• Journal of the Korean Society of Costume
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• v.56 no.7 s.107
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• pp.68-84
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• 2006

The aim of this study is to examine a structure of trousers worn by males in the western world during the 17th and 18th centuries in order to understand the characteristics of evolution in construction. it mainly examined engravings from these era because they provided me fine and detailed portrayals of what it needed to observe. Then, it classified them into models according to each era. it supplemented a flaw of depending on single type of studying material by examining other types of historical materials such as historical paintings and documents for comparative analysis of materials and decorations and previous studies on preserved historical documents to observe the examples of structures of trousers. Secondly, it studied both historical documents and previous studies on the trousers patterns used back in those days, analyzed the characteristics of each designing method by actually draping these patterns, and observed the differences in these completed patterns to understand the characteristics of changes in fashion design skill. As for the changes in length, these patterns show only a slight difference around above and below the knee line. However, the widths of waist, hip, girth and hem were significantly altered over the years to reduce wrinkles and the cutting lines became more refined to make the clothes fit to the body. As a result, a simple but fine patterning technique was born. In particular, new methods in cutting and sewing were invented for detailed parts such as waist, pocket, front and slit.

• International Journal of Precision Engineering and Manufacturing
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• v.9 no.1
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• pp.25-29
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• 2008

We introduce a new fabrication process for antireflective structured surfaces. A 4-inch silicon wafer was dipped in a suspension of 300-nm-diameter silica particles dispersed in a toluene solution. When the wafer was drawn out of the suspension, a hexagonally packed monolayer structure of particles self-assembled on almost the complete wafer surface. Due to the simple process, this could be applied to micro- and nano-patterning. The self-assembled silica particles worked as a mask for the subsequent reactive ion etching. An array of nanometer-sized pits could be fabricated since the regions that correspond to the small gaps between particles were selectively etched off. As etching progressed, the pits became deeper and combined with neighboring pits due to side-etching to produce an array of cone-like structures. We investigated the effect of etching conditions on antireflection properties, and the optimum shape was a nano-cone with height and spacing of 500 nm and 300 nm, respectively. This nano-structured surface was prepared on a $30\;{\times}\;10-mm$ area. The reflectivity of the surface was reduced 97% for wavelengths in the range 400-700 nm.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.1229-1232
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• 2008

We have successfully manufactured high-quality top-contact organic thin-film transistors using inkjet technologies with sub-femtoliter droplet volume. Silver fine lines were directly patterned by inkjet on pentacene channel layers. The minimum width of silver lines was $1{\mu}m$ with without the need for pre-patterning or surface pretreatments. The mobility was $0.3\;cm^2/Vs$.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1996.06a
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• pp.494-496
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• 1996

The purpose of this study is to investigate the effect of process conditions on pore distribution in porous silicon layer prepared by electrochemical reaction. Porous silicon layers formed on p-type silicon wafer show the network structure of fine porse whose diameters are less than 100${\AA}$. In n-type porous silicon, selective growth was found on the pore surface by wet etching process after PR patterning. And numerical method showed high current density on the pore tip. With this result we confirmed that pore formation has two steps. First step is the initial attack on the surface and second step is the directional growth on the pore tip.

• 제어로봇시스템학회:학술대회논문집
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• 2002.10a
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• pp.46.5-46
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• 2002

As device dimension shrinks down to sub 100nm, it is increasingly important to monitor plasma states. Plasma etching is a key means to fine patterning of thin films. Many parameters are involved in etching and each parameter has different impact on process performances, including etch rate and profile. The uniformity of etch responses should be maintained high to improve device yield and throughput. The uniformity can be measured on any etch response. The most difficulty arises when attempting to characterize etched profile. Conventionally, the profile has been estimated by measuring the slope or angle of etched pattern. One critical drawback in this measurement is that this is unable to cap...

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.639-642
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• 2002

A new PDP barrier rib formation technique was investigated utilizing transparent soft maid made of silicon resin. Transparent soft mold was fabricated by pouring a silicone resin into the base mold made with photosensitive glass. The photosensitive barrier rib paste was coated on the glass substrate and dried in a 90 $^{\circ}C$ convection oven for 20min. The transparent soft mold was pressed on top of the semi-dry barrier rib layer and then irradiated with a UV lamp to a total dose of $900{\sim}1000mJ/cm^2$ The soft maid was then removed from the pressed barrier rib by winding up and fine pattern of barrier rib was obtained. The photosensitive barrier rib paste makes the demolding easy due to reduced interfacial forces and shrinking of paste materials.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.475-476
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• 2006

Self-assembled monolayers (SAMs) formed by the adsorption of alkanethiols, HS(CH2)nX, where X is an organic functional group, onto gold surfaces have attracted widespread interest as templates for the fabrication of molecular and biomolecular microstructures. Previously photopatterning has been thought of as being restricted to the micron scale, because of the well-known diffraction limit. So, we have explored a novel approach to nanofabrication by utilizing a femtosecond laser.

• International Journal of Automotive Technology
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• v.4 no.2
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• pp.57-64
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• 2003

The Intelligent Power Unit (IPU) utilized in Honda's Civic Hybrid Integrated Motor Assist (IMA) system was developed with the aim of making every component lighter, more compact and more efficient than those in the former model. To reduce energy loss, inverter efficiency was increased by fine patterning of the Insulated Gate Bipolar Transistor (IGBT) chips, 12V DC-DC converter efficiency was increased by utilizing soft-switching, and the internal resistance of the IMA battery was lowered by modifying the electrodes and the current collecting structure. These improvements reduced the amount of heat generated by the unit components and made it possible to combine the previously separated Power Control Unit (PCU) and battery cooling systems into a single system. Consolidation of these two cooling circuits into one has reduced the volume of the newly developed IPU by 42% compared to the former model.

• The Korean Journal of Ceramics
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• v.3 no.1
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• pp.34-36
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• 1997

We have fabricated a patterned diamond field emitter on a silicon substrate. Fine diamond particles were planted on a silicon wafer using conventional scratch method. A silicon oxide film was deposited on the substrate seeded with diamond powder. An array of holes was patterned on the silicon oxide film using VLSI processing technology. Diamond grains were grown using a microwave plasma-assisted chemical vapor deposition. Because diamond could not grow on the silicon oxide barrier, diamond grains filled only the patterned holes in the silicon oxide film, resulting in an array of diamond tips.

• Laser Solutions
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• v.11 no.2
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• pp.20-25
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• 2008

Polyimide is one of the useful materials in industry. The surface treatment of polyimide by a femtosecond laser can help accurate and fine fabrication of microstructure. And it can change the transmittance and reflectance of polyimide, too. We put femtosecond laser pulses on polyimide for rectangular or square type surface treaments and observe the change of transmittance and reflectance. Pulsewidth is 172 fs, laser power changes for fabrication are from 5 mW to 20 mW, and transmittance and reflectance are measured under 20m W, 300m W, and 920 mW. Pulse patterning is stable and almost no unwanted surface damage is shown. As power increases, working depth increases but working line width does not increase significantly. As speed changes, they also have same results. It shows the efficiency of a femtosecond laser is good and thermal damage is small for polyimide.