• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.933-936
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• 2007

An inductively coupled plasma source with internaltype linear inductive antennas named as "multiple Utype antenna" was developed for the substrate size of $2,300mm\;{\times}\;2,000mm$. High density plasmas on the order of $1.18\;{\times}\;10^{11}\;cm^{-3}$ could be obtained and the RF power of 8kW with good plasma stability.

• Journal of the Korean Vacuum Society
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• v.15 no.3
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• pp.241-245
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• 2006

In this study, the characteristics of large area internal linear ICP sources of 1020mm X 920mm(substrate area is 880 X 660mm) were investigated using two different types of antenna, that is, a conventional serpentine-type antenna and a newly developed multiple U-type antenna. The multiple antenna showed a higher plasma density, a higher radical density, and more plasma stability compared to the serpentine-type antenna, and it appeared from the higher inductively coupling and less standing wave effect compared to the serpentine-type antenna. Using the multiple U-type antenna, the plasma density of $2\times10^{11}/cm^3$ with the plasma uniformity of 4% could be obtained using 15mTorr Ar and 5000W of RF power.