• Title/Summary/Keyword: Focused Ion Beam-Scanning Electron

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Use of Modern Non­destructive Techniques in High Temperature Degradation of Material and Coatings

  • Lee, C.K.;Sohn, Y.H.
    • International Journal of Korean Welding Society
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    • v.3 no.2
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    • pp.29-39
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    • 2003
  • The durability and reliability of thermal barrier coatings (TBCs) play an important role in the service reliability, availability and maintainability (RAM) of hot­section components in advanced turbine engines for aero and utility applications. Photostimulated luminescence spectroscopy (PSLS) and electrochemical impedance spectroscopy (EIS) are being concurrently developed as complimentary non­destructive evaluation (NDE) techniques for quality control and life­remain assessment of TBCs. This paper overviews the governing principles and applications of the luminescence and the impedance examined in the light of residual stress, phase constituents and resistance (or capacitance) in TBC constituents including the thermally grown oxide (TGO) scale. Results from NDE by PSLS and EIS are discussed and related to the microstructural development during high temperature thermal cycling, examined by using a variety of microscopic techniques including focused ion beam (FIB) in­situ lift­out (INLO), transmission and scanning transmission electron microscopy (TEM and STEM).

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Microprocess of silicon using focused Ar$^+$ llaser and estimates (집속된 아르곤 이온 레이저에 의한 실리콘의 미세가공 및 평가)

  • Cheong, Jae-Hoon;Lee, Cheon;Hwang, Kyoung-Hyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.11a
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    • pp.473-476
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    • 1997
  • Focused Ar ion laser beam can be utilized to fabricate microstructures on silicon substrate as well as other materials(e.g. such as ceramic). The laser using in this study is an argon ion laser with maximum power of 6 W, wavelength of 514 nm. This laser beam is focused by objectives with a high numerical aperture, a long working distance. We have achieved line width about 1 ${\mu}{\textrm}{m}$ with high scan speed. The resolution for Si machining is determined by the selectivity of the chemical reaction rather than the laser spot size. In this study, we have obtained the maximum etch rate of 434.7 ${\mu}{\textrm}{m}$/sec with high aspect ratio. The characteristics of etched groove was investigated by scanning electron microscope(SEM) and auger electron spectroscopy(AES). It is assumed that the technique using arson ion laser is applicab1e to fabricate microstructures.

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Direct Synthesis of Width-tailored Graphene Nanoribbon on Insulating Substrate

  • Song, U-Seok;Kim, Su-Yeon;Kim, Yu-Seok;Kim, Seong-Hwan;Lee, Su-Il;Jeon, Cheol-Ho;Park, Jong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.564-564
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    • 2012
  • Graphene has been emerged as a fascinating material for future nanoelectronic applications due to its extraordinally electronic properties. However, their zero-bandgap semimetallic nature is a major problem for applications in high performance field-effect transistors (FETs). Graphene nanoribbons (GNRs) with narrow widths (${\geq}10nm$) exhibit semiconducting behavior, which can be used to overcome this problem. In previous reports, GNRs were produced by several approaches, such as electron beam lithography patterning, chemically derived GNRs, longitudinal unzipping of carbon nanotubes, and inorganic nanowire template. Using these methods, however, the width distribution of GNRs was a quiet broad and substantial defects were inevitably occurred. Here, we report a novel approach for fabricating width-tailored GNRs by focused ion beam-assisted chemical vapor deposition (FIB-CVD). Width-tailored phenanthrene ($C_{14}H_{10}$) templates for direct growth of GNRs were prepared on $SiO_2$/Si substrate by FIB-CVD. The GNRs on the templates were synthesized at $900-1,050^{\circ}C$ with introducing $CH_4$ $(20sccm)/H_2$ (10 sccm) mixture gas for 10-300 min. Structural characterizations of the GNRs were carried out using Raman spectroscopy, scanning electron microscopy, and atomic force microscopy.

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Fabrication of Hydrophobic Surface by Controlling Micro/Nano Structures Using Ion Beam Method (이온빔을 이용한 표면 미세구조 제어를 통한 발수 표면 제조)

  • Kim, Dong-Hyeon;Lee, Dong-Hoon
    • Corrosion Science and Technology
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    • v.17 no.3
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    • pp.123-128
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    • 2018
  • The fabrication of a controlled surface is of great interest because it can be applied to various engineering facilities due to the various properties of the surface, such as self-cleaning, anti-bio-fouling, anti-icing, anti-corrosion, and anti-sticking. Controlled surfaces with micro/nano structures were fabricated using an ion beam focused onto a polypropylene (PP) surface with a fluoridation process. We developed a facile method of fabricating hydrophobic surfaces through ion beam treatment with argon and oxygen ions. The fabrication of low surface energy materials can replace the current expensive and complex manufacturing process. The contact angles (CAs) of the sample surface were $106^{\circ}$ and $108^{\circ}$ degrees using argon and oxygen ions, respectively. X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FT-IR) spectroscopy were used to determine the chemical composition of the surface. The morphology change of the surfaces was observed by scanning electron microscopy (SEM). The change of the surface morphology using the ion beam was shown to be very effective and provide enhanced optical properties. It is therefore expected that the prepared surface with wear and corrosion resistance might have a considerable potential in large scale industrial applications.

A Site Specific Characterization Technique and Its Application

  • Kamino, T.;Yaguchi, T.;Ueki, Y.;Ohnish, T.;Umemura, K.;Asayama, K.
    • 한국전자현미경학회:학술대회논문집
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    • 2001.11a
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    • pp.18-22
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    • 2001
  • A technique to characterize specific site of materials using a combination of a dedicated focused ion beam system(FIB), and Intermediate-voltage scanning transmission electron microscope(STEM) or transmission electron microscope(TEM) equipped with a scanning electron microscope(SEM) unit has been developed. The FIB system is used for preparation of electron transparent thin samples, while STEM or TEM is used for localization of a specific site to be milled in the FIB system. An FIB-STEM(TEM) compatible sample holder has been developed to facilitate thin sample preparation with high positional accuracy Positional accuracy of $0.1{\mu}m$ or better can be achieved by the technique. In addition, an FIB micro-sampling technique has been developed to extract a small sample directly from a bulk sample in a FIB system These newly developed techniques were applied for the analysis of specific failure in Si devices and also for characterization of a specific precipitate In a metal sample.

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Production and Properties of Amorphous TiCuNi Powders by Mechanical Alloying and Spark Plasma Sintering

  • Kim, J.C.;Kang, E.H.;Kwon, Y.S.;Kim, J.S.;Chang, Si-Young
    • Journal of Powder Materials
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    • v.17 no.1
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    • pp.36-43
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    • 2010
  • In present work, amorphous TiCuNi powders were fabricated by mechanical alloying process. Amorphization and crystallization behaviors of the TiCuNi powders during high-energy ball milling and subsequent microstructure changes were studied by X-ray diffraction and transmission electron microscope. TEM samples were prepared by the focused ion beam technique. The morphology of powders prepared with different milling times was observed by field-emission scanning electron microscope and optical microscope. The powders developed a fine, layered, homogeneous structure with milling times. The crystallization behavior showed that glass transition, $T_g$, onset crystallization, $T_x$, and super cooled liquid range ${\Delta}T=T_x-T_g$ were 628, 755 and 127K, respectively. The as-prepared amorphous TiCuNi powders were consolidated by spark plasma sintering process. Full densified TiCuNi samples were successfully produced by the spark plasma sintering process. Crystallization of the MA powders happened during sintering at 733K.

Nano-Resolution Connectomics Using Large-Volume Electron Microscopy

  • Kim, Gyu Hyun;Gim, Ja Won;Lee, Kea Joo
    • Applied Microscopy
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    • v.46 no.4
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    • pp.171-175
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    • 2016
  • A distinctive neuronal network in the brain is believed to make us unique individuals. Electron microscopy is a valuable tool for examining ultrastructural characteristics of neurons, synapses, and subcellular organelles. A recent technological breakthrough in volume electron microscopy allows large-scale circuit reconstruction of the nervous system with unprecedented detail. Serial-section electron microscopy-previously the domain of specialists-became automated with the advent of innovative systems such as the focused ion beam and serial block-face scanning electron microscopes and the automated tape-collecting ultramicrotome. Further advances in microscopic design and instrumentation are also available, which allow the reconstruction of unprecedentedly large volumes of brain tissue at high speed. The recent introduction of correlative light and electron microscopy will help to identify specific neural circuits associated with behavioral characteristics and revolutionize our understanding of how the brain works.

Applications of Focused Ion Beam for Biomedical Research (의생물 연구 분야에서 집속이온빔장치의 응용)

  • Kim, Ki-Woo;Baek, Saeng-Geul;Park, Byung-Joon;Kim, Hyun-Wook;Rhyu, Im-Joo
    • Applied Microscopy
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    • v.40 no.4
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    • pp.177-183
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    • 2010
  • A focused ion beam (FIB) system produces a beam of positive ions (usually gallium) which are heavier than electrons and can be focused by electrostatic lenses into a spot on the specimen. With its ability milling of the specimen material by 10 to 100 nm with each pass of the beam, FIB is widely adopted in materials science, semiconductor industry, and ceramics research. Recently, FIB has been increasingly employed in the field of biomedical sciences. Here we provide a brief introduction to FIB and its applications for a wide variety of biomedical research. The surface of specimen can be in situ processed and quasi-real time visualized by two beam combination of FIB and field emission scanning electron microscope (FESEM). Due to its milling process, internal structures can be exposed and analyzed: yeast cells, fungus-inoculated wheat leaf, mannitol particles in inhalation aerosols, and oyster shell. Serial blockface tomography with the system kindles 3-dimensional reconstruction researches in the realm of nervous system and life sciences. Two-beam system of FIB/FESEM is a versatile tool to be utilized in the biomedical sciences, especially in 3-dimensional reconstruction studies.

Fabrication of Plasmon Subwavelength Nanostructures for Nanoimprinting

  • Cho, Eun-Byurl;Yeo, Jong-Souk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.247-247
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    • 2012
  • Plasmon subwavelength nanostructures enable the structurally modulated color due to the resonance conditions for the specific wavelength range of light with the nanoscale hole arrays on a metal layer. While the unique properties offered from a single layer of metal may open up the potential applications of integrated devices to displays and sensors, fabrication requirements in nanoscale, typically on the order of or smaller than the wavelength of light in a corresponding medium can limit the cost-effective implementation of the plasmonic nanostructures. Simpler nanoscale replication technologies based on the soft lithography or roll-to-roll nanoimprinting can introduce economically feasible manufacturing process for these devices. Such replication requires an optimal design of a master template to produce a stamp that can be applied for a roll-to-roll nanoimprinting. In this paper, a master mold with subwavelength nanostructures is fabricated and optimized using focused ion beam for the applications to nanoimprinting process. Au thin film layer is deposited by sputtering on a glass that serves as a dielectric substrate. Focused ion beam milling (FIB, JEOL JIB-4601F) is used to fabricate surface plasmon subwavelength nanostructures made of periodic hole arrays. The light spectrum of the fabricated nanostructures is characterized by using UV-Vis-NIR spectrophotometer (Agilent, Cary 5000) and the surface morphology is measured by using atomic force microscope (AFM, Park System XE-100) and scanning electron microscope (SEM, JEOL JSM-7100F). Relationship between the parameters of the hole arrays and the corresponding spectral characteristics and their potential applications are also discussed.

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Design and Measurement of Nano-pattern for FIB Reliability Assessment (FIB 신뢰성 평가를 위한 나노패턴의 설계 및 측정)

  • Kang Hyun-Wook;Lee Seung-Jae;Cho Dong-Woo
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2005.05a
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    • pp.24-29
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    • 2005
  • Fm (Focused ion beam) system is one of the most important equipments for the nano-scale machining. Various researches have been performed, since it can etch the material and deposit 3-D structure with high-aspect-ratio in the nanometer scale. In spite of those researches, the definite method for the reliability of FIB system has not been reported. In this paper, we proposed the reliability assessment method through nano-pattern fabrication. In the fabricated nano-pattern, the characteristics of FIB system are included. Using this effect, we tried to assess the FIB reliability. First, we suggested reliability assessment items and nano-patterns. And, to know the suitableness of the proposed method, we fabricated several nano-patterns using Nova200(FEI Company) and SMI2050(SEIKO) which are FIB apparatuses. The fabricated nano-patterns are measured with SEM (Scanning Electron Microscope) and compared with designed dimensions. And the compared results showed that the proposed method is suitable for the assessment of FIB system reliability.

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