• Title/Summary/Keyword: Focused Beam

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Preliminary Experiments of Laser Induced Shock Phenomena (광열고압 충격현상에 대한 예비 실험)

  • Kim, Sun-Cheol;Choi, Yoon-Soo;Han, Chung-Kyu;Cho, Kyung-Ho;Kim, Hyoung-Won
    • Journal of the Korea Institute of Military Science and Technology
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    • v.14 no.6
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    • pp.1171-1177
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    • 2011
  • A high power laser beam focused on a small area accelerates a thin material that flies and hits other target material in which a shock wave may be induced. This laser induced shock experimental method is more repeatable and cheaper but worse than other experimental method using gas gun or other apparatus. An optical system including a phase zone plate reduces the interference and also makes the focused-beam-intensity distribution uniform. We wrote a computer code that calculates light ray traces. Using the code we designed and fabricated an optical system including a phase zone plate and improved the laser-beam uniformity. We introduce preliminary experimental results of laser induced shock of the samples such as aluminum and other materials.

Preparation Method of Plan-View Transmission Electron Microscopy Specimen of the Cu Thin-Film Layer on Silicon Substrate Using the Focused Ion Beam with Gas-Assisted Etch

  • Kim, Ji-Soo;Nam, Sang-Yeol;Choi, Young-Hwan;Park, Ju-Cheol
    • Applied Microscopy
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    • v.45 no.4
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    • pp.195-198
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    • 2015
  • Gas-assisted etching (GAE) with focused ion beam (FIB) was applied to prepare plan-view specimens of Cu thin-layer on a silicon substrate for transmission electron microscopy (TEM). GAE using $XeF_2$ gas selectively etched the silicon substrate without volume loss of the Cu thin-layer. The plan-view specimen of the Cu thin film prepared by FIB milling with GAE was observed by scanning electron microscopy and $C_S$-corrected high-resolution TEM to estimate the size and microstructure of the TEM specimen. The GAE with FIB technique overcame various artifacts of conventional FIB milling technique such as bending, shrinking and non-uniform thickness of the TEM specimens. The Cu thin film was uniform in thickness and relatively larger in size despite of the thickness of <200 nm.

Micro-machining Characteristics using Focused Ion Beam (집속이온빔에 의한 미세가공 특성)

  • 이종항;박철우;이상조
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.636-639
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    • 2003
  • It is difficult to machine below 10 micrometers by conventional machining methods, such as micro-EDM. However, ultra micro machining using focused ion beam(FIB) is able to machine to 50 nanometers. In addition, 3 dimensional structures can be made by a combination of FIB and CVD to the level of 10 nanometers. Die & moulds techniques are better than one-to-one machining techniques in the mass production of ultra size structures, in regards to production costs. In this case, the machining precision of die & moulds affects produced parts. Also, it is advantageous to machine die & moulds to the 10 micrometer level by FIB technique rather than other techniques. In this paper, the grooving characteristics for die & mould materials by FIB were carried out experimentally in order to compare the machining characteristics of FIB with conventional machining methods. The results showed that the machining parameters and the scanning path of FIB affects the precision. The machined width and depth of the groove varied depending on the required depth due to the redeposition of the sputtered ion material accumulating on both the bottom and the side of the wall.

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Secondary Electron Emission Characteristics of Functional Layer in AC-PDP

  • Son, Chang-Gil;Han, Young-Gyu;Kim, Yong-Hee;Cho, Byeong-Seong;Hong, Young-Jun;Song, Ki-Baek;Bae, Young-Joo;Kim, In-Tae;Choi, Eun-Ha
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.736-739
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    • 2009
  • We have studied that the secondary electron emission characteristics of functional layers which have different kinds of MgO sub-micrometer size powder in AC-PDP. We used cathodoluminescence(CL) and gamma focused ion beam (${\gamma}$-FIB) system for measurement of secondary electron emission characteristics. Also we made 6 inch test panel which applied functional layers for evaluation of discharge characteristics.

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Measurement of ion induced secondary electron emission $coefficient({\gamma})$ and work function of vacuum annealed MgO protective layer in AC PDP

  • Lim, J.Y.;Jeong, H.S.;Park, W.B.;Oh, J.S.;Jeong, J.M.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.799-801
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    • 2003
  • The secondary electron emission $coefficient({\bullet})$ of vacuum annealed MgO films has been investigated by ${\bullet}$ -focused ion beam(${\bullet}$ -FIB) system. The vacuum annealed MgO films have been found to have higher ${\bullet}$ values than those for as-deposited MgO films for Ne+ ion. Also it is found that the ${\bullet}$ for air-hold of vacuum annealed MgO layers for 24-hours is similar to that for vacuum annealed MgO films without any air-hold.

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Laser Beam Shaping Using Hollow Optical Fiber and Its Application in Laser Induced Thermal Printing

  • Yi, Jong-Hoon;Lee, Kang-In;Park, Ill-Hyun;Kwon, Jin-Hyuk
    • Journal of the Optical Society of Korea
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    • v.13 no.1
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    • pp.146-151
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    • 2009
  • A Gaussian beam of single mode fiber laser was changed into a ring-shaped pattern after it was transmitted through the hollow optical fiber. The ring-shaped beam was focused on a plane by an f-. lens and it was scanned by a Galvano-mirror. The spatial profile of laser energy incident on a plane had two peaks at both sides of the scanned linear track. The profile was compared with the result obtained when the Gaussian beam was dithered transversely by an acousto-optic modulator. It is found that hollow optical fiber beam shaper can replace acousto-optic beam dithering device which is employed in a laser induced thermal printing system.

Calculations of the Trapping Force of Optical Tweezers using FDTD Method (FDTD 방법을 이용한 광집게의 포획 힘 계산)

  • Sung, Seung-Yong;Lee, Yong-Gu
    • Korean Journal of Optics and Photonics
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    • v.19 no.1
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    • pp.80-83
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    • 2008
  • Optical tweezers are a tool that can use a tightly focused laser beam to trap and manipulate micron-sized dielectric particles that are immersed in a medium with lower refractive index. In this paper, the calculation of the trapping force of optical tweezers is presented. A nonparaxial Gaussian beam is used to represent a tightly focused Gaussian beam, and the FDTD (Finite-Difference Time-Domain) method is used for computing the electromagnetic field distributions in the dielectric medium. Scattered-field formulation is used for analytical expression of the incident fields. Using the electromagnetic field distribution from FDTD simulation, the trapping force is calculated based on Maxwell's stress tensor.