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http://dx.doi.org/10.3795/KSME-A.2010.34.11.1637

Fabrication of High-Quality Diffractive-Lens Mold having Submicron Patterns  

Woo, Do-Kyun (Dept. of Mechatronics, Gwangju Institute of Science and Technology (GIST))
Hane, Kazuhiro (Nanomechanics, Tohoku Univ.)
Lee, Sun-Kyu (Dept. of Mechatronics, Gwangju Institute of Science and Technology (GIST))
Publication Information
Transactions of the Korean Society of Mechanical Engineers A / v.34, no.11, 2010 , pp. 1637-1642 More about this Journal
Abstract
In this paper, we present the fabrication of a high-quality diffractive-lens mold having submicron patterns, which is suitable for an ultra-slim optical system. In order to fabricate high-quality diffractive lens with a variety of submicron patterns, the multi-alignment method was used; high-resolution electron-beam lithography and FAB plasma etching were carried out to obtain the patterns. The most important key technology in the multi-alignment method is to reduce alignment error, lithography error, and etching error. In this paper, these major fabrication errors were minimized, and a high-quality diffractive lens with a diameter of $267\;{\mu}m$ (NA = 0.25), minimum pattern width of 226 nm, and thickness of 819 nm was successfully fabricated.
Keywords
Electron-Beam Lithography; FAB(Fast Atom Beam) Plasma Etching; Diffractive Lens; Multi-Alignment Method;
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