• 제목/요약/키워드: GeSe

검색결과 329건 처리시간 0.027초

적외선 광학렌즈 제작을 위한 GeSe의 벌크 제작 및 특성 연구 (A Study on the Properties and Fabrication of Bulk Forming GeSe Based Chalcogenide Glass for Infrared Optical Lens)

  • 배동식;여종빈;박정후;이현용
    • 한국전기전자재료학회논문지
    • /
    • 제26권9호
    • /
    • pp.641-645
    • /
    • 2013
  • Chalcogenide glass has superior property of optical transmittance in the infrared region. Glass made using Ge-Se how many important optical applications. We have determined the composite formular of $Ge_{0.25}Se_{0.75}$ to be the GeSe chalcogenide glass composition appropriate for IR lenses. Also, the optical, thermal and physical characteristics of chalcogenide glass depended on the composition ratio. GeSe bulk sample is produced using the traditional melt-quenching method. The optical, structural, thermal and physical properties of the compound were measured by using Fourier transform infrared spectroscopy (FT-IR), X-ray diffraction (XRD), Differential scanning calorimeter (DSC), and Scanning electron microscope (SEM) respectively.

금속-절연층-실리콘 구조에서의 비정질 GeSe 기반 Resistive Random Access Memory의 동작 특성 (Operating Characteristics of Amorphous GeSe-based Resistive Random Access Memory at Metal-Insulator-Silicon Structure)

  • 남기현;김장한;정홍배
    • 한국전기전자재료학회논문지
    • /
    • 제29권7호
    • /
    • pp.400-403
    • /
    • 2016
  • The resistive memory switching characteristics of resistive random access memory (ReRAM) using the amorphous GeSe thin film have been demonstrated at Al/Ti/GeSe/$n^+$ poly Si structure. This ReRAM indicated bipolar resistive memory switching characteristics. The generation and the recombination of chalcogen cations and anions were suitable to explain the bipolar switching operation. Space charge limited current (SCLC) model and Poole-Frenkel emission is applied to explain the formation of conductive filament in the amorphous GeSe thin film. The results showed characteristics of stable switching and excellent reliability. Through the annealing condition of $400^{\circ}C$, the possibility of low temperature process was established. Very low operation current level (set current: ~ ${\mu}A$, reset current: ~ nA) was showed the possibility of low power consumption. Particularly, $n^+$ poly Si based GeSe ReRAM could be applied directly to thin film transistor (TFT).

Ag 및 MgF2/AsGeSeS 다층박막에서의 편광 홀로그래피 회절효율 특성 (The Properties of Diffraction Efficiency in Polarization Holography using the Ag and MgF2/AsGeSeS Multi-layer)

  • 나선웅;여철호;정홍배;김종빈
    • 한국전기전자재료학회논문지
    • /
    • 제15권12호
    • /
    • pp.1070-1074
    • /
    • 2002
  • We have carried out two-beam interference experiments to form holographic gratings on As$_{40}$ Se$_{15}$ S$_{35}$Ge$_{10}$ single layer, Ag/As$_{40}$ Se$_{15}$ S$_{35}$Ge$_{10}$ multi-layer. In this study, holographic gratings have been formed using He-Ne laser(632.8nm) under different polarization combinations(intensity polarization holography, phase polarization holography). The diffraction efficiency was obtained by the +lst order intensity. The maximum diffraction efficiency of As$_{40}$ Se$_{15}$ S$_{35}$Ge$_{10}$ single layer, As$_{40}$ Se$_{15}$ S$_{35}$Ge$_{10}$ and MgF$_2$/As$_{40}$ Se$_{15}$ S$_{35}$Ge$_{10}$ multi-layer were 0.8%, 1.4% and 3.1% under intensity polarization holography, respectively.

비정질 Ge1Se1Te2 과 Ge2Sb2Te5 칼코게나이드 박막의 상변화특성 (Phase Change Properties of Amorphous Ge1Se1Te2 and Ge2Sb2Te5 Chalcogenide Thin Films)

  • 정홍배;조원주;구상모
    • 한국전기전자재료학회논문지
    • /
    • 제19권10호
    • /
    • pp.918-922
    • /
    • 2006
  • Chalcogenide Phase change memory has the high performance necessary for next-generation memory, because it is a nonvolatile memory with high programming speed, low programming voltage, high sensing margin, low power consumption and long cycle duration. To minimize the power consumption and the program voltage, the new composition material which shows the better phase-change properties than conventional $Ge_2Sb_2Te_5$ device has to be needed by accurate material engineering. In the present work, we investigate the basic thermal and the electrical properties due to phase-change compared with chalcogenide-based new composition $Ge_1Se_1Te_2$ material thin film and convetional $Ge_2Sb_2Te_5$ PRAM thin film. The fabricated new composition $Ge_1Se_1Te_2$ thin film exhibited a successful switching between an amorphous and a crystalline phase by applying a 950 ns -6.2 V set pulse and a 90 ns -8.2 V reset pulse. It is expected that the new composition $Ge_1Se_1Te_2$ material thin film device will be possible to applicable to overcome the Set/Reset problem for the nonvolatile memory device element of PRAM instead of conventional $Ge_2Sb_2Te_5$ device.

셀레늄과 게르마늄 강화 배추와 고추 생산기술 (Development of Techniques for the Production of Selenium and Germanium-enriched Chinese Cabbage and Pepper)

  • 윤형권;장성호;서태철;황화자
    • 생물환경조절학회지
    • /
    • 제16권3호
    • /
    • pp.180-185
    • /
    • 2007
  • 셀레늄과 게르마늄 처리 시 배추(봄, 가을배추)와 고추의 생육과 품질의 변화를 조사하였다. 셀레늄처리에 의한 봄배추와 가을배추의 생체중은 차이가 없었고 Ge 처리시 높은 농도에서 생체중이 감소하였으나 고추에서는 차이가 없었다. 배추의 셀레늄 처리 경우 비타민 C 함량은 Se $4mg{\cdot}L^{-1}$ 10회 처리가 무 처리에 비하여 증가하였으며 게르마늄 처리 경우 Ge $4mg{\cdot}L^{-1}$ 10회 처리와 Ge $8mg{\cdot}L^{-1}$ 5회 처리에서 증가하였다. 고추에서 셀레늄 처리에 의해 Se $2mg{\cdot}L^{-1}$ 20회 처리가 높았으며 홍고추가 풋고추에 비교하여 비타민 C 함량이 약 2배가량 많았다. 봄, 가을배추 부위별 셀레늄함량은 외엽>중엽>내엽 순으로 많았고 엽육부위가 중륵에 비해 높았으며 농도의 증가에 따라 증가하는 경향이었다. 게르마늄 처리 시 가을 배추 잎에서 모든 처리구가 무 처리에 비해 높았다.

Se-base로 한 비정질 칼코게나이드 박막의 훌로그래픽 격자 형성 (A Study on Holographic Grating Formation in Se-base Amorphous Chalcogenide Thin Films)

  • 구용운;최혁;남기현;정홍배
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
    • /
    • pp.181-182
    • /
    • 2007
  • In this paper, we investigated the diffraction grating efficiency on $Ge_{75}Se_{25}$ and Ag-doped amorphous chalcogenide $Ag/Ge_{75}Se_{25}$ thin film for used to volume hologram. The film thickness was 2 um and diffraction efficiency was obtained from He-Ne (632.8nm) and DPSS(532nm) (P:P) polarized laser beam on $Ge_{75}Se_{25}$ and Ag/$Ge_{75}Se_{25}$ thin films. As a result. for the films, the diffraction efficiency on Ag/$Ge_{75}Se_{25}$ double layer, was better than single $Ge_{75}Se_{25}$ thin films. The recording speed of DPSS laser is higher than that of He-Ne laser.

  • PDF

두 번째 Ag 층을 적용한 Ag/$Ge_1Se_1Te_2$ 물질의 광학적 특성 연구 (Optical properties of Ag/$Ge_1Se_1Te_2$ material with secondary Ag layer adoption)

  • 김현구;한송이;김재훈;구상모;정홍배
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
    • /
    • pp.191-192
    • /
    • 2008
  • For phase transition method, good record sensitivity, low heat radiation, fast crystallization and hi-resolution are essential. Also, a retention time is very important part for phase-transition. In our past papers, we chose composition of $Ge_1Se_1Te_2$ material to use a Se factor which has good optical sensitivity than conventional Sb. Ge-Se-Te and Ag/$Ge_1Se_1Te_2$ samples are fabricated and irradiated with He-Ne laser and DPSS laser to investigate a reversible phase change by light. Because of Ag ions, the Ag layer inserted sample showed better performance than conventional one. We should note that this novel one showed another possibility for phase-change random access memory.

  • PDF

$MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ 다층박막에서 편광상태에 따른 회절효율 특성 (Characteristics of the Polarization Dependence Holographic Diffraction Efficiency using the $MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ Multi-Layer)

  • 이정태;여철호;신경;이기남;김종빈;정홍배
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 디스플레이 광소자분야
    • /
    • pp.127-130
    • /
    • 2003
  • We have carried out two-beam interference experiment to form holographic grating on amorphous $As_{40}Ge_{10}Se_{15}S_{35}$ single-laver, $MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ muliti-layer. In this study holographic grating formed using He-Ne laser(632.8nm) under different polarization state(intensity, phase polarization holography). The diffraction efficiency was obtained by first order intensity. The maximum diffraction efficiency of $As_{40}Ge_{10}Se_{15}S_{35}$ single-laver was 0.8% and The maximum diffraction efficiency of $MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ multi-layer(multi-layer I, multi-layer II) were 1.4% and 3.1%.

  • PDF

Ag가 도핑된 칼코게나이드 $As_{40}Ge_{10}Se_{15}S_{35}$ 박막의 광분해, 광확산특성 및 홀로그래픽 격자형성 (Photodissolution, photodiffusion characteristics and holographic grating formation on Ag-doped $As_{40}Ge_{10}Se_{15}S_{35}$ chalcogenide thin film)

  • 정홍배
    • 대한전기학회논문지:전기물성ㆍ응용부문C
    • /
    • 제55권10호
    • /
    • pp.461-466
    • /
    • 2006
  • In the present work, we investigated the photodissolution and photodiffusion effect on the interface of Ag/chalcogenide $As_{40}Ge_{10}Se_{15}S_{35}$ thin film by measuring the absorption coefficient, the optical density, the resistance change of Ag layer. It was found that the photodissolutioniphotodiffution ratio depends on the magnitude of photon energy absorbed in the chalcogenide thin film and the depth of photodiffution was proportional to the square root of the exposed time. Also, we have investigated the holographic grating formation with P-polarization states on chalcogenide $As_{40}Ge_{10}Se_{15}S_{35}$ thin film and $As_{40}Ge_{10}Se_{15}S_{35}/Ag$ double layer structure thin film. Holographic gratings have been formed using He-Ne laser (632.8 nm) which have a smaller energy than the optical energy gap, $E_g\;_{opt}$ of the film, i. e., an exposure of sub-bandgap light $(h{\upsilon} under P-polarization. As the results, we found that the diffraction efficiency on $As_{40}Ge_{10}Se_{15}S_{35}/Ag$ double layer structure thin film was more higher than that on single $As_{40}Ge_{10}Se_{15}S_{35}$ thin film. Also, we obtained that the maximum diffraction efficiency was 0.27 %, 1,000 sec on $As_{40}Ge_{10}Se_{15}S_{35}\;(1{\mu}m)/Ag$ (10 nm) double layer structure thin film by (P: P) polarized recording beam. It will offer lots of information for the photodoping mechanism and the analyses of chalcogenide thin films.

Ge-Se의 스위칭 특성 향상을 위한 Sb-doping에 관한 연구 (Electrolyte Mechanizm Study of Amorphous Ge-Se Materials for Memory Application)

  • 남기현;정홍배
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
    • /
    • pp.69-69
    • /
    • 2009
  • In other to progress better crystallization transition and long phase-transformation data of phase-change memory (PRAM), we investigated about the effect of Sb doping and Ag ions percolating into Ge-Se-Te phase-change material. Doped Sb concentrations was determined each of 10 wt%, 20 wt% and 30 wt%. As the Sb-doping concentration was increased, the resistivity decreased and the crystallization temperature increased. Ionization of Ag was progressed by DPSS laser (532 nm) for 1 hour. The resistivity was more decreased and the crystallization temperature was more increased in case of adding Ag layer under Sh-(Ge-Se-Te) thin film. At the every condition of thin films included Ag layer more stable states were indicated compare with just Sh-doped Ge-Se-Te thin films.

  • PDF