• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1875-1878
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• 2005

It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, column unit build up with electron beam gun head unit is necessarily required more than anything else to modify scanning electron microscope. In this study, various components included ceramic isolation plate and main body which are essentially constructed for electron beam gun head unit are designed and manufactured. And this electron beam gun head unit will be used for next connected study in the development step of scanning electron microscope based electron beam machining system.

• Journal of the Korean Vacuum Society
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• v.12 no.1
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• pp.1-6
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• 2003

An axial electron beam gun system, which emits the electron beam power of 50 kW, has been manufactured. The electron beam gun consists of two parts. One is the electron beam generation part. including the filament, cathode, and anode. The maximum beam current is 2 A and the acceleration voltage is 25 kV. The other part includes the focusing-, deflection-, and scanning coils. The beam diameter and ham trajectory can be controlled by these coils. The characteristic of each part is measured ior the optimum condition of evaporation process. Moreover, Helmholtz coil is installed inside the vacuum chamber to adjust the incident angel of the beam to the melting surface for the maximum evaporation. We report on the evaporation rates for zirconium(Zr) and gadolinium(Gd) metals which have the high melting temperatures.

• Nuclear Engineering and Technology
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• v.46 no.3
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• pp.387-394
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• 2014

A Slowing Down Time Spectrometer (SDTS) system is a highly efficient technique for isotopic nuclear material content analysis. SDTS technology has been used to analyze spent nuclear fuel and the pyro-processing of spent fuel. SDTS requires an external neutron source to induce the isotopic fissile fission. A high intensity neutron source is required to ensure a high for a good fissile fission. The electron linear accelerator system was selected to generate proper source neutrons efficiently. As a first step, the electron generator of an 80-keV electron gun was manufactured. In order to produce the high beam power from electron linear accelerator, a proper beam current is required form the electron generator. In this study, the beam current was measured by evaluating the performance of the electron generator. The beam current was determined by five parameters: high voltage at the electron gun, cathode voltage, pulse width, pulse amplitude, and bias voltage at the grid. From the experimental results under optimal conditions, the high voltage was determined to be 80 kV, the pulse width was 500 ns, and the cathode voltage was from 4.2 V to 4.6 V. The beam current was measured as 1.9 A at maximum. These results satisfy the beam current required for the operation of an electron linear accelerator.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.16 no.6
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• pp.163-167
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• 2007

A field emission electron gun including 3 electrodes including one cathode and two anodes is very important for high resolution electron microscope. To have functions to control the initially-emitted electron beam, two anodes act as an electrostatic lens according to equipotential lines by adjusting the spot size, intensity, and working distance. To verify the action of the electron beam by the electrostatic lens by changing several parameters such as electrode shape, displacement and applied voltage to the electrodes, the two lenses were design and simulated and then their performances were analyzed with angular beam intensity(distribution), electrical optic axis variation and their stability.

• Proceedings of the KIEE Conference
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• 2011.07a
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• pp.1580-1581
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• 2011

The linear accelerator of Pohang Accelerator Laboratory(PAL) will drive a top-up mode operation in PLS-II(Pohang Light Source-II). Due to this kind of the operation mode, the electron gun is expected to have shorter life time of the cathode. Further in the PLS-II, two gate valves will be installed in front of the electron gun. The distance between the pre-bunching section and the electron gun will increase by 400 mm compared to the existing system due to the insertion of these gate valves. As a result the incident electron beam. One of the goals to improve the beam pulse width is by incorporating suitable biased voltage. In this paper, we will present test results of beam pulse width as a function of different biased voltage and focusing solenoid coil.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.619-620
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• 2009

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.385-387
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• 2002

The electron beam simulation technology is indispensable for the recent electron gun design. The technology is becoming more and more important for deflection yoke (DY) design and investigation of the interference effects between gun and DY. Further, it may become vital even for shadow mask, glass funnel, exposure lens and magnetic shield.

• Laser Solutions
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• v.12 no.2
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• pp.26-30
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• 2009

Scanning Electron Microscopy (SEM) includes high voltage generator, electron gun, column, secondary electron detector, scan coil system and image grabber. Column includes electron lenses (condenser lens and objective lens). Condenser lens generates fringe field, makes focal length and control spot size. Focal length represents property of lens. Objective lens control focus. Most of the electrons emitted from the filament, are captured by the anode. The portion of the electron current that leaves the gun through the hole in the anode is called the beam current. Electron beam probe is called the focused beam on the specimen. Because of the lens and aperture, the probe current becomes smaller than the beam current. It generate various signals(backscattered electron, secondary electron) in an interaction with the specimen atoms. In this paper, we describe the result of research to develop the core elements for low-resolution SEM.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.1059-1063
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• 2002

The evolution of color CRT electron gun design over the past 40 years is addressed. Many milestones of CRT E-gun design are cited. For the future survival of color CRT the multi-beam group color E-gun and the recently announced multi-beam type index gun are suggested as the answer to the challenge of the next generation's requirements of low power and high performance color CRT

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.395-398
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• 2002

The spherical aberration and optical integer (f) of the electron gun's main lens in color CRT is obtained, using electron beam trajectory. A spherical aberration is obtained from the relation between the object plane and the image of a beam trajectory. To analyze beam profile, 3rd and 1st order coefficient were obtained and used. It is shown that, in practice, they are applied to electron gun design.