• Journal of the Korea Academia-Industrial cooperation Society
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• v.9 no.4
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• pp.1000-1005
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• 2008

The US government has designed new military standard vocoder algorithm, which is called MELP algorithm, to provide robust communication performance on poor channel environment. In this paper, we analyze transmission effect of security communication in MELP vocoder environment of HF channel. MELP vocoder develop properly application in environment of HF channel and influence of MELP vocoder and channel encoding apply to in envitonment of wireless burst and performance of plaintext communication and security communication study a matter from analysis of MOS and spectrum analysis.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2013.05a
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• pp.138-139
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• 2013

본 연구는 ZnO-TFT 소자에 Hf의 첨가에 따른 소자 특성 및 게이트 바이어스 스트레스에 대한 특성에 대해 분석을 하였다. Hf-Zn-O 박막은 Hf의 조성이 증가함에 따라 작아지는 grain size로 인해 TFT 소자의 전계효과 이동도와 게이트 바이어스 스트레스에서의 문턱전압의 변화가 더 커지는 것을 확인하였다. 한편, Hf이 14at% 함유된 HZO-TFT에서는 이동도는 현저히 저하되었지만, 게이트 바이어스 스트레스에서의 문턱전압의 변화가 현저히 개선되는 것을 확인하였는데, 이는 Hf의 조성이 증가함에 따라 비정질화 되어 grain boundaries에 의한 trap의 영향이 줄어든 결과를 확인하였다. 또한, 전계효과 이동도와 소자의 안정성을 확보하기 위해, poly-ZnO와 amorphous-HZO로 구성된 다중층 채널 구조를 이용한 TFT소자에서는 전계효과 이동도과 소자의 안정성이 개선된 결과를 보였다. 이는 채널과 게이트 산화물의 interface charge trap의 감소와 back-channel effect가 감소한 결과임을 확인하였다.

• Proceedings of the KAIS Fall Conference
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• 2008.05a
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• pp.118-120
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• 2008

본 논문에서는 HF channel 환경에서 MELP부호화 방식을 이용한 보안 통신의 전송영향을 분석하였다. MELP부호화 방식은 HF채널에 적합하게 적용되도록 개발되었으며 무선 버스터 환경에서 MELP 부호화 영향과 채널부호화 방식을 적용함으로써 평문통신과 보안통신의 성능을 MOS와 스펙트럼 분석을 통해 성능을 고찰하였다.

• Journal of the Korea Society for Simulation
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• v.11 no.1
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• pp.23-30
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• 2002

An STI(Shallow Trench Isolation) by using a CMP(Chemical Mechanical Polishing) process has been one of the key issues in the device isolation[1] In this paper we fabricated N, P-MOSFEET tall analyse hump characteristics in various rounding oxdation thickness(ex : Skip, 500, 800, 1000$\AA$). As a result we found that hump occurred at STI channel edge region by field oxide recess. and boron segregation(early turn on due to boron segregatiorn at channel edge). Therefore we improved that hump occurrence by increased oxidation thickness, and control field oxide recess( 20nm), wet oxidation etch time(19HF,30sec), STI nitride wet cleaning time(99HF, 60sec+P 90min) and fate pre-oxidation cleaning time (U10min+19HF, 60sec) to prevent hump occurring at STI channel edge.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2003.12a
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• pp.86-88
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• 2003

Gate 산화막을 high-k 물질인 $HfO_2$ 박막을 이용하여 N-type MOS field effect transistor를 제작하였다. 전극은 poly-Si 전극을 사용하였다. Gate 산화막은 ALD 로 $Hf(N(CH_3)_2)_4$ 원료를 이용하여 $HfO_2$ 박막을 형성하였다. 산화제는 $H_{2}O$ 와 $O_3$ 를 사용하였는데, $H_{2}O$ 가 약간 우수하였으나 그 차이는 크지 않았다. $HfO_2$ 를 증착하기 전에 in-situ 로 $O_3$ 를 흘려 줌으로써 $SiO_2$를 얇게 형성하였는데, 이 결과 threshold voltage 가 약 0.2V 높아지고 saturation current 가 커지는 것이 관찰되었다. 이러한 결과는 $HfO_2$ 박막을 직접 channel 위에 증착하는 것보다 $O_3$ 를 이용 얇은 $SiO_2$ 를 형성하고 그 위에 $HfO_2$ 박막을 증착하는 방법이 transistor의 특성을 향상시키는 데 도움이 된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.252-253
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• 2011

ZnO-based thin film transistors (TFTs) are of great interest for application in next generation flat panel displays. Most research has been based on amorphous indium-gallium-zinc-oxide (IGZO) TFTs, rather than single binary oxides, such as ZnO, due to the reproducibility, uniformity, and surface smoothness of the IGZO active channel layer. However, recently, intrinsic ZnO-TFTs have been investigated, and TFT- arrayss have been demonstrated as prototypes of flat-panel displays and electronic circuits. However, ZnO thin films have some significant problems for application as an active channel layer of TFTs; it was easy to change the electrical properties of the i-ZnO thin films under external conditions. The variable electrical properties lead to unstable TFTs device characteristics under bias stress and/or temperature. In order to obtain higher performance and more stable ZnO-based TFTs, HZO thin film was used as an active channel layer. It was expected that HZO-TFTs would have more stable electrical characteristics under gate bias stress conditions because the binding energy of Hf-O is greater than that of Zn-O. For deposition of HZO thin films, Hf would be substituted with Zn, and then Hf could be suppressed to generate oxygen vacancies. In this study, the fabrication of the oxide-based TFTs with HZO active channel layer was reported with excellent stability. Application of HZO thin films as an active channel layer improved the TFT device performance and bias stability, as compared to i-ZnO TFTs. The excellent negative bias temperature stress (NBTS) stability of the device was analyzed using the HZO and i-ZnO TFTs transfer curves acquired at a high temperature (473 K).

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2009.05a
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• pp.811-814
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• 2009

The HF band maritime communication is have developing to digital methode that techniques should be readied the automatic link establishment of 1:N by coast station to many ship station. Because can use way by polling simply that communication environment calls particular station wicked fellow HF communication states which is much redundancy times for coast station to set link. In amateur radio particular station selective calling do to be using ALE(Automatic Link Establishment) controller by 1:1 automatic link setting way, but expect 1:N link setting by these way in maritime communication very difficult. That is difficult to avoid collision by traffic overload to induce calling of ship stations. Because HF communication considers channel special quality traffic state radio link should be established, and should be applied automatically secures stability of channel as accommodative at traffic overload. In this paper is studied the new radio protocol by 3 step sequency driving of free access, group free access and polling access using multi-tone in single channel.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.19 no.3
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• pp.442-450
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• 1994

In this paper, the tracking of SFH/MFSK signals by using a paeallel correlator and a bank of BPF which is implemented by DFT recursively is studied. During symbol period, M-ary signal`s spectrum is analyzed by the step of n multiple of sampling period. The bank of BPF output which is stored for hop duration input to the parallel correlator. The time difference of the receiver and the transmitter is corrected by using sampling position and correlation time at which the largest output of correlator is generated. Syncronization signal detection rate and distribution of the largest output of correlator are evaluated by computer simulation in HF channel evironments for the performance analysis of proposed tracking method.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.304.2-304.2
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• 2016

Hafnium oxide-aluminum oxide (HfO2-Al2O3) dielectric films have been fabricated by Pulsed Laser Deposition (PLD), and their properties are studied in comparison with HfO2 films. As a gate dielectric of the TFT, in spite of its high dielectric constant, HfO2 has a small energy band gap and microcrystalline structure with rough surface characteristics. When fabricated by the device, it has the drawback of generating a high leakage current. In this study, the HfAlO films was obtained by Pulsed Laser Deposition with HfO2-Al2O3 target(chemical composition of (HfO2)86wt%(Al2O3)14wt%). The characteristics of the thin Film have been investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and spectroscopic ellipsometer (SE) analyses. The X-ray diffraction studies confirmed that the HfAlO has amorphous structure. The RMS value can be compared to the surface roughness via AFM analysis, it showed HfAlO thin Film has more lower properties than HfO2. The energy band gap (Eg) deduced by spectroscopic ellipsometer was increased. HfAlO films was expected to improved the interface quality between channel and gate insulator. Apply to an oxide thin Film Transistors, HfAlO may help improve the properties of device.

• Korean Journal of Materials Research
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• v.5 no.2
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• pp.208-214
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• 1995

In order to study on the penetrations of HF solution acording to the geometrical shrinkage of contact-hole pattern size, the wet etch characteristics for oxide in microchannel patterns was investigated. Microchannel patterns of LPCVD oxide surrounded by nitride film, with dimensions of 0.1~1$\mu\textrm{m}$ height and 0.1~20$\mu\textrm{m}$, width, were fabricated. And the etch rates of oxide in HF solution were observed. It was found that oxide etch rate for micro-channel patterns in HF was not affected by pattern sizes and initial aspect ratios up to $0.1 \times 0.1 \mu \textrm{m}^{2} size and 1.2$\mu\textrm{m}$ depth. Finally, it was concluded that there were no special limitations for penetrations of HF solution in wet processes according to the geometrical shrinkage of contact-hole pattern size.