• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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• 2003.05a
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• pp.157-162
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• 2003

This Paper presents a robust design of an Electrorheological(ER) damper using Taguchi method. Taguchi method is a robust design method that determines control parameters in the presence of noise effect. Electrode length, electrode gap, base oil viscosity and the weight ratio of ER particles are chosen for the control parameters and the temperature is considered to be a noise factor. The sensitivity of each factor with signal-to-noise(S/N) ratio and analysis of variance are investigated. The analysis results show that the electrode length and base oil viscosity of the ER fluid mostly affect the damping force in the absence of electric field. On the other hand, when the voltage is applied to the ER damper, the electrode length and the weight ratio of ER fluid exhibit significant effect. Based on the Taguchi method, an optimal configuration was designed and the robustness of the designed ER damper was validated by comparing the analysis and experimental results.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.8 no.3
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• pp.38-45
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• 2009

Recently, LCD Backlight Unit is being replaced from cold cathode fluorescent lamp(CCFL) to external electrode fluorescent lamp(EEFL) because the EEFL has high energy efficiency and long life. Also, it can reduce energy consumption and weight. So far, external electrode ring for EEFL is produced by sheet metal press forming process. Therefore it had low precision and much material loss. To solve these problems, Multi-Forming process that has five step forming process was invented. However, low productivity is another barrier. Product speed that is controlled by the rotational speed cannot be increased due to the unsatisfied design specification. The reason is that the gap between rolled two edge parts of the sheet plate is tightly inspected. Regarding this factor, the understanding of forming behavior to each process is inevitable. This paper describes the CAE analysis of the multi-forming process by PAM-STAMP.

• Journal of Information Display
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• v.5 no.2
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• pp.10-13
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• 2004

We have developed a new PDP cell structure called MARI(Multi Anode for Reduction of Ionic effect) and new driving scheme achieving a high luminous efficacy. The MARI PDP has middle electrode inserted between X and Y main electrodes. In the MARI PDP, reset and scan voltage is applied to middle electrode and sustain voltage is applied to X and Y electrode. Using a long gap sustain discharge we accomplished a high luminous efficacy. And we developed 42"full panel adopting MARI structure and new driving scheme and attained luminous efficacy of 2.35 lm/W.

• Proceedings of the KIEE Conference
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• 2003.07c
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• pp.1653-1655
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• 2003

The purpose of this paper is to evaluate the effects of pre-formed space charge by negative DC voltage on partial discharge(PD) patterns of XLPE. We have suggested a modified pulsed electro-acoustic method and demonstrated that the PD patterns are strongly influenced by the pre-formed space charge distributions, which are hardly disappeared up to AC 8kV in electrode configuration including air gap between XLPE layer and electrode.

• Journal of the Korean Vacuum Society
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• v.20 no.5
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• pp.322-326
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• 2011

Etch process of silicon dioxide layer by using capacitively coupled plasma (CCP) is currently being used to manufacture semiconductor devices with nano-scale feature size below 50 nm. In typical CCP plasma etcher system, plasmas are generated by applying the RF power on upper electrode and ion bombardment energy is controlled by applying RF power to the bottom electrode with the Si wafer. In this case, however, etch results often drift due to heating of the electrode during etching process. Therefore, controlling the temperature of the upper electrode is required to obtain improvement of etch repeatability. In this work, we report repeatability improvement during the silicon dioxide etching under extreme process conditions with very high RF power and close gap between upper and bottom electrodes. Under this severe etch condition, it is difficult to obtain reproducible oxide etch results due to drifts in etch rate, critical dimension, profile, and selectivity caused by unexpected problems in the upper electrode. It was found that reproducible etch results of silicon dioxide layer could be obtained by controlling temperature of the upper electrode. Methods of controlling the upper electrode and the correlation with etch repeatability will be discussed in detail.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2000.05a
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• pp.735-738
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• 2000

The characteristics of wire electrical discharge machining (WEDM) are governed by many factors such as the power supply type, operating condition and electrode material. This work deals with the effect of wire electrode materials on the machining characteristics such as, metal removal rate, surface characteristics and surface roughness during WEDM A wire's thermal physical properties are melting point, electrical conductivity and vapor pressure. One of the desired qualities of wire is a low melting point and high vapor pressure to help expel the contaminants from the gap. They are determined by the mix of alloying elements (in the case of plain brass and coated wire) or the base core material(i.e. molybdenum). Experiments have been conducted regarding the choice of suitable wire electrode materials and influence of the properties of these materials on the machinability and surface characteristics in WEDM, the experimental results are presented and discussed from their metallurgical aspect. And the coating effect of various alloying elements(Au, Ag, Cu, Zn, Cr, Mn, etc.) to the Cu or 65-35 brass core on them was reviewed also. The removal rate of some coated wires are higher than that of 65-35 brass electrode wire because the wire is difficult to break due to the wire cooling effect of Zn evaporation latent heat and the Zn oxide on the surface is effective in preventing short circuit. The removal rate increases with increasing Zn content from 35, 40 and Zn coated wire

• The Korean Journal of Physiology and Pharmacology
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• v.16 no.3
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• pp.219-224
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• 2012

Understanding how the b-wave of the electroretinogram (ERG) is generated by full-field light stimulation is still a challenge in visual neuroscience. To understand more about the origin of the b-wave, we studied the contributions of gap junctions to the ERG b-wave. Many types of retinal neurons are connected to similar and different neighboring neurons through gap junctions. The photopic (cone-dominated) ERG, stimulated by a small light beam, was recorded from goldfish (Carassius auratus) using a corneal electrode. Data were obtained before and after intravitreal injection of agents into the eye under a photopic illumination level. Several agents were used to affect gap junctions, such as dopamine D1 and D2 receptor agonists and antagonists, a nitric oxide (NO) donor, a nitric oxide synthase (NOS) inhibitor, the gap junction blocker meclofenamic acid (MFA), and mixtures of these agents. The ERG b-waves, which were enhanced by MFA, sodium nitroprusside (SNP), SKF 38393, and sulpiride, remained following application of a further injection of a mixture with MFA. The ERG b-waves decreased following $N^G$-nitro-L-arginine methyl ester (L-NAME), SCH 23390, and quinpirole administration but were enhanced by further injection of a mixture with MFA. These results indicate that gap junction activity influences b-waves of the ERG related to NO and dopamine actions.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.878-881
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• 2005

We report a cell gap variation tolerant liquid crystal display(LCD). Since the cell gap variation of the LCD results in the variation of brightness and contrast ratio, we should control carefully the process to get the uniform cell gap. For the projector application, this is more significant and the one reason of the low yield. We observed that the brightness variation of LCD is suppressed by insertion of dielectric layer between the pixel electrode and liquid crystal.

• Proceedings of the KIEE Conference
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• 1989.11a
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• pp.142-144
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• 1989

Triggering characteristics of a trigatron spark gap have been studied by measuring self-emission UV light. By combining the measurement of the UV light with that of the trigger gap voltage and the lain discharge current, we distinguished clearly the differences between the trigatron operations in which the lain discharge occurs after the trigger discharge in the case of sale polarity between the trigger pin and the lain electrode at the opposite side, and the lain gap breakdown takes place before the formation of the trigger spark in the case of different polarity. We show the observation of UV radiation with the other electromagnetic measurements is a simple and reliable scheme to investigate the triggering properties of the trigatron spark gaps.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.495-496
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• 2006

Electrostatically actuated nanoscale tweezers are fabricated on micro processed electrodes using FIB-CVD. Heavily doped electrode works as interconnection platform for controlling nanoscale devices. Short bent pillars are deposited to control the gap distance of main tweezers fabricated on bent ones. Two types of tweezers which have different gap distances are fabricated and tweezing motion was successfully demonstrated. The threshold voltages at snap-down of the pillars are dependent on the initial gap distance of the unactuated pillars, and the measured values were 93V for 3.6um and 30V for 2.2um. The dimension of nano tweezers and initial gap distances are controllable as demonstrated and we expect more complicated 3-dimensional shapes are also possible.