• Applied Microscopy
• /
• v.39 no.1
• /
• pp.79-83
• /
• 2009

We report a useful method to estimate the electron dose rate which may be a decisive factor to characterize sample properties. Even though most mircoscopes have their own exposure meters, there are several practical concerns when such exposure meters are used to measure the electron dose rate: 1) Specimen should be avoided within the entire area of exposure meter; 2) beam current has to be always recorded whenever the operation mode is changed; 3) the electron dose rate can not be calculated for the beam current beyond the detectable range. To overcome these limitations, we suggest a useful method which utilize a CCD (charge coupled device) camera which is now a popular detector to obtain the final electron micrographs. We have evaluated the CCD sensitivity using the linear relationship between electron current on the exposure meter and counter ratio on the CCD camera which are built in KBSI-HVEM (high voltage electron microscope). Applying the new method, we obtained the CCD sensitivity which are approximately 0.039 counts/$e^-$ and 1.37 counts/$e^-$ for the Top-TV and the HV-GIF CCD cameras, respectively.

• The Transactions of the Korean Institute of Electrical Engineers C
• /
• v.50 no.6
• /
• pp.281-287
• /
• 2001

In order to obtain guidelines for design and operation of a new plasma source by a magnetic neutral loop discharge(NLD), the electron behavior was studied experimentally and numerically. Experimentally, the magnetic field gradient was changed over a wide range, and it was found that there existed an optimum value for efficient plasma production. Analyses of the electron behavior were performed using a model that included effects of a three dimensional electromagnetic field configuration considering the spatial decay of the electric field, and the limitation to the motion of electron caused by the existence of walls and thus electron loss at wall surfaces. These three dimensional factors were found to explain the existence of the optimum magnetic field gradient. It was shown that the L dependence of the plasma production efficiency was firstly decided by the finite decay length of the electric field strength, which was further modified by electron elastic collisions with neutral atoms which drove the electron to walls. The latter effect tends to reduce the optimum value of L.

• Journal of radiological science and technology
• /
• v.21 no.2
• /
• pp.36-42
• /
• 1998

Treatment of a large diseased area with electron often requires the use of two or more adjoining fields. In such cases, not only electron beam divergence and lateral scattering but also fields overlapping and separation may lead to significant dose inhomogeneities(${\pm}20%$) at the region of junction of fields. In this study, we made Acrylic Electron Wedges to improve dose inhomogeneities(${\pm}5%$) in these junction areas and to apply it to clinical practices. All measurements were made using 6, 9, 12, 16, 20 MeV Electron beams from a linear accelerator for a $10{\times}10\;cm$ field at 100cm of SSD. Adding a 1 mm sheet of acryl gradually from 1 mm to 15 mm acquires central axis depth dose beam profile and isodose curves in water phantom. As a result, for all energies, the practical range was reduced by approximately the same distance according to the acryl insert, e.g. a 1 mm thick acryl insert reduces the practical range by approximately 1 mm. For every mm thickness of acryl inserted, the beam energy was reduced to approximately 0.2 MeV. These effects were almost Independent of beam energy and field size. The use of Acrylic Electron Wedges produced a small increase(less than 3%) in the surface dose and a small increase(less than 1%) in X-ray contamination. For acryl inserts, thickness of 3 mm or greater, the penumbra width increased nearly linear for all energies and isodose curves near the beam edge were nearly parallel with the incident beam direction at the point of penumbra width($35\;mm{\sim}40\;mm$). We decide heel thickness and angle of the wedge at this point. These data provide the information necessary to design Acrylic Electron Wedge which can be used to improve dose uniformity at electron field junctions and it will be effectively applied to clinical practices.

• The Journal of Korean Society for Radiation Therapy
• /
• v.10 no.1
• /
• pp.60-68
• /
• 1998

Treatment of a large diseased area with electron often requires the use of two or more adjoining fields. In such cases, not only electron beam divergence and lateral scattering but also fields overlapping and separation may lead to significant dose inhomogeneities(${\pm}20\%$) at the field junction area. In this study, we made Acrylic Electron Wedges to improve dose homogeneities(${\pm}5\%$) in these junction areas and considered application it to clinical practices. All measurements were made using 6, 9, 12, 16, 20MeV Electron beams from a linear accelerator for a $10{\times}10cm$ field at 100cm SSD. Adding a 1 mm sheet of acryl gradually from 1 mm to 15 mm, We acquired central axis depth dose beam profile and isodose curves in water phantom. As a result, for all energies, the practical range was reduced by approximately the same distance as the thickness of the acryl insert, e.g. a 1 mm thick acryl insert reduce the practical range by approximately 1 mm. For every mm thickness of acryl inserted, the beam energy was reduced by approximately 0.2MeV. These effects were almost independent of beam energy and field size. The use of Acrylic Electron Wedges produced a small increase $(less\;than\;3\%)\;in\;the\;surface\;dose\;and\;a\;small\;Increase(less\;than\;1\%)$ in X-ray contamination. For acryl inserts, thickness of 3 mm or greater, the penumbra width increased nearly linear for all energies and isodose curves near the beam edge were nearly parallel with the incident beam direction, and penumbra width was $35\;mm{\sim}40\;mm$. We decide heel thickness and angle of the wedge at this point. These data provide the information necessary to design Acrylic Electron Wedge which can be use to improve dose uniformity at electron field junctions and it will be effectively applicated in clinical practices.

• Applied Microscopy
• /
• v.42 no.2
• /
• pp.105-109
• /
• 2012

Electron tomography (ET) of biological specimens is performed from a series of images obtained over a range of tilt angles in a transmission electron microscope. When using the high voltage electron microscope (HVEM), various noises appear in EM images acquired from thick sections by high voltage electron beam. In order to obtain an adequate result in electron tomograms that allow visualization of rather complex and mega-cellular structure such as brain tissue, it is necessary to remove the noise in each original tilt images of thick section. Using band-pass filtering of original tilt images, the filtered images are obtained and used to assemble a reconstructed tomogram. The qualified 3D tomogram from filtered images results in a considerable reduction of the noises compared to conventional tomogram. In conclusion, this study suggests that band-pass filtering is effective to improve the brightness and intensity of HVEM produced tomograms acquired from micron-thick sections of biological specimens.

• Journal of the Korean Ceramic Society
• /
• v.20 no.4
• /
• pp.333-339
• /
• 1983

Semiconducting glaxe of iron system for the recent use as high Voltage porcelain insulators often showed the tendancy of unstable thermal properties. Thus the development of frit including magnetite was studied to cover the defect. In the experimental process melted and quenched frits were ground pelletized and heat-treated at various temperatures in the range of 800-1 $300^{\circ}C$ for various soaking time within 4 hours and then crystallized specimens were obtained. The speciment were studied with optical and electron microscope DTA x-ray diffractometer and electrometer The results obtained were as follows : 1) The optimum condition for the crystal growth of magnetite in the frite was the heat-treatment of $1300^{\circ}C$ for 3hrs and in this case the range of crystal size was $10-11\mu\textrm{m}$ 2) The activation energy for the crystal growth of magnetite was 21.1 kcal/mole. 3) The heat-treament at $1, 250^{\circ}C$ and $1, 300^{\circ}C$ resulted in the good thermal stability and the range of surface resistivity was $3.5{\times}10^4-4.0{\times}10^7$, /TEX> $\Omega$/$cm^2$ which was adguate to semiconducting frit. 4) The conduction mechanism seems to be due to the electron mobility rather than ion mobility and the activa-tion energy for the conduction was 0.07-0.15eV/mole for the heat-treated specimes in the range of 1, 250-1, 300C

• Bulletin of the Korean Chemical Society
• /
• v.34 no.1
• /
• pp.99-106
• /
• 2013

Polyaniline-yttrium trioxide (PAni-$Y_2O_3$) composites were synthesized by the in-situ polymerization of aniline in the presence of $Y_2O_3$ The composite formation and structural changes in these composites were investigated by X-ray diffraction (XRD), Fourier transform infra red spectroscopy (FTIR), scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The direct current (DC) electrical conductivity of the order of $0.51{\times}10^{-2}\;S\;cm^{-1}-0.283\;S\;cm^{-1}$ in the temperature range 300 K-473 K indicates semiconducting behavior of the composites. Room temperature AC conductivity and dielectric response of the composites were studied in the frequency range of 10 Hz to 1 MHz. The variation of AC conductivity with frequency obeyed the power law, which decreased with increasing weight percentage (wt %) of $Y_2O_3$. Studies on dielectric properties shows the relaxation contribution coupled by electrode polarization effect. The dielectric constant and dielectric loss in these composites depend on the content of $Y_2O_3$ with a percolation threshold at 20 wt % of $Y_2O_3$ in PAni. Electromagnetic interference shielding effectiveness (EMI SE) of the composites in the frequency range 100 Hz to 2 GHz was in the practically useful range of -12.2 dB to -17.2 dB. The observed electrical and shielding properties were attributed to the interaction of $Y_2O_3$ particles with the PAni molecular chains.

• Journal of the Korean Society of Food Science and Nutrition
• /
• v.26 no.6
• /
• pp.1039-1043
• /
• 1997

Correlation among color intensity, electron donating ability to $\alpha$, $\alpha$-diphenyl-$\beta$-dicrylhydrazy(DPPH) and cultivation conditions by Bacillus subtilis DC-2 were tested with response surface methodology. Both of pigment generation ability and DPPH were more affected by temperature than any other factor. The highest correlation was appeared between color intensity and DPPH as 0.8364 which is significant at 1% level. After fixing cultivation time which is not significant at 10% level to 84hrs as optical cultivation time, response surface methodology was conducted in regarding temperature and color intensity. As a result of overlapped contour map of color intensity and DPPH, when cultivation temperature was in the range of 38.9~41.1$^{\circ}C$ and pH was in the range of 8.34~9.12, optical density of color intensity was predicted higher than 0.374 at 390nm and DPPH was infered higher than 1.310 at 528nm. In the range of optical culture condition, cultivation temperature, pH and cultivation time was fixed to 4$0^{\circ}C$, 8.5 and 85hrs, respectively. In resulting, observation value of color intensity and DPPH was in the range of anticipation value as 0.386 at 390nm and 1.332 at 528nm respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.11b
• /
• pp.141-144
• /
• 2001

An accurate cross sections set are necessary for the quantitatively understanding and modeling of plasma phenomena. By using the electron swarm method. we determine an accurate electron cross sections set for objective atoms or molecule at low electron energy range. In previous paper, we calculated the electron transport coefficients in pure $CF_4$ molecular gas by using two-term approximation of the Boltzmann equation. And by using this simulation method. we confirmed erroneous calculated results of transport coefficients for $CF_{4}$ molecule treated in this paper having 'C2v symmetry' as $C_{3}H_{8}$ and $C_{3}F_{8}$ which have large vibrational excitation cross sections which may exceed elastic momentum transfer cross section. Therefore, in this paper, we calculated the electron transport coefficients(W and $ND_L$) in pure $CF_4$ gas by using multi-term approximation of the Boltzmann equation by Robson and Ness which was developed at lames-Cook university, and discussed an application and/or validity of the calculation method by comparing the calculated results by two-term and multi-term approximation code.

• Macromolecular Research
• /
• v.13 no.5
• /
• pp.435-440
• /
• 2005

This study describes a method where the match of two different length scales, i.e., the patterns from self-assembled block copolymer (<50 nm) and electron beam writing (>50 nm), allow the nanometer scale pattern mask. The method is based on using block copolymers containing a poly(methyl methacrylate) (PMMA) block, which is subject to be decomposed under an electron beam, as a pattern resist for electron beam lithography. Electron beam on self assembled block copolymer thin film selectively etches PMMA microdomains, giving rise to a polymeric nano-pattern mask on which subsequent evaporation of chromium produces the arrays of Cr nanoparticles followed by lifting off the mask. Furthermore, electron beam lithography was performed on the micropatterned block copolymer film fabricated by micro-imprinting, leading to a hierarchical self assembled pattern where a broad range of length scales was effectively assembled, ranging from several tens of nanometers, through submicrons, to a few microns.