• 청정기술
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• 제18권4호
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• pp.410-418
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• 2012

선택적 촉매환원(selective catalytic reduction, SCR) 시스템에서 사용되는 환원제의 효용성을 극대화하기 위해 적용되는 암모니아주입관(ammonia injection gun, AIG) 성능은 유량의 분배, 공기분배다기관(air distribution manifold, ADM)의 배치 그리고 노즐의 배열 및 형상 등에 의해 영향을 받는다. 본 연구에서는 전산유체역학(computational fluid dynamics, CFD) 기법을 이용하여 AIG 성능의 지표가 되는 토출 유량 균일도를 통계적인 수치로 표현하여 관련된 설계인자들과 SCR 시스템의 성능 사이의 상관관계를 평가하고자 하였다. 관내 유동에서 일어나는 유체역학적인 현상의 영향으로 AIG에 대한 공급유량이 증가할 때 각 노즐에서의 토출 유량의 균일도는 감소하는 해석결과를 얻었으며 헤더로부터 가까울수록 분지관으로의 유량분배율이 낮아짐과 동시에 헤더에 가까운 노즐일수록 토출유량이 적어지는 현상을 파악하였다. 각 분지관에 대해 유입 면적대비 노즐의 총 면적비가 0.5 미만일 때 토출 유량의 균일도와 분지관의 유량분배가 매우 균일해지는 것으로 파악되었다.

• 한국전산구조공학회논문집
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• 제20권4호
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• pp.407-416
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• 2007

가스터빈에서 연료 분무 노즐은 연소 특성에 영향을 미치는 중요한 부품이다. 스월 분무 장치를 설계하기 위하여 유량과 분무액적 평균 직경을 설계변수로 정하고 연료 분무 노즐의 최적화를 수행하였다. 설계변수는 이중 노즐의 실험값들을 비교하여 중요한 영향을 미치는 변수로 선정하였다. 민감도는 유량과 분무액적 평균 직경의 변화에 따른 값을 사용하였다. 이중 오리피스형 스월 분무장치의 형상 최적설계를 통하여 유량의 미립화를 높이도록 연구하였다. 최적설계를 위하여 실험 계획법을 이용하였으며, 영향을 적게 미치는 설계변수들은 설계대상에서 제외하였다. 분무 노즐의 분무액적 평균 직경을 사용한 결과는 Jasuja의 액적 평균 이론을 이용하여 도출된 결과와 유사함을 알 수 있었다. 연구 결과는 이중 오리피스형스월 분무장치와 이와 비슷한 종류의 노즐 최적화를 위한 특성을 파악하고 최적의 유량과 허용 공차를 제시하였다.

• 대한기계학회논문집B
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• 제25권4호
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• pp.507-513
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• 2001

Time averaged pressure distributions in a high-speed centrifugal compressor channel diffuser at design and off-design flow rates are investigated. Pressure distributions from the impeller exit to the channel diffuser exit are measured for various flow rates from choke to near surge condition, and the effects of operating condition are discussed. The strong non-uniformity in the pressure distribution is obtained over the vaneless space and semi-vaneless space caused by the impeller-diffuser interaction. As the flow rate increases, flow separation near the throat, due to large incidence angle at the vane leading edge, increases aerodynamic blockage and reduces the aerodynamic flow area downstream. Thus the minimum pressure location occurs downstream of the geometric throat, and it is named as the aerodynamic throat. And at choke condition, normal shock occurs downstream of this aerodynamic throat. The variation in the location of the aerodynamic throat is discussed.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2000년도 춘계학술대회논문집B
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• pp.548-554
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• 2000

The aim of this paper is to understand the time averaged pressure distributions in a high-speed centrifugal compressor channel diffuser at design and off-design flow rates. Pressure distributions from the impeller exit to the channel diffuser exit are measured and discussed far various flow rates from choke to near surge condition, and the effect of operating condition is discussed. The strong non-uniformity in the pressure distribution is obtained over the vaneless space and semi-vaneless space caused by the impeller-diffuser interaction. As the flow rate increases, flow separation near the throat, due to large incidence angle at the vane leading edge, increases aerodynamic blockage and reduces the aerodynamic flow area downstream. Thus the minimum pressure location occurs downstream of the geometric throat, and it is named as the aerodynamic throat. And at choke condition, normal shock occurs downstream of this aerodynamic throat. The variation in the location of the aerodynamic throat is discussed.

• 대한기계학회논문집
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• 제18권3호
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• pp.662-669
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• 1994

In the combustion system, the optimum spray conditions reduce the pollutant emission of exhaust gas and enhance the fuel efficiency. The spray characteristics-the drop size, the drop velocity, the number density and the mass flux, become increasingly important in the design of combustor and in testifying numerical simulation of spray flow in the combustor. The purposes of this study are to clarify the spray characteristics of twin-fluid nozzle and to offer the data for combustor design and the numerical simulation of a spray flow. Spatial drop diameter was measured by immersion sampling method. The mean diameter, size distribution and uniformity of drop were analyzed with variations of air/liquid mass flow ratio. The results show that the SMD increases with the liquid supply flow rate and decreases with the air supply velocity. The radial distribution of SMD shows the larger drops can diffuse farther to the boundary of spray. And the drop size range is found to be wider close to the spray boundary where the maximum SMD locates.

• 한국전산유체공학회지
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• 제14권1호
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• pp.78-85
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• 2009

A combined theoretical and numerical study is conducted to design a slit nozzle for large-area liquid coating. The objectives are to guarantee the uniformity in the injected flow and to provide the capability of explicit control of flow rate. The woking fluid is a dilute aqueous solution containing single-walled carbon nanotubes and its low viscosity and the presence of dispersed materials pose technical hurdles. A theoretical analysis leads to a guideline for the geometric design of a slit nozzle. The CFD-based numerical experiment is employed as a verification tool. A new flow passage unit, connected to the nozzle chamber, is proposed to permit the control of flow rate by using the commodity pressurizer. The numerical results confirm the feasibility of this idea. The optimal geometry of internal structure of the nozzle has been searched for numerically and the related issues are discussed.

• 한국자동차공학회논문집
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• 제22권3호
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• pp.179-185
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• 2014

Average temperature and temperature uniformity in a battery cell are the important criteria of the thermal management of the battery pack for hybrid electric vehicles and electric vehicles (HEVs and EVs) because high power with large size cell is used for the battery pack. Thus, liquid cooling system is generally applied for the HEV/EV battery pack. The liquid cooling system is made of multiple cooling plates with coolant flow paths. The cooling plates are inserted between the battery cells to reject the heat from batteries to coolant. In this study, the cooling plate with U-shaped coolant flow paths is considered to evaluate the effects of coolant flow condition on the cooling performance of the system. The counter flow and parallel flow set up is compared and the effect of flow rate is evaluated using CFD tool (FLUENT). The number of counter-flows and flow rate are changed and the effect on the cooling performance including average temperature, differential temperature, and standard deviation of temperature are investigated. The results show that the parallel flow has better cooling performance compared with counter flow and it is also found that the coolant flow rate should be chosen with the consideration of trade-off between the cooling performance and pressure drop.

• Transactions on Electrical and Electronic Materials
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• 제12권2호
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• pp.56-59
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• 2011

The characterization of the chemical mechanical polishing (CMP) process for undensified phophosilicate glass (PSG) film is reported using design of experiments (DOE). DOE has been used by experimenters to understand the relationship between the input variables and responses of interest in a simple and efficient way, and it typically is beneficial for determining the appropriatesize of experiments with multiple process variables and making statistical inferences for the responses of interest. The equipment controllable parameters used to operate the machine consist of the down force of the wafer carrier, pressure on the back side wafer, table and spindle speeds (SS), slurry flow (SF) rate, pad condition, etc. None of these are independent ofeach other and, thus, the interaction between the parameters also needs to be understoodfor improved process characterization in CMP. In this study, we selected the five controllable equipment parameters the most recommendedby process engineers, viz. the down force (DF), back pressure (BP), table speed (TS), SS, and SF, for the characterization of the CMP process with respect to the material removal rate and film uniformity in percentage terms. The polished material is undensified PSG which is widely used for the plananization of multi-layered metal interconnects. By statistical modeling and the analysis of the metrology data acquired from a series of $2^{5-1}$ fractional factorial designs with two center points, we showed that the DF, BP and TS have the greatest effect on both the removal rate and film uniformity, as expected. It is revealed that the film uniformity of the polished PSG film contains two and three-way interactions. Therefore, one can easily infer that process control based on a better understanding of the process is the key to success in current semiconductor manufacturing, in which the size of the wafer is approaching 300 mm and is scheduled to continuously increase up to 450 mm in or slightly after 2012.

• 반도체디스플레이기술학회지
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• 제21권4호
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• pp.81-85
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• 2022

Mist-CVD is known to have advantages of low cost and high productivity method since the precursor solution is misting with an ultrasonic generator and reacted on the substrate under vacuum-free conditions of atmospheric pressure. However, since the deposition distribution is not uniform, various efforts have been made to derive optimal conditions by changing the angle of the substrate and the position of the outlet to improve the result of the preceding study. Therefore, in this study, a deposition distribution uniformity model was derived through the shape and position of the substrate support and the conditions of inlet flow rate using the particle tracking method of computational fluid dynamics (CFD). The results of analysis were compared with the previous studies through experiment. It was confirmed that the rate of deposition area was improved from 38.7% to 100%, and the rate of deposition uniformity was 79.07% which was higher than the predicted result of simulation. Particle tracking method can reduce trial and error in experiments and can be considered as a reliable prediction method.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.1068-1071
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• 2004

We report the techniques to obtain the high uniformity of the phosphor film thickness in the cold cathode fluorescent lamps, which are widely used as a back-light for the liquid crystal display. The thickness variation of the phosphor layer was sensitive to blowing conditions. The optimum conditions were obtained at flow rate of 15 sccm for 30 min at 40 $^{\circ}C$. The optimum and uniform thickness of a phosphor layer gives good luminous output.