• Title/Summary/Keyword: Electron gun

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Machining Technology for the Micro-Burr Removal using Electro-Magnetic Field Effect (전자기장 효과를 이용한 마이크로 버 제거 가공기술)

  • 이용철;이종열;김전하;안재현;김정석;이득우
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.561-564
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    • 2003
  • The machining technology for the removal of micro-burr has been demanded because electrode parts of electron gun have minute holes. In this study, Magnetic Assisted Polishing(MAP) is applied to remove the micro-burr instead of the contentional polishing process such as the etching and barrel. Optimal polishing conditions are selected from many experiments using the tool of the flat end slit type. On the basis of experimental results, the deburring machine for the Magnetic Assisted Polishing of electrode part is developed and its performance is evaluated.

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FIRST OPERATING TEST OF THE 700 MHz 1 MW PROTOTYPE KLYSTRON FOR A PROTON ACCELERATOR

  • Ko, Seung-Kook;Lee, Bo-Young;Lee, Kang-Ok;Hong, Jin-Seok;Jeon, Jae-Ha;Chung, Bo-Hyun;Noh, Seung-Jeong;Chung, Kie-Hyung
    • Nuclear Engineering and Technology
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    • v.38 no.8
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    • pp.779-784
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    • 2006
  • The design, manufacturing process, and first operating test of a high power RF source for a proton accelerator are described. A klystron amplifier system has been developed for operation at 700 MHz, 1 MW and is composed of a triode type electron gun, six cavities, an RF output window, a beam collector, and an electromagnet. The prototype klystron was constructed and tested at a reduced duty to produce the designed output RF power.

Characterization Method for Testing Circuit Patterns on MCM/PCB Modules with Electron Beams of a Scanning Electron Microscope (MCM/PCB 회로패턴 검사에서 SEM의 전자빔을 이용한 측정방법)

  • Kim, Joon-Il;Shin, Joon-Kyun;Jee, Yong
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.9
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    • pp.26-34
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    • 1998
  • This paper presents a characterization method for faults of circuit patterns on MCM(Multichip Module) or PCB(Printed Circuit Board) substrates with electron beams of a SEM(Scanning Electron Microscope) by inducing voltage contrast on the signal line. The experimentation employes dual potential electron beams for the fault characterization of circuit patterns with a commercial SEM without modifying its structure. The testing procedure utilizes only one electron gun for the generation of dual potential electron beams by two different accelerating voltages, one for charging electron beam which introduces the yield of secondary electron $\delta$ < 1 and the other for reading beam which introduces $\delta$ > 1. Reading beam can read open's/short's of a specific net among many test nets, simultaneously discharging during the reading process for the next step, by removing its voltage contrast. The experimental results of testing the copper signal lines on glass-epoxy substrates showed that the state of open's/short's had generated the brightness contrast due to the voltage contrast on the surface of copper conductor line, when the net had charged with charging electron beams of 7KV accelerating voltages and then read with scanning reading electron beams of 2KV accelerating voltages in 10 seconds. The experimental results with Au pads of a IC die and Au plated Cu pads of BGA substrates provided the simple test method of circuit lines with 7KV charging electron beam and 2KV reading beam. Thus the characterization method showed that we can test open and short circuits of the net nondestructively by using dual potential electron beams with one SEM gun.

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Structural Design on the Vacuum Chamber of Electron Beam Welding System (전자빔 용접기 진공 작업실의 구조설계)

  • Lee, Young-Sin;Ryu, Chung-Hyun;Seo, Jung;Han, Yu-Hee
    • Laser Solutions
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    • v.1 no.1
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    • pp.11-17
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    • 1998
  • The electron beam welding system has the advantages of the high power density, narrow welding section, and small thermal distortion of a workpiece. Recently, the electron beam welding system is widely used to the airplane engineering, nuclear power plant, and automobile industry. In the present paper, the structural analyses on the vacuum chamber of the electron beam welding system are performed by the F.E.M. analysis. The stiffening characteristics on the geometric shape, stiffener height and stiffener span are investigated. The deflection of the stiffened vacuum chamber under pressure is minimized by longitudinal and transverse stiffeners which are continuous in both direction.

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Development of Intelligent Remote Beam Control Function in E-Beam Manufacturing System (전자빔 가공기의 지능형 원격 빔 조절 기능의 개발)

  • Lim Sun-Jong;Lyou Joon
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.15 no.2
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    • pp.24-29
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    • 2006
  • The use electron-beam(E-beam) manufacturing system provides a means to alleviate optic exposure equipment's problems. We are developing an E-beam manufacturing system with scanning electron microscope(SEM) function. The E-beam manufacturing system consist of high voltage generator, beam blanker, condenser lenses, object lenses, stigmator and stage. The development of E-beam manufacturing system is used on the method of remaking SEM's structure. The functions of SEM are developed. It is important for the test of E-beam performance. In E-beam manufacturing system and SEM, beam focus is important function. In this paper, we propose intelligent remote control function for beam focus in E-beam manufacturing system. The function extends the user's function and gives convenience.

Determination of Inelastic Collision Cross Sections for $C_{3}F_{8}$ Molecule by Multi-term Boltzmann Equation Analysis

  • Jeon, Byung-Hoon;Ha, Sung-Chul
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.934-941
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    • 2000
  • We measured the electron transport coefficients, the electron drift velocity W and the longitudinal diffusion coefficient $D_{L}$ in the 0.526% and 5.05% $C_{3}F_{8}$-Ar mixtures over the E/N range from 0.01 Td to 100 Td by the double shutter drift tube, and compared the measured results by Hunter et al. with those. We determined the inelastic collision cross sections for the $C_{3}F_{8}$ molecule by the comparison of the present measurements and the calculation of electron transport coefficients in the $C_{3}F_{8}$-Ar mixtures by using a multi-term Boltzmann equation analysis.

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The Effect of Sheet Resistance of Polysilicon Resistor with Contact Implantation and Metal Deposition (contact 이온주입과 Metal 증착이 다결정 실리콘저항의 면저항에 미치는 영향)

  • 박중태;최민성;이문기;김봉렬
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.24 no.6
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    • pp.969-974
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    • 1987
  • High value sheet resistance (Rs, 350 \ulcorner/ -80 K \ulcorner/ ) borom implanted polysilicon resistors were fabricated under process condition compatible with bipolar integrated circuits fabrication. This paper includes the effect of contact ion implantation on Rs and the effect of electron gun(e-gun) deosition vs. non e-gun evaporated metal contacts on the Rs. From results, we observed that the contact ion implanted samples showed higher Rs value than those without contact ion implantation. Also, it was shown that there is noticeable amount of Rs degradation for e-gun samples, while sputtered samples expressed little Rs degradation after PtSi was formed.

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A Measurements of Radio-Frequency Induction Discharge Plasma using probe method (고주파 유도방전 플라즈마의 푸로우브법에 의한 계측)

  • Park, Sung-Gun;Park, Sang-Yun;Ha, Chang-Ho;Park, Won-Zoo;Lee, Kwang-Sik;Lee, Dong-In
    • Proceedings of the KIEE Conference
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    • 1997.07e
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    • pp.1657-1659
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    • 1997
  • Electron temperature and electron density were measured in a radio-frequency inductively coupled plasma (RFICP) using a probe measurements. Measurement was conducted in an argon discharge for pressures from 10 [mTorr] to 40 [mTorr] and input rf power from 100 [W] to 800 [W], Ar flow rate from 5 [sccm] to 30 [sccm], Spatial distribution electron temperature and electron density were measured for discharge with same aspect ratio (R/L=2). Electron temperature and electron density were discovered depending on both pressure and power, Ar flow rate. Electron density was increased with increasing input power and in creasing pressure, increasing Ar flow rate. Radial distribution of the electron density was peaked in the plasma center. Normal distribution of the electron density was peaked in the center between quartz plate and substrate. From these results, We found out the generation mechanism of Radio-Frequency Inductively Coupled Plasma.

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Finite Element Analysis for Electron Optical System of a Thermionic SEM (열전자방사형 주사전자 현미경 전자광학계의 유한요소해석)

  • Park, Keun;Jung, Huen-U.;Kim, Dong-Hwan;Jang, Dong-Young
    • Proceedings of the KSME Conference
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    • 2007.05a
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    • pp.1288-1293
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    • 2007
  • The present study covers the design and analysis of a thermionic scanning electron microscope (SEM) column. The SEM column contains an electron optical system in which electrons are emitted and moved to form a focused beam, and this generates secondary electrons from the specimen surfaces, eventually making an image. The electron optical system mainly consists of a thermionic electron gun as the beam source, the lens system, the electron control unit, and the vacuum unit. In the design process, the dimension and capacity of the SEM components need to be optimally determined with the aid of finite element analyses. Considering the geometry of the filament, a three-dimensional (3D) finite element analysis is utilized. Through the analysis, the beam emission characteristics and relevant trajectories are predicted from which a systematic design of the electron optical system is enabled. The validity of the proposed 3D analysis is also discussed by comparing the directional beam spot radius. As a result, a prototype of a thermionic SEM is successfully developed with a relatively short time and low investment costs, which proves the adoptability of the proposed 3D analysis.

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