• 제목/요약/키워드: Excimer laser patterning

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ITO Thin Film Ablation Using KrF Excimer Laser and its Characteristics

  • Lee, Kyoung-Chel;Lee, Cheon;Le, Yong-Feng
    • Transactions on Electrical and Electronic Materials
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    • 제1권4호
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    • pp.20-24
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    • 2000
  • This study aimed to develop ITO(Indium Tim Oxide) tin films ablation with a pulsed type KrF excimer laser required for the electrode patterning application in flat panel display into small geometry on a large substrate are. The threshold fluence for ablating ITO on glass substrate is about 0.1 J/㎠. And its value is much smaller than that using 3 .sup rd/ harmonic Nd:YAG laser. Through the optical microscope measurement the surface color of the ablated ITO is changed into dark brown due to increase of surface roughness and transformation of chemical composition by the laser light. The laser-irradiated regions were all found to be electrically isolating from the original surroundings. The XPS analysis showed that the relative surface concentration of Sn and In was essentially unchanged (In:Sn=5:1)after irradiating the KrF excimer laser. Using Al foil made by 2$\^$nd/ harmonic Na:YAG laser, the various ITO patterning is carried out.

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식각액에 따른 용융실리카의 레이저 습식 식각 특성 비교 연구 (A Comparative Study on the Influence of Etchant upon the Etching Rate and Quality in Laser Induced Wet Etching of Fused Silica)

  • 이종호;이종길;전병희
    • 소성∙가공
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    • 제13권3호
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    • pp.268-272
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    • 2004
  • Transparent materials such as fused silica are widely utilized in optical and optoelectronics field because of its outstanding properties, such as transparency in a wide wavelength range, strong damage resistance for laser irradiation, and high thermal and chemical stability. In this study, we made a few micro patterns on the surface of fused silica plate using laser induced wet etching. KrF excimer laser was used as a light source. There were no burrs and micro cracks on the etched surface of fused silica and the flatness of the etched surface was fairly good. We investigated the influence of etchant upon the etch rate and quality in laser induced wet etching. Pyrene-acetone solution and toluene were used as etchant. In the side of etch rate, toluene solution was better than pyrene-acetone solution. But we made in wider range of energy density using pyrene-acetone solution. But pyrene-acetone solution gave us wider window of energy density for successful micro patterning.

Laser Assisted Lift-Off Process as a Organic Patterning Methodology for Organic Thin-Film Transistors Fabrication

  • Kim, Sung-Jin;Ahn, Taek;Suh, Min-Chul;Mo, Yeon-Gon;Chung, Ho-Kyoon;Bae, Jin-Hyuk;Lee, Sin-Doo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1154-1157
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    • 2006
  • Organic thin-film transistors (OTFTs) based on a semiconducting polymer have been fabricated using an organic patterning methodology. Laser assisted lift-off (LALO) technique, ablating selectively the hydrophobic layer by an excimer laser, was used for producing a semiconducting polymer channel in the OTFT with high resolution. The selective wettability of a semiconducting polymer, poly (9-9-dioctylfluorene-co-bithiophene) (F8T2), dissolved in a polar solvent was found to define precisely the pattering resolution of the active channel. It is demonstrated that in the F8T2 TFTs fabricated using the LALO technique and is applicable for the larger area display.

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ArF excimer laser 증착 기술을 이용한 우수한 특성의 YBCO/STO/YBCO 다층 박막 제작 (Fabrication of good quality YBCO/STO/YBCO multilayers by using an ArF excimer laser deposition technique)

  • 정태봉;강준희
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 2000년도 High Temperature Superconductivity Vol.X
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    • pp.80-84
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    • 2000
  • High temperature superconductor shows a good electric and magnetic properties and is known as a good candidate in various electronic device application. At present the technique to construct multilayers composed of HTS films and insulator films has not been fully studied in domestic research institutes. Since the construction of any reasonable eletronic devices require the use of multilayers, the development of HTS eletronic devices has been limited. To manufacture multiplayer, several processing steps which involve deposition and ion millings are required. To manufacture a good quality multilayerd structure, not only the deposition techniques but also the proper patterning have to be developed. In this work, we have fabricated a YBCO/STO/YBCO multiplayer and studied the electronic properties of it.

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UV레이저를 이용한 Cr 박막의 어블레이션 (The UV Laser Ablation of Cr film on Glass Substrate)

  • 윤경구;이성국;김재구;최두선;황경현;정재경;장원석;나석주
    • 한국정밀공학회지
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    • 제17권8호
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    • pp.134-139
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    • 2000
  • In order to understand the removal mechanism and seek the optimal conditions. KrF excimer laser ablation of Cr films on glass substrates is investigated. The surface morphology of the laser-irradiated spot is examined by SEM. The measured single-shot ablation rate is found to be about two times the result of numerical analysis based on a surface vaporization model and heat conduction theory. Surface morphology examination indicates that the Cr film is removed by the sequence of melting-surface vaporization-,melt expulsion by plasma recoil and that the outmost ripple of the diffraction pattern gives a strong effect on the morphology of molten Cr during the melting and vaporization processes. To seek the optimal process parameters for micro patterning morphological investigation is carried out experimentally on samples having different chromium film thicknesses. Optimal processing conditions are determined to enhance the accuracy and quality of thin film removal for micro patterning.

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Optical Equipment in Computer Manufacturing

  • Wilczynski, Janusz S.
    • 한국광학회:학술대회논문집
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    • 한국광학회 1991년도 제6회 파동 및 레이저 학술발표회 Prodeedings of 6th Conference on Waves and Lasers
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    • pp.1-1
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    • 1991
  • The fabrication of computer components requires a great variety of optical equipment. The patterning of integrated circuits is performed either on step-and-repeat cameras, scanning systems or step-and-repeat systems. The image forming optics used in these machines is quite difficult to design and fabricate. In addtion several layers of patterns must be precisely superposed, and also the illuminators have to provide the final irradiance in the image plane constant to within 1%. Other uses of specialized optical equipment are mass production of chip packages, inspection scanners and laser ablation cameras for polymers. The details of some of these systems will be described with particular ephasis on different optical structures and the use of excimer lasers as light sources.

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