• 제목/요약/키워드: High Vacuum

검색결과 3,496건 처리시간 0.035초

Design of Shock Absorber Housing Using Aluminum Vacuum Die Casting Technology

  • Jin, Chul-Kyu;Kang, Chung-Gil
    • 한국산업융합학회 논문집
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    • 제21권1호
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    • pp.1-8
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    • 2018
  • The purpose of this study is to develop a high-strength, high-toughness, thin-walled aluminum shock absorber housing product by applying a high vacuum die casting method to improve internal gas defect and formability. The analysis program dedicated for the casting was used because it was too costly and time-consuming to adopt the gating system design. The final casting plan was designed based on the flow pattern of the material filled into the mold and the result of air pressure and air pocket after the material was completely filled in the mold. Gaty shape was designed as a split type. The runner was designed to have the same shape as the initial inlet curve of the cavity, and the flow of the molten metal was prevented from turbulent flow. The most favorable results were obtained when the injection speed was $V_2=4.0m/s$. Defects on pores were reduced by applying high vacuum level inside the mold.

진공용 나노스테이지 개발 (Development of Nano Stage for Ultra High Vacuum)

  • 홍원표;강은구;이석우;최헌종
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2004년도 춘계학술대회 논문집
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    • pp.472-477
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    • 2004
  • Miniaturization is the central theme in modern fabrication technology. Many of the components used in modem products are becoming smaller and smaller. The direct write FIB technology has several advantages over contemporary micromachining technology, including better feature resolution with low lateral scattering and capability of mastless fabrication. Therefore, the application of focused ion beam(FIB) technology in micro fabrication has become increasingly popular. In recent model of FIB, however the feeding system has been a very coarse resolution of about a few ${\mu}{\textrm}{m}$. It is not unsuitable to the sputtering and the deposition to make the high-precision structure in micro or macro scale. Our research is the development of nano stage of 200mm strokes and l0nm resolutions. Also, this stage should be effectively operating in ultra high vacuum of about 1$\times$10$^{-5}$ pa. This paper presents the concept of nano stages and the discussion of the material treatment for ultra tush vacuum.

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Development of High Flux Metal Ion Plasma Source for the Ion Implantation and Deposition

  • Kim, Do-Yun;Lee, Eui-Wan
    • Journal of Korean Vacuum Science & Technology
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    • 제7권2호
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    • pp.45-56
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    • 2003
  • A high flux metal plasma pulse ion source, which can simultaneously perform ion implantation and deposition, was developed and tested to evaluate its performance using the prototype. Flux of ion source was measured to be 5 A and bi-polar pulse power supply with a peak voltage of 250 V, repetition of 20 Hz and width of 100 ${\mu}\textrm{s}$ has an output current of 2 kA and average power of 2 kW. Trigger power supply is a high voltage pulse generator producing a peak voltage of 12 kV, peak current of 50 A and repetition rate of 20 Hz. The acceleration column for providing target energy up to ion implantation is carefully designed and compatible with UHV (ultra high vacuum) application. Prototype systems including various ion sources are fabricated for the performance test in the vacuum and evaluated to be more competitive than the existing equipments through repeated deposition experiments.

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초고진공 분자선 에피성장 시스템의 제작과 에피성장된 ZnSe/GaAs(001)의 광학특성 (Construction of an Ultra High Vacuum Molecular Beam Epitaxy System and Optical Property of ZnSe/GaAs(001) Epitaxial films)

  • 김은도;손영호;엄기석;조성진;황도원
    • 한국진공학회지
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    • 제15권5호
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    • pp.458-464
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    • 2006
  • 본 연구에서는 초고진공 (UHV; ultra high vacuum) 분자선 에피성장 (MBE; molecular beam epitaxy) 시스템의 제작과 성능연구가 성공적으로 이루어졌다. 초고진공 용 분자선 에피성장 시스템을 국산화개발 및 제작하여, 장비에 관한 성능 테스트를 하게 되었다. 본 장비의 진공도가 $2X10^{10}$ Torr에 도달함을 확인하였고, 시편 가열모듈(substrate heating module)이 $1,100^{\circ}C$까지 가열됨을 확인할 수 있었으며, ZnSe/GaAs(001)의 증착특성을 SEM (scanning electron microscope), AFM (atomic force microscope), XRD (x-ray diffraction), PL (photoluminescence) 등으로 조사하였다.

Performance Improvement of All Solution Processable Organic Thin Film Transistors by Newly Approached High Vacuum Seasoning

  • Kim, Dong-Woo;Kim, Hyoung-Jin;Lee, Young-Uk;Hong, Mun-Pyo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.470-470
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    • 2012
  • Organic thin film transistors (OTFTs) backplane constitute the active elements in new generations of plastic electronic devices for flexible display. The overall OTFTs performance is largely depended on the properties and quality of each layers of device material. In solution based process of organic semiconductors (OSCs), the interface state is most impediments to preferable performance. Generally, a threshold voltage (Vth) shift is usually exhibited when organic gate insulators (OGIs) are exposed in an ambient air condition. This phenomenon was caused by the absorbed polar components (i.e. oxygen and moisture) on the interface between OGIs and Soluble OSCs during the jetting process. For eliminating the polar component at the interface of OGI, the role of high vacuum seasoning on an OGI for all solution processable OTFTs were studied. Poly 4-vinly phenols (PVPs) were the material chosen as the organic gate dielectric, with a weakness in ambient air. The high vacuum seasoning of PVP's surface showed improved performance from non-seasoning TFT; a $V_{th}$, a ${\mu}_{fe}$ and a interface charge trap density from -8V, $0.018cm^2V^{-1}s^{-1}$, $1.12{\times}10^{-12}(cm^2eV)^{-1}$ to -4.02 V, $0.021cm^2V^{-1}s^{-1}$, $6.62{\times}10^{-11}(cm^2eV)^{-1}$. These results of OTFT device show that polar components were well eliminated by the high vacuum seasoning processes.

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KSTAR 토카막 장치 진공 기술 현황 (Status of vacuum technique in KSTAR)

  • 김광표;김현석
    • 진공이야기
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    • 제4권1호
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    • pp.16-23
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    • 2017
  • Recently, KSTAR, Korea's superconducting fusion energy research and development device, has succeeded in driving the high performance plasma for 70 seconds for the first time in the world. Continuous plasma operation technology is an essential factor for commercialization of fusion energy power generation. Therefore, this achievement is expected to play a major role in the research of fusion technology required for future fusion power plants. In order to operate the KSTAR, the discharge process in which the neutral gas is turned into the plasma should be preceded in the start-up (breakdown) phase of tokamak operation. This process essentially involves the vacuum environment in the tokamak device. KSTAR has successfully operated a vacuum pumping system to achieve the target level of the vacuum environment through a high temperature baking operation, a discharge cleaning process and boronization.

고고도 우주환경모사용 터보분자펌프 진공설비 구축 (Development of Turbo Molecular Pump Vacuum Facility for High Altitude Space Environment Test)

  • 허환일;김민재;김성수
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2011년도 제37회 추계학술대회논문집
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    • pp.827-829
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    • 2011
  • 인공위성이나 우주발사체를 개발하기 위해서는 지상에서 우주환경 성능 시험이 필요하며 이를 위해서 고고도 환경을 모사할 수 있는 진공설비가 요구된다. 본 연구에서는 터보 분자 펌프를 이용하여 목표 진공도 $1.0{\times}10-6$ torr를 유지함으로써 200 km의 고도를 모사하기 위한 진공설비를 구축하고 터보 분자 펌프 장치를 구축하여 예비 진공도 성능 실험을 수행하고 보고하였다.

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