• 제목/요약/키워드: Fluorinated surface

검색결과 96건 처리시간 0.029초

F16CuPc를 이용한 FET의 전기적 특성 연구 (Electrical Properties of FET using F16CuPc)

  • 이호식;박용필
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.504-505
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    • 2008
  • We fabricated organic field-effect transistors (OFETs) based a fluorinated copper phthalocyanine ($F_{16}CuPc$) as an active layer. And we observed the surface morphology of the $F_{16}CuPc$ thin film. The $F_{16}CuPc$ thin film thickness was 40nm, and the channel length was $50{\mu}m$, channel width was 3mm. We observed the typical current-voltage (I-V) characteristics and capacitance-voltage (C-V) in $F_{16}CuPc$ FET and we calculated the effective mobility.

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The Effects of CF4 Partial Pressure on the Hydrophobic Thin Film Formation on Carbon Steel by Surface Treatment and Coating Method with Linear Microwave Ar/CH4/CF4 Plasma

  • Han, Moon-Ki;Cha, Ju-Hong;Lee, Ho-Jun;Chang, Cheol Jong;Jeon, Chang Yeop
    • Journal of Electrical Engineering and Technology
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    • 제12권5호
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    • pp.2007-2013
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    • 2017
  • In order to give hydrophobic surface properties on carbon steel, the fluorinated amorphous carbon films were prepared by using linear 2.45GHz microwave PECVD device. Two different process approaches have been tested. One is direct deposition of a-C:H:F films using admixture of $Ar/CH_4/CF_4$ working gases and the other is surface treatment using $CF_4$ plasma after deposition of a-C:H film with $Ar/CH_4$ binary gas system. $Ar/CF_4$ plasma treated surface with high $CF_4$ gas ratio shows best hydrophobicity and durability of hydrophobicity. Nanometer scale surface roughness seems one of the most important factors for hydrophobicity within our experimental conditions. The properties of a-C:H:F films and $CF_4$ plasma treated a-C:H films were investigated in terms of surface roughness, hardness, microstructure, chemical bonding, atomic bonding structure between carbon and fluorine, adhesion and water contact angle by using atomic force microscopy (AFM), nano-indentation, Raman analysis and X-ray photoelectron spectroscopy (XPS).

$CaNi_{5}$ 및 MG-$CaNi_{5}$ 전극의 퇴화거동에 미치는 불화처리의 영향 (The Effect of F-treatment on the Degradation Behavior of the $CaNi_{5}$ and MG-$CaNi_{5}$ Electrodes)

  • 이창래;오세진;강성군
    • 한국재료학회지
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    • 제9권6호
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    • pp.622-629
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    • 1999
  • Effects of the fluorination in the $K_2$TiF\ulcorner solution and in-situ KF+ KOH electrolyte on the electrochemical charge-discharge properties of CaNi\ulcorner and the Mg-CaNi\ulcorner electrodes were investigated. In-situ fluorination in the KF+ KOH electrolyte compared with pre-fluorination in the$ K_2$TiF\ulcorner solution could improve the electrochemical cycling durability of CaNi\ulcorner and MG-CaN\ulcorner electrodes. The fluorinated layer on the alloy surface by pre-fluorination to improve the activity and anti-corrosion of the electrodes was dissolved in the pure KOH electrolyte during the cycling. The fluorinated layer was formed continuously on the surface of the electrode by thee2N KF addition in the 6N KOH electrolyte. The excess F\ulcorner ion addition in KOH electrolyte could improve the electrochemical cycling durability of CaNi\ulcorner and Mg-CaNi\ulcorner electrode. But, in case of MG-CaNi\ulcorner electrode, the discharge capacity of the electrode was reduced and the poor cycling property was shown with increasing of the MG process times.

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Atmospheric Plasma Spray코팅을 이용한 Yttrium계 소재의 내플라즈마성 및 세정 공정에 관한 연구 (A Study on Plasma Corrosion Resistance and Cleaning Process of Yttrium-based Materials using Atmospheric Plasma Spray Coating)

  • 권혁성;김민중;소종호;신재수;정진욱;맹선정;윤주영
    • 반도체디스플레이기술학회지
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    • 제21권3호
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    • pp.74-79
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    • 2022
  • In this study, the plasma corrosion resistance and the change in the number of contamination particles generated using the plasma etching process and cleaning process of coating parts for semiconductor plasma etching equipment were investigated. As the coating method, atmospheric plasma spray (APS) was used, and the powder materials were Y2O3 and Y3Al5O12 (YAG). There was a clear difference in the densities of the coatings due to the difference in solubility due to the melting point of the powdered material. As a plasma environment, a mixed gas of CF4, O2, and Ar was used, and the etching process was performed at 200 W for 60 min. After the plasma etching process, a fluorinated film was formed on the surface, and it was confirmed that the plasma resistance was lowered and contaminant particles were generated. We performed a surface cleaning process using piranha solution(H2SO4(3):H2O2(1)) to remove the defect-causing surface fluorinated film. APS-Y2O3 and APS-YAG coatings commonly increased the number of defects (pores, cracks) on the coating surface by plasma etching and cleaning processes. As a result, it was confirmed that the generation of contamination particles increased and the breakdown voltage decreased. In particular, in the case of APS-YAG under the same cleaning process conditions, some of the fluorinated film remained and surface defects increased, which accelerated the increase in the number of contamination particles after cleaning. These results suggest that contaminating particles and the breakdown voltage that causes defects in semiconductor devices can be controlled through the optimization of the APS coating process and cleaning process.

초고진공 프로세스에 의해 제작된 A/CaF2/Diamond MISFET의 개선된 전기적 특성과 인버터회로에의 응용 (Highly Improved Electrical Properties of A1/CaF2/Diamond MISFET Fabricated by Ultrahigh Vacuum Process and Its Application to Inverter Circuit)

  • 윤영
    • 한국전자파학회논문지
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    • 제14권5호
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    • pp.536-541
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    • 2003
  • 본 논문에서는 다이아몬드 표면에의 산소흡착을 억제함으로써 양호한 전기적특성을 가지는 다이아몬드 MISFET를 제작하기 위해 초고진공 프로세스(ultrahigh vacuum process)에 의해 A1/Ca $F_2$/diamond MISFET를 제작하였다. 박막반도체 다이아몬드의 표면도전층으로서는 불소종단에 의해 형성되는 표면 도전층을 이용하였다. 초고진공 프로세스에 의해 제작된 A1/Ca $F_2$/diamond MISFET로부터 상용화된 실리콘 MOSFET와 동등한 레벨인~$10^{11}$ /$cm^2$ eV의 저농도의 표면준위밀도가 관측되었고, 유효이동도 $\mu$ $e_{ff}$ 는 이제까지 발표된 박막반도체 다이아몬드 FET중 최고치인 300 $cm^2$/Vs 이었다. 본 논문에서는 또한 초고진공 프로세스에 의해 제작된 Al/Ca $F_2$/diamond MISFET를 이용하여 인버터회로(inverter circuit)를 제작하였으며, 고온고주파 환경에서 양호한 전기적 특성을 관찰하였다. 본 논문의 특징은 초고진공 프로세스에 의해 제작된 불소화 다이아몬드 박막반도체 MISFET에 관한 최초의 보고이며, 또한 다이아몬드 박막반도체 MISFET의 인버터회로(inverter circuit)동작에 관한 최초의 보고이다.다.

불소화된 폴리우레탄의 합성과 표면특성 (Synthesis and Surface Properties of Fluorinated Polyurethanes)

  • 김형중
    • 폴리머
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    • 제25권1호
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    • pp.33-40
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    • 2001
  • 불소화된 폴리우레탄 탄성체를 4,4'-diphenyl methane diisocyanate(MDI) 혹은 toluene 2,4-diisocyanate(TDI) 같은 diisocyanate와 perfluorinated polyether(Fomblin $ZDOL^{\circledR}$)로부터 2단계 용액 중합법에 의해 합성하였다. 합성된 폴리우레탄의 soft segment 부분 중 10~50%를 Fomblin ZDOL 성분이 되도록 polypropylene glycol(PPG) 혹은 polytetramethylene glycol(PTMG)과 같은 polyether polyol을 반응도중에 혼합하여 반응을 완성하였다. 사슬연장제로는 ethylene diamine 혹은 1,4-butanediol을 사용하였다. 합성 중합체의 확인과 평균분자량 등 특성조사에 FT-IR, $1^H$-NMR, 겔투과 크로마토그래피(GPC), 시차주사열량계(DSC)를 이용하였고 표면특성은 X-ray photoelectron spectroscopy(XPS)와 접촉각으로 조사하였다. 표면분석결과 불소기는 합성된 탄성체 필름의 내면보다 표면에 더 많이 분포함을 알 수 있었다

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표면 개질을 통한 미생물합성 폴리에스테르의 효소분해속도 조절 (Control of Enzymatic Degradability of Microbial Polyester by Surface Modification)

  • 이원기
    • 한국환경과학회지
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    • 제11권12호
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    • pp.1315-1320
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    • 2002
  • Since the enzymatic degradation of microbial poly[(R)-3-hydroxybutyrate-co-3-hydroxyvalerate] (P(3HB-co-3HV)) initially occurs by a surface erosion process, a degradation behavior could be controlled by the change of surface property. In order to control the rate of enzymatic degradation, plasma gas discharge and blending techniques were used to modify the surface of microbial P(3HB-co-3HV). The surface hydrophobic property of P(3HB-co-3HV) film was introduced by CF$_3$H plasma exposure. Also, the addition of small amount of polystyrene as a non-degradable polymer with lower surface energy to P(3HB-co-3HV) has been studied. The enzymatic degradation was carried out at 37 $^{\circ}C$ in 0.1 M potassium phosphate buffer (pH 7.4) in the presence of an extracellular PHB depolymerase purified from Alcaligenes facalis T1. Both results showed the significant retardation of enzymatic erosion due to the hydrophobicity and the enzyme inactivity of the fluorinated- and PS-enriched surface layers.

표면불소화에 따른 Poly(phenylene oxide)막의 기체투과거동 연구 (Studies on the Gas Permeation Behaviors Using the Surface Fluorinated Poly(phenylene oxide) Membranes)

  • 이보성;김대훈;임지원
    • 멤브레인
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    • 제20권2호
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    • pp.106-112
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    • 2010
  • 본 연구에서는 poly(phenylene oxide) (PPO)의 막 표면에 100 ppm의 농도를 갖는 불소가스를 접촉시켜 표면불소화하였다. 표면 개질된 막의 특성을 알아보기 위하여 표면접촉각, XPS, 기체투과 실험을 수행하였다. 표면특성 분석 결과 불소처리 시간이 증가함에 따라 막 표면에 $-CF_2$, $-CF_3$의 perfluoro group의 결합으로 인해 막의 소수성이 증가함을 알 수 있었다. 기체투과 측정으로부터 불소화시간이 증가함에 따라 기체에 대한 투과도는 감소하였으며, 불소노출이 60분 경과한 막의 경우 질소 33%, 산소 23%, 이산화탄소 3%의 감소율을 나타내었다. 선택도의 경우 질소 대비 산소의 경우 3.92로부터 4.47로, 이산화탄소에 대한 질소의 경우 18.09에서 25.4로 증가함을 얻었다.

In vitro shear bond strength between fluorinated zirconia ceramic and resin cements

  • Tanis, Merve Cakirbay;Akay, Canan;Akcaboy, Turgut Cihan;Sen, Murat;Kavakli, Pinar Akkas;Sapmaz, Kadriye
    • The Journal of Advanced Prosthodontics
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    • 제10권3호
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    • pp.205-210
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    • 2018
  • PURPOSE. The purpose of this study was to evaluate the efficiency of a gas-phase fluorination method under different fluorination periods through using two resin cements. MATERIALS AND METHODS. 84 zirconia specimens in dimensions of $5mm{\times}5mm{\times}2mm$ were prepared and surface treated with $50{\mu}m$ aluminum oxide particles or gas phase fluorination for 2 min, 5 min, or 10 min. One specimen in each group was surface analyzed under scanning electron microscope. The remaining specimens were bonded to composite cylinders in dimensions of 2 mm diameter and 3 mm high with Panavia SA Plus or Variolink N. Then, the specimens were stored in $37^{\circ}C$ distilled water for 24 hours and shear bond strength test was applied at a speed of 1 mm/min. RESULTS. The highest shear bond strength values were observed in the samples fluorinated for 5 minutes and cemented with Panavia SA Plus. Variolink N did not elicit any statistical differences between surface treatments. Panavia SA Plus resin cement and Variolink N resin cements featured statistically significant difference in shear bond strength values only in the case of 5 minutes of fluorination treatment. CONCLUSION. According to the results of this study, application of 5 minutes of fluorination with 10-methacryloyloxydecyl dihydrogen phosphate monomer (MDP) containing Panavia SA Plus resin cement increased the resin bond strength of zirconia. Fluorination of the zirconia surface using conventional resin cement, Variolink N, did not lead to an increase in bond strength.

불소화 처리된 페놀계 활성탄소를 이용한 톨루엔 가스흡착 특성 (Adsorption Characteristics of Toluene Gas Using Fluorinated Phenol-based Activated Carbons)

  • 김민지;정민정;김민일;최석순;이영석
    • 공업화학
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    • 제26권5호
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    • pp.587-592
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    • 2015
  • 휘발성 유기화합물(Volatile organic compounds, VOCs) 중 톨루엔 가스의 흡착특성을 향상시키기 위하여 불소화 반응을 이용하여 활성탄소를 처리하였다. 이 활성탄소의 기공특성과 표면특성 평가를 위하여 비표면적 측정기와 X선광전자분광법(XPS)을 사용하여 분석하였고, 가스크로마토그래피를 이용하여 톨루엔 가스 흡착능과 제거효율을 고찰하였다. 100 ppm의 톨루엔 가스가 $300cm^3/min$으로 주입될 때, 불소화 처리된 활성탄소의 파과시간이 미처리 활성탄소에 비하여 약 27% 증가하였다. 0.1 g의 불소처리 활성탄소 흡착재는 19 h의 흡착시간 동안 100 ppm 농도의 톨루엔 가스를 모두 제거하였다. 이러한 실험 결과들은 톨루엔과 같은 발암성 물질을 제거하는 처리 기술로 활용될 수 있음을 보여주었다.