• 제목/요약/키워드: Gate recess etching

검색결과 12건 처리시간 0.017초

4H-SiC Planar MESFET for Microwave Power Device Applications

  • Na, Hoon-Joo;Jung, Sang-Yong;Moon, Jeong-Hyun;Yim, Jeong-Hyuk;Song, Ho-Keun;Lee, Jae-Bin;Kim, Hyeong-Joon
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제5권2호
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    • pp.113-119
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    • 2005
  • 4H-SiC planar MESFETs were fabricated using ion-implantation on semi-insulating substrate without recess gate etching. A modified RCA method was used to clean the substrate before each procedure. A thin, thermal oxide layer was grown to passivate the surface and then a thick field oxide was deposited by CVD. The fabricated MESFET showed good contact properties and DC/RF performances. The maximum oscillation frequency of 34 GHz and the cut-off frequency of 9.3 GHz were obtained. The power gain was 10.1 dB and the output power of 1.4 W was obtained for 1 mm-gate length device at 2 GHz. The fabricated MESFETs showed the charge trapping-free characteristics and were characterized by the extracted small-signal equivalent circuit parameters.

W-Band MMIC를 위한 T-형태 게이트 구조를 갖는 MHMET 소자 특성 (Characteristics of MHEMT Devices Having T-Shaped Gate Structure for W-Band MMIC)

  • 이종민;민병규;장성재;장우진;윤형섭;정현욱;김성일;강동민;김완식;정주용;김종필;서미희;김소수
    • 한국전기전자재료학회논문지
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    • 제33권2호
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    • pp.99-104
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    • 2020
  • In this study, we fabricated a metamorphic high-electron-mobility transistor (mHEMT) device with a T-type gate structure for the implementation of W-band monolithic microwave integrated circuits (MMICs) and investigated its characteristics. To fabricate the mHEMT device, a recess process for etching of its Schottky layer was applied before gate metal deposition, and an e-beam lithography using a triple photoresist film for the T-gate structure was employed. We measured DC and RF characteristics of the fabricated device to verify the characteristics that can be used in W-band MMIC design. The mHEMT device exhibited DC characteristics such as a drain current density of 747 mA/mm, maximum transconductance of 1.354 S/mm, and pinch-off voltage of -0.42 V. Concerning the frequency characteristics, the device showed a cutoff frequency of 215 GHz and maximum oscillation frequency of 260 GHz, which provide sufficient performance for W-band MMIC design and fabrication. In addition, active and passive modeling was performed and its accuracy was evaluated by comparing the measured results. The developed mHEMT and device models could be used for the fabrication of W-band MMICs.