• Title/Summary/Keyword: Film Resistance

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Influence of Treatment Temperature on Surface Characteristics during Low Temperature Plasma Carburizing and DLC duplex treatment of AISI316L Stainless Steel (AISI316L 강에 저온 플라즈마침탄 및 DLC 복합 코팅처리 시 처리온도에 따른 표면특성평가)

  • Lee, In-Sup
    • Journal of Ocean Engineering and Technology
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    • v.25 no.6
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    • pp.60-65
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    • 2011
  • A low temperature plasma carburizing process was performed on AISI 316L austenitic stainless steel to achieve an enhancement of the surface hardness without degradation of its corrosion resistance. Attempts were made to investigate the influence of the processing temperatures on the surface hardened layer during low temperature plasma carburizing in order to obtain the optimum processing conditions. The expanded austenite (${\gamma}_c$) phase, which contains a high saturation of carbon (S phase), was formed on all of the treated surfaces. Precipitates of chromium carbides were detected in the hardened layer (C-enriched layer) only for the specimen treated at $550^{\circ}C$. The hardened layer thickness of ${\gamma}_c$ increased up to about $65{\mu}m$ with increasing treatment temperature. The surface hardness reached about 900 $HK_{0.05}$, which is about 4 times higher than that of the untreated sample (250 $HK_{0.05}$). A minor loss in corrosion resistance was observed for the specimens treated at temperatures of $300^{\circ}C{\sim}450^{\circ}C$ compared with untreated austenitic stainless steel. In particular, the precipitation of chromium carbides at $550^{\circ}C$ led to a significant decrease in the corrosion resistance. A diamond-like carbon (DLC) film coating was applied to improve the wear and friction properties of the S phase layer. The DLC film showed a low and stable friction coefficient value of about 0.1 compared with that of the carburized surface (about 0.45). The hardness and corrosion resistance of the S phase layer were further improved by the application of such a DLC film.

Corrosion Resistance of Non-Chrome Magni 565 Coating and Characteristics of Its Coating Film (Non-Chrome Magni 565 코팅 피막의 특성과 내식성)

  • Kim, Sang-Su;Jeong, Byeong-Ho;Mun, Myeong-Jun;Kim, Mu-Gil
    • Journal of the Korean Society for Heat Treatment
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    • v.19 no.4
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    • pp.200-207
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    • 2006
  • In addition to the basic properties of the base and top coating agents, corrosion resistance of non-chrome magni 565 coating and characteristics of coating film when coated to steel substrate were studied. The system had a good wettability at room temperature. Moreover, both the contact angle and surface tension were affected little by the viscosity of coating agent and surface roughness of the steel substrate. And the samples coated with optimal conditions showed a great corrosion resistance in salt spray test with 1500 hours or longer of initial appearance time of rust. The coating film was composed of overlapping layer of zinc and aluminium flakes, and the thickness of base coat increased with an increase of base coat viscosity. Based on the C-F peaks of 1,1-Difluoroethaen homo-polymer, it was thought that the base coat was an inorganic polymer bond layer. Meanwhile, the top coat showed C-F peaks of polytetrafluoroethylene with C-H peaks of phenol in FT-IR analysis. From the lower weight loss of base coat in TG analysis, it was thought that cross linking density of base coat was larger than that of top coat. It was thought that the small exothermic reactions observed in DSC curves were due to the thermosetting resins contained in the coating agents. Compared to the non-coated specimen, the coated sample showed more higher polarization resistance and corrosion potential with lower corrosion current density.

A Study on Improvement of Material Characteristics by Control of Ion Implantation (이온주입 제어에 의한 재료특성 개선에 관한 연구)

  • Yang, Young-Joon;Lee, Chi-Woo;Fujita, Kazuhisa
    • Journal of Advanced Marine Engineering and Technology
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    • v.32 no.8
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    • pp.1178-1184
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    • 2008
  • In this study, techniques of ion implantation were used in order to improve the characteristics of metal materials such as the oxidation and wear resistant. In particular it is necessary to develope their oxidation and wear resistant that could be used in severe environmental conditions. There are mainly two elementary technologies including ion implantation and/or thin film coating. Ion implantation method was performed for surface modification. As a result, it was found that some ion implantations methods such as Nb, high-temperature Nb ion implantation and Nb+C combined implantation are somewhat effective for improving the oxidation resistance of TiAl alloy. Furthermore, the fluorine PBII treatment is more effective for improving the oxidation resistance of the TiAl alloy with three-dimensional shapes. The implantation of boron ion into thin film of TiN was also effective for improving the properties of materials like high temperature wear resistance. TiCrN film was applied to the actual seal ring for steam turbines, and it was observed that its sliding property showed a successfully good performance.

Characteristics of CrOx Thin-films for High Precision Resistors (고정밀저항용 크롬산화박막의 특성)

  • Seo, Jeong-Hwan;Noh, Sang-Soo;Lee, Eung-Ahn;Kim, Kwang-ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.3
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    • pp.253-258
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    • 2005
  • This paper presents characteristics of CrOx thin-film, which were deposited on $Al_2$O$_3$ wafer by DC reactive magnetron sputtering in an argon-oxide atmosphere for high temperature applications. The present paper deals with a study of the technological characteristics of thin film resistors to provide a control in obtaining temperature coefficients of resistance of given value. The optimized condition of CrOx thin-film were thickness range of 2500 $\AA$ and annealing condition(350 $^{\circ}C$, 1 hr) in oxide partial pressure(3.5${\times}$10$^{-4}$ torr). Under optimum conditions, the CrOx thin-films is obtained a high resistivity, p=340 $\mu$Ωcm, a low temperature coefficient of resistance, TCR=-55 ppm/$^{\circ}C$. The CrOx thin films resistors which were fabricated in this paper had excellent characteristics as high precision resistors.

A Study on Corrosion Resistance and Electrical Surface Conductivity of an Electrodeposited Ni-W Thin Film (전해도금에 의한 Ni-W 합금의 내식성 및 표면 전도도 특성 연구)

  • Park, Je-Sik;Jeong, Goo-Jin;Kim, Young-Jun;Kim, Ki-Jae;Lee, Churl-Kyoung
    • Journal of the Korean institute of surface engineering
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    • v.44 no.2
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    • pp.68-73
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    • 2011
  • A Ni-W thin-film was synthesized by electrodeposition, and its corrosion resistance and electrical surface conductivity were investigated. Amount of tungsten in the Ni-W thin-film increased linearly with current density during the electrodeposition, and crack-free and low-crystalline Ni-21 at.%W coating layer was obtained. Corrosion resistances of the Ni-W thin-films were examined with an anodic polarization method and a storage test in a strong sulfuric acid solution. As a result, the Ni-21 at.%W thin-film exhibited the greatest corrosion resistance, and maintained the electrical surface conductivity even after the severe corrosion test, which could be applicable as a surface treatment for advanced metallic bipolar plates in fuel cell or redox flow battery systems.

Investigation of contact resistance between metal electrodes and amorphous gallium indium zinc oxide (a-GIZO) thin-film transistors

  • Kim, Woong-Sun;Moon, Yeon-Keon;Lee, Sih;Kang, Byung-Woo;Kwon, Tae-Seok;Kim, Kyung-Taek;Park, Jong-Wan
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.546-549
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    • 2009
  • In this paper, we investigated the effects of different source/drain (S/D) electrode materials in thin film transistors (TFTs) based on indium-gallium-zinc oxide (IGZO) semiconductor. A transfer length and effective resistances between S/D electrodes and amorphous IGZO thin-film transistors were examined. Intrinsic TFT parameters were extracted by the transmission line method (TLM) using a series of TFTs with different channel lengths measured at a low drain voltage. The TFTs fabricated with Cu S/D electrodes showed the lowest contact resistance and transfer length indicating good ohmic characteristics, and good transfer characteristics with a field-effect mobility (${\mu}_{FE}$) of 10.0 $cm^2$/Vs.

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Flexible Hydrogen Sensor Using Ni-Zr Alloy Thin Film

  • Yun, Deok-Whan;Park, Sung Bum;Park, Yong-il
    • Korean Journal of Materials Research
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    • v.29 no.5
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    • pp.297-303
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    • 2019
  • A triple-layered $PMMA/Ni_{64}Zr_{36}/PDMS$ hydrogen gas sensor using hydrogen permeable alloy and flexible polymer layers is fabricated through spin coating and DC-magnetron sputtering. PDMS(polydimethylsiloxane) is used as a flexible substrate and PMMA(polymethylmethacrylate) thin film is deposited onto the $Ni_{64}Zr_{36}$ alloy layer to give a high hydrogen-selectivity to the sensor. The measured hydrogen sensing ability and response time of the fabricated sensor at high hydrogen concentration of 99.9 % show a 20 % change in electrical resistance, which is superior to conventional Pd-based hydrogen sensors, which are difficult to use in high hydrogen concentration environments. At a hydrogen concentration of 5 %, the resistance of electricity is about 1.4 %, which is an electrical resistance similar to that of the $Pd_{77}Ag_{23}$ sensor. Despite using low cost $Ni_{64}Zr_{36}$ alloy as the main sensing element, performance similar to that of existing Pd sensors is obtained in a highly concentrated hydrogen atmosphere. By improving the sensitivity of the hydrogen detection through optimization including of the thickness of each layer and the composition of Ni-Zr alloy thin film, the proposed Ni-Zr-based hydrogen sensor can replace Pd-based hydrogen sensors.

A Study on the MDTF for Uncooled Infrared Ray Thermal Image Sensors with High Thermal Coefficient of Resistance (높은 열저항 계수를 가지는 비냉각형 적외선 열영상 이미지 센서용 MDTF(Metal-dielectric Thin Film)에 관한 연구)

  • Jung, Eun-Sik;Jeong, Se-Jin;Kang, Ey-Goo;Sung, Man-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.5
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    • pp.366-371
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    • 2012
  • In this paper, fabricated by MEMS uncooled micro-bolometer detector for the study in the infrared sensitivity enhancement. Absorption layer SiOx-Metal series MDTF (metal-dielectric thin film) by high absorption rate and has a high thermal coefficient of resistance, low noise characteristics were implemented. Then MDTF were made in a vacuum deposition method. And MDTF for the analysis of the physical properties of silicon wafers were fabricated, TCR (temperature coefficient of resistance) value was made in order to measure the glass wafer and FT-IR (Fourier Transform Infrared spectroscopy) values were made in order to measure the germanium window. The analyzed results of MDTF -3 [%/K] has more characteristics of the TCR. And 8~12 um wavelength region close to 70% in the absorption characteristic.

An investigation of characteristics of Au plating for telecommunication components (통신기자재용 금도금 특성 분석 연구)

  • 한전건;강태만
    • Journal of the Korean institute of surface engineering
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    • v.25 no.6
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    • pp.309-317
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    • 1992
  • Evaluation of electroplated gold has been carried out to obtain the data base for electrical, mechanical and environmental properties for telecommunication component applications. Gold plating was performed to a various thickness of $0.1\mu\textrm{m}$ to 1.$25\mu\textrm{m}$ after Ni plating of $3\mu\textrm{m}$ on C52100 bronze. Electrical properties were evaluated by measuring contact resistance using 4-wire method under static contact and dynamic contact during wear. Reciprocating wear test was performed to study the wear behavior as well as failure of gold contacts. Environmental characteristics were evaluated by using salt spray testing and SO2 test. Hardness of soft gold film was measured to be 53KHN under 5g load. Friction coefficient was initially obtained to be 0.15 and 0.25 under 100g and 200g loads respectively, and then raised up to 0.8 with increasing reciprocating wear cycles. Static contact resistance was 2 to 3m$\Omega$ regardless of gold film thickness while drastic changes of contact resistance were occured upon stripping of the gold film during wear. The lifetime of contact wear showing stable contact resistance increased up to 6 times for $1\mu\textrm{m}$ thickness compared to that of$ 0.1\mu\textrm{m}$ thickness under 100g load. All gold plating appeared to be stable under salt atmosphere while only the gold plating over 1$\mu\textrm{m}$ was stable under SO2 atmosphere.

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Properties of the Gold and Palladium-Nickel Alloy Plated Layers on Electrical Contact Materials (접점상에 입힌 Au 및 Pd-Ni 합금도금층의 특성)

  • 백철승;장현구;김회정
    • Journal of the Korean institute of surface engineering
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    • v.25 no.3
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    • pp.107-116
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    • 1992
  • The optimum thickness of Pd-Ni plated layers used as an electrical contact film was investigated by evaluating mechanical, thermal and environmental characteristics. The variations of morphologies and chemical compositions were studied by using SEM, EDS and ESCA. As a result of wear test, the wear resistance behavior of the gold plated layers was not changed with the sliding velocity changes. The palladium-nickel plated layer showed better wear resistance than the gold plated layer at low sliding velocity, but it showed poor wear resistance at high sliding velocity. Under the thermal condition of $400^{\circ}C$ in air, the gold thickness of $2\mu\textrm{m}$ without underplate on phosphorous bronze formed copper oxide on the surface layer by rapid diffusion of copper whereas the gold thickness of $0.8\mu\textrm{m}$ deposited on nickel and palladium-nickel underplate was stable at $400^{\circ}C$. Under the sulfur dioxide environments, the gold thickness of $0.3\mu\textrm{m}$ deposited on the nickel thickness of$ 3\mu\textrm{m}$ and the palladium-nickel thickness of $2\mu\textrm{m}$ underplate was more corrosion-resistant than the gold thickness of $2\mu\textrm{m}$ without underplate on phosphorous bronze. Under the nitric acid vapor environment, corrosion resistance of the gold film was superior to an equivalent thickness of the palladium-nickel film.

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