• Title/Summary/Keyword: HF treatment

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Treatment Strategies of Improving Quality of Care in Patients With Heart Failure

  • Se-Eun Kim;Byung-Su Yoo
    • Korean Circulation Journal
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    • v.53 no.5
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    • pp.294-312
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    • 2023
  • Heart failure (HF) is a global health problem closely related to morbidity and mortality. As the burden of HF increases, it is necessary to manage and treat this condition well. However, there are differences between real-world practice and guidelines for the optimal treatment for HF. Patient-related, healthcare provider-related, and health system-related factors contribute to poor adherence to optimal care. This review article aims to examine HF treatment patterns and treatment adherence in real-world practice, identify clinical gaps to suggest ways to improve the quality of care for HF and clinical outcomes for patients with HF. Although it is important to optimize treatment based on evidence-based guidelines to the greatest extent, it is known that there is still poor treatment adherence, and many patients do not receive guideline-directed medical therapy, especially at the early stages. To improve medication adherence, qualitative evaluation through performance measurement, as well as education of patients, caregivers and medical staff through a multidisciplinary approach are important.

Treatment for Hydrofluoric Acid Chemical Injury on Hands (불산에 의한 수부 화학 화상의 치료)

  • Nam, Seung Min;Choi, Hwan Jun;Kim, Mi Sun
    • Archives of Plastic Surgery
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    • v.34 no.4
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    • pp.471-477
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    • 2007
  • Purpose: Hydrofluoric acid(HF) is one of the most dangerous mineral acids with dissociated fluoride ions. As hydrofluoric acid is present in various household products(such as rust removers), a large population of industrials is at the risk of HF exposure. It is a very strong organic acid, used widely in glass etching, metal washing, and in the semiconductor industry. Even when using adequate safety measures, lack of care on the user's part results in chemical burn by HF. Symptoms caused by HF-induced chemical burns shows delayed manifestations resulting in a loss of proper treatment opportunities. We therefore reviewed 20 cases of HF-induced chemical burns and treatment principle. Methods: The objects of this study were 19 male patients and 1 female treated from March 2004 to March 2006. There were 19 cases of injury on digits and 1 on the wrist area. There were 15 cases of immediate treatment after sustaining HF-induced burns, and 5 cases of delayed treatment. As a principle, in the emergency treatment, partial or complete removal of the nail along with copious washing with normal saline was done, depending on the degree of HF invasion of the distal digital extremities. Results: The 15 cases who came to the hospital immediately after the injury were healed completely without sequelae, and those who delayed their treatment needed secondary surgical measures, due to the severity of inflammation and necrosis of the digital tissues. Conclusion: As the industrial sector develops, the use of HF is increasing more and more, leading to increase in incidences of HF-induced chemical burns. When treating chemical burns caused by HF, washing by copious amounts of normal saline, along with early removal of the nails, rather than calcium gluconate, seems to be a available method for preserving the shape and function of the digits and the nail. The education of patients regarding this subject should be empathized accordingly.

Chemical HF Treatment for Rear Surface Passivation of Crystalline Silicon Solar Cells

  • Choi, Jeong-Ho;Roh, Si-Cheol;Jung, Jong-Dae;Seo, Hwa-Il
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.4
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    • pp.203-207
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    • 2013
  • P-type Si wafers were dipped in HF solution. The minority carrier lifetime (lifetime) increased after HF treatment due to the hydrogen termination effect. To investigate the film passivation effect, PECVD was used to deposit $SiN_x$ on both HF-treated and untreated wafers. $SiN_x$ generally helped to improve the lifetime. A thermal process at $850^{\circ}C$ reduced the lifetime of all wafers because of the dehydrogenation at high temperature. However, the HF-treated wafers showed better lifetime than untreated wafers. PERCs both passivated and not passivated by HF treatment were fabricated on the rear side, and their characteristics were measured. The short-circuit current density and the open-circuit voltage were improved due to the effectively increased lifetime by HF treatment.

Effect of Simple Acupuncture and Electroacupuncture at Bai Hui($GV_{20}$) on Heart Rate Variability in Healthy Adults with Stress Task (백회(百會)($GV_{20}$) 단순 자침과 전침 자극이 정신적 스트레스를 가한 정상 성인의 심박변이도에 미치는 영향 비교)

  • Kim, Ji-Na;Lee, Ji-Su;Hong, Jung-Soo;Kim, Soo-Jung;Moon, Sung-Il
    • Journal of Acupuncture Research
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    • v.29 no.3
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    • pp.89-99
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    • 2012
  • Objectives : This study was performed to investigate the effect of simple acupuncture and electroacupuncture at Bai Hui($GV_{20}$) on heart rate variability in healthy adults with stress task. Methods : 40 healthy volunteers participated in this study. HRV was recorded before and after stress. And then simple acupuncture(SA group) was applied at $GV_{20}$ or electroacupuncture(EA group) was applied at the same spot in each treatment group for 20 minutes. No treatment was performed in control group for 20 minutes. Then HRV was recorded. Results : 1. In all groups, LF norm, LF/HF, HF norm showed significant changes after mental stress. 2. Control group showed no significant change. In SA group, HF norm LF, LF norm and LF/HF showed a significant change after treatment. In EA group, Mean HR, HF, LF norm, HF norm and LF/HF showed a significant change after treatment. In both treatment groups, there were significant differences after treatment compared to control group. 3. In EA group, HF and HF norm decreased significantly after treatment compared to SA group. Conclusions : These results suggest that simple acupuncture and electroacupuncture at $GV_{20}$ affect the balance of the autonomic nervous system and that electroacupuncture at $GV_{20}$ enhances parasympathetic activation more than simple acupuncture.

Pain Control for Hydrofluoric Acid Chemical Burn Using EMLA® creams (EMLA® 연고를 이용한 불산 화학 화상의 통증 조절)

  • Choi, Hwan Jun;Song, Jin Woo;Choi, Chang Yong
    • Archives of Plastic Surgery
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    • v.36 no.1
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    • pp.113-117
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    • 2009
  • Purpose: Although Hydrofluoric acid(HF) is not a strong acid when compared to other hydrogen halides, it is a feared corrosive and is particularly dangerous at higher concentrations. HF burns are characterized by symptoms, often delayed and localized with diluted HF solutions, to include erythema, edema and severe pain. Pain, a well known symptom following exposure to calcium binding. And, EMLA$^{(R)}$ cream is a topical formulation based upon the eutectic mixture of lidocaine and prilocaine and is used in clinical settings to provide pain relief undergoing superficial surgical procedures. The aim of this study is to evaluate effects of EMLA$^{(R)}$ cream, pain - control dressing on the treatment for HF injury wound. Methods: From June 2007 to June 2008, this study was carried out with 10 patients who had HF partial thickness burns. We were applied topically EMLA$^{(R)}$ cream to injured wound with vaseline gauze and 10% calcium gluconate wet gauze dressings. As a principle, in the emergency treatment, partial or complete removal of the bullae along with copious washing with normal saline was done, depending on the degree of HF invasion of the distal digital extremities. The effect of dressing was investigated by visual analogue pain scale. Results: We therefore reviewed 10 cases of HF - induced pain and pain relief treatment principle. The 10 cases who came to the hospital nearly immediately after the injury healed completely without sequelae and EMLA$^{(R)}$ related complications. Conclusion: Proper initial treatment of HF burns are important, if not promptly recognized and properly treated, for produce serious injury. Topical EMLA$^{(R)}$ cream remain a powerful, new advancement for minimizing HF - related pain during dressing procedures. When used appropriately, topical EMLA$^{(R)}$ cream can provide a safe and effective alternative to other forms of HF - pain control treatment.

Mullitization of HF-treated Kaolin (HF 처리된 Kaolin의 Mullite화 반응)

  • 박정현;장안재;박한수
    • Journal of the Korean Ceramic Society
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    • v.24 no.4
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    • pp.376-384
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    • 1987
  • Kaolin was treated by HF and fired at high temperature in order to reduce silica and impurity minerals of kaolin, and eventually to increase the yield of mullite. The kaolin structure was destroyed by HF-treatment and transformed into mullite at lower temperature than those of non-treated kaolin. Not only the silica content of kaolin was reduced, but also the crystalline structure of it was destroyed by HF-treatment.

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Treatment Efficiency of Pollutants in Constructed Wetlands under Different Hydroponic Wastewater Injection Methods and Characteristic of Filter Media (시설하우스 폐양액 주입방법 및 여재 특성에 따른 인공습지에서 수질오염물질의 처리효율)

  • Seo, Dong-Cheol;Park, Jong-Hwan;Cheon, Yeong-Seok;Park, Seong-Kyu;Kim, Ah-Reum;Lee, Won-Gyu;Lee, Sang-Won;Lee, Seong-Tae;Cho, Ju-Sik;Heo, Jong-Soo
    • Korean Journal of Environmental Agriculture
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    • v.29 no.2
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    • pp.146-151
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    • 2010
  • In order to improve T-N and T-P removal in HF (horizontal flow)-HF hybrid constructed wetlands by natural purification method for treating the hydroponic wastewater in greenhouses, the efficiency of water treatment as affected by the injection method of hydroponic wastewater, the addition of special filter media, the particle size of filter media, and the injection ratio of hydroponic wastewater in $1^{st}$ HF and $2^{nd}$ HF beds were investigated in small-scale HF-HF hydroponic wastewater treatment apparatus. Removal rate of T-P in the water in HF-HF hydroponic wastewater treatment apparatus with calcite as affected by addition method of special filter media was higher than that in HF-HF hydroponic wastewater treatment apparatus with other filter media. Removal rate of BOD, COD, SS, T-N and T-P in the water in mixed filter media with calcite were 86, 84, 87, 50 and 97%, respectively. Removals of pollutants except for T-P in the water were slightly different. Therefore, it should be considered that the removal rate of T-P was good for calcite in HF-HF hydroponic wastewater treatment apparatus. To improve T-N and T-P removal, the optimum particle size of filter media was 1.2 mm, and the optimum injection ratio ($1^{st}$ HF bed : $2^{nd}$ HF bed) of hydroponic wastewater was 60:40.

A study on pre-bonding of Si wafer direct bonding at HF pre-treatment (HF 전처리시 Si기판 직접접합의 초기접합에 관한 연구)

  • Chung, Gwiy-Sang;Kang, Kyung-Doo
    • Journal of Sensor Science and Technology
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    • v.9 no.2
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    • pp.134-140
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    • 2000
  • Si wafer direct bonding(SDB) technology is very attractive for both Si-on-insulator(SOI) electronic devices and MEMS applications. This paper presents on pre-bonding according to HF pre-treatment conditions in Si wafer direct bonding. The characteristics of bonded sample were measured under different bonding conditions of HF concentration and applied pressure. The bonding strength was evaluated by tensile strength method. A bond characteristic on the interface was analyzed by using FT-IR, and surface roughness according to HF concentration was analyzed by AFM. Si-F bonds on Si surface after HF pre-treatment are replaced by Si-OH during a DI water rinse. Consequently, hydrophobic wafer was bonded by hydrogen bonding of Si-OH$\cdots$(HOH$\cdots$HOH$\cdots$HOH)$\cdots$OH-Si. The pre-bonding strength depends on the HF pre-treatment condition before pre-bonding. (Min : $2.4kgf/cm^2{\sim}$Max : $14.9kgf/cm^2$)

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Study on pre-bonding according with HF pre-treatment conditions in Si wafer direct bonding (실리콘기판 직접접합에 있어서 HF 전처리 조건에 따른 초기접합에 관한 연구)

  • 강경두;박진성;정수태;주병권;정귀상
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.370-373
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    • 1999
  • Si direct bonding (SDB) technology is very attractive for both Si-on-insulator(SOI) electric devices and MEMS applications because of its stress free structure and stability. This paper presents on- pre treatment conditions in Si wafer direct bonding, The paper resents on pre-bonding according to HF pre-treatment conditions in Si wafer direct bonding. The characteristics of bonded sample were measured under different bonding conditions of HF concentration, applied pressure and annealing temperature(200~ 100$0^{\circ}C$) after pre-bonding. The bonding strength was evaluated by tensile strength method. The bonded interface and the void were analyzed by using SEM and IR camera, respectively, Components existed in the interlayer were analyzed by using FT-IR. The bond strength depends on the HF pre-treatment condition before pre-bonding(Min 2.4kgf/$\textrm{cm}^2$~ Max : 14.kgf/$\textrm{cm}^2$)

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Improved Uniformity of Resistive Switching Characteristics in Ag/HfO2/Pt ReRAM Device by Microwave Irradiation Treatment (Microwave Irradiation 처리를 통한 Ag/HfO2/Pt ReRAM에서의 메모리 신뢰성 향상에 대한 연구)

  • Kim, Jang-Han;Nam, Ki-Hyun;Chung, Hong-Bay
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.2
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    • pp.81-84
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    • 2014
  • The bipolar resistive switching characteristics of resistive random access memory (ReRAM) based on $HfO_2$ thin films have been demonstrated by using Ag/$HfO_2$/Pt structured ReRAM device. MIcrowave irradiation (MWI) treatment at low temperature was employed in device fabrication with $HfO_2$ thin films as a transition layer. Compared to the as-deposited Ag/$HfO_2$/Pt device, highly improved uniformity characteristics of resistance values and operating voltages were obtained from the MWI treatment Ag/$HfO_2$/Pt ReRAM device. In addition, a stable DC endurance (> 100 cycles) and a high data retention (> $10^4$ sec) were achieved.