• 제목/요약/키워드: Glow plasma

검색결과 147건 처리시간 0.027초

Formation of Ti-0 Biomedical Film on Ti6A14V Alloy by DC Glow Plasma Oxidizing

  • Zheng, C.L.;Cui, F.Z.;Xu, Z.
    • Journal of Korean Vacuum Science & Technology
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    • 제6권1호
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    • pp.16-21
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    • 2002
  • Ti-0 film is a kind of biocompatible surface materials. In this paper, a new method, glow discharge plasma oxidizing, has been used in synthesizing Ti-O gradient films on Ti6A14V substrates. The effects of ion bombardment and process parameters on the structures of titanium oxide layers have been investigated. The results demonstrate that DC glow plasma oxidizing is more efficient in preparation of dense, hard, and high adhesive Ti-O biomedical films on titanium and its alloys. Samples treated by this method show higher hardness values than by others. Especially, in the condition of hollow cathode discharge, the ion bombardment enhances ionization of oxygen, promotes the oxygen permeation and facilitates the formation of the oxide of low valence states of titanium.

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After-glows in $N_2$ RF Flowing Plasma

  • 이민욱;오수기
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.489-489
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    • 2012
  • The vibrational distribution of $N_2$ (B, v') in after-glows in $N_2$ RF flowing plasma was investigated. The optical emission of the after-glow was studied as function of distance from plasma. In a tube 2.1 cm, the gas pressure varied 8 Torr with 1000sccm nitrogen gas flowing late.. The discharges were excited by two ring-electrode powered by RF 13.56 MHz 100 Watt. $N_2$ (B, v') vibrational distribution was analyzed to see depends of position in after-glow. Dissociation rate of $N_2$ varied showing maximum in the late after-glow region. We studied $N_2$ RF capacitive flowing plasmas and afterglows by emission spectroscopy and by NO titration to determine the density of N-atoms.

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글로우방전을 이용한 액체크로마토그라피 검출기 개발을 위한 기초특성연구 (Fundamental Studies of the Electrical Characteristics of the Glow Discharge for the Development of HPLC Detector)

  • 이현주;김효진
    • 약학회지
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    • 제39권4호
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    • pp.427-432
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    • 1995
  • The plasma oscillation has been observed in an argon pressure between a tungsten anode and cathode consisting of an aqueous conducting solution. The effects of experimental parameters on the electrical characteristics of the glow discharge have been studied. The experimental parameters include the anode-cathode distance, pressure, methanol flow rate, and cathode materials. The glow discharge with liquid cathode and solid anode showed the potential sensitive detector for HPLC

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글로우 방전을 이용한 고효율 공기 정화용 화학 반응기의 특성관찰에 관한 연구 (Study on High Degree of Efficiency Chemical Reactor for Air Purification Using the Glow Discharge)

  • 김기호;부민호;이상천
    • 대한화학회지
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    • 제50권1호
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    • pp.14-22
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    • 2006
  • 방전을 이용한 화학반응기의 기본 모델은 관통형 속 빈 음극 방전셀을 응용하였다. 최근 글로우 방전은 원자분광학에 있어서 방출원으로서의 역할과 더불어 원자화 장치로서 점차적으로 그 연구의 범위를 넓혀가고 있으며, 미량분석, 철강분석, 표면 분석 등에 널리 사용되고 있으며 타 분석 기기와의 접목 등을 통하여 상당한 기술적 성과가 이루어지고 있다.1 또한 본 연구 이전에 기초적인 글로우방전의 성질과 방출 특성에 대해서도 여러 차례 재검토된 바 있어 본 실험에 활용할 수 있었다.2-3 지난 1993년에는 저온의 플라즈마를 이용하여 대기중의 유독가스의 처리에 대한 연구가 발표되었으며, 이 논문에 의하면 연속적인 공기의 흐름 하에서 직류 글로우 방전을 이용하면 유해성 가스인 SO2와 NO의 제거가 가능하다고 보고되었다.4 이를 바탕으로 본 연구에서는 안정적인 공기 플라즈마의 형성과 관통형 양, 음극관 안으로 모든 흐름공기가 음 글로우(Negative glow)영역을 통과하도록 고효율 반응기를 설계하였다. 현재 본 연구에서 디자인한 속 빈 음극관 형 글로우 방전은 경제성이 우수하며 사용하기 쉽다는 것 외에도 방출원 으로서의 장점도 제공함을 관찰하였다.

원자 방출 분광 분석을 위한 개선된 관통형 속빈 음극관 글로우 방전 셀 개발 및 기초 연구 (The Fundamental Studies and Development of the Modified See - Through Hollow Cathode Glow Discharge Cell for Atomic Emission Spectrochemical Analysis)

  • 이성훈;조원보;정종필;최우창;스튜어드 보든;김규환;이장수;이상천
    • 분석과학
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    • 제15권6호
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    • pp.502-508
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    • 2002
  • 관통형 속빈 음극관 글로우 방전 (See-through hollow cathode glow discharge)셀을 이용한 미량 및 극미량 분석을 가능한 분광 분석 장치를 개발하였다. 이 장치는 기존의 관통형 속빈 음극관 글로우 방전 셀을 개선하기 위하여 수냉식 냉각 장치를 부착한 새로운 방전 셀의 형태로 개발하였다. 기존의 방전 셀로 미량 및 극미량 분석은 가능하였지만, 공랭식 냉각장치로도 플라즈마의 온도를 높이는 데 한계가 있으며, 단 시간에 플라즈마가 불안정해지는 문제점이 발생하였다. 이러한 문제점을 개선하기 위해서 본 장치에서는 수냉식 냉각 방식을 채택하여 플라즈마의 안정성을 높였으며, 플라즈마 온도를 증가시킬 수 있다. 개선된 방전 셀의 기초 연구를 위해 속빈 음극관의 재질 및 구경변화에 따른 방전 전력 및 압력에 관련한 연구를 하였으며, 속빈 음극관의 구경의 변화에 따른 플라즈마 온도 변화에 대해 측정하였다.

대향 음극형 플라즈마 프로세스의 글로우 방전특성에 관한 연구 (A Study on the Glow Discharge Characteristics of Facing Target Plasma Process)

  • Park, Chung-Hoo;Cho, Jung-Soo;Kim, Kwang-Hwa;Sung, Youl-Mool
    • 대한전기학회논문지
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    • 제43권3호
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    • pp.478-484
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    • 1994
  • Facing target dc sputtering system developed by Hoshi et al. has simple configuration and high deposition rate under moderate substrate temperature in the range of pressure 5x10S0-4T - 1x10S0-2T torr. In this system, magnetic field should be applied perpendicular to the target surface in order to confine high energy secondary electrons between two targets. Because of this magnetic field, the glow discharge characteristics are very different from dc planar diode system showing some unstable discharge region. In this paper, the glow discharge characteristics of this system have been studied under the condition of Ti targets with Ar-NS12T(10%) as working gas. It is found that this system has stable discharge region under the discharge current density of 15-30(mA/cmS02T). The plasma density and electron temperature are in the range of 10S010Y - 10S011T(CMS0-3T) and 2.5-5(eV), respectively.

평판형 전극계의 RF 글로우 방전특성 및 TiN 박막특성 (RF Glow Discharge and TiN Thin Film Characteristics in a Plane Electrode System)

  • 곽동주;김두환;김희제;박정후
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1838-1840
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    • 1996
  • In order to study the relationship between the physical properties of glow discharge plasma and the physical behavior of TiN thin film, electrical characteristics of RF discharge plasma driven at 13.56MHz in a parallel-plate electrode system were measured. Plasma parameters, such as electron density and temperature, are also studied since they may be considered as one of the very important factors deciding the physical properties of TiN thin film under given conditions of applied biasd voltage and pressure. The TiN thin film were fabricated over a wide range of discharge conditions, and some of the general relationships between the measured plasma parameters and the properties of TiN thin film were discussed.

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Surface Treatment of Steel by Plasma Boronizing

  • Lee, G.H.;Na, K.S.m;Kwon, S.C.;Kim, S.K.
    • 한국진공학회지
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    • 제4권S2호
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    • pp.49-57
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    • 1995
  • At present the processes of boronizing have been mostly studied in a plasma from gaseous compounds containing the impregnating element and are in an industrial use. These have been investigated by a variety of works in a glow discharge with different mixture ratios of $B_2H_6$ and $H_2$ as well as $BCl_3$ and $H_2$. The active atomosphere has been diluted by Ar or some other inert gas in order to enhance control of boron potential and to reduce the ignition voltage of the glow discharge. The Control of gaseous atomosphere is essential to a boride layer in plamsa boronizing treatment. The boride formation is required to make the workpiece surface saturated with boron content. The present study considers the efficiency of plasma boronizing reactions and the morphology of boride layer under various plasma conditions

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Synthesis and Characterization of Adsorbent for Pb(II)-capture by using Glow Discharge Electrolysis Plasma

  • Gao, Jinzhang;Wang, Youdi;Yang, Wu;Li, Yan
    • Bulletin of the Korean Chemical Society
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    • 제31권2호
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    • pp.406-414
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    • 2010
  • A novel polyacrylamide grafted hydrous ferric oxide adsorbent composite has been synthesized by using glow discharge electrolysis plasma. To optimize the synthesis conditions, the following parameters were examined in detail: applied power, discharge time, post polymerization temperature, post polymerization time, amount of crosslinking agent and hydrous ferric oxide gel added and so on. The adsorbent was characterized by Fourier transform infrared spectroscopy (FT-IR) and X-ray photoelectron spectroscopy (XPS). The removal percentage of the adsorbent in Pb(II) solution was examined and the data obtained showed that the adsorbent composite has a high capacity for lead ion. For the use in wastewater treatment, the thermodynamic and kinetic of Pb(II)-capture were also studied. Results indicated that the adsorption reaction was a spontaneous and an endothermic process, and it seems to be obeyed a pseudo-secondorder rate model. Moreover, the adsorption isotherm of Pb(II)-capture is following the Langmuir and Freundlich isotherm models.