• JSTS:Journal of Semiconductor Technology and Science
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• v.15 no.2
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• pp.301-306
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• 2015

An ultra-compact and wideband low noise amplifier (LNA) in a quad flat non-leaded (QFN) package is presented. The LNA monolithic microwave integrated circuit (MMIC) is implemented in a $0.25{\mu}m$ GaN IC technology on a Silicon Carbide (SiC) substrate provided by Triquint. A source degeneration inductor and a gate inductor are used to obtain the noise and input matching simultaneously. The resistive feedback and inductor peaking techniques are employed to achieve a wideband characteristic. The LNA chip is mounted in the $3{\times}3-mm^2$ QFN package and measured. The supply voltages for the first and second stages are 14 V and 7 V, respectively, and the total current is 70 mA. The highest gain is 13.5 dB around the mid-band, and -3 dB frequencies are observed at 0.7 and 12 GHz. Input and output return losses ($S_{11}$ and $S_{22}$) of less than -10 dB measure from 1 to 12 GHz; there is an absolute bandwidth of 11 GHz and a fractional bandwidth of 169%. Across the bandwidth, the noise figures (NFs) are between 3 and 5 dB, while the output-referred third-order intercept points (OIP3s) are between 26 and 28 dBm. The overall chip size with all bonding pads is $1.1{\times}0.9mm^2$. To the best of our knowledge, this LNA shows the best figure-of-merit (FoM) compared with other published GaN LNAs with the same gate length.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.15 no.2
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• pp.145-151
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• 2004

This paper presents a fully integrated 5 GHz band low phase noise LC tank VCO. The implemented VCO is tuned by integrated PN diodes and tuning rage is 5.01∼5.30 GHz with 0∼3 V control voltage. For improved phase noise performance, a LC filtering technique is adapted. The measured phase noise is -87.8 dBc/Hz at 100 kHz offset frequency and -111.4 dBc/Hz at 1 MHz offset frequency which is excellent performance. Moreover phase noise is improved by 5 dB after employing the LC filter. It is the first experimental result in field of InGaP/GaAs HBT VCOs. The figure of merit of the fabricated VCO with LC filter is -172.1 dBc/Hz. It is the best result among 5 GHz InGaP HBT VCOs. Moreover this work shows lower DC power consumption, higher output power and more fixed output power compared with previous 4, 5 GHz band InGaP HBT VCOs.

• Journal of the Korean Society for Aeronautical & Space Sciences
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• v.38 no.11
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• pp.1049-1059
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• 2010

This paper treats the aerodynamic optimization of the blade planform for helicopters. The blade shapes, which should be determined during the threedimensional aerodynamic configuration design step, are defined and are parameterized using the B$\acute{e}$zier curves. This research focuses on the design approaches generally adopted by industries and or research institutes using their own experiences and know-hows for the parameterization and for the definition of design constraints. The hover figure of merit and the equivalent lift-to-drag ratio for the forward flight are used to define the objective function. The resultant nonlinear programming (NLP) problem is solved using the sequential quadratic programming (SQP) method. The applications show the present method can design the important planform shapes such as the airfoil distribution, twist and chord variations in the efficient manner.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2017.05a
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• pp.129-129
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• 2017

열전재료는 열에너지를 전기에너지로 또는 전기에너지를 열에너지로 직접 변환하는데 가장 널리 사용되는 재료이다. $Bi_2Te_3$계 열전 재료는 400K 이하의 비교적 저온 영역에서 높은 성능지수(Dimensionless Figure of merit, ZT($={\alpha}2{\sigma}T/{\kappa}$, ${\alpha}$: 제백계수, ${\sigma}$: 전기전도도, T: 절대온도, ${\kappa}$: 열전도도))를 나타내는 열전재료이며 자동차 시트나 정수기 등에 응용되고 있다. 열전모듈은 제조시 수십 개에서 수백 개 이상의 n형 및 p형 열전소자를 알루미나($Al_2O_3$)와 같은 세라믹 기판(substrate) 상에 접합된 동 전극 위에 전기적으로 서로 직렬로 접합시켜 제조한다. 기존의 열전모듈의 제조방법에는 동 전극 위에 위에 Sn합금 분말과 플럭스(flux)의 혼합물인 솔더페이스트를 스크린 인쇄법을 사용하여 동 전극에 도포한 다음, 그 위에 열전소자를 얹고 약 520K의 열풍을 가하여 솔더를 용융시켜 열전소자와 동 전극을 접합시킨다. 스크린 인쇄법에서는 인쇄 압력이 일정하지 않으면, 솔더페이스트 층의 두께가 균일하지 않게 되어 열전소자 접합부의 불량을 유발시킨다. 그러나 열모듈은 단 하나의 접합 불량이 모듈 전체의 열전변환성능에 심각한 영향을 줄 수 있기 때문에 본 연구에서는 이러한 문제점을 해결하기 위해, 솔더페이스트를 도포하지 않고 열전소자를 직접 동 전극과 접합할 수 있는 방법을 고안하였다. 무전해도금을 이용한 니켈층을 형성시킨 $Bi_2Te_3$계 열전소자 표면에 약 $50{\mu}m$의 주석도금층을 전기도금법을 구사하여 형성시켰다. 그 후, wire cutting을 통하여 $3mm{\times}3mm{\times}3mm$의 크기로 절단한 주석도금된 열전소자를 동 전극에 얹고 1.1KPa의 압력을 가하면서 523K의 핫플레이트 위에서 3분간 방치하여 직접(direct) 열압착 접합을 실시하였다. 접합부의 단면을 SEM을 이용하여 관찰한 결과, 동 전극과 열전소자 사이의 계면에 용융 후 응고된 주석층이 결함없이 균일하게 형성된 양호한 접합부를 관찰할 수 있었다. 따라서, 솔더페이스트를 이용하지 않고, 열전소자 표면에 주석도금을 실시한 후, 동 전극과 직접 열압착 본딩을 실시하는 방법은 균일한 접합계면을 얻을 수 있는 새로운 공정으로 기대된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.450.2-450.2
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• 2014

열전재료는 열-전기가 상호 가역적으로 변하는 재료로서, 최근 에너지 변환소재 분야에서 각광받고 있다. 열전재료의 특성 효율은 무차원 열전 성능지수(dimensionless figure of merit, $ZT={\alpha}2{\sigma}T/{\kappa}$)로 나타낼 수 있다. 여기서 ${\alpha}$는 제벡계수(Seebeck coefficient), ${\sigma}$는 전기전도도(electrical conductivity), ${\kappa}$는 열전도도(thermal conductivity), T는 Kelvin 온도를 나타낸다. 500 K에서 800 K까지의 중온 영역에서 우수한 열전특성을 보이는 $Mg_2X$ (X=Si, Ge, Sn)와 이들의 고용체는 성분원소가 독성이 없고, 매장량이 많아 친환경 열전 재료로 각광받고 있다. $Mg_2X$ 고용체 중 $Mg_2Si_{1-x}Ge_x$는 기존 $Mn_2Si$, $Mg_2Ge$, $Mg_2Sn$계 보다 더 우수한 열전 성능지수를 보인다. 다양한 제조 방법들이 시도되고 있으나, 조성설계 및 구조, 성능 조절의 어려움이 있고, Mg의 산화와 휘발 및 Mg, Si, Ge의 융점 차이가 크고 중력 편석과 반응하지 않은 원소들로 인해 제조가 상당히 어렵다. Sb가 도핑된 $Mg_2Si_{0.5}Ge_{0.5}Sb_y$ (y=0, 0.005, 0.01, 0.02, 0.03) 고용체를 고상반응으로 합성하고 진공열간 압축성형을 통해 성공적으로 제조하였다. 고용 상을 확인하기 위하여 X선 회절분석을 실시하였고, 고용체 형성과 도핑에 따른 전기적 특성변화를 평가하기 위해 Hall 효과를 측정하여 전자 이동특성을 분석하였고, 323~823 K까지 전기전도도, 제벡계수, 열전도도의 측정을 통해 열전 성능지수를 평가하였다.

• Korean Journal of Crystallography
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• v.6 no.1
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• pp.1-13
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• 1995

Cr:A12O3 and Ti:A12O3 single crystals were grown by Czochralski method, and the effects of crystal growth parameters such as pulling rate, rotation rate, dopant and growth atmosphere on crystal quality were investigated. And spectroscopic properties including lasing efficiency were also measured. Single crystals, sized of 20mm in diameter and 100-135mm in length, were successfully grown from the seed of <001> direction. With the doping level of 0.5w/o Cr2O3, pulling rate 2.0mm/hr, rotation rate of 30rpm and inert atmosphere by nitrogen gas, high quality crystals of Cr:A12O3 were grown. While in case of Ti:A12O3 crystals, high quality crystals were grown under the conditions of the doping level of 0.25w/o TiO2, pulling rate of 1.5mm/hr, rotation rate of 30rpm and reducing atmosphere by hydrogen - nitrogen mixed gas. It was confirmed that Cr3+ ion which maintains its ionoc valence during growth easily de-bubbled than Ti4+ ion which changes its valence, Fe3+ ion also has do-bubbling effect to Ti:A12O3 crystal and the reducing atmosphere by 90% N2 - 10% H2 mixed gas gave effective result on the changing of Ti4+ to Ti3+ and de-bubbling. As a result of spectroscopic measurements of Cr:A12O3 crystal, 4A2 →4F2 and 4F1 absorption transitions and E →4A2(R1) and 2A →4A2(R2) fluorenscence transitions were confirmed. And it was measured that wavelengths of laser R1 and R2 transitions were 696±5nm and 692±5nm respectively, line width of these transitions were 12A, and life-time of fluorenscence was 152μsec. In case of Ti:A12O3 crystals, it was confirmed that absortion transition of 4T2→4E and fluorescence transition of 4E→4T2 with wide range of 650-1050nm was occured. And 147μsec of life-time of fluorescence, 125.4 of figure of merit and 9% of laser efficience were also measured.

• Korean Journal of Radiology
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• v.19 no.6
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• pp.1119-1129
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• 2018

Objective: To compare the image quality of low-tube-voltage and low-iodine-concentration-contrast-medium (LVLC) computed tomography urography (CTU) with iterative reconstruction (IR) with that of conventional CTU. Materials and Methods: This prospective, multi-institutional, randomized controlled trial was performed at 16 hospitals using CT scanners from various vendors. Patients were randomly assigned to the following groups: 1) the LVLC-CTU (80 kVp and 240 mgI/mL) with IR group and 2) the conventional CTU (120 kVp and 350 mgI/mL) with filtered-back projection group. The overall diagnostic acceptability, sharpness, and noise were assessed. Additionally, the mean attenuation, signal-to-noise ratio (SNR), contrast-to-noise ratio (CNR), and figure of merit (FOM) in the urinary tract were evaluated. Results: The study included 299 patients (LVLC-CTU group: 150 patients; conventional CTU group: 149 patients). The LVLC-CTU group had a significantly lower effective radiation dose ($5.73{\pm}4.04$ vs. $8.43{\pm}4.38mSv$) compared to the conventional CTU group. LVLC-CTU showed at least standard diagnostic acceptability (score ${\geq}3$), but it was non-inferior when compared to conventional CTU. The mean attenuation value, mean SNR, CNR, and FOM in all pre-defined segments of the urinary tract were significantly higher in the LVLC-CTU group than in the conventional CTU group. Conclusion: The diagnostic acceptability and quantitative image quality of LVLC-CTU with IR are not inferior to those of conventional CTU. Additionally, LVLC-CTU with IR is beneficial because both radiation exposure and total iodine load are reduced.

• Journal of Technologic Dentistry
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• v.37 no.4
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• pp.271-284
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• 2015

Purpose: The purpose of this study was to examine the usage of CAD/CAM, which is one of dental technologist duties, in an effort to look for any possible changes in the usage of CAD/CAM. It's specifically meant to compare the results of this study with those of Lee Jong-do, Park Kwang-Sig(2011)'s study in March, 2011, to determine if there were any changes over the past four years. The selected variables that were investigated were the ownership of CAD/CAM, awareness of it, the route of acquiring the first information on it, the merits and demerits of its usage, usage experience and educational experience about it. Methods: An online survey was conducted on the dental technologists who worked in urban communities including metropolitan cities to find out the usage of CAD/CAM in 2015 from July 15 to 31, 2015, after existing questionnaire items were modified. The collected data were analyzed by IBM SPSS statistics 22.0, and statistical data on frequency, percentage, mean and standard deviation for each item were obtained. To figure out the characteristics of the subjects and the relationship between their occupational characteristics and the usage of CAD/CAM, crosstabs, independent-samples t-test and one-way ANOVA were utilized. As for the usage of CAD/CAM in 2011, the results of Lee Jong-do, Park Kwang-Sig(2011)'s study were selected, and then a comparative analysis was made. The level of significance was all set at .05. Total 250 questionnaires were distributed to them, and 190(76.0%) were returned. After excluding 23 whose answers were uncertain or seemed to lack reliability, total 167(66.8%) were used in final analysis. Results: As a result of analyzing the usage of CAD/CAM that was one of dental technologist duties, there was a great increase in the ownership of CAD/CAM in their workplaces from 2.4 percent in 2011 to 71.7 percent in 2015, and there was an improvement in awareness about it and the necessity of its usage as well. In 2011, the Internet and mass media were the most common route that they got to know about it. They had a strong tendency to acquire related knowledge through education in 2015, and there were some changes in the products that they used or preferred. In both years, the great merit of CAD/CAM was the simplified manufacturing process of restoration, and it had another great advantages in 2015 such as the improved quality of restoration or improved environments for dental technology. Concerning disadvantages, high price was a big problem in 2011. In 2015, not only price but the burden of material costs, frequent breakdown, poor demand among dental clinics and a lack of CAD/CAM professionals were pointed out a lot. In the future, this researcher intends to make research to seek ways of improving CAD/CAM professionals. Conclusion: There was more awareness of CAD/CAM in 2015 than in 2011 when the changes in awareness of it were analyzed, and the finding suggest the necessity of sustained education and concern.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.37 no.3
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• pp.332-336
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• 2024

High-energy bandgap material silicon carbide (SiC) is gaining attention as a next-generation power semiconductor material, and in particular, SiC-based MOSFETs are developed as representative power semiconductors to increase the breakdown voltage (BV) of conventional planar structures. However, as the size of SJ (Super Junction) MOSFET devices decreases and the depth of pillars increases, it becomes challenging to uniformly form the doping concentration of pillars. Therefore, a structure with different doping concentrations segmented within the pillar is being researched. Using Silvaco TCAD simulation, a SJ VVD (vertical variation doping profile) MOSFET with three different doping concentrations in the pillar was studied. Simulations were conducted for the width of the pillar and the doping concentration of N-epi, revealing that as the width of the pillar increases, the depletion region widens, leading to an increase in on-specific resistance (R_on,sp) and breakdown voltage (BV). Additionally, as the doping concentration of N-epi increases, the number of carriers increases, and the depletion region narrows, resulting in a decrease in R_on,sp and BV. The optimized SJ VVD MOSFET exhibits a very high figure of merit (BFOM) of 13,400 KW/cm², indicating excellent performance characteristics and suggesting its potential as a next-generation highperformance power device suitable for practical applications.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.23 no.6
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• pp.691-699
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• 2012

In this paper, we present a Vt-DRO with a low phase noise, which is achieved by improving the coupling structure between the dielectric resonator and microstrip line. The Vt-DRO is a closed-loop type and is composed of 3 blocks; dielectric resonator, phase shifter, and amplifier. We propose a mathematical estimation method of phase noise, using the group delay of the resonator. By modifying the coupling structure between the dielectric resonator and microstrip line, we achieved a group delay of 53 nsec. For convenience of measurement, wafer probes were inserted at each stage to measure the S-parameters of each block. The measured S-parameter of the Vt-DRO satisfies the open-loop oscillation condition. The Vt-DRO was implemented by connecting the input and output of the designed open-loop to form a closed-loop. As a result, the phase noise of the Vt-DRO was measured as -132.7 dBc/Hz(@ 100 kHz offset frequency), which approximates the predicted result at the center frequency of 5.3 GHz. The tuning-range of the Vt-DRO is about 5 MHz for tuning voltage of 0~10 V and the power is 4.5 dBm. PFTN-FOM is -31 dBm.