• 제목/요약/키워드: Facing Material

검색결과 226건 처리시간 0.027초

대향타겟식 스퍼터법으로 제작한 $Ni_{81}Fe_{19}$박막의 결정배향성 (Crystal orientation of $Ni_{81}Fe_{19}$ thin film prepared by facing targets sputtering method)

  • 김용진;박창옥;최동진;김경환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.185-188
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    • 2000
  • Crystal orientation of Ni$_{18}$ $Fe_{19}$ thin films prepared by facing targets sputtering system was investigated. FTS system can deposit a high quality thin film and control deposition conditions in wide range. T he crystallographic characteristics of Ni$_{18}$ $Fe_{19}$ thin films on variation of thickness and substrate tempera ture was investigated by XRD and AFM. As a result, we obtained Ni$_{18}$ $Fe_{19}$ thin films prepared at subst rate temperature room temperature, thickness 160nm and over revealed good crystal orientation to [111] direction.irection.

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DBD 플라즈마를 이용한 후향계단 아음속 유동 제어 (Flow Control using DBD Plasma on Backward-facing Step)

  • 송지운;박슬기;김태환;조형희
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2011년도 제36회 춘계학술대회논문집
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    • pp.433-436
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    • 2011
  • 본 연구에서는 후향계단 형상의 0.5 m/s의 속도를 갖는 유동을 DBD 플라즈마를 통해 제어하였다. electrode와 dieletric material로 각각 stainless foil과 polymide film을 사용하였으며, 고압의 AC power source를 사용하였다. 후향계단 전단과 수직 부분의 두 부분으로 나누어 각각 플라즈마를 발생시켰으며, 플라즈마 발생 위치에 따라서 유동의 재부착 지점이 변경됨을 확인 할 수 있었다.

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유리섬유강화 플라스틱의 LNG 저장탱크용 합판 대체 가능성 평가 (Estimation for Adaptability of Fiber Reinforced Plastic Composite for LNG Storage Tank)

  • 김상범;조정미;조세현;권영수
    • 한국가스학회지
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    • 제7권1호
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    • pp.28-32
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    • 2003
  • 대체 facing material 소재로 유력시되는 FRP를 사용하여 facing material이 갖추어야할 압축, 인장 등 기계적 물성과, vapor barrier도, 화학적 안전성 등을 조사한 결과 모든 면에서 기존의 plywood보다 우수한 성질을 나타냄을 밝혔다. 본 연구의 결과로서 대체 facing material로 FRP를 사용할 경우 LNG 저장 탱크의 안전성이 향상되고 높은 vapor barrier기능으로 인해 탱크의 성능이 향상되는 등 다양한 장점을 나타냄을 알 수 있게 되었다. 따라서 본 연구의 결과는 LNG 저장 탱크의 성능을 개선하는데 기여하며, LNG 저장 탱크용 합판의 대체연구에 적극적으로 활용될 수 있을 것으로 사료된다.

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Facing targets sputtering system에서 TbFeCo박막의 산화에 미치는 제조조건의 영향 (The effect of deposition condition on the oxidation of TbFeCo thin films in facing targets sputtering system)

  • 문정탁;김명한
    • E2M - 전기 전자와 첨단 소재
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    • 제7권6호
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    • pp.511-519
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    • 1994
  • The effect of the deposition conditions, such as the base pressure, working pressure, sputtering power, pre-sputtering, and deposition thickness in facing targets sputtering system(FTS), on the oxidation of the TbFeCo thin films was studied by investigating the magneto-optical properties as well as oxygen analysis by the AES depth profiles. The results showed that the base pressure did not affect the magnetic properties so much, probably due to the short flight distance of the sputtered particles. At the higher sputtering power and lower working pressure with pre-sputtering the oxidation of TbFeCo thin films was decreased. As the film thickness increased the TbFeCo thin films showed the perpendicular anisotropy from in-plane anisotropy overcoming the oxidation effect at the beginning of the sputtering.

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A 12-year long-term study on the external deformation behavior of Geosynthetic Reinforced Soil (GRS) walls

  • Won, Myoung-Soo;Lee, O-Hyeon;Kim, You-Seong;Choi, Se-Kyung
    • Geomechanics and Engineering
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    • 제10권5호
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    • pp.565-575
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    • 2016
  • Geosynthetics reinforced soil (GRS) walls constructed on weak grounds may change in both the horizontal earth pressure and deformation on wall facing. However, only few studies were done in the literature to measure and analyze the horizontal external deformation behavior of GRS walls constructed on soft grounds for a long period of time. The present study describes the external deformation behavior of GRS walls observed for 12-year long-term performance. The horizontal deformation of the geosynthetics-wrapped-facing GRS walls shows a passive behavior along one third of the wall height, from top going downwards, and active behavior for the rest of the wall height. Even if the geogrid and nonwoven geotextiles are exposed directly to sunlight and rainfalls in a span of 12 years, they have functioned well as wall facing. Therefore, the geosynthetic reinforcement material is strong enough to resist ultraviolet rays.

타켓 종류에 따른 대향타겟 스퍼터링 장치의 방전 특성 (Discharge Characteristics of Facing Targets Sputtering Apparatus with Targets Species)

  • 금민종;손인환;신성권;가출현;박용서;김경환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.620-623
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    • 2004
  • In this study, the discharge characteristic of FTS (Facing Targets Sputtering) apparatus was investigated using metal target paramagnetic and ceramic targets such as Zn, Al, $ZnO:Al(Al_2O_3)$, ITO. Threshold voltage and stable stage of discharge show different with target species. Compare with commercial sputtering apparatus, the FTS apparatus is a high-speed sputter method that promotes ionization of sputter gas by screw and reciprocate moving high-speed ${\gamma}$electrons which arrays two targets facing each other, inserts plasma arresting magnetic field to the parallel direction of the center axis of both targets, discharged from targets and accelerated at the cathode falling area. Especially, we notice that the FTS method using ceramic target has stable discharge characteristic even by DC power source.

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대향타겟스퍼터링에 의한 Co-Cr 박막의 제작 (Preparation of Co-Cr Thin Films by Facing Targets Sputtering)

  • 김경환;금민종;공석현;손인환;최성민
    • 한국전기전자재료학회논문지
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    • 제11권5호
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    • pp.418-422
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    • 1998
  • The Co-Cr films are one of the most suitable candidates for perpendicular magnetic recording media. The facing targets sputtering(FTS) system has a advantage of preparing films over a wide range of working gas pressure on plasma-free substrate. In this study, we investigated the possibility of employing FTS system for depositing Co-Cr films. The Co-Cr thin films were deposited with various sputter gas pressure($P_Ar$, 0.1~10mTorr) by using FTS apparatus at temperature of $40^{\circ}C and 220^{\circ}C$, respectively. Crystallographic and magnetic characteristics were evaluated by x-ray diffractometry (XRD) and vibrating sample magnetometer(VSM), respectively. Under argon gas pressure at 0.1mTorr, films with morphologically dense microstructure, good c-axis orientation and higher coercivity were obtained. It has been confirmed that the FTS system is very useful for preparing Co-Cr thin film recording media.

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AZO Films Prepared by Facing Target Sputtering System

  • Kim, Kyung-Hwan
    • Transactions on Electrical and Electronic Materials
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    • 제7권5호
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    • pp.271-275
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    • 2006
  • Al oped zinc oxide (AZO) films were prepared by Facing Targets Sputtering (FTS) system for TCO applications. The electrical, optical and structural properties of AZO thin films have been investigated with input current, oxygen gas flow ratio and substrate temperature. Deposition was carried out at room temperature and $200^{\circ}C$. Working gas pressures were fixed at 1mTorr. As a result, AZO thin film deposited with an optical transmittance over 80 % and a resistivity about $10^{-4}{Omega}{\cdot}cm$.