• Title/Summary/Keyword: FAB(Fast Atom Beam) Plasma Etching

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Fabrication of High-Quality Diffractive-Lens Mold having Submicron Patterns (서브 미크론의 패턴으로 구성된 고효율 회절 렌즈 몰드 제작)

  • Woo, Do-Kyun;Hane, Kazuhiro;Lee, Sun-Kyu
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.34 no.11
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    • pp.1637-1642
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    • 2010
  • In this paper, we present the fabrication of a high-quality diffractive-lens mold having submicron patterns, which is suitable for an ultra-slim optical system. In order to fabricate high-quality diffractive lens with a variety of submicron patterns, the multi-alignment method was used; high-resolution electron-beam lithography and FAB plasma etching were carried out to obtain the patterns. The most important key technology in the multi-alignment method is to reduce alignment error, lithography error, and etching error. In this paper, these major fabrication errors were minimized, and a high-quality diffractive lens with a diameter of $267\;{\mu}m$ (NA = 0.25), minimum pattern width of 226 nm, and thickness of 819 nm was successfully fabricated.