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Computational Fluid Dynamics for Enhanced Uniformity of Mist-CVD Ga2O3 Thin Film  

Ha, Joohwan (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University)
Lee, Hakji (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University)
Park, Sodam (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University)
Shin, Seokyoon (Advanced Electronic Materials Laboratory, Advanced Institute of Convergence Technology, Seoul National University)
Byun, Changwoo (Research Center for Materials, Components and Equipment, Gyeonggi Province, Advanced Institute of Convergence Technology, Seoul National University)
Publication Information
Journal of the Semiconductor & Display Technology / v.21, no.4, 2022 , pp. 81-85 More about this Journal
Abstract
Mist-CVD is known to have advantages of low cost and high productivity method since the precursor solution is misting with an ultrasonic generator and reacted on the substrate under vacuum-free conditions of atmospheric pressure. However, since the deposition distribution is not uniform, various efforts have been made to derive optimal conditions by changing the angle of the substrate and the position of the outlet to improve the result of the preceding study. Therefore, in this study, a deposition distribution uniformity model was derived through the shape and position of the substrate support and the conditions of inlet flow rate using the particle tracking method of computational fluid dynamics (CFD). The results of analysis were compared with the previous studies through experiment. It was confirmed that the rate of deposition area was improved from 38.7% to 100%, and the rate of deposition uniformity was 79.07% which was higher than the predicted result of simulation. Particle tracking method can reduce trial and error in experiments and can be considered as a reliable prediction method.
Keywords
Power semiconductor; $Ga_2O_3$; Mist-CVD; CFD; Particle tracking; Droplet;
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