• 제목/요약/키워드: Heteroepitaxial growth

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Electronic Structure of Organic/organic Interface Depending on Heteroepitaxial Growth Using Templating Layer

  • Lim, Hee Seon;Kim, Sehun;Kim, Jeong Won
    • Applied Science and Convergence Technology
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    • 제23권6호
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    • pp.351-356
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    • 2014
  • The electronic structure at organic-organic interface gives essential information on device performance such as charge transport and mobility. Especially, the molecular orientation of organic material can affect the electronic structure at interface and ultimately the device performance in organic photovoltaics. The molecular orientation is examined by the change in ionization potential (IP) for metal phthalocyanines (MPc, M=Zn, Cu)/fullerene ($C_{60}$) interfaces on ITO by adding the CuI templating layer through ultraviolet photoelectron spectroscopy measurement. On CuPc/$C_{60}$ bilayer, the addition of CuI templating layer represents the noticeable change in IP, while it hardly affects the electronic structure of ZnPc/$C_{60}$ bilayer. The CuPc molecules on CuI represent relatively lying down orientation with intermolecular ${\pi}-{\pi}$ overlap being aligned in vertical direction. Consequently, in organic photovoltaics consisting of CuPc and $C_{60}$ as donor and acceptor, respectively, the carrier transport along the direction is enhanced by the insertion of CuI templaing layer. In addition, optical absorption in CuPc molecules is increased due to aligned transition matrix elements. Overall the lying down orientation of CuPc on CuI will improve photovoltaic efficiency.

HVPE법에 의한 Zn-Doped GaN 박막 제조 (Preparation of Zn-Doped GaN Film by HVPE Method)

  • 김향숙;황진수;정필조
    • 대한화학회지
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    • 제40권3호
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    • pp.167-172
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    • 1996
  • GaN 단결정 박막은 halide vapor phase epitaxy(HVPE)방법을 사용하여 사파이어 기판위에 헤케로에피탁시하게 성장시켰다. 이렇게 제조된 박막은 n형 전동성을 갖는다. 아연(Zn)을 받개 불순물로 도핑시켜 절연형 GaN 박막을 만들었는데 2.64과 2.43eV의 청색영역에서 발광 피크를 가졌다. 본 연구에의해 GaN 박막은 MIS(metal-insulator-semiconductor) 접합구조로 제작이 가능함을 시사하였고, 이종접합형 발광소자 개발에 기초자료가 될 것으로 전망된다.

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Variable-color Light-emitting Diodes Using GaN Microdonut Arrays

  • Tchoe, Youngbin;Jo, Janghyun;Kim, Miyoung;Heo, Jaehyuk;Yoo, Geonwook;Sone, Cheolsoo;Yi, Gyu-Chul
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.280-280
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    • 2014
  • We report the fabrication and electroluminescent characteristics of GaN/InxGa1-xN microdonut-shaped light-emitting diode (LED) microarrays as variable-color emitters. The diameter, width, height, and period of the GaN microdonuts were controlled by their growth parameters and the geometrical factors of the growth mask patterns. For the fabrication of microdonut LEDs, p-GaN/p-AlxGa1-xN/u-GaN/u-InxGa1-xN heteroepitaxial layers were coated on the entire surface of n-GaN microdonuts. The microdonut LED arrays showed strong light emission, which could be seen with the unaided eye under normal room illumination. Additionally, magnified optical images of microdonut LED arrays exhibited microdonut-shaped light emissions having spatially resolved blue and green colors. Their electroluminescence spectra had two dominant peaks at 460 and 560 nm. With increasing applied voltage, the intensity of the blue emission peak increased much faster than that of the green emission peak, indicating that the color of the LEDs is tunable. We also demonstrated that EL spectra of the devices could be controlled by changing the size of microdonut LEDs. What we want to emphasize here with the microdonut LEDs is that they have additional inner sidewall facets which did not exist for other typical three-dimensional structures including nanopyramids and nanorods, and that InxGa1-xN single quantum well formed on the inner sidewall facets had unique thickness and chemical composition, which generated additional EL color. The origin of the electroluminescence peaks was investigated by structural characterizations and chemical analyses.

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혼합소스 HVPE 방법에 의한 InGaN 나노구조의 성장에 있어서 Sb 첨가의 영향 (Effects of antimony addition on growth of InGaN nano-structures by mixed-source HVPE)

  • 옥진은;조동완;전헌수;이아름;이강석;조영지;김경화;장지호;안형수;양민
    • 한국결정성장학회지
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    • 제20권3호
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    • pp.113-116
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    • 2010
  • 본 논문에서는 Sb를 촉매제로 이용하는 경우의 InGaN 나노구조의 성장과 구조적 특징 및 광학적 특성에 대해서 연구하였다. 결정성장에 있어서 촉매제의 사용은 성장 모드의 변화와 결정 결함의 감소 등을 위한 목적으로 많이 사용되어왔다. 본 연구에서는 혼합소스 HVPE(hydride vapor phase epitaxy) 사용하여 (0001) 사파이어 기판 위에 InGaN 나노구조를 성장하였고, 구조적 및 광학적 특성은 scanning electron microscope(SEM)과 photoluminescence(PL)를 통해 평가하였다. Sb이 첨가되지 않은 경우에는 InGaN 나노구조가 c-축 방향으로 정렬되는 경향을 보이지만 Sb이 첨가된 경우에는 InGaN 나노구조의 c-축 방향이 기판에 대해 평행하거나 경사진 방향으로 정렬되고 있는 것을 관찰할 수 있었다. In의 조성은 Sb 의 첨가 여부에 관계없이 약 3.2% 정도로 계산되었다. 이러한 결과들로부터 측면 배향된 나노입자를 활성층으로 하는 광소자에 적용할 경우 압전 전계를 완화할 수 있기 때문에 광소자의 발광 성능을 향상시킬 수 있을 것으로 기대된다.

액상에피택시 방법에 의한 InP기판상의 GaAs 이종접합 박막 성장 (Liquid Phase Epitaxial Growth of GaAs on InP Substrates)

  • 김동근;이형종;임기영;장성주;장성주;김종빈;이병택
    • 한국재료학회지
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    • 제4권5호
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    • pp.600-607
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    • 1994
  • LPE방법을 이용하여 InP기판 상에 GaAs이종접합 박막을 최초로 성장하였으며 제반 성장조건들이 박막특성에 미치는 영향을 NDIC광학현미경, SEM, TEM 및 DCXRD 등을 이용하여 조사하였다. 적정 LPE성장온도는 $720^{\circ}C$(냉각속도 $0.5^{\circ}C$/min.)이었으며 성장된 GaAs 박막의 표면형상은 융액 균질화 처리 시 기판을 InP cover웨이퍼로 보호한 경우가 In/InP 융액으로 보호한 경우에 비해 현저히 개선되었다. 박막 성장 시 Ga성장융액 내에 0.005wt% 정도의 Se을 첨가함으로서 기판의 열융해(meltback)현상이 억제되었고 박막의 표면 거칠기도 현저히 개선되었다. 미세 격자가 식각된 InP기판 상에 성장된 GaAs 박막의 DCXRD측정결과 미세 격자 패턴이 없는 기판 위에 성장된 시료보다 결정성이 더욱 향상되었으며 이는 TEM 관찰결과 GaAs/InP계면에서 생성된 전위들 중 일부가 상호반응에 의하여 미세격자 영역 내에 국한되기 때문으로 판단되었다.

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Analysis of the Inhibition Layer of Galvanized Dual-Phase Steels

  • Wang, K.K.;Wang, H.-P.;Chang, L.;Gan, D.;Chen, T.-R.;Chen, H.-B.
    • Corrosion Science and Technology
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    • 제11권1호
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    • pp.9-14
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    • 2012
  • The formation of the Fe-Al inhibition layer in hot-dip galvanizing is a confusing issue for a long time. This study presents a characterization result on the inhibition layer formed on C-Mn-Cr and C-Mn-Si dual-phase steels after a short time galvanizing. The samples were annealed at $800^{\circ}C$ for 60 s in $N_{2}$-10% $H_{2}$ atmosphere with a dew point of $-30^{\circ}C$, and were then galvanized in a bath containing 0.2 %Al. X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM) was employed for characterization. The TEM electron diffraction shows that only $Fe_{2}Al_{5}$ intermetallic phase was formed. No orientation relationship between the $Fe_{2}Al_{5}$ phase and the steel substrate could be identified. Two peaks of Al 2p photoelectrons, one from metallic aluminum and the other from $Al^{3+}$ ions, were detected in the inhibition layer, indicating that the layer is in fact a mixture of $Fe_{2}Al_{5}$ and $Al_{2}O_{3}$. TEM/EDS analysis verifies the existence of $Al_{2}O_{3}$ in the boundaries of $Fe_{2}Al_{5}$ grains. The nucleation of $Fe_{2}Al_{5}$ and the reduction of the surface oxide probably proceeded concurrently on galvanizing, and the residual oxides prohibited the heteroepitaxial growth of $Fe_{2}Al_{5}$.

유기 금속 화학 증착법(MOCVD)의 희석된 SiH4을 활용한 Si-Doped β-Ga2O3 에피 성장 (Growth of Si-Doped β-Ga2O3 Epi-Layer by Metal Organic Chemical Vapor Deposition U sing Diluted SiH4)

  • 김형윤;김선재;천현우;이재형;전대우;박지현
    • 한국재료학회지
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    • 제33권12호
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    • pp.525-529
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    • 2023
  • β-Ga2O3 has become the focus of considerable attention as an ultra-wide bandgap semiconductor following the successful development of bulk single crystals using the melt growth method. Accordingly, homoepitaxy studies, where the interface between the substrate and the epilayer is not problematic, have become mainstream and many results have been published. However, because the cost of homo-substrates is high, research is still mainly at the laboratory level and has not yet been scaled up to commercialization. To overcome this problem, many researchers are trying to grow high quality Ga2O3 epilayers on hetero-substrates. We used diluted SiH4 gas to control the doping concentration during the heteroepitaxial growth of β-Ga2O3 on c-plane sapphire using metal organic chemical vapor deposition (MOCVD). Despite the high level of defect density inside the grown β-Ga2O3 epilayer due to the aggregation of random rotated domains, the carrier concentration could be controlled from 1 × 1019 to 1 × 1016 cm-3 by diluting the SiH4 gas concentration. This study indicates that β-Ga2O3 hetero-epitaxy has similar potential to homo-epitaxy and is expected to accelerate the commercialization of β-Ga2O3 applications with the advantage of low substrate cost.

Direct Imaging of Polarization-induced Charge Distribution and Domain Switching using TEM

  • 오상호
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.99-99
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    • 2013
  • In this talk, I will present two research works in progress, which are: i) mapping of piezoelectric polarization and associated charge density distribution in the heteroepitaxial InGaN/GaN multi-quantum well (MQW) structure of a light emitting diode (LED) by using inline electron holography and ii) in-situ observation of the polarization switching process of an ferroelectric Pb(Zr1-x,Tix)O3 (PZT) thin film capacitor under an applied electric field in transmission electron microscope (TEM). In the first part, I will show that strain as well as total charge density distributions can be mapped quantitatively across all the functional layers constituting a LED, including n-type GaN, InGaN/GaN MQWs, and p-type GaN with sub-nm spatial resolution (~0.8 nm) by using inline electron holography. The experimentally obtained strain maps were verified by comparison with finite element method simulations and confirmed that not only InGaN QWs (2.5 nm in thickness) but also GaN QBs (10 nm in thickness) in the MQW structure are strained complementary to accommodate the lattice misfit strain. Because of this complementary strain of GaN QBs, the strain gradient and also (piezoelectric) polarization gradient across the MQW changes more steeply than expected, resulting in more polarization charge density at the MQW interfaces than the typically expected value from the spontaneous polarization mismatch alone. By quantitative and comparative analysis of the total charge density map with the polarization charge map, we can clarify what extent of the polarization charges are compensated by the electrons supplied from the n-doped GaN QBs. Comparison with the simulated energy band diagrams with various screening parameters show that only 60% of the net polarization charges are compensated by the electrons from the GaN QBs, which results in the internal field of ~2.0 MV cm-1 across each pair of GaN/InGaN of the MQW structure. In the second part of my talk, I will present in-situ observations of the polarization switching process of a planar Ni/PZT/SrRuO3 capacitor using TEM. We observed the preferential, but asymmetric, nucleation and forward growth of switched c-domains at the PZT/electrode interfaces arising from the built-in electric field beneath each interface. The subsequent sideways growth was inhibited by the depolarization field due to the imperfect charge compensation at the counter electrode and preexisting a-domain walls, leading to asymmetric switching. It was found that the preexisting a-domains split into fine a- and c-domains constituting a $90^{\circ}$ stripe domain pattern during the $180^{\circ}$ polarization switching process, revealing that these domains also actively participated in the out-of-plane polarization switching. The real-time observations uncovered the origin of the switching asymmetry and further clarified the importance of charged domain walls and the interfaces with electrodes in the ferroelectric switching processes.

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