• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1781-1784
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• 2007

The increase of repetition rate, the dithering of laser optics, and the extension of pulse duration time are major approaches in improving the picture quality of AMOLEDs fabricated by excimer laser crystallization (ELC). Advanced solid phase crystallization (ASPC) has been developed to improve the uniformity and the process cost. Even though the mobility of ASPC-TFT is lower than that of ELC-TFT, it is high enough to drive AMOLED pixels.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.1
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• pp.6-11
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• 2001

We studied the feasibility of optical lithography for the critical layers of 0.12${\mu}{\textrm}{m}$ DRAM assuming ArF excimer laser as a light source. To enhance the fidelity of aerial image and process margin, Phase shift mask (PSM) patterns as well as binary mask patterns are corrected with in-house developed Optical Proximity Correction (OPC) software. As the result, w found that the aerial image of critical layers of DRAM cell with 0.12${\mu}{\textrm}{m}$ design rule could not be reproduced with binary masks. But if we use PSM or optical proximity corrected PSM, the fidelity of aerial image ,resolution and process margin are so much enhanced that they could be processed with optical lithography.

• Journal of ILASS-Korea
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• v.6 no.3
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• pp.1-7
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• 2001

In this study, quantitative measurement of nitric oxide concentration distributions visualization were investigated in the laminar $CH_4/O_2N_2$ nixed flame by Planar laser-induced fluorescence(PLIF). The NO A-X (0,0) vibrational band around 226nm was excited using a XeCl excimer-pumped dye laser. Selecting an appropriate NO transition minimizes interference from Rayleigh scattering and $O_2$ fluorescence. The measurements were taken in $CH_4/O_2N_2$ premixed flame with equivalence ratios varying from $1.0{\sim}1.6$, and a fixed flow rate of 3slpm. NO was found to produce primarily between an inner premixed and an outer nonpremixed flame front, and total NO concentration is raised when equivalence ratios increase. These results suggest that prompt NO is likely to contribute to MO formation in $CH_4/O_2N_2$ premixed flame. Furthermore, this trend was well matched with previous works.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2001.04a
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• pp.914-917
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• 2001

Single-shot laser damage of thin Cr films on glass substrates has been studied to understand the cracking and peeling-off mechanism. A numerical model is developed for the calculation of transient heat transfer and thermal stresses in Cr films during excimer laser irradiation and cooling, the transient temperature, and the stress-strain fields are analyzed by using a three-dimensional finite-element model of heat flow. According to the numerical analysis for the experimentally determined cracking and peeling-off conditions, cracking is found to be the result of the tensile brittle fracture due to the excessive thermal stresses formed during the cooling process, while peeling-off is found to be the combined result of films bulging from the softened glass surface at higher temperature and the tensile brittle fracture during the cooling process.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.109-112
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• 2008

The grain size of JIC poly-Si can be varied from few tens of nanometers to the one having the larger grain size exceeding that of excimer laser crystallized (ELC) poly-Si according transmission electron microscopy. JIC poly-Si exhibits an excellent uniformity with regards to the grain size. We report here the blanket crystallization of the large area using the $2^{nd}$ generation glass substrate.

• Journal of the Korean Ceramic Society
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• v.43 no.3 s.286
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• pp.185-192
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• 2006

The effects of annealing on structural and electrical properties of ITO/PES (Indium Tin Oxide/Polyethersulfone) films was investigated. Amorphous ITO thin films were grown on plastic substrates, PES using low temperature DC magnetron sputtering. Various post annealing techniques were attempted to research variations of microstructure and electrical properties: i) conventional thermal annealing, ii) excimer laser annealing, iii) UV irradiation. The electrical properties were obtained using Hall effect measurements and DC 4-point resistance measurement. The microstructural features were characterized by FESEM, XRD, Raman spectroscopy in terms of morphology and crystallinity. Optimized UV treatment exhibits the enhanced conductivity and crystallinity, compared to those of conventional thermal annealing.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.45-48
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• 2006

Effectiveness and its possibility of ELA (Excimer Laser Annealing) for advanced Si TFT system on insulator are described. Currently, extensive study is carried out to realize an advanced SoG (System on Glass) based on LTPS (Low Temperature Poly-Si) technique. By reducing further the process temperature and by improving the fabrication process of LTPS, addressing TFT circuits for FPD (Flat Panel Display) can be mounted onto a flexible plastic as well as onto a glass substrate. Functional devices on the insulating panels are developed to be formed by using ELA. Although technical issues are remained for the fabrication process, Si transistors including 3D TFT structure formed by ELA is expected as a functional Si system on insulator in the ubiquitous IT era.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1154-1157
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• 2006

Organic thin-film transistors (OTFTs) based on a semiconducting polymer have been fabricated using an organic patterning methodology. Laser assisted lift-off (LALO) technique, ablating selectively the hydrophobic layer by an excimer laser, was used for producing a semiconducting polymer channel in the OTFT with high resolution. The selective wettability of a semiconducting polymer, poly (9-9-dioctylfluorene-co-bithiophene) (F8T2), dissolved in a polar solvent was found to define precisely the pattering resolution of the active channel. It is demonstrated that in the F8T2 TFTs fabricated using the LALO technique and is applicable for the larger area display.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.1108-1111
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• 2005

We propose an improved laser crystallization method based on a directional lateral growth technique. To assess the feasibility of this technique, we have developed an experimental prototype using a 351 nm XeF excimer laser and special optics to produce a long and extremely sharp, narrow beam without need for a photo type mask pattern. Using this system, we have demonstrated very uniform directional laterally grown poly-Si films without any grain boundary protrusions. We believe this method can meet the high performance and uniformity requirements needed for future TFTs in System On Panel (SOP) and OLED applications, as well as providing high process throughput for mass production.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.8
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• pp.806-811
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• 2004

1-Hydroxy-4-(2-naphthalenesulfonyloxy) cyclohexane(1), 1,4-di-(2-naphthalenesulfonyloxy) cyclohexane(2), 1-hydroxy-4-(2-thiophenesulfonyloxy) cyclohexane(3), 1,4-di-(2-thiophenesulfonyloxy) cyclohexane(4) were synthesized and evaluated for their performance as novel acid amplifiers for 193 nm photoresists. These acid amplifiers(1-4) showed reasonable thermal stability at the usual resist-processing temperature, 9$0^{\circ}C$-12$0^{\circ}C$. And estimated by the sensitivity curve, (1)-(4) enhanced the sensitivity of poly(tert-butyl methacrylate) film by 1.2-1.4 times, compared to poly(tert-butyl methacrylate) film whithout acid amplifiers, in the presence of a photoacid generator.