• 한국공작기계학회논문집
• /
• 제16권5호
• /
• pp.96-100
• /
• 2007

Condenser lens and objective lens are used to demagnify the image of the crossover to the final spot size. In lens, electrons are focused by magnetic fields. This fields is fringing field. It is important in electron focusing. Electron focusing occurs the radial component field and axial component field. Radial component produces rotational force and axial component produces radial force. Radial force causes the electron's trajectory to curve toward the optic axis and corss it. Focal length decreases as the current of lens increases. In this paper, we use the focal length for desiging the hardware of lens current control and present the results.

• 한국레이저가공학회지
• /
• 제12권2호
• /
• pp.26-30
• /
• 2009

Scanning Electron Microscopy (SEM) includes high voltage generator, electron gun, column, secondary electron detector, scan coil system and image grabber. Column includes electron lenses (condenser lens and objective lens). Condenser lens generates fringe field, makes focal length and control spot size. Focal length represents property of lens. Objective lens control focus. Most of the electrons emitted from the filament, are captured by the anode. The portion of the electron current that leaves the gun through the hole in the anode is called the beam current. Electron beam probe is called the focused beam on the specimen. Because of the lens and aperture, the probe current becomes smaller than the beam current. It generate various signals(backscattered electron, secondary electron) in an interaction with the specimen atoms. In this paper, we describe the result of research to develop the core elements for low-resolution SEM.

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2005년도 추계학술대회 논문집
• /
• pp.149-153
• /
• 2005

The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. The polepieces of these lenses are usually made with high purity iron which is hard to fabricate and very expensive. In this paper, the possibility of using polepiece of object lens composed with pure iron and low carbon steel was examined to reduce cost. The magnetic field at object lens was calculated with finite element method, and practical focusing qualities of SEM pictures were observed comparing for the object lens polepieces with pure iron and two type of composed with low carbon steel.

• 반도체디스플레이기술학회지
• /
• 제8권4호
• /
• pp.43-48
• /
• 2009

The aim of this paper is to describe the development of the electron-beam optic analysis algorithm for simulating the e-beam behavior concerned with electrostatic lenses and their focal properties in the micro-column of the multi-beam lithography system. The electrostatic lens consists of an array of electrodes held at different potentials. The electrostatic lens, the so-called einzel lens, which is composed of three electrodes, is used to focus the electron beam by adjusting the voltages of the electrodes. The optics of an electron beam penetrating a region of an electric field is similar to the situation in light optics. The electron is accelerated or decelerated, and the trajectory depends on the angle of incidence with respect to the equi-potential surfaces of the field. The performance parameters, such as the working distances and the beam diameters are obtained by the computational simulations as a function of the focusing voltages of the einzel lens electrodes. Based on the developed simulation algorithm, the high performance of the micro-column can be achieved through optimized control of the einzel lens.

• 한국공작기계학회논문집
• /
• 제16권6호
• /
• pp.163-167
• /
• 2007

A field emission electron gun including 3 electrodes including one cathode and two anodes is very important for high resolution electron microscope. To have functions to control the initially-emitted electron beam, two anodes act as an electrostatic lens according to equipotential lines by adjusting the spot size, intensity, and working distance. To verify the action of the electron beam by the electrostatic lens by changing several parameters such as electrode shape, displacement and applied voltage to the electrodes, the two lenses were design and simulated and then their performances were analyzed with angular beam intensity(distribution), electrical optic axis variation and their stability.

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2004년도 추계학술대회 논문집
• /
• pp.401-404
• /
• 2004

The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. To achieve small spot size as 1-2 nm for higher power of electron beam, magnetic lenses should be designed considering their magnetic field distribution. In this paper, the magnetic field at two condenser lenses and object lens are calculated with finite element method and discussed its performances.

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2007년도 추계학술대회 논문집
• /
• pp.461-462
• /
• 2007

• 한국공작기계학회논문집
• /
• 제15권2호
• /
• pp.24-29
• /
• 2006

The use electron-beam(E-beam) manufacturing system provides a means to alleviate optic exposure equipment's problems. We are developing an E-beam manufacturing system with scanning electron microscope(SEM) function. The E-beam manufacturing system consist of high voltage generator, beam blanker, condenser lenses, object lenses, stigmator and stage. The development of E-beam manufacturing system is used on the method of remaking SEM's structure. The functions of SEM are developed. It is important for the test of E-beam performance. In E-beam manufacturing system and SEM, beam focus is important function. In this paper, we propose intelligent remote control function for beam focus in E-beam manufacturing system. The function extends the user's function and gives convenience.

• 한국공작기계학회논문집
• /
• 제16권6호
• /
• pp.153-158
• /
• 2007

The present study covers numerical analysis of a thermionic scanning electron microscope(SEM) column. The SEM column contains an electron optical system in which electrons are emitted and moved to form a focused beam, and this generates secondary electrons from the specimen surfaces, eventually making an image. The electron optical system mainly consists of a thermionic electron gun as the beam source, the lens system, the electron control unit, and the vacuum unit. For a systematic design of the electron optical system, the beam trajectories are investigated through numerical analyses by tracing the ray path of the electron beams, and the quality of resulting image is evaluated from the analysis results.

• 한국공작기계학회:학술대회논문집
• /
• 한국공작기계학회 2005년도 춘계학술대회 논문집
• /
• pp.15-18
• /
• 2005

We have designed and fabricated a thermal scanning electron microscopy. It includes an electron source, two condenser lenses, one objective lens, a scanning coil and a stigmator coil for focusing in column and also have a secondary electron detector for constructing the image in chamber with a high vacuum condition and control part for operating the SEM. Especially, in order for us to find out the optical characteristics, our attention and studies have been concentrated on the effects of two condenser lenses and one objective lens for high resolution with SEM. Finally, we developed a high resolution thermal scanning electron microscopy.