• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
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• pp.2153-2155
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• 2005

SF6 &NF3 chemistry를 사용하여 W bitline process 조건에서 plasma confinement 및 gas & radical의 flow에 영향을 미치는 focus ring 재질과 두께변경을 하여 Rnit non uniformity 평가한다.

• 한국컴퓨터정보학회논문지
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• 제22권1호
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• pp.63-69
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• 2017

In this paper, we propose a method to optimize the geometry and installation position of the mixer in the selective catalytic reduction (SCR) system by computational fluid dynamic(CFD). Using the commercial CFD software of CFD-ACE+, the flow dynamics of the flue gas was numerically analyzed for improving the injection uniformity of the reduction agent. Numerical analysis of the mixed gas heat flow into the upstream side of the primary SCR catalyst layer was performed when the denitrification facility was operated. The characteristics such as the flow rate, temperature, pressure loss and ammonia concentration of the mixed gas consisting of the flue gas and the ammonia reducing gas were examined at the upstream of the catalyst layer of SCR. The temperature difference on the surface of the catalyst layer is very small compared to the flow rate of the exhaust gas, and the temperature difference caused by the reducing gas hardly occurs because the flow rate of the reducing gas is very small. When the mixed gas is introduced into the SCR reactor, there is a slight tendency toward one wall. When the gas passes through the catalyst layer having a large pressure loss, the flow angle of the exhaust gas changes because the direction of the exhaust gas changes toward a smaller flow. Based on the uniformity of the flow rate of the mixed gas calculated at the SCR, it is judged that the position of the test port reflected in the design is proper.

• 반도체디스플레이기술학회지
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• 제22권4호
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• pp.19-25
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• 2023

With an attempt to investigate the correlation between the internal pressure distribution of slit nozzle and the thickness uniformity of slot-coated thin films, we have performed computational fluid dynamics (CFD) simulations of slit nozzles and slot coating of high-viscosity (4,800 cPs) polydimethylsiloxane (PDMS) using a gantry slot-die coater. We have calculated the coefficient of variation (CV) to quantify the pressure and velocity distributions inside the slit nozzle and the thickness non-uniformity of slot-coated PDMS films. The pressure distribution inside the cavity and the velocity distribution at the outlet are analyzed by varying the shim thickness and flow rate. We have shown that the cavity pressure uniformity and film thickness uniformity are enhanced by reducing the shim thickness. It is addressed that the CV value of the cavity pressure that can ensure the thickness non-uniformity of less than 5% is equal to and less than 1%, which is achievable with the shim thickness of 150 ㎛. It is also found that as the flow rate increases, the average cavity pressure is increased with the CV value of the pressure unchanged and the maximum coating speed is increased. As the shim thickness is reduced, however, the maximum coating speed and flow rate decrease. The highly uniform PDMS films shows the tensile strain as high as 180%, which can be used as a stretchable substrate.

• 대한기계학회논문집B
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• 제28권9호
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• pp.1133-1138
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• 2004

Shape optimization method was coupled with a conventional CFD analysis to find the optimal shape of ex-manifold diffuser which decreases the maldistribution of flow above the catalyst. Shape optimization results show that flow uniformity above the catalyst was increased about 28% fur the axi-symmetric case and about 18% for the asymmetric case. The axi-symmetric type can be applied to the diffuser of under floor catalyst and the asymmetric type can be applied to the diffuser of close coupled catalyst.

• E2M - 전기 전자와 첨단 소재
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• 제9권2호
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• pp.188-195
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• 1996

The AlSi etching process using the MERIE type reactor carried out with different process parameters such as C1$_{2}$ and N$_{2}$ gas flow rate, RF power and chamber pressure. The etching characteristics were evaluated in terms of etch rate, selectivity, uniformity and etched profile. As the N2 gas flow rate is increased, the AlSi etch rate is decreased and uniformity has remained constant within .+-.5%. The etch rate is increased and uniformity is decreased, according to increment of the C1$_{2}$ gas flow rate, RF power and chamber pressure. Selective etching of TEOS with respect to AlSi is decreased as the RF power is increased while it is increased by increment of the C1$_{2}$ gas flow rate and chamber pressure, on the other hand, selective etching of photoresist with respect to AlSi is increased by increment of the C1$_{2}$ gas flow rate and chamber pressure, it is decreased as the N$_{2}$ gas flow rate is increased.

• 플랜트 저널
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• 제9권3호
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• pp.48-52
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• 2013

본 연구에서는 전산유체해석(CFD)을 통하여 SCR 탈질설비 내부의 유동장 흐름을 전산모사하였다. 또한 유동장의 균일도를 분석하기 위해 기존 설비에 대한 해석을 수행하였으며 이를 통해 문제점을 도출하고 개선하였다. 개선방안으로는 곡관에 guide vane을 설치하여 곡관상에 기류를 균일하게 안내해 주었으며, baffle을 설치하여 SCR설비로 초기 유입된 기류의 균일한 공간 분포를 도출하였다. 마지막으로 porous plate를 baffle 하단에 설치하여 균일류 형성의 최적화 모델을 도출하였다.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2000년도 추계학술대회논문집B
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• pp.261-266
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• 2000

Temperature variation during silicon wafer baking is mainly due to natural convection caused by temperature difference between silicon wafer and upper plate. Several cases are tested and calculated numerically to improve temperature uniformity. The temperature difference and velocity magnitude in the flow cell is reduced for a small gap between the wafer and upper plate because the natural convection force is suppressed in the small space. The uniform temperature distribution can be obtained with controling the incoming flow distribution from the upper plate. An alternative method is the adiabatic wall condition on the upper plate to maintain the temperature uniformity within $0.3^{\circ}C$ on the water plate.

• 대한기계학회논문집B
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• 제24권11호
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• pp.1417-1427
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• 2000

A flow stabilizer, which is made of a honeycomb and three different mesh screens, is located downstream of a butterfly-type valve, for the reduction of flow disturbances behind the valve. Mean flow and turbulence measurements as well as flow visualizations are conducted in the downstream region of the deepens the non-uniformity of the streamwise velocity component and turbulence. The mesh screens considerably reduce the turbulence and enhance the uniformity of mean velocities. The combination of the honeycomb and the three mesh screens results in an efficient reduction in the flow disturbances. In addition, the flow stabilizer proves to have a good performance in the suppression of turbulence at a short distance.

• 한국자동차공학회논문집
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• 제9권3호
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• pp.76-83
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• 2001

An experimental investigation has been performed on the steady flow in exhaust system. When individual flow coming from exhaust manifold entered UCC, the inlet conditions at entry to the diffuser in UCC were affected by the upstream pipe and manifold works. But those effects of the inlet condition on flow through monolith are negligible because the flows are concentrated on the center of monolith regardless of inlet flow distribution. To improve the flow distribution, we installed the cone type circular ring in diffuser of UCC. This led to increasement of flow uniformity, but there was minor increment of pressure drop.

• 대한기계학회논문집B
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• 제31권4호
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• pp.376-383
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• 2007

This research represents the catalytic converter for application in the motorcycle. We have to consider about catalytic converter for reducing exhaust gas strength regarding the displacement volume enlargement. The catalytic converter has been widely used to satisfy the regulations of pollutant emissions from automobiles. Recently, all catalytic converter researches are about automobile. Study about motorcycle catalytic converter has not been conducted yet. In this study, flow uniformity and pressure distribution were simulated in the monolithic inlet of catalytic converter for motorcycle. Exhaust pulsation pressure was set as transient condition about. It was found that flow uniformity shown in base model (0.85) was lower than megaphone model (0.98).