• 한국재료학회지
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• 제25권5호
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• pp.247-252
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• 2015

The effect of precursor concentration on the structural, morphological, and optical properties of $TiO_2$nano-flowers was investigated in this study. An increase in crystallite size was observed with an increase in the concentration of the precursor (titanium butoxide). The FE-SEM micrographs of the as-prepared samples show a three-dimensional flower-like morphology. The flowers consist of several nanorods coming out of a single core and have very sharp edges. Also, the variation in the aspect ratio of the nanostructure was observed with the concentration of the precursor. The photocatalytic properties of the samples show that the sample that has a high aspect ratio (AR~9) has a much better photocatalytic activity compared to the nano-crystal with a low aspect ratio (AR~6.1). It is believed that the excellent photocatalytic performance and short time synthesis of $TiO_2$nano-flowers using the microwave hydrothermal method can have potential applications in the field of photocatalysis.

• 한국분말재료학회지
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• 제1권2호
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• pp.159-166
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• 1994

The variation of the microstructures and the mechanical properties with varying vacuum hot pressing temperature and pressure was investigated in PyM processed 20 vol%) SiCw/ 2124Al composites. As increasing the vacuum hot pressing temperature, the aspect ratio of whiskers and density of composites increased due to the softening of 2124Al matrix with the increased amount of liquid phase. The tensile strength of composite increased with increasing vacuum hot pressing temperature up to $570^{\circ}C$ and became saturated above $570^{\circ}C$, To attain the high densification of composites above 99%, the vacuum hot pressing pressure was needed to be above 70 MPa. However, the higher vacuum hot pressing pressure above 70 MPa was not effective to increase the tensile strength due to the reduced aspect ratio of SiC whiskers from damage of whiskers during vacuum hot pressing. A phenomenological equation to predict the tensile strength of $SiC_w$/2124AI composite was proposed as a function including two microstructural parameters, i.e. density of composites and aspect ratio of whiskers. The tensile strength of $SiC_w$/2124AI were found more sensitive to the porosity than other P/M materials due to the higher stress concentration and reduced load transfer efficiency by the pores locating at whisker/matrix interfaces.

• 대한건축학회논문집:구조계
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• 제34권1호
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• pp.33-39
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• 2018

This study performed experimental validation of the hysteretic steel slit damper's basic and dependent characteristics, which should be considered for the design. The basic characteristic of the steel slit damper is used for determining design properties of non-linear analysis, such as yielding strength, yielding displacement, elastic stiffness and post-yielding stiffness. In order to evaluate dependent characteristics of the hysteretic steel slit damper, repeated deformation capacity with respect to the displacement, velocity and aspect ratio of the damper was evaluated. In this study, steel slit damper, which is widely used in Korea, was considered. The slit dampers with 55kN and 240kN of yielding strength were produced and tested. It was concluded that the slit damper's hysteresis behavior was affected by the dependent characteristics: displacement, velocity and aspect ratio. In other words, the steel slit damper's behavior was stable within limit displacement, and aspect ratio of the strut affected repeated deformation capacity of the damper subjected to large deformation. In addition, it was observed that the repeated deformation capacity abruptly decreased at the high speed range (${\geq}60mm/sec$). Furthermore, the experimental results were evaluated with the criterion of the damping device specified in ASCE7-10.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2004년도 춘계학술대회
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• pp.978-982
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• 2004

We present high aspect ratio 100nm-scale nickel stamper using e-beam lithography process and Cr/Qz mask for the injection molding process of nano grating patterns. Conventional photolithography blank mask (CrON/Cr/Qz) consists of quartz substrate, Cr layer of UV protection and CrON of anti-reflection layer. We have used Cr/Qz blank mask without anti-reflection layer of CrON which is non-conductive material and ebeam lithography process in order to simplify the nickel electroplating process. In nickel electroplating process, we have used Cr layer of UV protection as seed layer of nickel electroplating. Fabrication conditions of photolithography mask using e-beam lithography are optimized with respect to CrON/Cr/Qz blank mask. In this paper, we have optimized e-beam lithography process using Cr/Qz blank mask and fabricated nickel stamper using Cr seed layer. CrON/Cr/Qz blank mask and Cr/Qz blank mask require optimal e-beam dosage of $10.0{\mu}C/cm^2$ and $8.5{\mu}C/cm^2$, respectively. Finally, we have fabricated $116nm{\pm}6nm-width$ and $240nm{\pm}20nm-height$ nickel grating stamper for the injection molding pattern.

• 폴리머
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• 제37권1호
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• pp.1-4
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• 2013

본 연구에서는 스탬프와 레진의 접촉-인장 방법을 이용하여 고 세장비를 가지는 폴리머 마이크로 헤어를 제작하는 공정을 제안하였다. 또한 광경화시 수축방향에 따라 마이크로 헤어에 표면주름이 다르게 생성되는 것을 실험적으로 관찰하였으며, 헤어의 직경이 $20{\mu}m$ 부근일 때, 일정한 패턴을 가진 표면주름이 제작되었다. 이 직경에서 스탬프와 레진의 접합력보다 수축력이 더 크게 되어 광경화 도중에 레진이 스탬프에서 분리되면서 단방향의 수축을 유도하게 되어 일정한 간격의 주름이 발생하는 것으로 사료된다. 본 연구의 기초결과를 이용하여, 향후 균일한 표면주름을 가지는 다양한 형태의 마이크로 폴리머 헤어를 제작할 수 있을 것으로 사료되며, 생체모사, 열전달 및 촉매 촉진과 같은 표면적과 관련된 기술 등 다양한 분야에 응용이 가능할 것으로 사료된다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2006년도 추계학술발표회 초록집
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• pp.88-88
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• 2006

• 대한기계학회논문집
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• 제9권6호
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• pp.750-756
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• 1985

본 연구에서는 종횡비 0.1이고 상.하 수평경계면이 단열된 직각밀폐용기내에 서 Pr수가 1보다 큰 물(Pr=6.97, 20.deg. C) 및 실리콘 오일(Pr=1086.42, 20.deg. C)의 양단의 온도차에 의한 자연대류에서 아직 충분히 연구되지 않은 코어형상에 주안점을 두고 실 험적으로 관찰, 조사하였으며 그 결과를 Lee의 이론적인 예측과도 비교, 검토해 보았 다.

• 화약ㆍ발파
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• 제31권1호
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• pp.1-10
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• 2013

발파해체 공법은 구조물 형상과 주변현황에 따라 다양한 공법을 적용할 수 있으나, 고종횡비를 가지는 비대칭 구조물을 발파해체 하기 위해서는 사전취약화와 발파지점 및 시차와 주변현황에 따른 발파조건을 고려하여 설계하여야 한다. 본 연구에서는 고종횡비 비대칭 구조물을 안전하게 전도시키기 위해 ELS 소프트웨어를 사용하여 사전취약화 위치와 형상에 따른 모멘트 발생지점을 분석하여 킥백(kick back)을 제어할 수 있는 사전취약화 위치 및 형상에 대한 시뮬레이션을 수행하였으며, 비대칭 구조물의 붕괴 시 전도방향의 좌우로 발생하는 비틀림 모멘트(torsional moment)를 최소화하기 위해 붕괴방향을 제어 할 수 있는 발파 시차 및 위치를 선정하였다. 또한 시뮬레이션상의 사전 취약 및 발파시차를 실 구조물의 전도 붕괴에 적용하여 붕괴 거동에 대한 모션분석을 하였다. 그 결과 시뮬레이션의 붕괴거동에 대한 신뢰성을 확인하였으며, 발파해체 시 사전취약화의 형상 및 위치에 따라 킥백을 제어할 수 있으며, 발파 위치와 시차에 따라 비틀림 모멘트를 제어 할 수 있다는 것을 알 수 있었다.

• 정보저장시스템학회논문집
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• 제6권1호
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• pp.37-40
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• 2010

Fresnel lens is a kind of refractive optical lens with various advantages. It has nearly flat shaped optical lens that has small mass. Fresnel lens has number of applications in the compact optical systems. Recently, demands of high quality Fresnel lens for small size optical systems such as illumination units, compact imaging systems, display units, information storage systems, optical detecting units had increased rapidly. Conventional manufacturing process of high quality Fresnel lens is direct machining. However, it is not suitable for mass production because of high cost and long cycle time. Replication method can provide cost effective mass production process. However, there are various issues about replication of Fresnel lens. Fresnel lens has number of sharp blade shape prism. In the replication process, this blade shape causes defects that can affect optical efficiency. In this study, replication processes; injection molding process and UV imprinting process, were developed and evaluated using Fresnel lens that has maximum pattern height of $250\;{\mu}m$ and aspect ratio of 1.5.

• 한국정밀공학회지
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• 제25권1호
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• pp.130-137
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• 2008

Two-photon stereolithography (TPS) is recognized as a useful process for the fabrication of three-dimensional microstructures. Recently, the need for a two-photon curable resin with high strength increases as 3-D moicrostructures of high aspect ratio or large scale of several hundreds micrometers are required for applications of nano/micro devices in IT/BT. In this work, process parameters of TPS employing the SU-8 which is a representative two-photon curable resin with high strength have been studied for the precise fabrication of 3-D microstructures with high strength. The pre-baking and post-baking processes are studied and the parameter study of the SU-8 in TPS is conducted. Through this work, very small roughness of 12 nm and the minimum aspect ratio of ${\sim}1$ which provides a precise accumulation of layers could be obtained. Using the conditions studied in this work, some 3-D examples are fabricated.