• Journal of Korean Society of Environmental Engineers
• /
• v.34 no.10
• /
• pp.702-708
• /
• 2012

Tetrafluoromethane ($CF_4$) has been used as etching and Chemical Vapor Deposition (CVD) gases for semiconductor manufacturing processes. These gases need to be removed efficiently because of their strong absorption of infrared radiation and long atmospheric lifetimes which cause the global warming effect. Also, the wastewater including the fluorine is caused by of the ground water pollution. Long-term consumption of water containing excessive fluoride can lead to fluorosis of the teeth and bones. The wastewater including the fluorine among the by-product which is generated by using the waterjet plasma after destroying $CF_4$ by HF is generated. The system which can remove the hydrogen fluoride among the wastewater by using the electrocoagulation using this wastewater the aluminum electrode was developed. The operating condition such as initial pH, electrocoagulation time, wastewater flow rate, current density were investigated experimentally using a electrocoagulation. Through the parametric studies, the highest hydrogen fluoride destruction of 85% was achieved at 3.5 initial pH, 10 min electrocoagulation time, 10 mL/min wastewater flow rate and $159A/m^2$ current density.

• Biomedical Science Letters
• /
• v.14 no.2
• /
• pp.105-113
• /
• 2008

The objective of this study was to evaluate the influence of surface modifications on the bonding characteristics and cytotoxicity of specific titanium porcelain bonded to milling titanium and cast titanium. Milling titanium and cast titanium samples were divided into 8 test groups. These groups are as follow: i) sandblasted with particles of different size of $220{\mu}m\;and\;50{\mu}m$, ii) different sequences of sandblasting treatment and etching treatment, iii) etched with different etching solutions, and iv) preheated or not. The surface characteristics of specimens were characterized by the test of mean roughness of surface and SEM. The bond strength of titanium-ceramic systems was measured by using three-point bending test and SEM. The results show that the mean roughness of surface of sample sandblasted with $220{\mu}m$ aluminum oxide increased and bond strength were higher than sample sandblasted with $50{\mu}m$ aluminum oxide. The mean roughness of surface decreased, but the bond strength increased when the samples sandblasted with $220{\mu}m$ aluminum oxide were preheated. The sample sandblasted with $220{\mu}m$ aluminum oxide after oxidized with occupational corrosive agent I (50% NaOH, 10% $CuSO_4{\cdot}5H_2O$) and II (35% $HNO_3$, 5% HF) showed higher bond strength than sample oxidized with 30% $HNO_3$ after sandblasted with $220{\mu}m$ aluminum oxide. Group NaCuNF220SP (milling Ti: 35.3985 MPa, casting Ti: 37.2306 MPa) which was treated with occupational corrosive agent I (50% NaOH, 10% $CuSO_4{\cdot}5H_2O$) and II (35% $HNO_3$, 5% HF), followed by sandblasting with $220{\mu}m$ aluminum oxide and preheating at $750^{\circ}C$ for 1 hour showed the highest bond strength and significant differences (P<0.05). The method for modifying surface of titanium showed excellent stability of cells.

• The Journal of Advanced Prosthodontics
• /
• v.10 no.2
• /
• pp.101-112
• /
• 2018

PURPOSE. The purpose of this study was to investigate the effect of various surface treatments (ST) on the shear bond strength of resin composite to three bilayer dental ceramics made by CAD/CAM and two veneering ceramics. MATERIALS AND METHODS. Three different bilayer dental ceramics and two different veneering ceramics were used (Group A: IPS e.max CAD+IPS e.max Ceram; Group B: IPS e.max ZirCAD+IPS e.max Ceram, Group C: Vita Suprinity+Vita VM11; Group D: IPS e.max Ceram; Group E: Vita VM11). All groups were divided into eight subgroups according to the ST. Then, all test specimens were repaired with a nano hybrid resin composite. Half of the test specimens were subjected to thermocycling procedure and the other half was stored in distilled water at $37^{\circ}C$. Shear bond strength tests for all test specimens were carried out with a universal testing machine. RESULTS. There were statistically significant differences among the tested surface treatments within the all tested fracture types (P<.005). HF etching showed higher bond strength values in Groups A, C, D, and E than the other tested ST. However, bonding durability of all the surface-treated groups were similar after thermocycling (P>.00125). CONCLUSION. This study revealed that HF etching for glass ceramics and sandblasting for zirconia ceramics were adequate for repair of all ceramic restorations. The effect of ceramic type exposed on the fracture area was not significant on the repair bond strength of resin composites to different ceramic types.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2009.05a
• /
• pp.250-251
• /
• 2009

For the fabrication of a multilevel resist (MLR) based on a very thin amorphous carbon (a-C) layer an $Si_{3}N_{4}$ hard-mask layer, the selective etching of the $Si_{3}N_{4}$ layer using physical-vapor-deposited (PVD) a-C mask was investigated in a dual-frequency superimposed capacitively coupled plasma etcher by varying the following process parameters in $CH_{2}F_{2}/H_{2}/Ar$ plasmas : HF/LF powr ratio ($P_{HF}/P_{LF}$), and $CH_{2}F_{2}$ and $H_2$ flow rates. It was found that infinitely high etch selectivities of the $Si_{3}N_{4}$ layers to the PVD a-C on both the blanket and patterned wafers could be obtained for certain gas flow conditions. The $H_2$ and $CH_{2}F_{2}$ flow ratio was found to play a critical role in determining the process window for infinite $Si_{3}N_{4}$/PVDa-C etch selectivity, due to the change in the degree of polymerization. Etching of ArF PR/BARC/$SiO_x$/PVDa-C/$Si_{3}N_{4}$ MLR structure supported the possibility of using a very thin PVD a-C layer as an etch-mask layer for the $Si_{3}N_{4}$ layer.

• Korean Journal of Optics and Photonics
• /
• v.3 no.4
• /
• pp.244-251
• /
• 1992

Buried Bragg filters of single mode $Si_{3}N_{4}$ rib waveguide with a cover layer of $SiO_{2}$ and grating at the interface of $Si_{3}N_{4}$ and $SiO_{2}$ are designed and fabricated. Etching of the grating on $Si_{3}N_{4}$ waveguide core by buffered HF showed uniform etching with good control up to 1 nm. This buried type of Bragg filters are immune to contamination of the surface of device. The mode index and bandwidth of filters are determined by measurements of the transmission spectrum of Bragg filters and compared with that of calculation. Waveguide Bragg filters loaded with the micro-heater of Cr film and the cladding of silicone rubber are made to control the Brag wavelength of the filter. As a result the filter wavelength of the device moved by 0.41 nm for 10 mA current to the shorter side of wavelength proportional to the square of the current.

• Journal of Technologic Dentistry
• /
• v.41 no.3
• /
• pp.177-185
• /
• 2019

Purpose: This study was to investigate the effect of three different surface treatments on the shear bond strength of lithium disilicate ceramics to enamel. Methods: Totally 60 lithium disilicate ceramic disc specimens were fabricated with IPS e.max press (Ivoclar Vivadent, Schaan, Liechtenstein) and Mazic Claro (Vericom, Korea). 30 specimens in each lithium disilicate ceramic were assigned to 3 groups of the each following surface treatment: 1) $50{\mu}m$ airborne particle abrasion+silane, 2) 9.5% hydroflouric acid etching (HF)+silane, 3) $50{\mu}m$ airborne particle abrasion+9.5% HF+silane. Lithium disilicate ceramic surfaces after surface treatments were AFM examined. The shear bond strength was measured in a universal testing machine at 0.5mm/min crosshead speed. All data were analyzed using a two-way ANOVA and Tukey's test(${\alpha}=0.05$). Results: The mean surface roughness of lithium disilicate ceramics ranged from $0.178{\mu}m$ to $0.441{\mu}m$. The mean shear bond strengths ranged from $23.81{\pm}2.78MPa$ to $33.99{\pm}4.85MPa$. Conclusion: 1. Mazic Claro showed higher shear bond strength than IPS e.max press at 3 different surface treatments, and no statistically significant was observed. 2. The shear bond strength of IPS e.max press was strongly enhanced as surface treated with $50{\mu}m$ airborne particle abrasion and 9.5% hydroflouric acid etching. And there was no statistical significance at the shear bond strength of Mazic Claro with surface treatments.

• Analytical Science and Technology
• /
• v.22 no.3
• /
• pp.247-253
• /
• 2009

Porous silicon films are electrochemically etched from crystalline silicon wafers in an aqueous solution of hydrofluoric acid(HF). Careful control of etching conditions (current density, etch time, HF concentration) provides films with precise, reproducible physical parameters (morphology, porosity and thickness). The etched pattern could be varied due to (1) current density controls pore size (2) etching time determines depth and (3) complex layered structures can be made using different current profiles (square wave, triangle, sinusoidal etc.). The optical interference spectrum from Fabry-Perot layer has been used for forensic applications, where changes in the optical reflectivity spectrum confirm the identity. We will explore a method of identifying the specific pattern code and can be used for identities of individual code with porous silicon based encoded nanosized smart particles.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2016.02a
• /
• pp.161.1-161.1
• /
• 2016

박막 태양전지의 광 산란을 위한 텍스쳐 된 표면은 반사 손실을 감소시키기 위한 것이다. 그러나, 투명한 전극(TCO)의 텍스쳐 된 표면은 빛의 가용성을 제한하고, 장파장 영역에서 haze의 수치를 감소시키며, 전반사의 증가는 박막 태양전지의 Jsc를 감소시킨다. 본 논문에서는 높은 빛의 가용성을 위하여 HF+HCl 혼합용액을 이용하여 표면의 질을 향상시키기 위한 해결책을 제시했다. 같은 HF+HCl 혼합용액을 사용하여, 540 nm의 파장에서 약 85 %의 높은 haze 수치를 달성했으며, ZnO:Al 막의 증착 후에 식각된 유리 기판과 함께 비교했을 때, 2.3%의 haze 수치의 감소를 얻었다. 또, 깊은 습식 식각에 의하여 Haze 수치를 증가시키기 위한 메커니즘 간단히 설명했다. 텍스쳐 된 유리 기판의 haze 수치의 측면에서 광학 이득은 일반적인 Asahi FTO 유리(${\lambda}=540nm$의 13.5%)에 비해 상당히 높다. 이러한 높은 haze 수치의 AZO 박막은 박막 태양전지의 Jsc를 개선하는데 이용할 수 있다.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 1996.04a
• /
• pp.146-150
• /
• 1996

A thermal micro actualtor has been fabricated using surface micromachining techniques. It consists of doped ploysilicon as a moving part and TEOS(Tetra Ethyl Ortho Silicate) as a sacrificial layer. The polysilicon was annealed for the reduction of residual stress which is the main cause to its deformation such as bending and buckling. And the newly developed HF VPE(vapor phase etching)process was also used as an effective release method for the elimination of sacrificaial layer. With noliquid involved during any of the steps for relasing, unlike other reported relase techniques, the HF VPE pocess has produced polysilicon microstructures with virtually no process-induced stiction problem. The actuation is incured by the thermal expasion due to current flow in active polysilicon cantilever, which motion is amplified bylever mechanism. The thickness of pllysilicon is 2 .mu. m and the length of active and passive polysilicon cantilever are 500 .mu. m, respectively. The moving distance of polysilicon actuator was experimentally conformed as large as 21 .mu. m at the input voltage level of 10 V and 50Hz square wave. These micro actuator technology can be utilized for the fabrication of MEMS (microlectromechanical system) such as microrelay, which requires large displacement or contact force but relatively slow response.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.25 no.1
• /
• pp.58-61
• /
• 2012

In our report a relatively simple process for fast nano-texturing of p-type(100) CZ- silicon surface using silver catalyzed wet chemical etching in aqueous hydrofluoric acid (HF) and hydrogen peroxide solution($H_2O_2$) at room temperature. The wafers were saw-damaged by NaOH(6 wt%) at $60^{\circ}C$ for 150s. To obtain a nano-structured black surface, a thin layer of silver with thickness of 1 - 10 nm was deposited on the surfaces by evaporation system. After this process the samples were etched in HF : $H_2O_2$ : $H_2O$ = 1:5:10 at room temperature for 80s - 220s. Due to the local catalytic of the Ag clusters, this treatment results in the nano-scale texturing on the surface. This resulted in average reflectance values less than 9% after the silver on the surface of the wafers were removed.