• Title/Summary/Keyword: Free standing film

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Electromagnetic Shielding Characteristics of Polyaniline and Its Mixtures (폴리아닐린과 그 혼합물의 전자기파 차폐특성)

  • 박종수;임인호;최병수
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.12 no.2
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    • pp.293-298
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    • 2001
  • EB-NMP free standing film is manufactured from NMP solution of polyaniline(emeraldine base EB). Also ES(emeraldine salt EB . HCl) film is manufactured by doping of EB-NMP film with 1 mole HCI aqueous solution. And EB-mixture films containing conductor(carbon black, graphite, Ag etc.) are prepared, In this study, electromagnetic interference shielding efficiency(EMI SE) of ES free standing film ($\sigma$=5 S/cm, t=0.14mm) is 23~25 dB in the frequency range of 10 MHz~1 GHz. ES-mixture(carbon black, graphite, Ag etc.) films, polyaniline film doped camphorsulfonic acid(CSA) show higher EMI SE(30~34 dB, 36~42 dB, 44~52 dB, 34~43 dB) property than that of ES free standing film, respectively.

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Effect of Hydrogen Plasma Treatment on the Photoconductivity of Free-standing Diamond Film (다이아몬드막의 광전도성에 관한 수소 플라즈마 표면 처리의 효과)

  • Sung-Hoon, Kim
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1999.06a
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    • pp.337-350
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    • 1999
  • Thick diamond film having ~700${\mu}{\textrm}{m}$ thickness was deposited on polycrystalline molybdenum (Mo) substrate using high power (4kW) microwave plasma enhanced chemical vapor deposition (MPECVD) system. We could achieve free-standing diamond film via detaching as-deposited diamond film from the substrate by rapid cooling them under vacuum. We investigated the variation of photoconductivity after exposing the film surface to either oxygen or hydrogen plasma. At as-grown state, the growth side (the as-grown surface of the film) showed noticeable photoconductivity. The oxygen plasma treatment of this side led to the insulator. After exposing the film surface to hydrogen plasma, on the other hand, we could observe the reappearing of photoconductivity at the growth side. Based on these results, we suggest that the hydrogen plasma treatment may enhance the photoconductivity of free-standing diamond film.

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Effect of hydrogen plasma treatment on the photoconductivity of free-standing diamond film

  • Kim, Sung-Hoon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.4
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    • pp.441-445
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    • 1999
  • Thick diamond film having $~700\mu\textrm{m}$ thickness was deposited on polycrystalline molybdenum(Mo) substrate using high power (4 kW) microwave plasma-enhanced chemical vapor depostion (MPECVD) system. We could achieve free-standing diamond film via detaching as-deposited diamond film from the substrate by rapid cooling them under vacuum. We investigated the variation of photoconductivity after exposing the film surface to either oxygen or hydrogen plasma. At as-grown state, the growth side (the as-grown surface of the film) showed noticeable photoconcuctivity. The oxygen plasma treatment of this side led to the insulator. After exposing the film surface to hydrogen plasma, on the other hand, we could observe the reappearing of photoconductivity at the growth side. Based on these results, we suggest that the hydrogen plasma treatment may enhance the photoconductivity of free-standing diamond film.

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Patterned free-standing diamond field emitters for iarge area field emission display applications

  • Kim, Sung-Hoon
    • Journal of Korean Vacuum Science & Technology
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    • v.3 no.1
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    • pp.10-15
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    • 1999
  • Using micro-wells on the Mo substrate, we could obtain various tubular-volcano-types of free-standing diamond field emitters by depositing a diamond film detaching the film and turning the film upside down. The field emission characteristics of these structures were investigated as a function of size, shape and the number density of the tubular-volcano-type diamond field emitters. The field emission characteristics, especially the current density, were greatly enhanced with increasing the number density of the tubular-volcano-type diamond field emitters on the Mo substrate. Based on these results, we suggest that the reduction of the well size can give better field emission characteristics by the increase in the number density of the tubular-volcano-type diamond field emitters. Finally, we suggest the feasibility of fabricating a large-area field emission display using our patterned tubular-volcano-type free-standing diamond field emitters.

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Characteristics of Free-Standing GaN Substrates grown by Hydride Vapor Phase Epitaxy (Hydride Vapor Phase Epitaxy 법으로 성장된 Free-Standing GaN 기판의 특성에 관한 연구)

  • Kim, Hwa-Mok;Choe, Jun-Seong;O, Jae-Eung;Yu, Tae-Gyeong
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.37 no.3
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    • pp.14-19
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    • 2000
  • Free-standing GaN single crystal substrates have been obtained by growing thick GaN epitaxial layers on (0001) sapphire substrates using hydride vapor phase epitaxy (HVPE) method. After growing the GaN thick film of 200 ${\mu}{\textrm}{m}$, a free-standing GaN with a size of 10 mm $\times$10 mm were obtained by mechanical polishing process to remove sapphire substrate. Crack-free GaN substrates have been obtained by GaCl pre-treatment prior to the growth of GaN epitaxial layers. Properties of free-standing GaN substrates have been compared with those of lateral epitaxial overgrowth (LEO) GaN films by double-crystal x-ray diffraction (DC-XRD), cathodoluminescence (CL) and photoluminescence (PL) measurements.

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Planarization of the Diamond Film Surface by Using the Hydrogen Plasma Etching with Carbon Diffusion Process (수소 플라즈마 에칭과 탄소 확산법에 의한 다이아몬드막 표면의 평탄화)

  • Kim, Sung-Hoon
    • Journal of the Korean Chemical Society
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    • v.45 no.4
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    • pp.351-356
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    • 2001
  • Planarization of the free-standing diamond film surface as smooth as possible could be obtained by using the hydrogen plasma etching with the diffusion of the carbon species into the metal alloy (Fe, Cr, Ni). For this process, we placed the free-standing diamond film between the metal alloy and the Mo substrate like a metal-diamond-molybdenum (MDM) sandwich. We set the sandwich-type MDM in a microwave-plasma-enhanced chemical vapor deposition (MPECVD) system. The sandwich-type MDM was heated over ca. 1000 $^{\circ}C$ by using the hydrogen plasma. We call this process as the hydrogen plasma etching with carbon diffusion process. After etching the free-standing diamond film surface, we investigated surface roughness, morphologies, and the incorporated impurities on the etched diamond film surface. Finally, we suggest that the hydrogen plasma etching with carbon diffusion process is an adequate etching technique for the fabrication of the diamond film surface applicable to electronic devices.

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Fabrication of Alumina Free-standing Objects by Electrophoretic Deposition

  • Uchikoshi, Tetsuo;Furumi, Seiichi;Suzuki, Tohru S.;Sakka, Yoshio
    • Proceedings of the Korean Powder Metallurgy Institute Conference
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    • 2006.09b
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    • pp.1107-1108
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    • 2006
  • The coating of conductive polypyrrole (Ppy) on nonconductive ceramic substrates was performed by polymerization of pyrrole (Py) in an aqueous solution. The Ppy film was characterized by scanning electron microscopy and conductivity measurements. Electrophoretic deposition of bimodal alumina suspension prepared with a phosphate ester was performed using Ppy film as a cathode. Fabrication of alumina ceramics with irregular shapes or complicated patterns were also attempted by sintering the deposits together with the Ppy coated substrates in air.

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Simultaneous Detection Properties of Organic Vapor, Pressure Difference and Magnetic Field using a Rugate-structured Free-standing Porous Silicon Film (Rugate 구조를 갖는 자립형 다공성 실리콘 박막을 이용한 유기 증기, 압력차, 자기장의 동시 감응 특성)

  • Han, Seong-Beom;Lee, Ki Won
    • Journal of Sensor Science and Technology
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    • v.26 no.3
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    • pp.186-191
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    • 2017
  • In this study, we investigated the simultaneous detection properties of organic vapor, pressure difference, and magnetic field using a single rugate-structured free-standing porous silicon (RFPS) thin film. Both the wavelength and the intensity of the rugate peaks were changed in the reflectivity spectrum measured at the thin film surface while the organic vapor was exposed to the RFPS thin film. However, when the pressure difference and the magnetic field were exposed to the film, only the rugate peak intensity was changed. Therefore, it is possible to distinguish whether or not the organic vapor is detected by simultaneously changing the rugate peak wavelength and intensity. In addition, a method of distinguishing between the pressure difference and the magnetic field detection signal has been derived by rapidly modulating the direction of the magnetic field. This study shows that it is possible to simultaneously detect and distinguish various objects using a single RFPS thin film, and it is found that porous silicon can be utilized as a sensor sufficiently.

Fabrication and Characterization of Free-Standing DBR Porous Silicon Film

  • Um, Sungyong;Sohn, Honglae
    • Journal of Integrative Natural Science
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    • v.7 no.1
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    • pp.1-4
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    • 2014
  • Distributed Bragg reflector porous silicon of different characteristics were formed to determine their optical constants in the visible wavelength range using a periodic square wave current between low and high current densities. The surface and cross-sectional SEM images of distributed Bragg reflector porous silicon were obtained using a cold field emission scanning electron microscope. The surface image of distributed Bragg reflector porous silicon indicates that the distributions of pores are even. The cross-sectional image illustrates that the multilayer of distributed Bragg reflector porous silicon exhibits a depth of few microns and applying of square current density during the etching process results two distinct refractive indices in the contrast. Distributed Bragg reflector porous silicon exhibited a porosity depth profile that related directly to the current-time profile used in etch. Its free-standing film was obtained by applying an electro-polishing current.

Experimental Evidence for New Pinning Conditions in Strongly Pinned Permalloy Film

  • Han, Kyung-Hunn;Cho, Jae-Hun;Lee, Suk-Mock
    • Journal of Magnetics
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    • v.12 no.1
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    • pp.27-30
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    • 2007
  • Experimental evidence suggests that spin pinning conditions for standing spin mode in polycrystalline $Ni_{84}Fe_{16}$ alloy film, is confirmed using the four categories of Camley et al. and the value of q$\bot$ for the pinning conditions, this was achieved by performing Brillouin light scattering measurements. The value of q$\bot$ was observed, in order to increase at a rate of $\pi$/2 with an increasing mode number. With this condition, the coexistence of standing spin wave modes was shown, with intermediate pinning, in addition to free and strong pinning. The values for spin-wave-stiffness constant ($D_B$), g-factor (g), and surface magnetization (4$\pi$M) of the Permalloy film were obtained from the results of BLS, and determined to be $D_B=1.85{\pm}0.05Oecm^2$, $g=2.11{\pm}0.02$, and 4$\pi$M=8.7 kG, respectively.