• Bulletin of the Korean Chemical Society
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• 제22권8호
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• pp.827-832
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• 2001

The excitation temperature and electron number density have been measured for end-on-view ICP discharge. In this work, end-on-view ICP-AES equipped with the newly developed “optical plasma interface (OPI)” was used to eliminate or remove the neg ative effects caused by end-on-plasma source. The axial excitation temperature was measured using analyte (Fe I) emission line data obtained with end-on-view ICP-AES. The axial electron number density was calculated by Saha-Eggert ionization equilibrium theory. In the present study, the effects of forward power, nebulizer gas flow rate and the presence of Na on the excitation temperature and electron number density have been investigated. For sample introduction, two kinds of nebulizers (pneumatic and ultrasonic nebulizer) were utilized.

• Journal of Advanced Marine Engineering and Technology
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• 제23권4호
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• pp.514-522
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• 1999

The laser-induced plasma affects greatly on the results of welding process. moreover selective evaporation loss of alloying elements leads to change in chemical composition of weld metal as well as the mechanical properties of welded joint. this study was undertaken to obtain a fundamental knowledge of pulsed laser welding phenomena especially evaporation mechanism of different aluminum alloys. The intensities of molecular spectra of AlO and MgO were different each other depeding on the power density of a laser beam Under the low power density condition the MgO band spectrum was predominant in intensity while the AlO spectra became much stronger with an increase in the power density. These behaviors have been attributed to the difference in evaporation phenomena of Al and Mg metals with different boiling points and latent heats of vaporization. The time-averaged plasma temperature and electron number density were determined by spectroscopic methods and consequently the obtained temperature was $3,280{\pm}150K$ and the electron number density was $1.85{\times}10^{19}\;l/m^3$.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집
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• pp.248-251
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• 2002

We measured the electron drift velocity, W, in 0.5% $SF_{6}$-Ar mixture over the E/N range from 30 Td to 300 Td and gas pressure range from 0.1 to 8 Torr by the double shutter drift tube with a variable drift distance. This coefficient in the mixture was calculated over the same E/N and gas pressure range by using the two-term approximation of the Boltzmann equation. And the measured and calculated values at different gas number density at each E/N was appreciable dependence in the results on the gas number density,

• 대한화학회지
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• 제30권3호
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• pp.327-332
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• 1986

유도결합 플라스마 공간내의 전자밀도를 측정하였다. 전자밀도의 측정시 유도결합 플라스마의 작동조건은, (1) 냉각기체만 사용할 때, (2) 냉각기체와 운반기체만을 사용할 때, (3) 보통의 작동조건은, 즉 에아로졸을 포함한 운반기체를 사용할 때, (4) 약 88%의 에아로졸을 제거시켰을 때, 그리고 (5) 과량의 리튬을 주입시켰을 때로서 분류하였다. 보통의 작동조건에서 플라스마의 낮은 부분에서는 전자밀도가 상당히 감소하여 플라스마내의 가장 전자밀도가 큰 곳보다 약 80배 감소하였다. 이온화 방해영향을 일으키는 알칼리금속을 과량으로 넣었을 때 전자밀도의 변화는 관찰되지 않았고 유도코일의 power를 증가시키면 전자밀도도 증가하였다.

• 조명전기설비학회논문지
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• 제27권7호
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• pp.52-58
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• 2013

The two-dimensional finite difference time domain algorithm is used to numerically reconstruct the electron density profile in O-mode ultrashort pulse reflectometry. A Gaussian pulse is employed as the source of a probing electromagnetic wave. The Gaussian pulse duration is chosen in such a manner as to have its frequency spectrum cover the whole range of the plasma frequency. By using a number of numerical band-pass filters, it is possible to compute the time delays of the frequency components of the reflected signal from the plasma. The electron density profile is reconstructed by substituting the time delays into the Abel integral equation. As a result of simulation, the reconstructed electron density profile agrees well with the assumed profile.

• 한국전기전자재료학회논문지
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• 제19권3호
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• pp.301-306
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• 2006

The electron drift velocity W and the product of the longitudinal diffusion coefficient and the gas number density $ND_{L}$ in the $0.525\;\%$ and $5.05\;\%$ $C_{3}F_8-Ar$ mixtures were measured by using the double shutter drift tube with variable drift distance over the E/N range from 0.03 to 100 Td and gas pressure range from 1 to 915 torr. And we determined the electron collision cross sections set for the $C_{3}F_8$ molecule by STEP 1 of electron swarm method using a multi-term Boltzmann equation analysis. Our special attention in the present study was focused upon the vibrational excitation and new excitations cross sections of the $C_{3}F_8$ molecule.

• 한국패류학회지
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• 제4권1호
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• pp.1-16
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• 1988

The authors observed histochemical and ultrastructural characters on the osphradium of Rapana venosa Valenciennes using light microscope, scanning and transmission electron microscpes. The results were as follows:1)The basic structure of osphradium was bipectinated shape, which consisted of a septum situating in the center of osphradium and numerous osphradial leaflets. On the other hand, Epidermis of ospradial leaflets formed the structure of pseudostratified ciliated columnar epithelium which was composed of an epithelial cell layer, a basal cel layer and a neuropile. 2) Ciliated dpithelial cells:A large number of these cells were observed on the lateral and ventral regions but a small number of them were observed on the dorsal region. These cells had cylindrical microvilli, slender mitochondria and serve fibers.3) Supporting cells: These cells had cylindrical microvilli, spongy layer, electron dense granules, mitochondria and nerve fibers4) Four types secretory epothelial cells: Four distinct types of secretory epithelial cells were recognized and were arbitrily designated as Type I, Type II, Type III and Type IV.cell type I: These cells contained electron denwe granules(diameter, 0.94-1.56${\mu}{\textrm}{m}$), well developed Golgi apparatus and rough endoplasmic reticula, cell type II: These cills contained two types of granules of the different electron density. One was high electron density granules which were 0.4-1.0${\mu}{\textrm}{m}$ in diameter, The other was low electron density granules which were 0.75-1.2${\mu}{\textrm}{m}$ in diameter.cell type III:These cells had fibrous secretory materials and exhibited strongly positive reaction with Toluidine blue.cell type IV:A large number of this type of cells were observed on the ventral region of ospgradial leaflets and positively reacted with periodic acid Schiff reagent. 5)Dark cells contained several electron dense cillaty rootlets and unmerous granules but cellular organelles were not observed.6) Four types basal cells: Four distinci types of basal cells were recognized and arbitrarily designated as Type I, Type II, Type III and Type IV.Cell type I(light cell): These cells exhibited low electuon density and contained short smooth endoplasmic reticula, several vacuoles and granules.

• 전기학회논문지
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• 제66권2호
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• pp.370-378
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• 2017

A fluid model of 2D axis-symmetry based on inductively coupled plasma (ICP) reactor using $N_2/NH_3/SiH_4$ gas mixture has been developed for hydrogenated silicon nitride ($SiN_x:H$) deposition. The model was comprised of 62 species (electron, neutral, ions, and excitation species), 218 chemical reactions, and 45 surface reactions. The pressure (10~40 mTorr) and gas mixture ratio ($N_2$ 80~96 %, $NH_3$ 2~10 %, $SiH_4$ 2~10 %) were considered simulation variables and the input power fixed at 1000 W. Different distributions of electron, ions, and molecules density were observed with pressure. Although ionization rate of $SiH_2{^+}$ is higher than $SiH_3{^+}$ by electron direct reaction with $SiH_4$, the number density of $SiH_3{^+}$ is higher than $SiH_2{^+}$ in over 30 mTorr. Also, number density of $NH^+$ and $NH_4{^+}$ dramatically increased by pressure increase because these species are dominantly generated by gas phase reactions. The change of gas mixture ratio not affected electron density and temperature. With $NH_3$ and $SiH_4$ gases ratio increased, $SiH_x$ and $NH_x$ (except $NH^+$ and $NH_4{^+}$) ions and molecules are linearly increased. Number density of amino-silane molecules ($SiH_x(NH_2)_y$) were detected higher in conditions of high $SiH_x$ and $NH_x$ molecules density.

• 한국의학물리학회지:의학물리
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• 제17권2호
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• pp.105-113
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• 2006

본 연구는 전산치료선량계획장치에서 중첩(Superposition)법을 사용해 비균질성 조직층을 통한 교정선량을 확인하기 위해 수행되었다. 조직등가물질로는 폐조직으로 콜크($\rho=0.2\;g/cc$)를, 근조직에는 n-Glucose, 골조직에는 $K2HPO4$를 사용한 시료의 전자밀도를 구하였으며, CT영상은 110 KVp와 130 KVp X선을 주사해서 얻고 CT번호(H)와 전자밀도의 함수관계를 조사하였다. 물에 대한 전자밀도비는 컴퓨터선량계획에 중요한 변수이므로 CT번호에 대응된 전자밀도비를 입력하고, 선량확인을 위해 펜텀 구성은 폴리스탈린 고체 펜텀 사이에 5.0 cm 층의 시료를 삽입하고 깊이 12.0 cm와 20.0 cm의 조직 선량을 구하여 실측과 비교하였다. 실험결과 CT번호-전자밀도비는 광전효과 현상에 영향을 크게 받게 되어 원자번호가 높은 재질에서 비선형적으로 나타났으며, 130 KVp에서 근조직에는 0.001026H+1.00을, 골조직에는 0.000304H+1.07을 얻었다. 균질 근조직에서 컴퓨터선량과 실측선량을 비교한 결과 중첩법과 FFT 콘볼루션(convolution) 법에서 6, 15 MV X선 모두 1.0% 오차 범위내에 있었으며, 폐조직층 통과한 경우 중첩법은 6 MV X선에서 평균 -1.2%, 골조직에는 평균 -2.9%를 보였고, 15 MV X선에서 2.7%와 2.2%를 얻었으며, FFT콘볼루션법은 6 MV X선에서 폐조직 2.8%, 골조직 -5.0%를 보였고, 15MV X선에서는 각각 6.0%, 0.2%를 보여 중첩법에 의한 치료계획선량이 신뢰성이 있음을 확인하였다. 본 실험을 통해 저자들은 각 임상기관에서 사용하고 있는 CT는 일정하지 않고 교정이 필요한 장비이므로, 발전된 치료계획시스템에 적용하고 있는 CT번호-전자밀도비에 대한 정기적인 확인이 필요하며, FFT 콘볼루션법에 비해 빔의 확산방향에 일치된 커널빔을 사용한 중첩법에서 오차가 적음을 확인하였다.

• 한국방사선학회논문지
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• 제11권6호
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• pp.501-508
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• 2017

방사선치료에 사용하는 CT 스캐너에 의해 획득된 CT 및 CBCT 전자밀도팬텀의 CT영상부터 CT수 대 물리적 밀도 변환에 관한 CT 스캐닝 매개변수의 의존성은 실험으로 분석하였다. CT수는 관전류량, 슬라이스 두께, 영상재구성 필터, 시야 그리고 팬텀 용적의 크기에 대해 의존하지 않았다. 그러나 CT수는 관전압과 팬텀 횡단면적 크기에 의존하였다. 결과로서, 물리적 밀도 1이상의 범위에 대하여, 90과 120 kVp 사이의 관전압에서 관측된 최대 CT수 차이는 27%이었고, 그리고 CT 몸통과 머리 전자밀도팬텀 사이에서 관측된 최대 CT수 차이는 15%이었다.