• Korean Journal of Soil Science and Fertilizer
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• v.47 no.6
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• pp.457-463
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• 2014

This study was carried out to find out major factors to mitigate carbon emission using Life Cycle Assessment (LCA). System boundary of LCA was confined from sowing to packaging during vegetable production. Input amount of agri-materials was calculated on 2007 Income reference of white radish, chinese cabbage and chive produced at open field and film house published by Rural Development Administration. Domestic data and Ecoinvent data were used for emission factors of each agri-material based on the 1996 IPCC guideline. Carbon footprint of white radish was 0.19 kg $CO_2kg^{-1}$ at open fields, 0.133 kg $CO_2kg^{-1}$ at film house, that of chinese cabbage was 0.22 kg $CO_2kg^{-1}$ at open fields, 0.19 kg $CO_2kg^{-1}$ at film house, and that of chive was 0.66 kg $CO_2kg^{-1}$ at open fields and 1.04 kg $CO_2kg^{-1}$ at film house. The high carbon footprint of chive was related to lower vegetable production and higher fuel usage as compared to white radish and Chinese cabbage. The mean proportion of carbon emission was 35.7% during the manufacturing byproduct fertilizer; white radish at open fields was 50.6%, white radish at film house 13.1%, Chinese cabbage at outdoor 38.4%, Chinese cabbage at film house 34.0%, chive at outdoor 50.6%, and chive at film house 36.0%. Carbon emission, on average, for the step of manufacturing and combustion accounted for 16.1% of the total emission; white radish at open fields was 4.3%, white radish at film house 15.6%, Chinese cabbage at open fields 6.9%, Chinese cabbage at film house 19.0%, chive at open fields 12.5%, and chive at film house 29.1%. On the while, mean proportion of carbon footprint for the step of $N_2O$ emission was 29.2%; white radish at open fields was 39.2%, white radish at film house 41.9%, Chinese cabbage at open fields 34.4%, Chinese cabbage at film house 23.1%, chive at open fields 28.8%, and chive at film house 17.1%. Fertilizer was the primary factor and fuel was the secondary factor for carbon emission among the vegetables of this study. It was suggested to use Heug-To-Ram web-service system, http://soil.rda.go.kr, for the scientific fertilization based on soil testing, and for increase of energy efficiency to produce low carbon vegetable.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.307.1-307.1
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• 2016

Amorphous zinc tin oxide (ZTO) thin films are being widely studied for a variety electronic applications such as the transparent conducting oxide (TCO) in the field of photoelectric elements and thin film transistors (TFTs). Thin film transistors (TFTs) with transparent amorphous oxide semiconductors (TAOS) represent a major advance in the field of thin film electronics. Examples of TAOS materials include zinc tin oxide (ZTO), indium gallium zinc oxide (IGZO), indium zinc oxide, and indium zinc tin oxide. Among them, ZTO has good optical and electrical properties (high transmittance and larger than 3eV band gap energy). Furthermore ZTO does not contain indium or gallium and is relatively inexpensive and non-toxic. In this study, ZTO thin films were formed by UHV RF magnetron co-sputter deposition on silicon substrates and sapphires. The films were deposited from ZnO and SnO2 target in an RF argon and oxygen plasma. The deposition condition of ZTO thin films were controlled by RF power and post anneal temperature using rapid thermal annealing (RTA). The deposited and annealed films were characterized by X-ray diffraction (XRD), atomic force microscope (AFM), ultraviolet and visible light (UV-VIS) spectrophotometer.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.300.2-300.2
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• 2016

Increasing of the demand for energy savings for buildings, thermal barrier films have more attracted. In particular, as heat loss through the windows have been pointed out to major problems in the construction and automobile industries, the research is consistently conducted for improving the thermal blocking performance for windows. The main theory of the technology is reflect the infrared rays to help the cut off the inflow of the solar energy in summer and outflow of the heat from indoors in winter to save the energy on cooling and heating. Furthermore, this is well known for prevent glare, reduces fading caused by harmful ultraviolet radiation and easy to apply on constructed buildings if it made as a film. In addition to these advantages, apply the transparent electrode to eliminate condensation by heating. Generally ITO is used as a transparent electrode, but is has a low stability in environmental factors. In this study, ITO and its alternative, ATO, is deposited by sputtering system and then the characteristic is evaluated each material based thermal barrier thin film. The optical property was measured on wide range of wavelength (200 nm 2500 nm) to know the transparency in visible wavelength and reflectivity in IR wavelength range. The electrical property was judged by sheet resistivity. Finally the changes of the temperature and current of the deposited film was observed while applying a DC power.

• Proceedings of the Korean Society of Propulsion Engineers Conference
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• v.y2005m4
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• pp.189-193
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• 2005

Thermal effect of finite-rate chemistry on linear combustion stability and film cooling effect are investigated in sample rocket engine. The flow variables required to evaluate stability limits are obtained from CFD data with finite-rate chemistry adopted in three dimensional chamber. Major flow variables are affected appreciably by finite-rate chemistry and thereby, the calculated stability limits are modified. It is found that finite-rate chemistry contributes to stability enhancement in thermal point of view. And film cooling also has the effect of combustion stabilization.

• Transactions of the Korean Society of Mechanical Engineers
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• v.15 no.6
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• pp.1975-1981
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• 1991

A new numerical solution of the elastohydrodynamic lubrication(EHL) problem of an axially profiled cylindrical roller is presented. A finite difference method and the Newton-Raphson method are used to solve the nonlinear system equations. A non-uniform grid system is adopted to reduce the number of grid points and to obtain accurate solution. For two different types of profiles which have similar elastostatic pressure distribution, the EHL results show large differences. Especially the difference in film shape is larger than in pressure distribution. Therefore, the magnitude of the minimum film thickness should be a major criteria to design the axial profile of the roller. Variations of the minimum film thickness with dimensionless parameters show considerably different behavior from those of infinite solution and show a good agreement with the experimental data in literatures. Present numerical scheme can be used generally in the analysis of three-dimensional EHL problem.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.25 no.4
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• pp.79-87
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• 2011

In this paper, the best conditions for the deposition of the high quality diamond thin-film from N-hexane as a carbon source in the microwave plasma process was carried out. Major parameters are the deposition time, flow rates of oxygen and hexane. The deposition time for the steady state thin-film was required more than 4[h], and the suitable flow rates of hexane and oxygen for the high-quality thin-film are 0.4[sccm] and 0.1~0.2[sccm], respectively. In addition, amorphous carbons such as DLC and graphite were grown by increasing the flow rate of hexane, and it decreased by increasing the flow rate of oxygen. Specifically, the growth rate is about 1.5[${\mu}mh-1$] under no addition of oxygen and it decreased about 60[%] as ca. 1.0[${\mu}mh-1$] with oxygen.

• Tribology and Lubricants
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• v.35 no.6
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• pp.350-355
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• 2019

Surface energy is an important factor in determining the performance of application components in terms of preventing adhesion failure between thin films. In this regard, numerous attempts have been made to acquire the desired surface energy through chemical treatment or by using micro/nanostructures. However, such approaches are expected to provide extreme values of surface energy, which may not be suitable in achieving the enhanced performance of applications. In this study, we propose a method to control surface energy by using bilayer metallic film heterostructures. We measure the water contact angle of incompatible (Ni/Ag) and compatible (Zn/Ag) metal pairs under several experimental factors, including thickness, time, and temperature. Furthermore, we conduct Auger electron spectroscopy measurements to investigate the atomic concentration with respect to depth after the change in the water contact angle. The experimental results reveal that three parameters, namely, compatibility, film thickness, and environmental temperature, are major factors in controlling the water contact angle. Thus, we experimentally demonstrate that controlling these three parameters can provide the approximate desired water contact angle. This result is expected to aid in the performance enhancement of a wide range of application components, where control of surface energy is required.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.234.2-234.2
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• 2014

Organic light emitting diode (OLED) is considered as the next generation flat panel displays due to its advantages of low power consumption, fast response time, broad viewing angle and flexibility. For the flexible application, it is essential to develop thin film encapsulation (TFE) to protect oxidation of organic materials from oxidative species such as oxygen and water vapor [1]. In many TFE research, the inorganic film by atomic layer deposition (ALD) process demonstrated a good barrier property. However, extremely low throughput of ALD process is considered as a major weakness for industrial application. Recently, there has been developed a high throughput ALD, called 'spatial ALD' [2]. In spatial ALD, the precursors and reactant gases are supplied continuously in same chamber, but they are separated physically using a purge gas streams to prevent mixing of the precursors and reactant gases. In this study, the $Al_2O_3$ thin film was deposited by spatial ALD process. We characterized various process variables in the spatial ALD such as temperature, scanning speed, and chemical compositions. Water vapor transmission rate (WVTR) was determined by calcium resistance test and less than $10-^3g/m^2{\cdot}day$ was achieved. The samples were analyzed by x-ray photoelectron spectroscopy (XPS) and field emission scanning electron microscope (FE-SEM).

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.8
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• pp.704-710
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• 2000

Metal electrode materials for plasma display panel should have low electrical resistivity in order to maintain stable gas discharge and have fast response time. They should also hae good film uniformity adhesion and thermal stability. In this study Cr/Cu/Cr metal electrode structure is formed by DC magnetron sputtering. Cr and Cu films were deposited on ITO coated glasses with various DC power density and main pressures as the major parameters. After metal electrodes were formed a heat treatment was followed at 55$0^{\circ}C$ for 20 min in a vacuum furnace. The intrinsic stress of the sputtered Cr film passed a tensile stress maximum decreased and then became compressive with further increasing DC power density. Also with increasing the main pressure stress turned from compression to tension. After heat the treatment the electrical resistivity of the sputtered Cu film of 2${\mu}{\textrm}{m}$ in thickness prepared at 1 motor with the applied power density of 3.70 W/cm$^2$was 2.68 $\mu$$\Omega$.cm With increasing the main pressure the DC magnetron sputtered Cu film became more open structure. The heat treatment decreased the surface roughness of the sputtered Cr/Cu/Cr metal electrodes.

• Journal of Electrochemical Science and Technology
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• v.1 no.1
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• pp.45-49
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• 2010

$Li_2PtO_3$ thin film electrodes, which might be possible candidate for the cathode materials for implantable batteries, were synthesized using an electrostatic spray deposition (ESD) technique onto a platinum foil substrate. Single phase $Li_2PtO_3$with a structure similar to layered $LiCoO_2$ structure were synthesized by spraying a precursor solution of $CH_3CO_2Li2H_2O$ in ethanol onto a Pt substrate at temperatures ranging from 200 to $400^{\circ}C$ followed by annealing at above $600^{\circ}C$. Lithium carbonate was the only major phase at temperatures up to $500^{\circ}C$. The X-ray diffraction (XRD) peaks of the Pt foil substrate and lithium carbonate disappeared at temperatures >$600^{\circ}C$. The volumetric capacity of the $Li_2PtO_3$ thin film synthesized using the ESD technique was approximately 817 mAh/$cm^3$, which exceeded that of $LiCoO_2$ (711 mAh/$cm^3$).