• Title/Summary/Keyword: Electron beam-physical vapor deposition

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Solid State Cesium Ion Beam Sputter Deposition

  • Baik, Hong-Koo
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1996.06a
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    • pp.5-18
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    • 1996
  • The solid state cesium ion source os alumino-silicate based zeolite which contains cerium. The material is an ionic conductor. Cesiums are stably stored in the material and one can extract the cesiums by applying electric field across the electrolyte. Cesium ion bombardment has the unique property of producing high negative ion yield. This ion source is used as the primary source for the production of a negative ion without any gas discharge or the need for a carrier gas. The deposition of materials as an ionic species in the energy range of 1.0 to 300eV is recently recognized as a very promising new thin film technique. This energetic non-thermal equilibrium deposition process produces films by “Kinetic Bonding / Energetic Condensation" mechansim not governed by the common place thermo-mechanical reaction. Under these highly non-equilibrium conditions meta-stable materials are realized and the negative ion is considered to be an optimum paeticle or tool for the purpose. This process differs fundamentally from the conventional ion beam assisted deposition (IBAD) technique such that the ion beam energy transfer to the deposition process is directly coupled the process. Since cesium ion beam sputter deposition process is forming materials with high kinetic energy of metal ion beams, the process provider following unique advantages:(1) to synthesize non thermal-equilibrium materials, (2) to form materials at lower processing temperature than used for conventional chemical of physical vapor deposition, (3) to deposit very uniform, dense, and good adhesive films (4) to make higher doposition rate, (5) to control the ion flux and ion energy independently. Solid state cesium ion beam sputter deposition system has been developed. This source is capable of producing variety of metal ion beams such as C, Si, W, Ta, Mo, Al, Au, Ag, Cr etc. Using this deposition system, several researches have been performed. (1) To produce superior quality amorphous diamond films (2) to produce carbon nitirde hard coatings(Carbon nitride is a new material whose hardness is comparable to the diamond and also has a very high thermal stability.) (3) to produce cesiated amorphous diamond thin film coated Si surface exhibiting negative electron affinity characteristics. In this presentation, the principles of solid state cesium ion beam sputter deposition and several applications of negative metal ion source will be introduced.

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Influence of Subsurface Layer on the Indentation Damage Behavior of YSZ Thermal Barrier Coating Layers Deposited by Electron Beam Physical Vapor Deposition (전자 빔 물리적 증착(EB-PVD)법으로 코팅된 YSZ 열차폐층의 압흔손상 거동에 대한 하부층의 영향)

  • Heo, Yong-Suk;Park, Sang-Hyun;Han, In-Sub;Woo, Sang-Kuk;Jung, Yeon-Gil;Paik, Un-Gyu;Lee, Kee-Sung
    • Journal of the Korean Ceramic Society
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    • v.45 no.9
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    • pp.549-555
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    • 2008
  • The thermal barrier coating must withstand erosion when subjected to flowing gas and should also maintain good stability and mechanical properties while it must also protect the turbine component from high temperature, hot corrosion, creep, and oxidation during operation. In this study we investigated the influence of subsurface layer, $Al_2O_3$ or NiCrCoAIY bond coat layer, on the indentation damage behavior of YSZ thermal barrier coating layers deposited by electron beam physical vapor deposition (EB-PVD). The bond coat is deposited using different process such as air plasma spray (APS) or spray of high velocity oxygen fuel (HVOF) and the thickness is varied. Hertzian indentation technique is used to induce micro damages on the coated layer. The stress-strain behaviors are characterized by results of the indentation tests.

Deposition uniformity of 7 wt% YSZ as a thermal barrier coating with different configurational arrangement for turbine blade shape mock-up by electron beam physical vapor deposition (터빈블레이드 형상 mock-up의 기하학적 배치조건에 따른 전자빔 물리기상증착법으로 제조된 7 wt% YSZ 열차폐 코팅의 코팅 균일성)

  • Oh, Yoon-Suk;Chae, Jung-Min;Ryu, Ho-lim;Han, Yoon-Soo;An, Jong-Kee;Son, Myung-Sook;Kim, Hong-Kyu
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.29 no.6
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    • pp.308-316
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    • 2019
  • Electron beam physical vapor deposition (EBPVD) is a conventional method to fabricate thermal barrier coating (TBC) of high temperature airfoil engine parts, such as blade etc. for its high temperature structural stability from the nature of columnar growth behavior. For the high quality of TBC by EBPVD, the structural factors, such as growth behavior, thickness uniformity and so on, should be managed to obtain the coating which satisfied the required specifications of usable level of mechanical and thermal properties. In this study, the growth behavior and structure variations of 7YSZ (7 wt% yttria stabilized zirconia) coatings with different configurational deposition parameters for the specimens which have turbine blade shape mock-up were investigated. Growth behavior of coatings were studied by comparing computational modeling of evaporation behavior with actual deposition process using e-beam source.

Improved Electrical Properties of Graphene Transparent Conducting Films Via Gold Doping

  • Kim, Yoo-Seok;Song, Woo-Seok;Kim, Sung-Hwan;Jeon, Cheol-Ho;Lee, Seung-Youb;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.388-388
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    • 2011
  • Graphene, with its unique physical and structural properties, has recently become a proving ground for various physical phenomena, and is a promising candidate for a variety of electronic device and flexible display applications. The physical properties of graphene depend directly on the thickness. These properties lead to the possibility of its application in high-performance transparent conducting films (TCFs). Compared to indium tin oxide (ITO) electrodes, which have a typical sheet resistance of ~60 ${\Omega}/sq$ and ~85% transmittance in the visible range, the chemical vapor deposition (CVD) synthesized graphene electrodes have a higher transmittance in the visible to IR region and are more robust under bending. Nevertheless, the lowest sheet resistance of the currently available CVD graphene electrodes is higher than that of ITO. Here, we report an ingenious strategy, irradiation of MeV electron beam (e-beam) at room temperature under ambient condition,for obtaining size-homogeneous gold nanoparticle decorated on graphene. The nano-particlization promoted by MeV e-beam irradiation was investigated by transmission electron microscopy, electron energy loss spectroscopy elemental mapping, and energy dispersive X-ray spectroscopy. These results clearly revealed that gold nanoparticle with 10~15 nm in mean size were decorated along the surface of the graphene after 1.0 MeV-e-beam irradiation. The fabrication high-performance TCF with optimized doping condition showed a sheet resistance of ~150 ${\Omega}/sq$ at 94% transmittance. A chemical transformation and charge transfer for the metal gold nanoparticle were systematically explored by X-ray photoelectron spectroscopy and Raman spectroscopy. This approach advances the numerous applications of graphene films as transparent conducting electrodes.

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Correlation between Physical Defects and Performance in AlGaN/GaN High Electron Mobility Transistor Devices

  • Park, Seong-Yong;Lee, Tae-Hun;Kim, Moon-J.
    • Transactions on Electrical and Electronic Materials
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    • v.11 no.2
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    • pp.49-53
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    • 2010
  • Microstructural origins of leakage current and physical degradation during operation in product-quality AlGaN/GaN high electron mobility transistor (HEMT) devices were investigated using photon emission microscopy (PEM) and transmission electron microscopy (TEM). AlGaN/GaN HEMTs were fabricated with metal organic chemical vapor deposition on semi-insulating SiC substrates. Photon emission irregularity, which is indicative of gate leakage current, was measured by PEM. Site specific TEM analysis assisted by a focused ion beam revealed the presence of threading dislocations in the channel below the gate at the position showing strong photon emissions. Observation of electrically degraded devices after life tests revealed crack/pit shaped defects next to the drain in the top AlGaN layer. The morphology of the defects was three-dimensionally investigated via electron tomography.

Tendency of PVD coating technology on Metal cutting tools (금속 절삭공구에 대한 PVD 코팅기술의 동향)

  • Kim, Jong-Seong
    • Journal of the Korean Society for Precision Engineering
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    • v.18 no.8
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    • pp.11-17
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    • 2001
  • Industrial use of physical vapor deposition(PVD) has been widely expanded during last two decades, and in the mean time plasma assistance in PVD has become an essential tool in preparing compound films with dense microstructure. The principles of electron beam-based plating, balanced and unbalanced magnetron sputtering and cathodic arc deposition. consisting three basic configuration of plasma assisted PVD(PAPVD)process, were reviewed. Recent technical development in PVD coating process were discussed. This paper tries to show tendency for developing new coating film on cutting tools.

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MAGNETIC AND MAGNETO-OPTICAL PROPERTIES OF Co-BASED MULTILAYERED FILMS PREPARED BY ELECTRON-BEAM EVAPORATION

  • Lee, Y.P.;Lee, B.J.;Park, H.K.;Kim, S.K.;Kang, J.S.;Jeong, J.I.
    • Journal of the Korean Vacuum Society
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    • v.4 no.S2
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    • pp.24-29
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    • 1995
  • The magnetic amd magneto-optical(MO)properties of Co-based multilayered(ML)films are known to vary sensitively according to the manufacturing methods and the film microstructures. Co/Pd and Co/Pt ML films with ultrathin layers of Co were prepared by alternating deposition in an ultrahigh-vacuum physical-vapor-deposition system. The individual layer thicknesses of the samples were estimated making use of the angular positions of x-ray diffraction peaks. The magnetic and MO properties were investigated, and correlated systematically to the structural parameters of the films. A Kerr spectrometer was self-manufactured to measure the MO properties such as Kerr rotation angle, ellipticity and reflectivity. The rms surface roughness was also measured using atomic force microscopy. Some of the samples showed good properties for MO medium, such as large perpendicular magnetic anisotropy and Kerr rotation, and perfect squareness of the magnetic hysteresis loop.

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Enhanced Optical Properties of Au Nanoparticles/ZnO Nanowires Fabiracted by X-ray Induced Wet Process

  • Lee, Mu-Seong;Gang, Hyeon-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.318.1-318.1
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    • 2014
  • Metal nano-crystals have been received much attentions owing to their excellent catalytic property and surface plasmon effect. In the last decade, many studies on synthesizing well-dispersive nanoparticles and on understanding their distinct physical properties have been performed. There were tremendous reports revealing the electrochemical activities and enhancement of surface plasmonic effect were dependent mainly on the size, shape, and composition. So far, most fabrication methods have been based on vacuum based deposition techniques, such as chemical vapor deposition and electron-beam evaporation, and then annealed them to transform into the nanoparticles. Recently, there were several reports regarding to the photoinduced nano-crystal synthesis as an effective way to produce the metal nanoparticles. In this study, we report synchrotron x-ray mediated synthesis of Au nanoparticles on ZnO nanowires. ZnO nanowires were fabricated by hydrothermal method, and then they were dip into a solution having Au clusters. Detailed structural evolution of Au nanoparticles was investigated using scanning electron microscopy and photoluminescence measurements. The results on formation of well-dispersive Au nanoparticles on ZnO nanowires will be presented.

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Effect of Substrate Temperature and O2 Introduction With ITO Deposition by Electron Beam Evaporation on Polycyclic Olefin Polymer (전자빔으로 폴리사이클릭 올레핀 기판에 ITO 증착시 기판온도 및 산소 도입의 영향)

  • Ahn, Hee-Jun;Ha, KiRyong
    • Applied Chemistry for Engineering
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    • v.16 no.6
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    • pp.742-748
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    • 2005
  • Transparent conductive indium-tin oxide (ITO) films are widely used as transparent electrodes for flat panel displays. Many of the ITO films for practical use have been prepared by magnetron sputtering, chemical vapor deposition, electron beam evaporation, etc. An oxide target composed of 10 wt% $SnO_2$ and 90 wt% $In_2O_3$ has been deposited onto polycyclic olefin polymer (POP) substrate by electron beam evaporation. POP has a higher glass transition temperature ($Tg=330^{\circ}C$) than other conventional polymers. In this study, the effects of substrate temperature and the $O_2$ introduction flow rate were investigated in terms of physical, electrical and optical properties of deposited ITO films. We investigated the effects of processing variables such as substrate temperature and the oxygen introduction flow rate. The best electrical and optical properties of deposited ITO films obtained from this study were electrical resistivity value of ${\rho}=1.78{\times}10^{-3}{\Omega}{\cdot}cm$ and optical transmittance of about 85% at 8 sccm (Standard Cubic Centimeter per Minute) $O_2$ introduction flow rate, $5{\AA}/sec$ deposition rate, $1000{\AA}$ deposited ITO thickness and $200^{\circ}C$ substrate temperature.

Failure Mechanisms for Zirconia Based Thermal Barrier Coatings

  • Lee, Eui Y.;Kim, Jong H.
    • The Korean Journal of Ceramics
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    • v.4 no.4
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    • pp.340-344
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    • 1998
  • Failure mechanisms were investigated for the two layer thermal barrier coatings consisting of NiCrAlY bond coat and $ZrO_2$-8wt.% $Y_2O_3$ ceramic coating during cyclic oxidation. $Al_2O_3$ developed at the ceramic coating/bond coat interface first, followed by the Cr/Ni rich oxides such as $NiCr_2O_4$ and $Ni(Al, Cr)_2O_4$ during cyclic oxidation. It was observed that the spalling of ceramic coatings took place primarily within the NiCrAlY bond coat oxidation products or at the interface between the bond coat oxidation products and zirconia based ceramic coating or the bond coat. It was also observed that the fracture within these oxidation products occurred with the formation of $Ni(Cr, Al)_2O_4$ spinel or Cr/Ni rich oxides. It was therefore concluded that the formation of these oxides was a life-limiting event for the thermal barrier coatings.

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