• Title/Summary/Keyword: Ga-As laser

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A Study on the Immunohistology in Injury Cure of Rat by using InGaAlP Laser Diode (InGaAlP 레이저다이오드를 적용한 Rat의 착상 치유에서 면역조직화학적 연구)

  • Yu, Seong-Mi;Park, Yong-Pil;Cheon, Min-Woo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.5
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    • pp.431-435
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    • 2009
  • The apparatus has been fabricated using the laser diode and microprocessor unit. The apparatus used a InGaAlP laser diode for laser medical therapy and was designed for a pulse width modulation type to increase stimulation effects. To raise the stimulus effect of the human body, the optical irradiation frequency could be set up. The study has executed in-vivo experiment by employing our own developed laser diode irradiation system to investigate the effects of the InGaAlP laser diode irradiation on the wound healing as a preliminary study aimed at the application of InGaAlP laser diode to wound healing of human skin injury. The study cut out whole skin layers of Sprague-Dawley rat on the back part in 1 cm circle and observed developing effects after executing light irradiation for 9 days, and in result it is found that the light irradiation rat showed earlier wound healing than non-irradiation rat during the experimental period. In addition, there are some differences found regarding the healing process between laser diode irradiated rats and non-irradiated ones.

A Study on the Single Crystal Growth of InGaAsP/GaAs by Vertical LPE System (수직형 LPE 장치에 의한 InGaAsP/GaAs 단결성 성장에 관한 연구)

  • 홍창희;조호성;황상구;오종환;예병덕;박윤호
    • Journal of the Korean Institute of Navigation
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    • v.16 no.2
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    • pp.21-27
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    • 1992
  • Shortening the lasing wavelength(particularly below infrared ; the visible region) of laser diodes is very attractive because it can provide a wide range of applications in the fields of optical information, measurement, sensor, the development of medical instrument, and optical communication through plastic fibers. According to the recent researches on the field, InGaAsP/GaAs was suggested as a material for red-light laser. In this study, in order to grow InGaAsP/GaAs epitaxial layer on InGaAsP/GaAs by LPE, we used GaP and InP two phase solution technique for 670nm and 780 nm region, respectively. Through the X-ray diffraction measurement for the epitaxial layer grown from the experiments, we found that the lattice mismatch of $In_{0.46}Ga_{0.54}As_{0.07}P_{0.93}$/GaAs and $In_{0.19}Ga_{0.81}As_{0.62}P_{0.38}$/GaAs was about +0.3% and +0.1%, respectively.

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Reduction of Operating Voltage of GaN-based Blue-violet Laser Diode by using Highly Mg Doped GaN Layer (고농도의 Mg가 도핑된 GaN층을 이용한 GaN계 청자색 레이저다이오드의 동작 전압 감소)

  • 곽준섭
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.7
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    • pp.764-769
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    • 2004
  • In order to reduce operating voltage of the GaN based blue-violet laser diodes, the effect of highly Mg doped GaN layer, which was grown below ohmic contact metals, on contact resistivity as well as operating voltage has been investigated. The addition of the highly Mg doped GaN layer greatly reduced contact resistivity of Pd/Pt/Au ohmic contacts from $5.2 \times {10}^-2 \Omegaㆍ$\textrm{cm}^2$ to 7.5 \times {10}^-4 \Omegaㆍ$\textrm{cm}^2$$. In addition, it also decreased device voltage at 20 mA by more than 3 V. Temperature- dependent sheet resistivity of the highly Mg doped GaN layer suggested that the reduction of the contact resistivity could be attributed to predominant current flow at the interface between the Pd/Pt/Au contacts and p-GaN through a deep level defect band, rather than the valence band.

The study of characteristic III-V compound semiconductor by He-Ne laser (III-V 화합물반도체에서의 He-Ne Laser를 활용한 광 특성 연구)

  • Yu, Jae-Yong;Choi, K.S.;Choi, Son Don
    • Laser Solutions
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    • v.16 no.1
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    • pp.1-4
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    • 2013
  • The optical properties of III-V compound semiconductor structure was investgated by photoreflectance (PR). The results show two signals at 1.42 and 1.73eV. These are attributed to the bandgap energy of GaAs, AlGaAs, respectively. Also, AlGaAs region showed weak signal. This signal is attributed to carbon or si defect.

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The Effect of GaAIAs Laser Irradiation on EGF Expression in Epidermal Tissue of Rats Induced by Wound (GaAIAs 레이저 조사가 흰쥐 창상부위 상피조직의 EGF 발현에 미치는 영향)

  • Kim, Dong-Hyun;Baek, Su-Jeong;Bae, Ju-Han;Kim, Suk-Bum;Kwon, Young-Shil;Kim, Jin-Sang
    • The Journal of Korean Physical Therapy
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    • v.13 no.3
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    • pp.603-611
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    • 2001
  • This study was performed. using EGF, to observated the effect of GaAIAs laser on wound model induced designedly in lumbar region. The results of this study were as following: 1. In expression of EGF which used marker of wound healing, laser irradiating group made EGF to more induce significantly than laser non-irradiating group at 3 days. 2. EGF immunoreactivity in epidermis were increased markedly 3 days after wound, and increased gradually from 1 day to 2 days in wound which is laser irradiation. Therefore, EGF immunoreactivity which increased after wound with GaAIAs laser irradiation indicate that GaAIAs laser have wound healing effect. This study also can become a part of scientific evidence on electrotherapy through measuring quantitively effects of GaAIAs laser in wound

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LASER-Induced Vapour Phase Hetero-Epitaxy of A^{III}\;B^V$ Type Opto-Electronics (LASER 광려기 기상반응에 의한 III-V 족계 광전재기의 Hetero-Epitaxy 고찰)

  • 우희조;박승민
    • Korean Journal of Crystallography
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    • v.1 no.2
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    • pp.99-104
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    • 1990
  • The hetero-epitaxial growth of AmB v type onto-electronic material is attempted by means of the laser-induced chemical vapour deposition technique. The bimolecular gas phase reaction of trimethylgallium with ammonia on (001) alumina substrate for the epitaxy of gallium nitride is chosen as a model system. In this study, ArF exciter laser (193nm) is employed as a photon source. Marked difference is found in nucleation and in subsequent crystal incorporation between the doposits formed with and without the laser-irradiation. The surface coverage with isomorphically grown drystallites is pronounced upon "volume-excited" irradiation in comparison with the conventional thermal process. As to the crystal structure of the grown layers, the laser-induced deposits of GaN may be represented by either of the following two models: (001) plane of sapphire //y (001) plane of wurtzite-type GaN, OR (001) plane of sapphire//(001) plane of wurtzite-type-GaN (111) plane of twinned zinc blende-type GaN.

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Design and Simulation of an 808 nm InAlAs/AlGaAs GRIN-SCH Quantum Dot Laser Diode

  • Chan, Trevor;Son, Sung-Hun;Kim, Kyoung-Chan;Kim, Tae-Geun
    • Journal of the Optical Society of Korea
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    • v.15 no.2
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    • pp.124-127
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    • 2011
  • Quantum dots were designed within a GRIN-SCH(Graded index - Separate confinement Heterostructure) heterostructure to create a high power InAlAs/AlGaAs laser diode. 808 nm light emission was with a quantum dot composition of In0.665Al0.335As and wetting layer composition of Al0.2Ga0.8As by LASTIP simulation software. Typical characteristics of GRIN structures such as high confinement ratios and Gaussian beam profiles were shown to still apply when quantum dots are used as the active media. With a dot density of 1.0x1011 dots/cm2, two quantum dot layers were found to be good enough for low threshold, high-power laser applications.

Laser Direct Ory Etching for $Al_{0.3}Ga_{0.7}As/GaAs$ Multi-layer Structures ($Al_{0.3}Ga_{0.7}As/GaAs$ 다층구조의 레이저 직접 건식에칭)

  • Park, Se-Ki;Lee, Cheon;Kim, Seong-Il;Kim, Eun-Kyu;Min, Suk-Ki
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.1980-1981
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    • 1996
  • Laser direct dry etching is a new technique in semiconductor processing which has a lot of advantage, including decrease of etching-induced damage, maskless, photoresistiess, and high selectivity. This study presents characteristics of a laser direct dry etching for $Al_{0.3}Ga_{0.7}As/GaAs$ multi-layer structures for the first time. In this study, we were able to obtain the unusual aching profiles. The cross sectional analysis of etched groove was peformed for reaction characteristics and their applications.

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The Fabrication of (Ga, Al) As/GaAs Modified Multi-Quantum Well Laser Diode by MOCVD (MOCVD법에 의한 (Ga, Al) As/GaAs 변형된 영지우물 레이저 다이오드의 제작)

  • Kim, Chung-Jin;Kang, Myung-Ku;Kim, Yong;Eom, Kyung-Sook;Min, Suk-Ki;Oh, Hwan-Sool
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.29A no.9
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    • pp.36-45
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    • 1992
  • The Modified Multi-Quantum Well(MMQWAl) structures have been grown by Mental-Organic chemical Vapor Deposition(MOCVD) method and stripe type MMQW laser diodes have been investigated. In the case of GaAs/AlGaAs superlattice and quantum well growth by MOCVD, the periodicity, interface abruptess, Al compositional uniformity and layer thickness have been confirmed though the shallow angle lapping technique, double crystal x-ray diffractometry (DCXD) and photoluminescence (PL) measurement. stripe-type MMQW laser diodes have been fabricated using the process technology of photolithography, chemical etching, ohmic contact, back side removing and cleaving. As the result of the electrical and opticalmeasurement of these laser diodes, we have achieved the series resistance of $1[\Omega}~2{\Omega}$ by current-voltage measurements, the threshold current of 200-300mA by currnt-light measurements and the lasing wavelength of 8000-8400$\AA$ by lasing spectrum measurements.

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