• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 춘계학술대회 논문집
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• pp.1875-1878
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• 2005

It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, column unit build up with electron beam gun head unit is necessarily required more than anything else to modify scanning electron microscope. In this study, various components included ceramic isolation plate and main body which are essentially constructed for electron beam gun head unit are designed and manufactured. And this electron beam gun head unit will be used for next connected study in the development step of scanning electron microscope based electron beam machining system.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 추계학술대회 논문집
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• pp.698-701
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• 2005

We have investigated experimentally a nano patterning using electron beam lithography for the nickel stamper fabrication. Recently, DVD and Blu-ray disk(BD) have nano-scale patterns in order to increase the storage density. Specially, BD has 100nm-scale patterns which are generally fabricated by electron beam lithography. In this paper, we found optimum condition of electron-beam lithography for 100nm-scale patterning. We controlled various conditions of EHP(acceleration voltage), beam current, dose and aperture size in order to obtain optimum conditions. We used 100nm-thick PMMA layer on a silicon wafer as photoresist. We found that EHP was the most dominant factor in electron-beam lithography.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.1017-1020
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• 2004

It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, column unit build up with several electo-magnetic lens is necessarily required more than anything else to modify scanning electron microscope. In this study, various components included several electro-magnetic lens and main body which are essentially constructed for column unit are designed and manufactured. And this established column unit will be used for next connected study in the development step of scanning electron microscope based electron beam machining system.

• Design & Manufacturing
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• 제14권1호
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• pp.56-62
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• 2020

An electron beam was used to mainly utilize for polishing, finishing, welding, a lithography process, etc. Due to the high technical level of difficulty of high-power density electron beam, it is difficult to secure related technologies. In this study, research was carried out to improve the machinability by developing the vaporized amplification sheets to realize the electron beam drilling technology. Their vaporized amplification sheets were analyzed by using the measurement of chemical and composition, which is such as TGA, SEM. We analyzed micro-hole processing using a microscope. Also, the thermal characteristics of vaporized amplification sheets are highly significant for applying to high-power density electron beam technique. So, we finished the vaporized amplification sheets according to the process conditions and analyzed it according to the machining conditions of the electron beam. It was confirmed that the effect on the experimental results differs depending on the influence of the metal powder contained in the developed material.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2008년도 춘계학술대회 논문집
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• pp.939-940
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• 2008

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 추계학술대회 논문집
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• pp.535-536
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• 2010

• Design & Manufacturing
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• 제14권2호
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• pp.62-68
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• 2020

Recently, research on precise parts required in aerospace, ship, and automobile industries has been actively conducted. In this paper, electron beam drilling machining parameters were selected and experiments were conducted to compare processing characteristics analysis according to machining parameters through machining experiments of a vaporization amplification sheet to which STS 304 was applied. Also, as a result of measuring the machining. As the thickness gradually increased, it was confirmed that the electron beam could not reach the vaporization amplification sheet and thus melted on the surface of the material. As a result of the experimental analysis, it was analyzed that the vaporization explosion reaction of the vaporization amplification sheet was not normally performed due to the working distance (WD) according to the material thickness.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 춘계학술대회 논문집
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• pp.1741-1744
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• 2005

The electron beam machining provides very high resolution up to nanometer scale, hence the E-Beam writing technology is rapidly growing in MEMS and nano-engineering areas. For E-Beam machining, $2^{nd}$ electron detector is required to see a machined sample at the stage. The $2^{nd}$ electron detector is composed of scintillator and photomultiplier with signal amplifier and high voltage power supplier. Since a photomultiplier tube is an extremely high-sensitivity photodetector, the signal light level to be detected is very low and therefore particular care must be exercised in shielding external light. In this paper, the design methodology of $2^{nd}$ electron detector and the image noise removal method are introduced.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.890-893
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• 2004

The ultra precision machining in industrial field are increased day by day. The diamond turning has been used generally, but now is faced with limitation of use, because of higher requirement of production field. The electron beam lithography is alternative in machining area as semiconductor production. For EB lithography, 5 axis vacuum stage is required to duplicate small and large patterns on wafer. The stage is composed of 2 rotational axis and 3 translational axis with 5 DC servo motors. The positioning repeatability and resolution of Z axis feed unit are 3.21$\mu$m and 0.5 $\mu$m/step enough to apply to lithography.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.401-404
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• 2004

The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. To achieve small spot size as 1-2 nm for higher power of electron beam, magnetic lenses should be designed considering their magnetic field distribution. In this paper, the magnetic field at two condenser lenses and object lens are calculated with finite element method and discussed its performances.