• 한국전자통신학회논문지
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• 제6권2호
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• pp.225-230
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• 2011

본 논문에서는 Retinex를 이용하여 객체의 추적을 할 때, 빛의 변화에 안정적으로 대응할 수 있게 하는 시스템을 제안한다. 기존의 인터렉션 시스템들은 한정된 공간 안에서 빛의 변화가 없는 상태를 구성을 하여 콘텐츠의 작동이 이루어졌기 때문에 빛의 변화에 대한 대응을 하지 않았다. 하지만 빛의 변화가 있는 실내에서 이러한 인터렉션 콘텐츠들이 작동할 경우 시간에 대한 빛의 투입량이 바뀌게 된다. 빛의 변화에 민감한 카메라를 통해 객체를 추적할 경우 약간의 빛으로 시스템이 오작동 하는 경우가 있으므로 빛의 변화는 시스템의 작동에 많은 영향을 미치는 요소 중의 하나이다. 본 논문에서는 이러한 빛의 변화를 안정적이고 일정한 처리를 위해 Retinex 알고리즘을 이용한다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.561-562
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• 2006

The purpose of this study was to investigate the root cause of adhesion of silica and ceria particles during Poly-Si, TEOS, and SiN CMP process, respectively. The zeta-potentials of abrasive particles and wafers were observed negative surface charges in the alkaline solutions. SAC and STI patterned wafers have intermediate values of their composition surface's zeta potentials. The theoretical interaction force and adhesion force of silica and ceria particle were calculated in solution with acidic, neutral and alkaline pH. A stronger attractive force was calculated for silica and ceria particles on wafers in acidic solutions than in alkaline solutions. The theoretical interaction forces of the SAC and STI patterned wafers have intermediate values of their constitution wafer's values. The adhesion forces is observed lower values in alkaline solutions than in acidic solutions. And the ceria particle has lower adhesion than that of the silica particle.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.1283-1287
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• 2004

The design rules are being more strict with requirement of operation speed and development of IC industry. For this reason, required minimum line-width has been narrowed under sub-micron region. As the length of minimum line-width is narrowed, local and global planarization are being prominent. CMP(Chemical-Mechanical Polishing), one of the planarizarion technology, is a process which polishes with the ascent of chemical reaction and relative velocity between pad and wafer without surface defects. CMP is performed with a complex interaction among many factors, how CMP has an interaction with such factors is not evident. Accordingly, the studies on this are still carrying out. Therefore, an examination of the CMP phenomena and an accurate understanding of compositive factors are urgently needed. In this paper, we will consider of the relations between the effects of temperature which influences many factors having an effect on polishing results and the characteristics of CMP in order to understand and estimate the influence of temperature. Then, through the interaction of shown temperature and polishing result, we could expect to boost fundamental understanding on complex CMP phenomena.

• 정보교육학회논문지
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• 제14권2호
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• pp.229-240
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• 2010

본 연구는 초등학교 3학년 영어과 교수 학습용 전자교과서를 개발 적용하는 것이다. 이를 위해 현재 사용되고 있는 CD-ROM 타이틀의 단점을 보완하고 전자교과서가 가진 장점을 극대화하기 위해 XML을 기반으로 설계하고 개발하였다. 개발된 후에는 그 효과성을 알아보기 위해 상호작용성, 만족도, 그리고 흥미도의 3가지 요소를 중심으로 포커스 그룹 인터뷰를 실시하였다. 연구 결과, 개발된 영어과 전자교과서의 사용으로 학습자들의 상호작용성, 학습 만족감, 그리고 학습 흥미도가 높아져 자기 주도적 학습 능력이 보다 증진될 것으로 예상된다. 이것은 영어 학습 효과성으로 이어질 것이다

• Advances in nano research
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• 제15권5호
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• pp.385-399
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• 2023

Hexagonal boron nitride (h-BN), commonly referred to as Boron Nitride Nanoribbons (BNNRs), is an electrical insulator characterized by high thermal stability and a wide bandgap semiconductor property. This study delves into the electronic properties of two BNNR configurations: Armchair BNNRs (ABNNRs) and Zigzag BNNRs (ZBNNRs). Utilizing the nearest-neighbour tight-binding approach and numerical methods, the electronic properties of BNNRs were simulated. A simplifying assumption, the Hamiltonian matrix is used to compute the electronic properties by considering the self-interaction energy of a unit cell and the interaction energy between the unit cells. The edge perturbation is applied to the selected atoms of ABNNRs and ZBNNRs to simulate the electronic properties changes. This simulation work is done by generating a custom script using numerical computational methods in MATLAB software. When benchmarked against a reference study, our results aligned closely in terms of band structure and bandgap energy for ABNNRs. However, variations were observed in the peak values of the continuous curves for the local density of states. This discrepancy can be attributed to the use of numerical methods in our study, in contrast to the semi-analytical approach adopted in the reference work.

• Transactions on Electrical and Electronic Materials
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• 제7권1호
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• pp.26-29
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• 2006

We present the structural, magnetic, and electrical properties in the (Al,Mn)N films with various Mn concentrations grown by plasma-enhanced molecular beam epitaxy. X-ray diffraction analyses reveal that the (Al,Mn)N films have the wurtzite structure without secondary phases. All (Al,Mn)N films showed the ferromagnetic ordering. Particularly, ($Al_{1-x}Mn_{x}$)N film with x = 0.028 exhibited the highest magnetic moment per Mn atom at room temperature. Since all the films exhibit the insulating characteristics, the origin of ferromagnetism in (Al,Mn)N might be attributed to either indirect exchange interaction caused by virtual electron excitations from Mn acceptor level to the valence band within the samples or a percolation of bound magnetic polarons arisen from exchange interaction of localized carriers with magnetic impurities in a low carrier density regime.

• 한국전자통신학회논문지
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• 제10권8호
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• pp.891-900
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• 2015

최근 클라우드 컴퓨팅이 새로운 공격 대상으로 부상하기 시작했으며, 클라우드의 다양한 서비스를 지연 및 방해하기 위한 악의적인 DDoS 공격이 진행되고 있다. 본 논문에서는 허니팟 보안 기술과 클라우드 컴퓨팅의 자원을 이용한 호넷 클라우드를 제안하며, 간략하게 능동 상호동작의 개념과 보안 기능들을 설계한다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1993년도 추계학술대회 논문집
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• pp.134-136
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• 1993

Microelectronic fabrication technology .is based on the use of lithsgraphy to create small linewidths and patterns that make up ULSI. In previous papers, we discussed the theoretically calculated values such as ion range, ion concentration,ion transmission coefficient and the defocused ion beam-induced characteristics in a-Se$_{75}$Ge$_{25}$. In this paper, the typical Monte Carlo (MC) simulation results and p개cedures for the focused ion beam lithography were presented. The interaction and scattering of ions with the resist depend on the beam energy, impact parameter arid resist parameters. For ion exposure simulations, the quantity of interest is the spatial distribution of energy deposited by ions in the resist due to interaction phenomena with resist ions.s.s.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.711-714
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• 2004

Chemical mechanical polishing (CMP) has been widely accepted for the global planarization of multi-layer structures in semiconductor manufacturing. However, it still has various problems to the CMP equipment, in particular, among the CMP components, process variables are very important parameters in determining the removal rate and non-uniformity. Using a design of experiment (DOE) approach, this study was performed investigating the interaction between the various parameters such as turntable and head speed, down force and back pressure during CMP. Using statistical analysis techniques, a better understanding of the interaction behavior between the various parameters and the effect on removal rate, no-uniformity and ETC (edge to center) is achieved.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.256-256
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• 2010

It is demonstrated that graphene sheets are produced via thermal reduction of graphene oxide (GO) in the presence of imidazoium-based poly (ionic liquid) (PIL). PILs plays an important role in minimizing the reduction time and dispersing graphene sheets in organic solvents. In addition, as-obtained graphene sheets are found to be functionalized with PIL molecules by the strong interaction of PIL and the graphene, as analyzed by various physical methods such as atomic force microscopy (AFM), X-ray photoelectric spectroscopy (XPS) and Raman spectroscopy. Such a strong interaction allows the successful production of graphene/PIL composites, in which their electrical properties are controllable by the loading level of graphene in the PIL matrix.