• Title/Summary/Keyword: H atoms

Search Result 651, Processing Time 0.025 seconds

The Thermodynamics of the Formation of Polymethylbenzene-Halogens Charge Transfer Complexes (Ⅱ) (폴리메틸벤젠과 할로겐 사이의 전하이동착물 생성에 관한 열역학적 연구 (제2보))

  • Oh Cheun Kwun;Jeong Rim Kim
    • Journal of the Korean Chemical Society
    • /
    • v.25 no.2
    • /
    • pp.75-84
    • /
    • 1981
  • Ultraviolet spectrophotometric investigations have been carried out on the systems of mesitylene with iodine, bromine, iodine monochloride and iodine monobromide in carbon tetrachloride. The results reveal the formation of the charge transfer complexes of the type, $C_6H_3(CH_3)_3{\cdot}X_2$ or $C_6H_3(CH_3)_3{\cdot}IX$ (X denotes halogen atoms). The equilibrium constants were obtained in consideration of that absorption maxima due to the formation of the charge transfer complexes shift to blue with the increasing temperatures. Thermodynamic parameters, ${\Delta}H$, ${\Delta}G$ and ${\Delta}S$ for the formation of the charge transfer complexes were calculated from these values. These results indicate that the relative stabilities of the mesitylene complexes at each temperature decrease in the order, ICl > IBr > $I_2$ > $Br_2$. This order may be a measure of their relative acidities toward mesitylene, which is explaned in terms of the relative polarizabilities of halogen molecules and the relative electronegativities of halogen atoms. These results combined with previous study of this series indicated that the relative stabilities of the polymethylbenzene complexes with iodine increase in the order Benzene < Toluene < Xylene < Mesitylene Thus, analysis of these findings is discussed.

  • PDF

Crystal Structure Analysis of $LiN(D_xH_{1-x}){_4}SO_4$ by X-ray and Neutron Diffraction (X-선과 중성자 회절을 이용한 강유전체 단결정 $LiN(D_xH_{1-x}){_4}SO_4$의 결정구조 연구)

  • Kim, Shin-Ae;Kim, Seong-Hoon;So, Ji-Yong;Lee, Jeong-Soo;Lee, Chana-Hee
    • Journal of the Mineralogical Society of Korea
    • /
    • v.20 no.4
    • /
    • pp.351-356
    • /
    • 2007
  • The crystal structure of $Li(ND_4)SO_4$ was analyzed by X-ray and neutron diffraction methods. The crystal is a deuterated $Li(NH_4)SO_4$ and one of the ferroelectric materials with hydrogen atoms. The crystal is orthorhombic at room temperature, $P2_1nb$, with lattice parameters of $a=5.2773(5)\;{\AA},\;b=9.1244(23)\;{\AA},\;c=8.7719(11)\;{\AA}$ and Z=4. Neutron intensity data were collected on the Four-Circle diffractometer (FCD) at HANARO in Korea Atomic Energy Research Institute and X-ray date were given by Prof. Y. Noda of Tohoku University Japan. The structure was refined by full-matrix least-square to final R value of 0.070 for 1450 observed reflections by X-ray diffraction and to final R=0.049 for 745 observed reflections by neutron diffraction. With X-ray data we obtained only one hydrogen atomic position. However, not only all atomic positions of four hydrogen atoms at $NH_4$ but also the occupation factors of D and H were refined with neutron data. From this results we obtained the average chemical structure of this sample, $LiND_{3.05}H_{0.95}SO_4$.

A Study on the Removal of Cu Impurity on Si Substrate and Mechanism Using Remote Hydrogen Plasma (리모트 수소 플라즈마를 이용한 Si 기판 위의 Cu 불순물 제거)

  • Lee, Jong-Mu;Jeon, Hyeong-Tak;Park, Myeong-Gu;An, Tae-Hang
    • Korean Journal of Materials Research
    • /
    • v.6 no.8
    • /
    • pp.817-824
    • /
    • 1996
  • Removal of Cu impurities on Si substrates using remote H-plasma was investigated. Si substrates were intentionally contaminated by 1ppm ${CuCI}_{2}$, standard chemical solution. To determine the optimal process condition, remote H-plasma cleaning was conducted varying the parameters of rf power, cleaning time and remoteness(the distance between the center of plasma and the surface of Si substrate). After remote H-plasma cleaning was conducted, Si surfaces were analysed by TXRF(total x-ray reflection fluorescence) and AFM(atomic force microscope). The concentration of Cu impurity was reduced by more than a factor of 10 and its RMS roughness was improved by more than 30% after remote H-plasma cleaning. TXRF analysis results show that remote H-plasma cleaning is effective in eliminating Cu impurity on Si surface when it is performed under the optimal process condition. AFM analysis results also verifies that remote H-plasma cleaning makes no damage to the Si surface. The deposition mechanism of Cu impurity may be explained by the redox potential(oxidation-reduction reaction potential) theory. Based on the XPS analysis results we could draw a conclusion that Cu impurities on the Si substrate are removed together with the oxide by a "lift-off" mechanism when the chemical oxide( which forms when Cu ions are adsorbed on the Si surface) is etched off by reactive hydrogen atoms.gen atoms.

  • PDF

Deposition of Diamond Film by Hydrogen-oxyacetylene Combustion Flame (수소-산소아세틸렌 연소염에 의한 다이아몬드 필름의 증착)

  • Ko, Chan-kyoo;Kim, Ki-young;Park, Dong-wha
    • Applied Chemistry for Engineering
    • /
    • v.8 no.1
    • /
    • pp.84-91
    • /
    • 1997
  • Diamond film was deposited on Mo substrate at atmospheric pressure using a combustion flame apparatus with the addition of $H_2$. With the substrate temperature, the nucleation density of the substrate was increased. At temperatures above $1000^{\circ}C$, some of diamond was partly converted into graphite and etched by hydrogen atoms. With an increase of the $C_2H_2/O_2$ ratio, the nucleation density was increased. But crystals were cauliflower-shaped and a large number of amorphous carbon were deposited. With the addition of $H_2$, the nucleation density of diamond was increased by the improvement of surface activity. Diamond film of high crystallinity was deposited by etching amorphous carbon. With an increase of deposition time, the thickness of diamond film was increased.

  • PDF

Capacitively Coupled Plasma Simulation for Low-k Materials Etching Process Using $H_2/N_2$ gas (저 유전 재료의 에칭 공정을 위한 $H_2/N_2$ 가스를 이용한 Capacitively Coupled Plasma 시뮬레이션)

  • Shon, Chae-Hwa
    • The Transactions of the Korean Institute of Electrical Engineers C
    • /
    • v.55 no.12
    • /
    • pp.601-605
    • /
    • 2006
  • The resistance-capacitance (RC) delay of signals through interconnection materials becomes a big hurdle for high speed operation of semiconductors which contain multi-layer interconnections in smaller scales with higher integration density. Low-k materials are applied to the inter-metal dielectric (IMD) materials in order to overcome the RC delay. Relaxation continuum (RCT) model that includes neutral-species transport model have developed to model the etching process in a capacitively coupled plasma (CCP) device. We present the parametric study of the modeling results of a two-frequency capacitively coupled plasma (2f-CCP) with $N_2/H_2$ gas mixture that is known as promising one for organic low-k materials etching. For the etching of low-k materials by $N_2/H_2$ plasma, N and H atoms have a big influence on the materials. Moreover the distributions of excited neutral species influence the plasma density and profile. We include the neutral transport model as well as plasma one in the calculation. The plasma and neutrals are calculated self-consistently by iterating the simulation of both species till a spatio-temporal steady state profile could be obtained.

EPR Study of${\gamma}(1,2)-[H{_n}SiV^{IV}VW_{10}O_{40}]^{(7-n)-}$ (n = 0, 1 or 2). Identification of Four One-Electron Reduction Products and Evidence for Proton Transfer in the Solid State

  • Jeongmin Park;Hyunsoo So
    • Bulletin of the Korean Chemical Society
    • /
    • v.15 no.9
    • /
    • pp.752-758
    • /
    • 1994
  • Several one-electron reduction products of ${\gamma}$(1,2)-[$H_nSiV_2W_{10}O_{40}]^{(6-n)-}$ were separated by precipitating or coprecipitating with diamagnetic host compounds at different pH. Mono-and diprotonated species, 1 and 2, in powder samples exhibit aPR spectra characteristic of a mononuclear oxovanadium species, indicating that the unpaired electron is trapped at one vanadium atom. The EPR spectrum of the unprotonated species 0 shows 15 parallel lines, indicating that the unpaired electron interacts equally with two vanadium atoms. While different species were precipitated depending upon the pH of the solution and the charge of the host anion, only one species 1' was formed in the frozen solutions at pH 3.2-4.7. The EPR spectrum of 1' indicates that the unpaired electron is trapped at one vanadium atom and 1/16 of the spin density is delocalized onto the second vanadium atom. The species 1' is probably another form of the monoprotonated species. The EPR spectra show that some of 2 transform into 1 and some of 0 transform into 1' in the solid state at low temperatures. It is suggested that proton transfer between the heteropolyanion and water molecues in the solid state is involved in these transformations.

A Study on the Laser Salt-meter (II) (활선염해 측정장치 개발연구 (II))

  • Kim, H.J.;Jin, Y.S.;Lee, H.S.;Yoon, J.Y.;Joo, B.S.;Chung, S.J.
    • Proceedings of the KIEE Conference
    • /
    • 1995.07c
    • /
    • pp.1347-1349
    • /
    • 1995
  • Insulators contaminated by salt particles may cause flashovers in humid climate or light rain. Therefore, the quantity of salt on insulators should be monitored not to exceed a critical value. We propose a new remote sensing technique to measure the quantity of salt on insulators of power systems. The amount of the salt is measured from the intensity of the spontaneous emission from the sodium atoms. In this paper, a compact remote on-line salt-meter composed of Q Switch pulsed Nd:YAG laser and emission signal detection system will be introduced. And as the first result of this study, the operating characteristics of our developing laser system is also introduced.

  • PDF

Two-dimensional Cu Coordination Polymer: [$Cu_2Cl_2$(4,4'-dipyen)] (2차원 구리 배위 고분자: [$Cu_2Cl_2$(4,4'-dipyen)])

  • Huh, Hyun-Sue;Lee, Soon-W.
    • Korean Journal of Crystallography
    • /
    • v.18 no.1_2
    • /
    • pp.16-20
    • /
    • 2007
  • Under hydrothermal conditions, a 2-dimensional copper(I) coordination polymer [$Cu_2Cl_2$(4,4'-dipyen)] (1) was prepared from [$Cu(OAc)_2]{\cdot}H_2O$, 4,4'-dipyen, and KCl. In polymer 1, copper atoms are linked by the 4,4'-dipyen ligands approximately along the b-axis and are also linked by the chloro ligands approximately along the a-axis to form a 2-D layer, a network of rectangles.

Chemical Vapor Deposition of Silicon Carbide by the Pyrolysis of Methylchlorosilanes (메틸클로로실란류의 열분해를 이용한 탄화규소의 화학증착)

  • 최병진;박동원;조미자;김대룡
    • Journal of the Korean Ceramic Society
    • /
    • v.32 no.4
    • /
    • pp.489-497
    • /
    • 1995
  • The DDS((CH3)2SiCl2)+H2 gas mixture, where C atoms exist in excess in the molecules, was used for chemical vapor deposition of SiC in order to prevent codeposition of free Si in MTS(Ch3SiCl3)+H2 system. The deposition rate was more rapid than MTS, however differ from that of MTS, it decreased after shwoing a maximum at 140$0^{\circ}C$. The stoichiometry was highly improved by using the DDS as a precursor, although there exist a little pyrolytic C at 150$0^{\circ}C$. The preferred orientation was (220) in MTS, however, it changed to (111) in DDS. The microstructure of the layer deposited at lower temperature were dense, however it grew coarse with the increase in the temperature.

  • PDF

3D-QSAR Analysis and Molecular Docking of Thiosemicarbazone Analogues as a Potent Tyrosinase Inhibitor

  • Park, Joon-Ho;Sung, Nack-Do
    • Bulletin of the Korean Chemical Society
    • /
    • v.32 no.4
    • /
    • pp.1241-1248
    • /
    • 2011
  • Three dimensional quantitative structure-activity relationships (3D-QSARs) between new thiosemicarbazone analogues (1-31) as a substrate molecule and their inhibitory activity against tyrosinase as a receptor were performed and discussed quantitatively using CoMFA (comparative molecular field analysis) and CoMSIA (comparative molecular similarity indices analysis) methods. According to the optimized CoMSIA 2 model obtained from the above procedure, inhibitory activities were mainly dependent upon H-bond acceptor favored field (36.5%) of substrate molecules. The optimized CoMSIA 2 model, with the sensitivity of the perturbation and the prediction, produced by a progressive scrambling analysis was not dependent on chance correlation. From molecular docking studies, it is supposed that the inhibitory activation of the substrate molecules against tyrosinase (PDB code: 1WX2) would not take place via uncompetitive inhibition forming a chelate between copper atoms in the active site of tyrosinase and thiosemicarbazone moieties of the substrate molecules, but via competitive inhibition based on H-bonding.