• Title/Summary/Keyword: Electronic Device Alignment System

Search Result 11, Processing Time 0.019 seconds

Vertical Growth of Amorphous SiOx Nano-Pillars by Pt Catalyst Films (Pt 촉매 박막을 이용한 비정질 SiOx 나노기둥의 수직성장)

  • Lee, Jee-Eon;Kim, Ki-Chul
    • Journal of the Korea Academia-Industrial cooperation Society
    • /
    • v.19 no.1
    • /
    • pp.699-704
    • /
    • 2018
  • One-dimensional nanostructures have attracted increasing attention because of their unique electronic, optical, optoelectrical, and electrochemical properties on account of their large surface-to-volume ratio and quantum confinement effect. Vertically grown nanowires have a large surface-to-volume ratio. The vapor-liquid-solid (VLS) process has attracted considerable attention for its self-alignment capability during the growth of nanostructures. In this study, vertically aligned silicon oxide nano-pillars were grown on Si\$SiO_2$(300 nm)\Pt substrates using two-zone thermal chemical vapor deposition system via the VLS process. The morphology and crystallographic properties of the grown silicon oxide nano-pillars were investigated by field emission scanning electron microscopy and transmission electron microscopy. The diameter and length of the grown silicon oxide nano-pillars were found to be dependent on the catalyst films. The body of the silicon oxide nano-pillars exhibited an amorphous phase, which is consisted with Si and O. The head of the silicon oxide nano-pillars was a crystalline phase, which is consisted with Si, O, Pt, and Ti. The vertical alignment of the silicon oxide nano-pillars was attributed to the preferred crystalline orientation of the catalyst Pt/Ti alloy. The vertically aligned silicon oxide nano-pillars are expected to be applied as a functional nano-material.