Optimization of the $POCI_3$ doping process according to the variation of deposition temperature, gas flow rate and doping time
(온도, 가스량 및 도핑시간변화에 따른 $POCI_3$ 도핑 공정의 최적화)
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- Electrical & Electronic Materials
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- v.7 no.3
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- pp.206-212
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- 1994