• Title/Summary/Keyword: HF etching

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Surface Treatment of Dielectric Ceramic Resonator for High Frequency Devices (고주파용 유전체 세라믹 공진기의 표면처리)

  • Park, Hae-Duck;Kang, Sung-Goon
    • Korean Journal of Materials Research
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    • v.11 no.11
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    • pp.923-928
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    • 2001
  • An electrolytic silver plating process has been successfully developed for terminated electrode parts of dielectric ceramic resonator. High adhesion strength and high Qu is obtained and blister occurance is minimized under plating condition with $HNO_3$750 $m\ell/\ell$ and HF $ 250m\ell/\ell$ solution at $25^{\circ}C$ for 20 minutes. Adhesion strength has the highest value, 3.2 kg/mm$^2$ at etching temperature of $25^{\circ}C$. Adhesion strength, Qu and blister occurance are monotonically increased with the thickness of electrodeposition layer. In case of electrodeposition of Ag, Qu value of 380 has obtained higher than in case of electrolytic Cu plating with Qu value of 325. Therefore, terminated electrode parts of dielectric ceramic resonator reducing dielectric loss can be obtained using prensent process.

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Formation of metal nano particles on optical fiber for fiber optic localized surface plasmon resonance sensor (광섬유 국소화 표면 플라즈몬 공명 센서를 위한 광섬유 표면상의 금속 나노 입자 형성)

  • Lee, Hoon;Lee, Seung-Ki
    • Journal of Sensor Science and Technology
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    • v.17 no.2
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    • pp.95-99
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    • 2008
  • Various etching methods of optical fiber and formation of metal nano particles on the optical fiber have been proposed for fabrication of fiber optic localized surface plasmon resonance (FO LSPR) biosensors. Different types of etched optical fiber are possible by removing the cladding of optical fiber using HF (hydrofluoric acid) solution and BHF (buffered hydrofluoric acid) solution, which results in improved surface roughness when BHF solution is used. Localized surface plasmon can be formed and measured by formation of silver and gold nano particles on the etched optical fiber. The characteristics of the etched optical fiber and metal nano particles on the etched surface of the optical fiber play a key role in dictating the sensitivity of the LSPR sensors, so that the proposed results can be expected to be applied for related research on fiber optic based biosensors.

Morphology of Si Etching Structure Using KOH Solution with IPA and Ethanol (KOH를 이용한 Si 식각에서 IPA와 Ethanol을 사용한 경우의 표면 비교)

  • Lee, Gwi-Deok;Roh, Yong-Han
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.123-124
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    • 2006
  • 본 연구에서는 KOH 용액을 사용한 Si 습식 이방성 식각실험 진행 후, 나타나는 표면의 거친 현상을 완화하는 데에 중점을 두고 연구를 진행하였다. 이를 위해 $SiO_2$ 웨이퍼 위에 Photo-lithography 공정으로 형성시킨 PMER 패턴을 Mask로 사용하여 HF 용액으로 $SiO_2$를 식각시켰으며, 형성된 $SiO_2$를 Mask로 사용하여 KOH 용액으로 Si을 식각시켰다. 이 때, KOH와 혼합하는 용액으로 IPA와 Ethan이을 각각 사용하여 실험을 진행하였으며, ESEM을 이용하여 표면을 비교하였다.

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Driving silicon membrane with electromagnetic force (전자력을 이용한 실리콘 막의 구동)

  • Kim, Yong-Sung;Ahn, Si-Hong;Kim, Yong-Kweon
    • Proceedings of the KIEE Conference
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    • 1998.11c
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    • pp.1020-1022
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    • 1998
  • Silicon membrane to be used for micropump is fabricated and the deflection of the membrane driven by the electromagnetic force is measured. Silicon and glass are anodic bonded and Si is thinned. Silicon membrane is fabricated by the glass etching. The gold pattern can be protected against HF by the washing and fixing process under the glass etching process. The electromagnetic force is gained by the magnetic field driven by the current flowing through two coils. Deflection of the silicon membrane has a tendency of increasing with the increase of the driving current.

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Fabrication of Macroporous Silicon Diaphragms (매크로기공을 갖는 다공질 실리콘 다이어프램의 제작)

  • Min, Nam-Ki;Ha, Dong-Sik;Jeong, Woo-Sik;Min, Suk-Ki
    • Proceedings of the KIEE Conference
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    • 1998.07d
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    • pp.1558-1560
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    • 1998
  • Macroporous silicon diaphragms 20 to $200{\mu}m$ thick have been formed on p-type silicon by anistropic etching in TMAH solution and then by electrochemical etching in HF-ethanol-water solution with an applied current. The pores have a pore diameter of $1.5{\sim}2{\mu}m$, with a depth of $20{\sim}30{\mu}m$ and are not interconnected, which are in sharp contrast to the porous silicon reported previouly for similarly doped p-Si. The fabrication of macroporous silicon and free-standing diaphragms is expected to offer new applications for microsensors, micro-machining, and separators.

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Investigation of surface texturing to reduce optical losses for multicrystalline silicon solar cells (다결정 실리콘 태양전지의 광학적 손실 감소를 위한 표면 텍스쳐링에 관한 연구)

  • Kim, Ji-Sun;Kim, Bum-Ho;Lee, Soo-Hong
    • 한국신재생에너지학회:학술대회논문집
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    • 2007.11a
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    • pp.264-267
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    • 2007
  • It is important to reduce optical losses from front surface reflection to improve the efficiency of crystalline silicon solar cells. Surface texturing by isotropic etching with acid solution based on HF and $HNO_3$ is one of the promising methods that can reduce surface reflectance. Anisotropic texturing with alkali solution is not suitable for multicrystalline silicon wafers because of its various grain orientations. In this paper, we textured multicrystalline silicon wafers by simple wet chemical etching using acid solution to reduce front surface reflectance. After that, surface morphology of textured wafer was observed by Scanning Electron Microscope(SEM) and Atomic Force Microscope(AFM), surface reflectance was measured in wavelength from 400nm to 1000nm. We obtained 29.29% surface reflectance by isotropic texturing with acid solution in wavelength from 400nm to 1000nm for fabrication of multicrystalline silicon solar cells.

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Stress Measurement of films using surface micromachined test structures (표면 미세 가공된 구조체를 이용한 박막의 응력 측정)

  • 이창승;정회환;노광수;이종현;유형준
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1996.11a
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    • pp.721-725
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    • 1996
  • The microfabricated test structures were used in order to evaluate the stress characteristics in films. The test structures were fabricated using surface micromachining technique, including HF vapor phase etching as an effective release method. The fabricated structures were micro strain gauge, cantilever-type vernier gauge and bridge for stress measurement, and cantilever for stress gradient measurement. The strain was measures by observing the deformation of the structures occurred after release etching and the amount of deformation can be detected by micro vernier gauge, which has gauge resolution of 0.2${\mu}{\textrm}{m}$. The detection principles and the degree of precision for the measured strain were also discussed. The characteristics of residual stress in LPCVD polysilicon films were studied using these test structures. The stress gradient due to the stress variation through the film thickness was calculated by measuring the deflection at the cantilever free end.

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A Study on Cleaning Processes for Ti/TiN Scales on Semiconductor Equipment Parts (반도체 장비 부품의 Ti/TiN 흡착물 세정 공정 연구)

  • 유정주;배규식
    • Journal of the Semiconductor & Display Technology
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    • v.3 no.2
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    • pp.11-15
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    • 2004
  • Scales, accumulated on some parts of semiconductor equipments such as sputters and CVD during the device fabrication processes, often lower the lifetime of the equipments and production yields. Thus, many equipment parts have be cleaned regularly. In this study, an attempt to establish an effective process to remove scales on the sidewall of collimators located inside the chamber of the sputter was made. The EDX analysis revealed that the scales were composed of Ti and TiN with the columnar structure. Through the trial-and-error experiments, it was found that the etching in the $HNO_3$:$H_2SO_4$:$H_2O$=4:2:4 solution for 5.5 hrs at $67^{\circ}C$, after the oxide removal in the HF solution, and the heat-treatment at $700^{\circ}C$ for 1 min., was the most effective process for the scale removal.

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Optical Characterization of DBR Porous Silicon by Changing of Applied Current Density (전류세기의 변화에 따른 DBR 다공성 실리콘의 광학적 특성)

  • Choi, Tae-Eun;Park, Jaehyun
    • Journal of Integrative Natural Science
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    • v.2 no.2
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    • pp.82-85
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    • 2009
  • Distributed Bragg reflector (DBR) porous silicon (PSi) was generated by an electrochemical etching a bragg structure into a silicon wafer through electrode current in aqueous ethanolic HF solution. DBR PSi exhibiting unique reflectivity was successfully obtained by an electrochemical etching of silicon wafer using square current waveform. The multilayered photonic crystals of DBR PSi exhibited the reflection of a specific wavelength with high reflectivity in the optical reflectivity spectrum. In this work, we have developed a method to create refractive index in Si substrate through intensity of an electric current. The electrochemical process allows for precise control of the structural properties of DBR PSi such as thickness of the porous layer, porosity, and average pore diameter. The number of reflection peak of DBR PSi and its pore size increased as the intensity of electric current increased. This might be a demonstration for the fabrication of specific reflectors or filters.

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Fabrication and Characterization of Silole and Biotin-functionalized Rugate Porous Silicon

  • Kwon, Hyungjun
    • Journal of Integrative Natural Science
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    • v.3 no.1
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    • pp.24-27
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    • 2010
  • Multi-functionalized rugate porous silicon (PSi) for biosensor was developed by hydrosilylation with silole and its further reaction with biotin groups. PSi was generated by an electrochemical etching of silicon wafer in aqueous ethanolic HF solution PSi prepared by using etching conditions showed that many sharp spectral lines can be obtained in the optical reflectivity spectrum. 1,1-hydrovinyl-2,3,4,5-tetraphenylsilole was obtained from the reaction of 1,1-dilithio-2,3,4,5-tetraphenyl-1,3-butadiene with dichlorovinylsilane. Multi-functionalized PSi with silole and biotin groups was characterized by UV-vis absorption spectroscopy, Ocean optics 2000 spectrometer, and fluorescence spectroscopy. Optical characteristics such as reflectivity and photoluminescence (PL) were observed. An increase of the reflection wavelength in the reflectivity spectrum by 20 nm was observed, indicative of a change in refractive indices induced by hydrosilylation of the silole and biotin groups to the rugate PSi. This red-shift was attributed to the replacement of some of the Si-H group of fresh rugate PSi with silole and biotin group.