• 조명전기설비학회논문지
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• 제21권7호
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• pp.46-53
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• 2007

Micro-Grid는 높은 전력품질을 제공하기 위해 독립적으로 유효 및 무효전력 제어가 가능한 연료전지와 마이크로터빈과 같이 친환경적이고 신뢰할 수 있는 전력원을 채용하는 Micro-Source들로 구성된다. 본 논문은 Micro-Grid시스템의 동특성 모델링과 안정도 해석의 기본적 해석 방법에 관하여 연구하였다. Micro-Source 인버터의 기본주파수 모델을 이용하여 Micro-Grid 시스템의 동특성 모델을 구성하였다. Micro-Grid 시스템의 선형화된 동특성 모델을 기초로 하여 안정도 해석을 수행하였다. 사례연구 결과로부터 Micro-Grid 시스템의 안정도에 영향을 미치는 파라미터를 식별하였다.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2005년도 제24회 춘계학술대회논문집
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• pp.198-202
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• 2005

가스발생기는 액체 추진 로켓의 터보 펌프 시스템에서 터빈을 구동시키기 위한 중요한 장치이다. 터빈 블레이드의 보호를 위해서 가스발생기의 출구 온도가 제한을 받으며, 이를 위해 농후 연소를 발생시킨다. 본 연구에서는 가스발생기의 연소에 대한 수치적 연구를 통하여 가스발생기 내부의 유동 특성을 이해하고 나아가 가스발생기의 성능을 예측할 수 있는 수치 해석 도구의 개발을 목표로 하고 있다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 학술대회 논문집 전문대학교육위원
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• pp.21-25
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• 1999

This paper proposes a novel control strategy of SVC(Static var compensator) using cascade multilevel inverter. To control the reactive power instantaneously, the dq-dynamic system model is described and analyzed. A single pulse pattern based on the SHE(Selective Harmonic Elimination) technique is determined from the look-up table to reduce the line current harmonics and a rotating fundamental frequency switching scheme is applied to adjust the DC capacitor voltage at the scheme level. From the simulation, it is verified that this proposed control scheme make the dynamic control response of SVC fast, the current harmonics low, and the DC capacitor voltage balanced.

• 전력전자학회논문지
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• 제8권6호
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• pp.576-584
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• 2003

본 논문에서는 비 선형 단상부하에 의해 발생하는 전류 고조파를 보상하기 위한 단상능동전력필터의 새로운 제어방법을 제안한다. 부하전류에 시간지연을 주어 임의의 두 번째 상을 생성한 후 단상시스템을 두 상을 갖는 시스템으로 만들어 복소계산을 가능하게 한다. 기존의 방법은 부하전류를 1/4 T(T는 기본파의 주기) 만큼 지연시켜서 가상의 상을 만들었지만, 본 논문에서 제안하는 방법은 저역통과필터가 상 지연의 특성을 가지는 것을 이용하여 필터를 통과한 지연된 위상을 가진 새로운 신호를 두 번째 상으로 이용하였다. 두 개의 위상이 다른 상이 존재하므로 고조파 전류의 순시계산이 가능하게 된다. 기존의 고정좌표계를 이용하여 순시무효전력이론을 적용하지 않고, 본문에서는 전원주파수에 동기하는 회전좌표계를 사용하여 순시계산을 하였고, 보상전류 지령치를 구하였다. 전류원으로 사용되는 RL부하에 대하여 시뮬레이션과 실험을 수행하였고, 제안된 제어법의 유효성을 입증하였다.

• 전력전자학회논문지
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• 제23권2호
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• pp.86-93
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• 2018

In this work, control methods and operating modes are proposed to manage standalone microgrid. A standalone microgrid generally consists of two sources, namely, battery energy storage system (BESS) and diesel generator (DG). BESS is the main source that supplies active and reactive power regardless of load conditions, whereas DG functions as an auxiliary power source. BESS operates in a constant voltage constant frequency (CVCF) control, which includes proportional-integral + resonant controller in a parallel structure. In CVCF control, the concept of fundamental positive and negative transformation is utilized to generate a three-phase sinusoidal voltage under imbalanced load condition. Operation modes of a standalone microgrid are divided into three modes, namely, normal, charge, and manual modes. To verify the standalone microgrid along with the proposed control methods, a demonstration site is constructed, which contains 115 kWh lead-acid battery bank, 50 kVA three-phase DC - AC inverter, and 50 kVA DG and controllable loads. In the CVCF control, the total harmonic distortion of output voltage is improved to 1.1% under imbalanced load. This work verifies that the standalone microgrid provides high-quality voltage, and three operation modes are performed from the experimental results.

• 전기학회논문지
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• 제65권8호
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• pp.1340-1346
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• 2016

Utilization of Distributed Generations (DGs) using Renewable Energy Sources (RESs) has been constantly increasing as they provide a lot of environmental, economic merits. In spite of these merits, some problems with respect to voltage profile, protection and its coordination system due to reverse power flow could happen. In order to analyze and solve the problems, accurate modeling of DG systems should be preceded as a fundamental research task. In this paper, we present a PhotoVoltaic (PV) generation system which consists of practical PV cells with series and parallel resistor and an inverter for interconnection with a main distribution system. The inverter is based on controllable current source which is capable of controlling power factors, active and reactive powers within a certain limit related to amount of PV generation. To verify performance of the model, a distribution system based on actual data is modeled by using ElectroMagnetic Transient Program (EMTP) software. Computer simulations according to various conditions are also performed and it is shown from simulation results that the model presented is very effective to study DG-related researches.

• Molecules and Cells
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• 제41권1호
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• pp.35-44
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• 2018

Mitochondria are responsible for supplying of most of the cell's energy via oxidative phosphorylation. However, mitochondria also can be deleterious for a cell because they are the primary source of reactive oxygen species, which are generated as a byproduct of respiration. Accumulation of mitochondrial and cellular oxidative damage leads to diverse pathologies. Thus, it is important to maintain a population of healthy and functional mitochondria for normal cellular metabolism. Eukaryotes have developed defense mechanisms to cope with aberrant mitochondria. Mitochondria autophagy (known as mitophagy) is thought to be one such process that selectively sequesters dysfunctional or excess mitochondria within double-membrane autophagosomes and carries them into lysosomes/vacuoles for degradation. The power of genetics and conservation of fundamental cellular processes among eukaryotes make yeast an excellent model for understanding the general mechanisms, regulation, and function of mitophagy. In budding yeast, a mitochondrial surface protein, Atg32, serves as a mitochondrial receptor for selective autophagy that interacts with Atg11, an adaptor protein for selective types of autophagy, and Atg8, a ubiquitin-like protein localized to the isolation membrane. Atg32 is regulated transcriptionally and post-translationally to control mitophagy. Moreover, because Atg32 is a mitophagy-specific protein, analysis of its deficient mutant enables investigation of the physiological roles of mitophagy. Here, we review recent progress in the understanding of the molecular mechanisms and functional importance of mitophagy in yeast at multiple levels.

• JSTS:Journal of Semiconductor Technology and Science
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• 제2권4호
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• pp.259-267
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• 2002

We present a novel 3D fabrication method with single X-ray process utilizing an X-ray mask in which a micro-actuator is integrated. An X-ray absorber is electroplated on the shuttle mass driven by the integrated micro-actuator during deep X-ray exposures. 3D microstructures are revealed by development kinetics and modulated in-depth dose distribution in resist, usually PMMA. Fabrication of X-ray masks with integrated electrothermal xy-stage and electrostatic actuator is presented along with discussions on PMMA development characteristics. Both devices use $20-\mu\textrm{m}$-thick overhanging single crystal Si as a structural material and fabricated using deep reactive ion etching of silicon-on-insulator wafer, phosphorous diffusion, gold electroplating, and bulk micromachining process. In electrostatic devices, $10-\mu\textrm{m}-thick$ gold absorber on $1mm{\times}1mm$ Si shuttle mass is supported by $10-\mu\textrm{m}-wide$, 1-mm-long suspension beams and oscillated by comb electrodes during X-ray exposures. In electrothermal devices, gold absorber on 1.42 mm diameter shuttle mass is oscillated in x and y directions sequentially by thermal expansion caused by joule heating of the corresponding bent beam actuators. The fundamental frequency and amplitude of the electrostatic devices are around 3.6 kHz and $20\mu\textrm{m}$, respectively, for a dc bias of 100 V and an ac bias of 20 VP-P (peak-peak). Displacements in x and y directions of the electrothermal devices are both around $20{\;}\mu\textrm{m}$at 742 mW input power. S-shaped and conical shaped PMMA microstructures are demonstrated through X-ray experiments with the fabricated devices.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.434-435
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• 2012

Plasma enhanced chemical vapor deposition (PECVD) silicon dioxide thin films have many applications in semiconductor manufacturing such as inter-level dielectric and gate dielectric metal oxide semiconductor field effect transistors (MOSFETs). Fundamental chemical reaction for the formation of SiO2 includes SiH4 and O2, but mixture of SiH4 and N2O is preferable because of lower hydrogen concentration in the deposited film [1]. It is also known that binding energy of N-N is higher than that of N-O, so the particle generation by molecular reaction can be reduced by reducing reactive nitrogen during the deposition process. However, nitrous oxide (N2O) gives rise to nitric oxide (NO) on reaction with oxygen atoms, which in turn reacts with ozone. NO became a greenhouse gas which is naturally occurred regulating of stratospheric ozone. In fact, it takes global warming effect about 300 times higher than carbon dioxide (CO2). Industries regard that N2O is inevitable for their device fabrication; however, it is worthwhile to develop a marginable nitrous oxide free process for university lab classes considering educational and environmental purpose. In this paper, we developed environmental friendly and material cost efficient SiO2 deposition process by substituting N2O with O2 targeting university hands-on laboratory course. Experiment was performed by two level statistical design of experiment (DOE) with three process parameters including RF power, susceptor temperature, and oxygen gas flow. Responses of interests to optimize the process were deposition rate, film uniformity, surface roughness, and electrical dielectric property. We observed some power like particle formation on wafer in some experiment, and we postulate that the thermal and electrical energy to dissociate gas molecule was relatively lower than other runs. However, we were able to find a marginable process region with less than 3% uniformity requirement in our process optimization goal. Surface roughness measured by atomic force microscopy (AFM) presented some evidence of the agglomeration of silane related particles, and the result was still satisfactory for the purpose of this research. This newly developed SiO2 deposition process is currently under verification with repeated experimental run on 4 inches wafer, and it will be adopted to Semiconductor Material and Process course offered in the Department of Electronic Engineering at Myongji University from spring semester in 2012.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.17-18
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• 2011

Plasma in liquid phase has attracted great attention in the last few years by the wide domain of applications in material processing, decomposition of organic and inorganic chemical compounds and sterilization of water. The plasma in liquid is characterized by three main regions which interact each - other during the plasma operation: the liquid phase, which supply the plasma gas phase with various chemical compounds and ions, the plasma in the gas phase at atmospheric pressure and the interface between these two regions. The most complex region, but extremely interesting from the fundamental, chemical and physical processes which occur here, is the boundary between the liquid phase and the plasma gas phase. In our laboratory, plasma in liquid which behaves as a glow discharge type, is generated by using a bipolar pulsed power supply, with variable pulse width, in the range of 0.5~10 ${\mu}s$ and 10 to 30 kHz repetition rate. Plasma in water and other different solutions was characterized by electrical and optical measurements. Strong emissions of OH and H radicals dominate the optical spectra. Generally water with 500 ${\mu}S/cm$ conductivity has a breakdown voltage around 2 kV, depending on the pulse width and the repetition rate of the power supply. The characteristics of the plasma initiated in ultrapure water between pairs of different materials used for electrodes (W and Ta) were investigated by the time-resolved optical emission and the broad-band absorption spectroscopy. The deexcitation processes of the reactive species formed in the water plasma depend on the electrode material, but have been independent on the polarity of the applied voltage pulses. Recently, Coherent anti-Stokes Raman Spectroscopy method was employed to investigate the chemistry in the liquid phase and at the interface between the gas and the liquid phases of the solution plasma system. The use of the solution plasma allows rapid fabrication of the metal nanoparticles without being necessary the addition of different reducing agents, because plasma in the liquid phase provides a reaction field with a highly excited energy radicals. We successfully synthesized gold nanoparticles using a glow discharge in aqueous solution. Nanoparticles with an average size of less than 10 nm were obtained using chlorauric acid solutions as the metal source. Carbon/Pt hybrid nanostructures have been obtained by treating carbon balls, synthesized in a CVD chamber, with hexachloro- platinum acid in a solution plasma system. The solution plasma was successfully used to remove the template remained after the mesoporous silica synthesis. Surface functionalization of the carbon structures and the silica surface with different chemical groups and nanoparticles, was also performed by processing these materials in the liquid plasma.