• Title/Summary/Keyword: Flow Uniformity

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Mixer design for improving the injection uniformity of the reduction agent in SCR system

  • Hwang, Woohyeon;Lee, Kyungok
    • Journal of the Korea Society of Computer and Information
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    • v.22 no.1
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    • pp.63-69
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    • 2017
  • In this paper, we propose a method to optimize the geometry and installation position of the mixer in the selective catalytic reduction (SCR) system by computational fluid dynamic(CFD). Using the commercial CFD software of CFD-ACE+, the flow dynamics of the flue gas was numerically analyzed for improving the injection uniformity of the reduction agent. Numerical analysis of the mixed gas heat flow into the upstream side of the primary SCR catalyst layer was performed when the denitrification facility was operated. The characteristics such as the flow rate, temperature, pressure loss and ammonia concentration of the mixed gas consisting of the flue gas and the ammonia reducing gas were examined at the upstream of the catalyst layer of SCR. The temperature difference on the surface of the catalyst layer is very small compared to the flow rate of the exhaust gas, and the temperature difference caused by the reducing gas hardly occurs because the flow rate of the reducing gas is very small. When the mixed gas is introduced into the SCR reactor, there is a slight tendency toward one wall. When the gas passes through the catalyst layer having a large pressure loss, the flow angle of the exhaust gas changes because the direction of the exhaust gas changes toward a smaller flow. Based on the uniformity of the flow rate of the mixed gas calculated at the SCR, it is judged that the position of the test port reflected in the design is proper.

Study on Correlation Between the Internal Pressure Distribution of Slit Nozzle and Thickness Uniformity of Slit-coated Thin Films (슬릿 노즐 내부 압력 분포와 코팅 박막 두께 균일도 간의 상관관계 연구)

  • Gieun Kim;Jeongpil Na;Mose Jung;Jongwoon Park
    • Journal of the Semiconductor & Display Technology
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    • v.22 no.4
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    • pp.19-25
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    • 2023
  • With an attempt to investigate the correlation between the internal pressure distribution of slit nozzle and the thickness uniformity of slot-coated thin films, we have performed computational fluid dynamics (CFD) simulations of slit nozzles and slot coating of high-viscosity (4,800 cPs) polydimethylsiloxane (PDMS) using a gantry slot-die coater. We have calculated the coefficient of variation (CV) to quantify the pressure and velocity distributions inside the slit nozzle and the thickness non-uniformity of slot-coated PDMS films. The pressure distribution inside the cavity and the velocity distribution at the outlet are analyzed by varying the shim thickness and flow rate. We have shown that the cavity pressure uniformity and film thickness uniformity are enhanced by reducing the shim thickness. It is addressed that the CV value of the cavity pressure that can ensure the thickness non-uniformity of less than 5% is equal to and less than 1%, which is achievable with the shim thickness of 150 ㎛. It is also found that as the flow rate increases, the average cavity pressure is increased with the CV value of the pressure unchanged and the maximum coating speed is increased. As the shim thickness is reduced, however, the maximum coating speed and flow rate decrease. The highly uniform PDMS films shows the tensile strain as high as 180%, which can be used as a stretchable substrate.

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About the Shape Optimization of Ex-Manifold Diffuser (배기 매니폴드 확관부 형상 최적화에 관하여)

  • Jo, Sok-Hyun
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.28 no.9
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    • pp.1133-1138
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    • 2004
  • Shape optimization method was coupled with a conventional CFD analysis to find the optimal shape of ex-manifold diffuser which decreases the maldistribution of flow above the catalyst. Shape optimization results show that flow uniformity above the catalyst was increased about 28% fur the axi-symmetric case and about 18% for the asymmetric case. The axi-symmetric type can be applied to the diffuser of under floor catalyst and the asymmetric type can be applied to the diffuser of close coupled catalyst.

Properties of AlSi etching using the MERIE type reactor (MERIE형 반응로를 이용한 AlSi의 식각 특성)

  • 김창일;김태형;장의구
    • Electrical & Electronic Materials
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    • v.9 no.2
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    • pp.188-195
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    • 1996
  • The AlSi etching process using the MERIE type reactor carried out with different process parameters such as C1$_{2}$ and N$_{2}$ gas flow rate, RF power and chamber pressure. The etching characteristics were evaluated in terms of etch rate, selectivity, uniformity and etched profile. As the N2 gas flow rate is increased, the AlSi etch rate is decreased and uniformity has remained constant within .+-.5%. The etch rate is increased and uniformity is decreased, according to increment of the C1$_{2}$ gas flow rate, RF power and chamber pressure. Selective etching of TEOS with respect to AlSi is decreased as the RF power is increased while it is increased by increment of the C1$_{2}$ gas flow rate and chamber pressure, on the other hand, selective etching of photoresist with respect to AlSi is increased by increment of the C1$_{2}$ gas flow rate and chamber pressure, it is decreased as the N$_{2}$ gas flow rate is increased.

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An Optimized Analysis of the Optimal Flow Uniformity in SCR Facility for Small-and Mid-Sized CHPs (중소형 열병합 발전용 SCR 장치의 유동 균일화를 위한 전산유체해석 최적화 연구)

  • Lee, Sang-Hwan;Shin, Sang-Woo;Kim, Jung-Sub
    • Plant Journal
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    • v.9 no.3
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    • pp.48-52
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    • 2013
  • In this study, the internal flow field of SCR Denitrification Plant was simulated by using Computational Fluid Dynamics(CFD). In order to analyze the uniformity of flow field, an interpretation on the pre-existing facilities was performed, and some moot points were identified and compensated through this analysis. The compensatory methods include the installation of the Porous Plate below the bottom of the Baffle to create uniform flow and also, and the Guide Vane was also placed in the bend of pipe to guide the flow uniformly. Lastly, the Baffle was installed to deduct equalized space distribution of the air flow, initially flowed into the SCR Plant.

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A Study to Improve Temperature Uniformity in Hot Plate Oven for Silicon Wafer Manufacturing (반도체 웨이퍼용 핫 플레이트 오븐에서 온도 균일도 향상을 위한 연구)

  • Lee, Sei-Young;Cho, Hyung-Hee;Lee, Young-Won
    • Proceedings of the KSME Conference
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    • 2000.11b
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    • pp.261-266
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    • 2000
  • Temperature variation during silicon wafer baking is mainly due to natural convection caused by temperature difference between silicon wafer and upper plate. Several cases are tested and calculated numerically to improve temperature uniformity. The temperature difference and velocity magnitude in the flow cell is reduced for a small gap between the wafer and upper plate because the natural convection force is suppressed in the small space. The uniform temperature distribution can be obtained with controling the incoming flow distribution from the upper plate. An alternative method is the adiabatic wall condition on the upper plate to maintain the temperature uniformity within $0.3^{\circ}C$ on the water plate.

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An Experimental Study on the Flow Stabilization in the Downstream Region of a Butterfly-Type Valve (버터플라이 밸브 하류 유동의 안정화에 관한 연구)

  • Park, Sang-Won;Lee, Sang-U
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.24 no.11
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    • pp.1417-1427
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    • 2000
  • A flow stabilizer, which is made of a honeycomb and three different mesh screens, is located downstream of a butterfly-type valve, for the reduction of flow disturbances behind the valve. Mean flow and turbulence measurements as well as flow visualizations are conducted in the downstream region of the deepens the non-uniformity of the streamwise velocity component and turbulence. The mesh screens considerably reduce the turbulence and enhance the uniformity of mean velocities. The combination of the honeycomb and the three mesh screens results in an efficient reduction in the flow disturbances. In addition, the flow stabilizer proves to have a good performance in the suppression of turbulence at a short distance.

An Effect of Cone Type Circular Ring on the Flow Distribution in Catalytic Converter (원추 환형링이 촉매변환기내의 유동분포에 미치는 영향)

  • 이철구;이은호;유재석;목재균;황석렬
    • Transactions of the Korean Society of Automotive Engineers
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    • v.9 no.3
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    • pp.76-83
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    • 2001
  • An experimental investigation has been performed on the steady flow in exhaust system. When individual flow coming from exhaust manifold entered UCC, the inlet conditions at entry to the diffuser in UCC were affected by the upstream pipe and manifold works. But those effects of the inlet condition on flow through monolith are negligible because the flows are concentrated on the center of monolith regardless of inlet flow distribution. To improve the flow distribution, we installed the cone type circular ring in diffuser of UCC. This led to increasement of flow uniformity, but there was minor increment of pressure drop.

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Numerical Analysis on the Pressure Characteristic and Flow Uniformity in a Ceramic Catalytic Converter for Motorcycle (2륜 자동차용 세라믹 촉매변환기내 압력특성과 유동균일도에 관한 수치해석)

  • Yi, Chung-Seub;Lee, Yonghun;Jeong, Hyomin;Chung, Han-Shik
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.31 no.4
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    • pp.376-383
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    • 2007
  • This research represents the catalytic converter for application in the motorcycle. We have to consider about catalytic converter for reducing exhaust gas strength regarding the displacement volume enlargement. The catalytic converter has been widely used to satisfy the regulations of pollutant emissions from automobiles. Recently, all catalytic converter researches are about automobile. Study about motorcycle catalytic converter has not been conducted yet. In this study, flow uniformity and pressure distribution were simulated in the monolithic inlet of catalytic converter for motorcycle. Exhaust pulsation pressure was set as transient condition about. It was found that flow uniformity shown in base model (0.85) was lower than megaphone model (0.98).