depends on the silicon content and it may results from very low volatile temperature of SiF4 generated during plasma etching. The silicon concentration at the plasma etched surface was very low besides the concentration of yttrium and aluminum was relatively high than that of silicon due to high volatile temperature of fluorine compounds which consisted with aluminum and yttrium. Therefore, we conclude that the samples having low silicon content should be considered to obtain low plasma etching rate for the plasma resisting material.

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Effects of Al-doping on IZO Thin Film for Transparent TFT

  • Bang, J.H.;Jung, J.H.;Song, P.K.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.207-207
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    • 2011
  • Amorphous transparent oxide semiconductors (a-TOS) have been widely studied for many optoelectronic devices such as AM-OLED (active-matrix organic light emitting diodes). Recently, Nomura et al. demonstrated high performance amorphous IGZO (In-Ga-Zn-O) TFTs.1 Despite the amorphous structure, due to the conduction band minimum (CBM) that made of spherically extended s-orbitals of the constituent metals, an a-IGZO TFT shows high mobility.2,3 But IGZO films contain high cost rare metals. Therefore, we need to investigate the alternatives. Because Aluminum has a high bond enthalpy with oxygen atom and Alumina has a high lattice energy, we try to replace Gallium with Aluminum that is high reserve low cost material. In this study, we focused on the electrical properties of IZO:Al thin films as a channel layer of TFTs. IZO:Al were deposited on unheated non-alkali glass substrates (5 cm ${\times}$ 5 cm) by magnetron co-sputtering system with two cathodes equipped with IZO target and Al target, respectively. The sintered ceramic IZO disc (3 inch ${\phi}$, 5 mm t) and metal Al target (3 inch ${\phi}$, 5 mm t) are used for deposition. The O2 gas was used as the reactive gas to control carrier concentration and mobility. Deposition was carried out under various sputtering conditions to investigate the effect of sputtering process on the characteristics of IZO:Al thin films. Correlation between sputtering factors and electronic properties of the film will be discussed in detail.

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광중합 시 수종의 심미적 수복재와 이장재의 사용에 따른 치수내 온도변화 (TEMPERATURE CHANGES IN THE PULP ACCORDING TO VARIOUS ESTHETIC RESTORATIVE MATERIALS AND BASES DURING CURING PROCEDURE)

  • 장혜란;이형일;이광원;이세준
    • Restorative Dentistry and Endodontics
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    • 제26권5호
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    • pp.393-398
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    • 2001
  • Polymerization of light-activated restorations results in temperature increase caused by both the exothermic reaction process and the energy absorbed during irradiation. Within composite resin, temperature increases up to 2$0^{\circ}C$ or more during polymerization. But, insulation of hard tissue of tooth lowers this temperature increase in pulp. However, many clinicians are concerned about intrapulpal temperature injury. The purpose of this study was to evaluate temperature changes in the pulp according to various restorative materials and bases during curing procedure. Caries and restoration-free mandibular molars extracted within three months were prepared Class I cavity of 3$\times$6mm with high speed handpiece fissure bur. 1mm depth of dentin was evaluated with micrometer in mesial and distal pulp horns. Pulp chambers were filled with 37.0$\pm$0.1$^{\circ}C$ water to CEJ. Chromium-alumina thermocouple was placed in pulp horn below restorative materials for evaluating of temperature changes. This thermocouple was connected to temperature-recording device(Multiplication analyzer MX, 6.000, JAPAN). Temperature changes was evaluated from initial 37.$0^{\circ}C$ after temperature changes to 37.$0^{\circ}C$. Tip of curing unit was placed in the center of prepared cavity separated 1mm from restorative materials. Curing time was 40s. The restorative materials were used with Z 100, Fuji II LC, Compoglass flow and bases were used with Vitrebond, Dycal. Resrorative materials were placed in 2mm. The depth of bases were formed in 1mm and in this upper portion, resin of 2mm depth was placed. This procedure was performed 10 times. The results were as follows. 1. All the groups showed that the temperature in pulp increased as curing time increased 2. The temperature increase of glass ionomer was significantly higher than that of Resin and Compomer during curing procedure (P<0.05). 3. The temperature increase in glass ionomer base was significantly higher than that of Calcium hydroxide base during Resin curing procedure (P<0.05).

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낙구식 점도계를 이용한 아이스슬러리의 점도측정에 관한 연구 (A Study on the Measuring Method of Ice Slurry Viscosity Using the Falling Sphere Viscometer)

  • 김명준;유직수;임재근;최순열
    • 설비공학논문집
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    • 제19권8호
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    • pp.593-598
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    • 2007
  • The present study has dealt with the measuring method of ice slurry viscosity using falling sphere viscometer. The experimental apparatus was composed by test section and high-speed video system. And the spheres used in this study were alumina and glass. The main parameters were ice packing factor (IPF) and falling velocity of sphere so the acquired results were discussed for these parameters. The viscosity of ice slurry was calculated by using measured falling velocity and moving distance at instantaneous time and the Stokes hypothesis was used for this calculation. It was clarified that possible measuring range was $IPF\;=\;0.06{\sim}0.14$ of this type of measuring device and measuring method. In addition, it was clarified that the viscosity of ice slurry increased to increase of ice packing factor (IPF) of ice slurry.

Ga이 첨가된 ZnO 박막의 가스센서로의 응용 연구 (Ga doped ZnO Thin Films for Gas Sensor Application)

  • 황현석;여동훈;김종희;송준태
    • 한국전기전자재료학회논문지
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    • 제21권6호
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    • pp.499-502
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    • 2008
  • In this work, Ga-doped ZnO (GZO) thin films for gas sensor application were deposited on low temperature co-fired ceramics (LTCC) substrates, by RF magnetron sputtering method. The LTCC substrate is one of promising materials for this application since it has many advantages (e.g., low cost production, high manufacturing yields and easy realizing 3D structure etc.). The LTCC substrates with thickness of $400\;{\mu}m$ were fabricated by laminating 12 green tapes which consist of alumina and glass particle in an organic binder. The structural properties of the fabricated GZO thin film with thickness of 50 nm is analyzed by X-ray diffraction method (XRD) and field emission scanning electron microscope (FESEM). The film shows good adhesion to the substrate. The GZO gas sensors are tested by gas measurement system and show fast response and recovery characteristics to $NO_x$ gas that is 27.2 and 27.9 sec, recpectively.

LTCC 기판을 이용한 PZT 압력 센서의 제작 및 특성 연구

  • 허원영;황현석;이태용;이경천;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 춘계학술대회 논문집
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    • pp.13-13
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    • 2010
  • Piezoelectric sensors are extensively used to measure force because of their high sensitivity and low cost. however, the development of device with reduced size but with improved sensitivity is highly important. Low-temperature co-fired ceramic (LTCC) is one of promising materials for this application than a silicon substrate because it has very good electrical and mechanical properties as well as possibility of making various three dimensional (3D) structures. In this work, piezoelectric pressure sensors based on hybrid LTCC technology were presented. The LTCC diaphragms with thickness of $400\;{\mu}m$ were fabricated by laminating 12 green tapes which consist of alumina and glass particle in an organic binder. The piezoelectric sensing layer consists of PZT thin film deposited by RF magnetron sputtering method on between top and bottom Au electrodes. The PZT films deposited on LTCC diaphragms were successfully grown and were analyzed by using X-ray diffraction method (XRD) and field emission scanning electron microscope (FESEM).

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3차원 LTCC 기판을 이용한 PZT 압력센서의 주파수 응답 특성 (Frequency response characteristics of PZT pressure sensor using three dimensional LTCC substrates)

  • 허원영;이경천;황현석;이태용;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.204-204
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    • 2010
  • A development of device with reduced size and improved sensitivity is highly impotant Pb(Zr,Ti)$O_3$ thin films are widely used both to make actuator and sensor due to their high sensitivity and low cost. In this study, the feasibility of a piezoelectric presssure sensors based on hybrid low-temperaute co-fired ceramic (LTCC) technology were presented. The LTCC diaphragms with thickness of $400\;{\mu}m$ were fabricated by laminating 4 green tapes which consist of alumina and glass particle in an organic binder. PZT thin films were successfully prepared on between top and bottom Au electrode with LTCC substrates using RF magnetron sputtering. In addition, The frequency response characteristics of the sensor under varing pressure has been analysed. by Network Analyser (HP-8722D). A frequency shift range has been obseved from 1.7GHz to 1.8GHz with a good linearity for applied pressure from 0 psi up to 25 psi.

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LTCC 기판위에 성장시킨 PZT 박막의 열처리시 $O_2$가 미치는 영향 (Effects of annealing under oxygen atmosphere of PZT thin films on LTCC substrates)

  • 이경천;허원영;황현석;이태용;이종덕;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.205-205
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    • 2010
  • Recently, low temperature co-fired ceramic (LTCC) technology is widely used in sensors, actuators and microsystem fields because of its very good electrical and mechanical properties, high stability as well as possibility of making 3D micro structures. In this study, we investigated the effects of on $O_2$ annealing treatment on the electrical properties of Pb(ZrTi)$O_3$ (PZT) thin films deposited on LTCC substrate. The LTCC substrates with thickness of $400\;{\mu}m$ were fabricated by laminating 4 green tapes which consist of alumina and glass particle in an organic binder. The PZT thin films were deposited on Au / LTCC substrates by RF magnetron sputtering method. The change of the crystallization of the films were investigated under various atmosphere. The structural variation of the films were analyzed by using X-Ray diffraction (XRD) and field emission scanning electron microscopy (FESEM) and secondary ion mass spectrometry (SIMS).

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The effect of thickness and operation temperature on Ga doped ZnO thin film NOx gas sensor

  • 황현석;여동훈;김종희;송준태;김정호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.365-365
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    • 2008
  • In this work, Ga-doped ZnO (GZO) thin films for NOx gas sensor application were deposited on low temperature co-fired ceramics (LTCC) substrates, by RF magnetron sputtering method. The LTCC substrate is one of promising materials for this application since it has many advantages (e.g., low cost production, high manufacturing yields and easy realizing 3D structure etc.). The LTCC substrates with thickness of 400 pm were fabricated by laminating 12 green tapes which consist of alumina and glass particle in an organic binder. The structural properties of the fabricated GZO thin films with different thickness are analyzed by X-ray diffraction method (XRD) and field emission scanning electron microscope (FESEM). The GZO gas sensors are tested by gas measurement system under varing operation temperature and show good performance to the NOx gas in sensitivity and response time.

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