• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
• /
• pp.83-84
• /
• 2006

For phase transition method, good recording sensitivity, low heat radiation, fast crystallization and hi-resolution are essential. Also, A retention time is very important part for phase transition. In our presentation wall, we chose Ge-Se-Te material to use a Se material which has good optical sensitivity than Sb. A Ge-Se-Te sample was fabricated and Irradiated with He-Ne laser and DPSS laser to investigate a reversible phase change by light.

• Journal of Advanced Marine Engineering and Technology
• /
• 제29권6호
• /
• pp.707-712
• /
• 2005

PRAM (Phase change random access memory) is one of the most promising candidates for next generation Non-volatile Memories. The Phase change materials have been researched in the field of optical data storage media. Among the phase change materials. $Ge_2Sb_2Te_5$ is very well known for its high optical contrast in the state of amorphous and crystalline. However the characteristics required in solid state memory are quite different from optical ones. In this study. the structural Properties of GeSbTe thin films with composition were investigated for PRAM. The 100-nm thick $Ge_2Sb_2Te_5$ and $Sb_2Te_3$ films were deposited on $SiO_2/Si$ substrates by RF sputtering system. In order to characterize the crystal structure and morphology of these films. x-ray diffraction (XRD). atomic force microscopy (AFM), differential scanning calorimetry (DSC) and 4-point measurement analysis were performed. XRD and DSC analysis result of GST thin films indicated that the crystallization of $Se_2Sb_2Te_5$ films start at about $180^{\circ}C$ and $Sb_2Te_3$ films Start at about $125^{\circ}C$.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2010년도 하계학술대회 논문집
• /
• pp.52-52
• /
• 2010

상변화 재료로 가장 널리 이용되고 있는 $Ge^2Sb^2Te^5$ 박막에 전기전도성이 높은 Au를 첨가하여 상변환 특성을 연구하였다. ($Au)_x(Ge^2Sb^2Te^5)_{1-x}$ (X = 0, 0.05, 0.1) 박막은 Si 와 Glass 위에 Au 타켓과 $Ge^2Sb^2Te^5$ 타겟을 Co Sputtering 하여 만들었다. 증착된 박막은 Nanopulse Scanner 를 사용하여 결정화 속도를 측정하였다. 또한 $100^{\circ}C{\sim}400^{\circ}C$까지 $25^{\circ}C$간격으로 열처리 후 4 point prove를 이용하여 열처리 온도에 따른 저항의 차이를 측정하였으며 비정질 - 결정질 천이의 구조를 확인하기 위하여 XRD를 측정하였다. UV-VIS/IR 장비를 사용하여 비정질 박막과 결정화된 박막의 물성과 전기적 특성을 분석하였다.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2007년도 제38회 하계학술대회
• /
• pp.1329-1330
• /
• 2007

Phase-change random access memory(PRAM) has many advantages compare with the existing memory. For example, fast programming speed, low programming voltage, high sensing margin, low power consume and long cyclability of read/write. Though it has many advantages, there are some points which must be improved. So, we invented and studied new constitution of $Ge_{1}Se_{1}Te_{2}$ chalcogenide material. Actually, the performance properties have been improved surprisingly. However, crystallization time was as long as ever for amorphization time. In this paper, we studied in order to make set operation time and reset operation voltage reduced. In the present work, by alloying Sb in $Ge_{1}Se_{1}Te_{2}$. we could confirm that improved its set operation time and reset operation voltage. As a result, the method of Sb-alloyed $Ge_{1}Se_{1}Te_{2}$ can be solution to decrease the set operation time and reset operation voltage.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
• /
• pp.330.1-330.1
• /
• 2014

개인용 노트북, 태블릿 PC, 핸드폰 기술 발전에 의해 언제 어디서나 데이터를 작성하고 기록하는 일들이 가능해졌다. 특히 cloud 시스템을 이용하여 데이터를 휴대기기에 직접 저장하지 않고 server에 기록하는 일들이 가능해짐에 따라 server 기기의 성능, server-room power 및 space 에 대한 관심이 증가하였다. Storage class memory (SCM) 이란 memory device와 storage device의 장점을 결합한 memory를 일컫는 기술로 현재 소형 디바이스 부분부터 점차 그 영역을 넓히고 있다. 그중 phase change material을 이용한 phase change memory (PCM) 기술이 가장 각광받고 있다. PCM의 경우 scaling됨에 의해 cell간의 열 간섭으로 인한 data 손실의 우려가 있어 cell의 면적을 최소화 하여 소자를 제작하여야 한다. 기존의 sputtering등의 PVD 방법으로는 한계가 있어 ALD 공정을 이용한 PCM에 대한 연구가 활발히 진행중이다. 특히 tellurium 원료기체로 silyl 화합물 [1]을 사용하여 주로 $Ge_2Sb_2Te_5$의 조성에 초점을 맞춰 진행되고 있으나, 세부 공정에 대한 기본적인 연구는 미비하다. 본 연구에서는 Ge-Sb-Te 3원계 박막을 형성하기 위한 Sb-Te 화합물의 증착 공정에 대한 연구를 수행하였다. 특히 원료기체로 Si이 없는 새로운 Te 원료기체를 이용하여 조성 조절을 하였고, 박막의 물성을 분석하였다. 또한 공정온도에 따른 박막의 물성 변화를 분석하였다.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
• /
• pp.203-204
• /
• 2005

PRAM (Phase change Random Access Memory) is one of the most promising candidates for next generation Non-volatile Memories. The Phase change material has been researched in the field of optical data storage media. Among the phase change materials $Ge_2Sb_2Te_5$(GST) is very well known for its high optical contrast in the state of amorphous and crystalline. However, the characteristics required in solid state memory are quite different from optical ones. In this study, the structural properties of GST thin films with composition were investigated for PRAM. The 100-nm thick GeTe and $Sb_2Te_3$ films were deposited on $SiO_2$/Si substrates by RF sputtering system. In order to characterize the crystal structure and morphology of these films, we performed x-ray diffraction (XRD) and atomic force microscopy (AFM).

• 한국분말재료학회지
• /
• 제18권5호
• /
• pp.449-455
• /
• 2011

In this study, p-type $(AgSbTe_2)_{15}(GeTe)_{85}$: TAGS-85 compound powders were prepared by gas atomization process, and then their microstructures and mechanical properties were investigated. The fabricated powders were of spherical shape, had clean surface, and illustrated fine microstructure and homogeneous $AgSbTe_2$ + GeTe solid solution. Powder X-ray diffraction results revealed that the crystal structure of the TAGS-85 sample was single rhombohedral GeTe phase, which with a space group $R_{3m}$. The grain size of the powder particles increased while the micro Vickers hardness decreased with increasing annealing temperature within the range of 573 K and 723 K due to grain growth and loss of Te. In addition, the crystal structure of the powder went through a phase transformation from rhombohedral ($R_{3m}$) at low-temperature to cubic ($F_{m-3m}$) at high-temperature with increasing annealing temperature. The micro Vickers hardness of the as-atomized powder was around 165 Hv, while it decreased gradually to 130 Hv after annealing at 673K, which is still higher than most other fabrication processes.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2009년도 제38회 동계학술대회 초록집
• /
• pp.155-155
• /
• 2010

Oxygen incorporated $Ge_2Sb_2Te_5$ (GST) films were prepared by an ion beam sputtering deposition (IBSD) method. From the I-V curves, the $V_{th}$ value varies with the oxygen content. Ge-deficient hexagonal phases are responsible for the observed unstability and decrease in $V_h$ values. In the case of a GST film with an elevated oxygen content of 30.8 %, the GST layer melted at 9.02 V due to the instability conferred by the high oxygen content. The formation of Ge-deficient hexagonal phases such as $GeSb_2Te_4$ and $Sb_2Te_3$ appear to be responsible for the $V_{th}$ variation. Impedance analyses indicated that the resistance in GST films with oxygen contentsof 16.7 % and 21.7 % had different origins. Thermal desorption spectroscopy (TDS)data indicate that moisture and hydrocarbons were more readily desorbed at higher oxygen content because the oxygen incorporated GST films are more hydrophilic than undoped GST films.

• 한국전자현미경학회:학술대회논문집
• /
• 한국현미경학회 2005년도 제36차 추계학술대회 및 제4회 HVEM 이용자 워크샵
• /
• pp.95-98
• /
• 2005

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 2007년도 추계학술발표대회 및
• /
• pp.74.1-74.1
• /
• 2007