• Title/Summary/Keyword: Gas Discharge

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A Compact Pulse Corona Plasma System with Photocatalyst for an Air Conditioner (광촉매와 조합된 코로나 방전 플라즈마 필터의 유해 가스 및 입자 제거 특성)

  • Shin, Soo-Youn;Moon, Jae-Duk
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.1
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    • pp.151-155
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    • 2007
  • A compact discharge plasma system with a photocatalyst has been proposed and investigated experimentally for application to air conditioners. It was found that there was intense ultra violet radiation with high energy of 3.2 eV from the corona discharge due to the DC-biased pulse voltage applied on a wire. An electrophotochemical reaction took place apparently on the surfaces of the photocatalyst of $TiO_2$ irradiated ultra violet front the discharge plasma in the proposed plasma system. The proposed discharge plasma system with the photocatalyst of $TiO_2$ showed very high removal efficiency of VOCs by tile additional electrophotochemical reactions on the photocatalyst. The proposed discharge plasma system also showed very high removal efficiency of particles such as smokes, suspended bacteria, and pollen and mite allergens by the electrostatic precipitation part. This type of corona discharge plasma system with a photocatalyst can be used as an effective means of removing both indoor pollutant gases and particles including suspended allergens.

Optical Emission Characteristics of Atmospheric Pressure Dielectric Barrier Discharge (대기압 유전체배리어방전의 발광특성)

  • Kim, Jin Gi;Kim, Yoon Kee
    • Korean Journal of Materials Research
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    • v.25 no.2
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    • pp.100-106
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    • 2015
  • Plasma properties of dielectric barrier discharges (DBDs) at atmospheric pressure were measured and characterized using optical emission spectroscopy. Optical emissions were measured from argon, nitrogen, or air discharges generated at 5-9 kV using 20 kHz power supply. Emissions from nitrogen molecules were markedly measured, irrespective of discharge gases. The intensity of emission peaks was increased with applied voltage and electrode gap. The short wavelength peaks (315.9 nm and 337.1 nm) measured at the middle of DBDs were significantly increased with applied voltage. The optical emission from DBDs decreased with the addition of oxygen gas, which was especially significant in argon discharge. Emission from oxygen molecules cannot be measured from air discharge and argon discharge with 4.8% oxygen. The emission intensity at 337.1 nm and 357.7 nm related with nitrogen molecule was sensitively changed with electrode types and discharge voltages. However, the pattern of argon emission spectrum was nearly the same, irrespective of electrode type, oxygen content, and discharge voltage.

Degradation of VOC by Photocatalysts and Dark Discharge Hybrid Systems (광촉매와 암방전(dark discharge) 복합 시스템을 이용한 VOC의 분해)

  • Jung, Jihoon
    • Korean Chemical Engineering Research
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    • v.46 no.5
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    • pp.852-857
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    • 2008
  • The immobilization technique is important to extend the application field of a photocatalyst. Titanium surface was changed into a $TiO_2$ thin film by the anodizing process. The anodized $TiO_2$ had photocatalytic activity, and showed sponge like shape. The photocatalytic degradation of gas phase acetaldehyde and VOCs by anodized titania has been studied in various initial concentrations, humidity and discharge potentials. The reactivity of anodized titania was increased with relative humidity, but excessive humidity led to a decrease of the reaction rate. The electric dark discharge that was combined with photocatalytic reaction enhanced the decomposition rate of the organic compounds. But excessively applied voltage caused corona discharge, which decreased the reaction rate. Optimum relative humidity was 40% and discharge potential was 5 kV under dark discharge region in photocatalytic reaction.

The Effect of Working Gas Xex+Ne1-x on the Electro-optical Characteristics of AC PDP (AC PDP의 전기광학적 특성에 미치는 동작 Gas Xex+Ne1-x의 영향)

  • Park, Chung-Hoo;Yoo, Su-Bok;Lee, Don-Kyu;Lee, Hae-June;Lee, Ho-Jun;Kim, Jae-Sung
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.1
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    • pp.142-146
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    • 2007
  • Nowadays, itis inevitable trend to use high Xe gas contents for increase luminous efficiency and luminance in plasma display panel. However, the increase of Xe gas contents causes the driving voltage, although the brightness is increase. In this paper, we study the characteristics of electro optical according to Xe gas contents and gas pressure. Electro-optical characteristics were investigated by the discharge voltage, luminance and luminous efficacy measurements, respectively. With some increasing Xe gas contents and pressure, the electro-optical properties increased. However, the characteristics of electro-optical begin to be saturated, when too high increased Xe gas contents and pressure.

MICOWAVE PLASMA BURNER

  • Hong, Yong-Cheol;Shin, Dong-Hun;Lee, Sang-Ju;Jeon, Hyung-Won;Lho, Taihyeop;Lee, Bong-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.95-95
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    • 2010
  • An apparatus for generating flames and more particularly the microwave plasma burner for generating high-temperature large-volume plasma flame was presented. The plasma burner was composed of micvrowave transmission lines, a field applicator, discharge tube, coal and gas supply systems, and a reactor. The plasma burner is operated by injecting coal powders into a 2.45 GHz microwave plasma torch and by mixing the resultant gaseous hydrogen and carbon compounds with plasma-forming gas. We in this work used air, oxygen, steam, and their mixtures as a discharge gas or oxidant gas. The microwave plasma torch can instantaneously vaporize and decompose the hydrogen and carbon containing fuels. It was observed that the flame volume of the burner was more than 50 times that of the torch plasma. The preliminary experiments were carried out by measuring the temperature profiles of flames along the radial and axial directions. We also investigated the characteristics for coal combustion and gasification by analyzing the byproducts from the exit of reactor. As expected, various byproducts such as hydrogen, carbon monoxide, carbon dioxide, hydrogen sulfide, etc. were detected. It is expected that such burner cab be applied to coal gasification, hydrocarbon reforming, industrial boiler of power plants, etc.

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Discharge Characteristics of SF6 Mixture Gases due to Processing Status of needle electrode under Non-Uniform Fields (불평등 전계 하에서의 침전극 가공상태에 따른 SF6혼합가스의 방전특성)

  • Go, Y.S.;Seo, H.J.;Rhie, D.H.
    • Proceedings of the KIEE Conference
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    • 2006.10a
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    • pp.198-199
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    • 2006
  • AC spark discharge voltage of SF6/C02and SF6/N2 containing various mixed rate in volume percent (1, 5 and 10%) of SF6 in non-uniform fields are investigated. The needle to plane electrode gap spacing was 5 and 10 mm, and the gas pressure was varied within the range of 0.1${\sim}$0.7 MPa. We have observed a N-characteristic typical for the electronegative gases even in gas mixtures of 1% SF6 with CO2 and N2 as buffer gases. Especially, the materials of the needle electrode affect the insulation properties of the gas mixtures drastically. On the contrary to the case of needle electrodes made by mild steel or high carbon steel, the N-characteristics are hardly perceived in the case of stainless steel needle in this experiment.

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Development and Test results of the Dielectric Evaluation System for a Helium Gas Cooled HTS Cable (헬륨가스 냉각 고온초전도 케이블의 절연특성 평가 시스템 개발 및 성능평가)

  • Kwag, Dong-Soon;Rodrigo, Horatio
    • Progress in Superconductivity and Cryogenics
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    • v.14 no.1
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    • pp.25-29
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    • 2012
  • The novel type of cable under consideration is cooled by gaseous Helium at elevated pressure. Helium is known for having poor electric breakdown strength; therefore the dielectric capabilities of this type of cable must be tested under conditions similar to the envisaged operation. In order to study the dielectric performance we have designed and built a novel high pressure cryostat rated at 2.17 MPa which has been used for testing model cables of lengths of up to 1 m. The cryostat is an open system where the gas is not re-circulated. This allows maintaining a high purity of the gas. The target temperature range is between 40 K and 70 K. This substantially increases the critical current density of the HTS compared to 77 K, which is the typical temperature of cables cooled by liquid nitrogen. The cryostat presented allows for adjusting the temperature and keeping it constant for the time necessary to run a complete dielectric characterization test. We give a detailed description of the cryostat. Measurements of partial discharge inception voltages as well as the temperature distribution along the model cables as a function of time are presented.

Flat Fluorescent Lamp with Good Uniformity for LCD Back-Light (훌륭한 휘도 균일도를 갖는 LCD 후면 광원용 평판 형광램프)

  • Kwon, Soon-Seok;Yoon, Geel-Joong
    • Journal of the Institute of Electronics Engineers of Korea TE
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    • v.37 no.1
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    • pp.12-17
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    • 2000
  • In this paper, the frequency characteristics of flat fluorescent lamp(FFL) using ultraviolet generated from gas discharge are studied. The lamp is a simple structure with insulator layer, phosphor layer, and gas gap(1.1mm). The firing voltage and uniform voltage was decreased with increasing the frequency. It was considered that this tendency was resulted from the space charge effect due to Xe and Ar positive ions trapped in gas gap. Luminance in FFL using Xe as discharge gas was shown 2700 cd/$m^2$ in operation (700 Vrms, 80 kHz). Hence, the maximum luminous efficiency was 5 lm/W.

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Preparation of Synthesis Gas from Methane in a Capacitive rf Discharge (용량성 rf 플라즈마를 이용한 메탄으로부터의 합성가스 제조)

  • Song, Hyung Keun;Choi, Jae-Wook;Lee, Hwaung;Kim, Seung-Soo;Na, Byung-Ki
    • Clean Technology
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    • v.12 no.3
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    • pp.138-144
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    • 2006
  • Conversion of methane to synthesis gas in a capacitive rf plasma at low pressure was experimentally studied. In this plasma, electrons which had sufficient energy-level collided with the molecules of methane or oxygen-containing gas, which were than activated and converted to synthesis gas. The effect of input power, various oxygen-containing gas and composition of the gas mixture were investigated. The conversion of methane reached up to 100%. In all cases, hydrogen and carbon oxide were produced as primary products, and other compounds was generated. The conversion of methane and the yield of hydrogen and carbon oxides were increased with increasing the input power. Depending on the oxygen-containing gases, the composition of synthesis gas was varied.

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Effects of Si cluster incorporation on properties of microcrystalline silicon thin films

  • Kim, Yeonwon;Yang, Jeonghyeon;Kang, Jun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.181-181
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    • 2016
  • Hydrogenated microcrystalline silicon (${\mu}c-Si:H$) films have attracted much attention as materials of the bottom-cells in Si thin film tandem photovoltaics due to their low bandgap and excellent stability against light soaking. However, in PECVD, the source gas $SiH_4$ must be highly diluted by $H_2$, which eventually results in low deposition rate. Moreover, it is known that high-rate ${\mu}c-Si:H$ growth is usually accompanied by a large number of dangling-bond (DB) defects in the resulting films, which act as recombination centers for photoexcited carriers, leading to a deterioration in the device performance. During film deposition, Si nanoparticles generated in $SiH_4$ discharges can be incorporated into films, and such incorporation may have effects on film properties depending on the size, structure, and volume fraction of nanoparticles incorporated into films. Here we report experimental results on the effects of nonoparticles incorporation at the different substrate temperature studied using a multi-hollow discharge plasma CVD method in which such incorporation can be significantly suppressed in upstream region by setting the gas flow velocity high enough to drive nanoparticles toward the downstream region. All experiments were performed with the multi-hollow discharge plasma CVD reactor at RT, 100, and $250^{\circ}C$, respectively. The gas flow rate ratio of $SiH_4$ to $H_2$ was 0.997. The total gas pressure P was kept at 2 Torr. The discharge frequency and power were 60 MHz, 180 W, respectively. Crystallinity Xc of resulting films was evaluated using Raman spectra. The defect densities of the films were measured with electron spin resonance (ESR). The defect density of fims deposited in the downstream region (with nonoparticles) is higher defect density than that in the upstream region (without nanoparticles) at low substrate temperature of RT and $100^{\circ}C$. This result indicates that nanoparticle incorporation can change considerably their film properties depending on the substrate temperature.

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